JPH056512A - Production of thin-film magnetic head - Google Patents
Production of thin-film magnetic headInfo
- Publication number
- JPH056512A JPH056512A JP1351091A JP1351091A JPH056512A JP H056512 A JPH056512 A JP H056512A JP 1351091 A JP1351091 A JP 1351091A JP 1351091 A JP1351091 A JP 1351091A JP H056512 A JPH056512 A JP H056512A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- film
- thin film
- magnetic head
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は磁気ディスク装置等に用
いられる薄膜磁気ヘッドの製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thin film magnetic head used in a magnetic disk device or the like.
【0002】[0002]
【従来の技術】薄膜磁気ヘッドは浮上レールを有するス
ライダにコイル導体や磁気ギャップなどを有する電磁変
換素子等が形成されて概略構成されている。2. Description of the Related Art A thin film magnetic head is generally constructed by forming an electromagnetic conversion element having a coil conductor and a magnetic gap on a slider having a flying rail.
【0003】一般にこの薄膜磁気ヘッドを製造する工程
は大きく分けて薄膜形成プロセスとスライス・研摩工程
とに分けることができる。Generally, the process of manufacturing the thin film magnetic head can be roughly divided into a thin film forming process and a slicing / polishing process.
【0004】薄膜形成プロセスでは、図3(a)に示すよ
うな表面にAl2O3等の被膜されたアルチックからなる
ウエハ10を用い、このウエハ10の片面に多数の電磁
変換素子やボンディングパッドを薄膜形成法により積層
し、複数のチップを形成する。In the thin film forming process, a wafer 10 made of AlTiC whose surface is coated with Al 2 O 3 or the like as shown in FIG. 3A is used, and a large number of electromagnetic conversion elements and bonding pads are formed on one surface of the wafer 10. Are laminated by a thin film forming method to form a plurality of chips.
【0005】その後、スライス・研摩工程において、ウ
エハ10から各チップを切り出し、またそれら切り出し
た各チップに研摩等の加工を施して浮上レールを有する
スライダ状に加工して薄膜磁気ヘッドを製造する。After that, in a slicing / polishing step, each chip is cut out from the wafer 10, and each cut-out chip is processed by polishing or the like to be processed into a slider having a flying rail to manufacture a thin film magnetic head.
【0006】[0006]
【発明が解決しようとする課題】上記製造工程で薄膜形
成プロセスにおいて、ウエハ10に成膜する際には、ス
パッタもしくは蒸着メッキ等によりウエハ10に膜付け
を行うが、その際の熱または膜応力によってウエハ10
に図3(b)に示すような反りが生じてしまい易いもので
あった。In the thin film forming process in the above manufacturing process, when a film is formed on the wafer 10, a film is formed on the wafer 10 by sputtering or vapor deposition plating, but heat or film stress at that time is applied. By wafer 10
In addition, a warp as shown in FIG.
【0007】このウエハ10の反りはレジスト塗布の塗
布ムラやマスク合わせ等のアライメント時の位置ずれや
トラック幅のずれ等の原因となり、高精度が要求される
薄膜磁気ヘッドの製造にとって大きな障害となるもので
あった。The warp of the wafer 10 causes coating unevenness in resist coating, positional deviation during alignment such as mask alignment, and track width deviation, which is a major obstacle to the manufacture of a thin film magnetic head that requires high accuracy. It was a thing.
【0008】また薄膜磁気ヘッドの軽薄短小化の要求や
大量生産等や合理化の必要性から、ウエハの現状の寸法
は一般的に直径が約3インチで厚みが約4mmであるが、
今後のウエハの寸法は直径が約4〜6.0インチと大き
くなり、厚みが約2.8〜2mmとより薄くなることが予
測され、ウエハの反りの問題がクローズアップされるこ
とは必然的である。Due to the demand for thin, thin and compact thin-film magnetic heads, mass production, and rationalization, the current wafer size is generally about 3 inches in diameter and about 4 mm in thickness.
It is expected that the size of wafers in the future will increase to about 4 to 6.0 inches in diameter and thinner to about 2.8 to 2 mm, and it is inevitable that the problem of wafer warpage will be highlighted. Is.
【0009】本発明は上記課題を解決するためになされ
たもので、薄膜磁気ヘッドの製造過程中で、ウエハに反
りが生じることのない薄膜磁気ヘッドの製造方法を提供
するものである。The present invention has been made to solve the above problems, and provides a method of manufacturing a thin film magnetic head in which the wafer is not warped during the manufacturing process of the thin film magnetic head.
【0010】[0010]
【課題を解決するための手段】請求項1記載の薄膜磁気
ヘッドの製造方法は、ウエハの片面に下部磁性層,コイ
ル導体,絶縁層,上部磁性層などを有する電磁変換素子を
薄膜形成法で積層して複数のチップを整列状態で形成
し、これらを切り出してスライダ状に加工して薄膜磁気
ヘッドを製造する方法において、ウエハに薄膜を形成す
る工程中に各チップの周囲に膜分断溝を形成することを
特徴とするものである。A method of manufacturing a thin film magnetic head according to claim 1 is a method of forming a thin film on an electromagnetic conversion element having a lower magnetic layer, a coil conductor, an insulating layer, an upper magnetic layer, etc. on one surface of a wafer. In a method of manufacturing a thin film magnetic head by stacking and forming a plurality of chips in an aligned state and cutting them out and processing them into a slider shape, a film dividing groove is formed around each chip during a process of forming a thin film on a wafer. It is characterized by forming.
【0011】請求項2記載の薄膜磁気ヘッドの製造方法
は、ウエハの片面に下部磁性層,コイル導体,絶縁層,上
部磁性層などを有する電磁変換素子を薄膜形成法で積層
して複数のチップを整列状態で形成し、これらを切り出
してスライダ状に加工して薄膜磁気ヘッドを製造する方
法において、ウエハに薄膜を形成する工程中に複数個の
チップからなるブロックの周囲に膜分断溝を形成するこ
とを特徴とするものである。According to a second aspect of the present invention, there is provided a thin film magnetic head manufacturing method, wherein an electromagnetic conversion element having a lower magnetic layer, a coil conductor, an insulating layer, an upper magnetic layer and the like is laminated on one surface of a wafer by a thin film forming method to form a plurality of chips. In the method of manufacturing a thin film magnetic head by forming these in an aligned state and cutting them and processing them into a slider shape, a film dividing groove is formed around a block composed of a plurality of chips during the process of forming a thin film on a wafer. It is characterized by doing.
【0012】[0012]
【作用】本発明はウエハに絶縁層や磁性層やコイル導体
などを薄膜形成で積層して薄膜磁気ヘッドを製造する際
に生じる反りをウエハに膜分断溝を形成し、膜応力を除
去してウエハを平坦にする。According to the present invention, a warp that occurs when a thin film magnetic head is manufactured by laminating an insulating layer, a magnetic layer, a coil conductor and the like on a wafer by forming a thin film, forms a film dividing groove on the wafer to remove film stress. Flatten the wafer.
【0013】膜分断溝はウエハに形成されるチップを傷
付けることのないように、各チップの周囲もしくは複数
個のチップからなるブロックの周囲に膜分断溝を形成す
る。The film dividing grooves are formed around each chip or around a block composed of a plurality of chips so as not to damage the chips formed on the wafer.
【0014】この際、膜分断溝がウエハに形成される絶
縁層や磁性層やコイル導体などからなる電磁変換素子に
悪影響を及ぼすことのないことが必要であり、膜分断溝
の幅は5μmないし0.4mm位が好ましい。At this time, it is necessary that the film dividing groove does not adversely affect the electromagnetic conversion element formed of an insulating layer, a magnetic layer, a coil conductor, etc. formed on the wafer, and the width of the film dividing groove is 5 μm or more. It is preferably about 0.4 mm.
【0015】[0015]
【実施例】本実施例の薄膜磁気ヘッドの製造方法はウエ
ハに形成される各チップごとにその周囲に膜分断溝を形
成するものである。図1と図2を参照して以下に本実施
例を説明する。EXAMPLE A method of manufacturing a thin film magnetic head of this example is to form a film dividing groove around each chip formed on a wafer. This embodiment will be described below with reference to FIGS. 1 and 2.
【0016】まず従来の方法どおり、基板でありアルチ
ックからなるウエハ12の片面にAl2O3からなる被膜
を形成する。そしてスパッタ等を使用する薄膜形成法で
下部磁性層,コイル導体,絶縁層,上部磁性層等を積層し
て電磁変換素子14及びボンディングパッド20等を有
する複数のチップ16,16,・・・,を整列状態に形成して
いく。First, according to a conventional method, a coating film made of Al 2 O 3 is formed on one surface of a wafer 12 made of Altic as a substrate. Then, a plurality of chips 16, 16, ... Having an electromagnetic conversion element 14, a bonding pad 20, etc. are formed by laminating a lower magnetic layer, a coil conductor, an insulating layer, an upper magnetic layer, etc. by a thin film forming method using sputtering or the like. To be aligned.
【0017】この薄膜の形成を続けることで膜応力など
によりウエハ12には次第に反りが発生してしまうが、
本実施例では形成された各チップ16,16,・・・,の周囲
に膜分断溝18を形成することで、ウエハ12に生じて
いた横方向の膜応力を開放し、ウエハ12を平坦化す
る。Continuing the formation of this thin film causes the wafer 12 to gradually warp due to film stress or the like.
In this embodiment, by forming the film dividing groove 18 around each of the formed chips 16, 16, ..., The lateral film stress generated in the wafer 12 is released, and the wafer 12 is flattened. To do.
【0018】この膜分断溝18の形成方法はレジストや
金属等のマスクを利用したウェットエッチング、ドライ
エッチング、スパッタエッチングやイオンミーリングま
たはスライサ等を用いることができる。As a method of forming the film dividing groove 18, wet etching, dry etching, sputter etching, ion milling, slicer or the like using a mask of resist or metal can be used.
【0019】また膜分断溝18の深さは反りのなくなる
深さ、即ち膜応力を発生させている膜の厚み程度が好ま
しい。Further, the depth of the film dividing groove 18 is preferably such that there is no warpage, that is, the thickness of the film that causes the film stress.
【0020】さらにまた、膜分断溝18の幅Wは後工程
であるバースライスやチップスライスのブレード幅の
0.4mm位がふさわしい。Furthermore, the width W of the film dividing groove 18 is preferably about 0.4 mm of the blade width of the bar slice or the chip slice which is a post-process.
【0021】そして、スライダに加工するために各チッ
プ16,16,・・・,を切り出す際には、この膜分断溝18
を境界としてウエハ12を切断し、研摩等の工程を経て
浮上レールを有するスライダを形成し薄膜磁気ヘッドを
得る。When cutting the chips 16, 16, ... For processing into sliders, the film dividing groove 18 is used.
The wafer 12 is cut with the boundary as a boundary, and a slider having a flying rail is formed through steps such as polishing to obtain a thin film magnetic head.
【0022】本実施例のように、ウエハに膜分断溝を縦
横に形成することで、ウエハの反りを解消し、後工程で
の作業,精度維持を高めることができる。By forming the film dividing grooves vertically and horizontally on the wafer as in the present embodiment, it is possible to eliminate the warp of the wafer and enhance the work in the subsequent steps and the accuracy maintenance.
【0023】また薄膜形成でメッキを施す場合には、上
・下磁性層の形成時に、各チップの周囲にレジストやポ
リイミドを塗布し、メッキ後に塗布したレジストやポリ
イミドを除去することで、後から膜分断溝を形成するこ
とを省略することも可能である。When plating is performed by forming a thin film, a resist or polyimide is applied to the periphery of each chip when the upper and lower magnetic layers are formed, and the resist or polyimide applied after plating is removed. It is also possible to omit forming the film dividing groove.
【0024】尚、本実施例では各チップの周囲に膜分断
溝を形成したが、複数個のチップを幾つかのブロックに
分け、各ブロックごとにその周囲に膜分断溝を形成して
ウエハの反りを解消することもできる。In this embodiment, the film dividing groove is formed around each chip. However, a plurality of chips are divided into several blocks, and the film dividing groove is formed around each of the blocks to form a wafer dividing wafer. The warp can be eliminated.
【0025】[0025]
【発明の効果】本発明の薄膜磁気ヘッドの製造方法はウ
エハ上に成膜することにより形成されるチップの周囲に
膜分断溝を形成するものであるので、薄膜の形成を行っ
てもウエハに反りが生じることがなく、レジスト等の塗
布ムラやアライメント時の位置ずれ等が起こりにくく、
高精度な薄膜磁気ヘッドを製造することのできるもので
ある。According to the method of manufacturing a thin film magnetic head of the present invention, a film dividing groove is formed around a chip formed by forming a film on a wafer. No warpage occurs, uneven coating of resist or the like and positional deviation during alignment are less likely to occur,
It is possible to manufacture a highly accurate thin film magnetic head.
【0026】また複数個のチップからなるブロックごと
に膜分断溝を各ブロックの周囲に形成しても、ウエハの
反りを解消することができ、レジスト等の塗布ムラやア
ライメント時の位置ずれ等が起こりにくく、高精度な薄
膜磁気ヘッドを製造することのできるものである。Further, even if a film dividing groove is formed around each block for each block composed of a plurality of chips, the warp of the wafer can be eliminated, and uneven coating of resist or the like and misalignment during alignment are caused. It is possible to manufacture a highly accurate thin film magnetic head that is unlikely to occur.
【図1】本実施例の薄膜磁気ヘッドの製造方法を説明す
るための複数個のチップと膜分断溝の形成されたウエハ
の平面図である。FIG. 1 is a plan view of a wafer having a plurality of chips and a film dividing groove for explaining a method of manufacturing a thin film magnetic head according to an embodiment.
【図2】図2(a)は本実施例のウエハの平面図、図2(b)
は本実施例のウエハの側面図である。FIG. 2A is a plan view of a wafer of this embodiment, and FIG.
[FIG. 3B] is a side view of the wafer according to the present embodiment.
【図3】図3(a)は従来例のウエハの平面図、図3(b)は
従来例のウエハの側面図である。FIG. 3A is a plan view of a conventional wafer, and FIG. 3B is a side view of a conventional wafer.
10 ウエハ 12 ウエハ 14 電磁変換素子 16 チップ 18 膜分断溝 10 wafers 12 wafers 14 Electromagnetic conversion element 16 chips 18 Membrane cutting groove
Claims (2)
絶縁層,上部磁性層などを有する電磁変換素子を薄膜形
成法で積層して複数のチップを整列状態で形成し、これ
らを切り出してスライダ状に加工して薄膜磁気ヘッドを
製造する方法において、ウエハに薄膜を形成する工程中
に各チップの周囲に膜分断溝を形成することを特徴とす
る薄膜磁気ヘッドの製造方法。1. A lower magnetic layer, a coil conductor, and
In a method of manufacturing a thin film magnetic head by stacking electromagnetic conversion elements having an insulating layer, an upper magnetic layer, etc. by a thin film forming method to form a plurality of chips in an aligned state, cutting these and processing them into sliders, a wafer A method of manufacturing a thin film magnetic head, characterized in that a film dividing groove is formed around each chip during a step of forming a thin film on the substrate.
絶縁層,上部磁性層などを有する電磁変換素子を薄膜形
成法で積層して複数のチップを整列状態で形成し、これ
らを切り出してスライダ状に加工して薄膜磁気ヘッドを
製造する方法において、ウエハに薄膜を形成する工程中
に複数個のチップからなるブロックの周囲に膜分断溝を
形成することを特徴とする薄膜磁気ヘッドの製造方法。2. A lower magnetic layer, a coil conductor, and
In a method of manufacturing a thin film magnetic head by stacking electromagnetic conversion elements having an insulating layer, an upper magnetic layer, etc. by a thin film forming method to form a plurality of chips in an aligned state, cutting these and processing them into sliders, a wafer A method of manufacturing a thin film magnetic head, characterized in that a film dividing groove is formed around a block composed of a plurality of chips during a step of forming a thin film on the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1351091A JPH056512A (en) | 1991-02-04 | 1991-02-04 | Production of thin-film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1351091A JPH056512A (en) | 1991-02-04 | 1991-02-04 | Production of thin-film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH056512A true JPH056512A (en) | 1993-01-14 |
Family
ID=11835143
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1351091A Withdrawn JPH056512A (en) | 1991-02-04 | 1991-02-04 | Production of thin-film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH056512A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009032974A (en) * | 2007-07-27 | 2009-02-12 | Seiko Epson Corp | Manufacturing method and formation substrate of thin-film device, and manufacturing method of liquid injection head |
-
1991
- 1991-02-04 JP JP1351091A patent/JPH056512A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009032974A (en) * | 2007-07-27 | 2009-02-12 | Seiko Epson Corp | Manufacturing method and formation substrate of thin-film device, and manufacturing method of liquid injection head |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4418472A (en) | Method of delineating thin film magnetic head arrays | |
US5406694A (en) | Scalable method of fabricating thin-film sliders | |
EP0030625A2 (en) | Ferrite core magnetic head assembly | |
EP0006269A1 (en) | Elements for magnetic heads, magnetic heads manufactured with these elements, methods for producing both | |
JPS63173213A (en) | Manufacture of thin film magnetic head | |
US6202289B1 (en) | Manufacturing process of thin film magnetic head sliders | |
JPH056512A (en) | Production of thin-film magnetic head | |
US5635082A (en) | Process for producing a thin film head of the floating type | |
JP2895680B2 (en) | Magnetic head and method of manufacturing the same | |
JPH0453012A (en) | Manufacture of thin film magnetic head | |
JP2658908B2 (en) | Method for manufacturing thin-film magnetic head | |
JPH0359811A (en) | Thin-film magnetic head and production thereof | |
JP2685235B2 (en) | Method for manufacturing thin-film magnetic head | |
JP3271375B2 (en) | Method of manufacturing magnetic head device | |
JPS62119715A (en) | Production of thin film magnetic head | |
JP2680750B2 (en) | Manufacturing method of magnetic head | |
JPS5853019A (en) | Manufacture for magnetic head | |
JPH0696424A (en) | Production of thin-film magnetic head | |
JPS6231015A (en) | Thin-film magnetic head | |
JPH0589430A (en) | Thin-film magnetic head | |
JPH05143932A (en) | Thin-film magnetic head | |
JPH0520634A (en) | Thin-film magnetic head wafer | |
JP2664380B2 (en) | Method for manufacturing thin-film magnetic head | |
JPH04143912A (en) | Production of thin-film magnetic head | |
JPS6124007A (en) | Thin film magnetic head |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |