JPH0562420B2 - - Google Patents
Info
- Publication number
- JPH0562420B2 JPH0562420B2 JP58252132A JP25213283A JPH0562420B2 JP H0562420 B2 JPH0562420 B2 JP H0562420B2 JP 58252132 A JP58252132 A JP 58252132A JP 25213283 A JP25213283 A JP 25213283A JP H0562420 B2 JPH0562420 B2 JP H0562420B2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- laser beam
- target
- point
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 6
- 150000002500 ions Chemical group 0.000 description 46
- 230000001133 acceleration Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000004157 plasmatron Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58252132A JPS60146438A (ja) | 1983-12-30 | 1983-12-30 | イオンビ−ム発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58252132A JPS60146438A (ja) | 1983-12-30 | 1983-12-30 | イオンビ−ム発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60146438A JPS60146438A (ja) | 1985-08-02 |
JPH0562420B2 true JPH0562420B2 (enrdf_load_stackoverflow) | 1993-09-08 |
Family
ID=17232920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58252132A Granted JPS60146438A (ja) | 1983-12-30 | 1983-12-30 | イオンビ−ム発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60146438A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0762990B2 (ja) * | 1986-09-12 | 1995-07-05 | 株式会社島津製作所 | 試料面分析装置 |
JPH0458441A (ja) * | 1990-06-26 | 1992-02-25 | Japan Steel Works Ltd:The | 金属イオン源 |
JP3413491B2 (ja) * | 2000-08-10 | 2003-06-03 | 岡崎国立共同研究機構長 | 質量分析用インターフェイス、質量分析計、及び質量分析方法 |
-
1983
- 1983-12-30 JP JP58252132A patent/JPS60146438A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60146438A (ja) | 1985-08-02 |
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