JPH0561147A - Silver halide photographic sensitive material and method for developing same - Google Patents

Abstract

PURPOSE:To obtain the photographic sensitive material high in sensitivity and small in fog and capable of rapid processing by incorporating tellurium-sensitized silver halide grains and colloidal silica in at least one of emulsion layers. CONSTITUTION:The silver halide photographic sensitive material has at least one silver halide emulsion layer and at least one protective layer on a support and at least one of the emulsion layer contains the tellurium-sensitized silver halide grains and colloidal silica. It is preferred that the outermost protective layer has a kinetic friction coefficient of <=0.35, and the protective layer is coated with gelatin in an amount of <=0.5g/m<2>, and the total gelatin coating amounts including the emulsion layers are <=2.5g/m<2>, thus permitting the obtained photographic sensitive material to be high in sensitivity and reduced in pressure fog due to contact frictions with various materials and to be rapidly processed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material, and particularly to a silver halide photographic which has a high sensitivity and an improved pressure resistance in a short exposure with a high illuminance and has an excellent suitability for rapid processing. The present invention relates to a photosensitive material and a development processing method thereof.

[0002]

2. Description of the Related Art A silver halide photographic light-sensitive material generally comprises a support such as a plastic film, paper or paper coated with plastic, glass or the like with a light-sensitive emulsion layer and, if necessary, an intermediate layer, a protective layer, a back layer, By combining various constituent layers such as antihalation layer and antistatic layer,
It has been applied. The silver halide photographic light-sensitive material is
In the manufacturing process such as coating, drying, processing, etc., during handling such as shooting, development processing, printing, transportation such as projection, etc., the contact part between various devices and the photosensitive material, or photosensitive material such as dust and fiber scraps Frequently, pressure fog is generated in the photosensitive material due to contact friction between the photosensitive material and the contact friction between the photographic photosensitive materials such as between the surface of the photosensitive material and the back surface. As a means for improving such a change in concentration due to pressure, a method of incorporating a plasticizer such as a polymer latex or a polyhydric alcohol, a method of reducing the silver halide / gelatin ratio of the silver halide emulsion layer, and a method of thickening the protective layer It is known that the pressure is relaxed before reaching the silver halide grains by adding a slip agent or colloidal silica to the protective layer. British Patent No. 738,618, heterocyclic compounds, Nos. 738,637, alkyl phthalates, Nos. 738,689, alkyl esters, and U.S. Pat. No. 2,960,404, polyhydric alcohols. No. 3,121,060, carboxyalkyl cellulose, JP-A-49-5017 use paraffin and carboxylate, and JP-B No. 53-28086 use alkyl acrylate and organic acid. It is disclosed. However, since the method of adding a plasticizer lowers the mechanical strength of the emulsion layer, its use amount is limited, and if the silver halide / gelatin ratio is made small, the development progress is delayed and the suitability for rapid processing is impaired. Have. Also,
Polyhydroxybenzene compounds have been introduced into silver halide photographic light-sensitive materials containing hydrazine derivatives for various purposes.
US Pat. No. 4,332,108, US Pat. No. 4,38
No. 5,108, U.S. Pat. No. 4,377,634 and the like, and JP-A-62-21143 discloses a technique for preventing pressure sensitization. However, in the printing industry, there is a strong demand for efficient work and speedup, and there is a wide range of needs for speeding up scanning and shortening the processing time of photosensitive materials.
In order to meet the needs of these printing fields, in exposure machines (scanners, plotters), it is desired to increase the scanning speed, increase the number of lines and squeeze the beam to improve image quality. It is desired that the material has high sensitivity, excellent stability, and rapid development processing. The rapid development process referred to here is that after the leading edge of the film is inserted into the automatic processor, the leading edge of the film passes through the developing tank, crossover portion, fixing tank, crossover portion, washing tank, and drying portion, and the tip of the film comes out of the drying portion. 15 to 6 hours
It says a process that is 0 seconds.

As described above, as a method for obtaining a high-sensitivity silver halide photographic light-sensitive material, a conventional method of sensitizing with a tellurium sensitizer is disclosed in US Pat.
No. 0069, No. 3772031, No. 3531289
No. 3,655,394, No. 4,704,349, British Patent Nos. 2,352,11, No. 1121496, No. 1295.
No. 462, No. 1396696, No. 2160993,
Canadian Patent No. 800958, JP-A-61-67845
, Etc., but for a detailed and specific description of tellurium sensitizers, see British Patent No. 1295.
Nos. 462 and 1396696 and Canadian Patent No. 8009
No. 58, etc. By this method, a highly sensitive silver halide photographic light-sensitive material can be obtained, but with this, pressure fog becomes worse. With the conventionally known means, a sufficient effect on pressure fog cannot be obtained, and further improvement has been strongly desired.

[0004]

SUMMARY OF THE INVENTION An object of the present invention is to provide a silver halide photographic light-sensitive material having high sensitivity, improved pressure fog due to contact friction with various substances, and capable of rapid processing. is there.

[0005]

These objects of the present invention are directed to a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support and at least one protective layer above the emulsion layer. A silver halide photographic light-sensitive material characterized by containing silver halide grains sensitized with a tellurium sensitizer and colloidal silica in at least one of the emulsion layers.

The silver halide used in the present invention may be any of silver chloride, silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver iodobromide, silver chloroiodobromide and the like. . In the present invention, among the above silver halides, silver chloroiodobromide, silver chlorobromide and silver iodobromide are preferable. More preferably, the silver iodide content is 0 to
Silver chlorobromide or silver chloroiodobromide containing 1 mol% is advantageously used. The average grain size of silver halide used in the present invention is preferably fine grains (for example, 0.7 μ or less), and particularly preferably 0.5 μ or less. The particle size distribution is basically not limited, but it is preferably monodisperse. The term "monodisperse" as used herein means at least 95% by weight or the number of particles.
Is composed of a group of particles having a size within ± 40% of the average particle size. The silver halide grains in the photographic emulsion may have a regular crystal such as a cube or an octahedron, or may have an irregular crystal such as a sphere or a plate. Alternatively, it may have a composite form of these crystal forms. The silver halide grains may have a uniform phase in the inside and the surface layer, or may have a simple phase. 2 formed separately
A mixture of two or more silver halide emulsions may be used.
Further, the silver halide emulsion layer may be a single layer or multiple layers (two layers, three layers, etc.), and in the case of multiple layers, different silver halide emulsions may be used. Good,
You may use the same thing. In the silver halide emulsion used in the present invention, cadmium salt, sulfite salt, lead salt, thallium salt, rhodium salt or its complex salt, iridium salt or its complex salt and the like are allowed to coexist in the process of formation or physical ripening of silver halide grains. Good. In the present invention, it is preferable to use a water-soluble rhodium salt, typically, rhodium chloride, rhodium trichloride, rhodium ammonium chloride and the like. Furthermore, these complex salts can also be used. The addition time of the rhodium salt is limited before the completion of the first ripening in the emulsion production, and it is particularly preferable to add it during grain formation. The addition amount is 1 × 10 ^-8 mol or more per 1 mol of silver, 1 × The range of 10 ^-6 mol or less is preferable.

The silver halide particularly suitable for use in the present invention is prepared in the presence of 10 ^-8 to 10 ^-5 mol of iridium salt or its complex salt per mol of silver. In the above, it is desirable to add the above amount of iridium salt before the physical ripening in the production process of the silver halide emulsion, especially at the time of grain formation. The iridium salt used here is a water-soluble iridium salt or iridium complex salt, such as iridium trichloride, iridium tetrachloride, hexachloroiridium (II
I) potassium acid, potassium hexachloroiridium (IV) acid, ammonium hexachloroiridium (III) acid and the like. Gelatin is advantageously used as the binder or protective colloid of the photographic emulsion, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose and cellulose sulfates, sugar derivatives such as sodium alginate and starch derivatives, polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-
A wide variety of synthetic hydrophilic polymeric substances such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, polyvinylpyrazole, and other single or copolymers can be used.

The silver halide emulsion used in the present invention may not be chemically sensitized, but may be chemically sensitized. As a method of chemically sensitizing a silver halide emulsion, sulfur sensitization, selenium sensitization, reduction sensitization and noble metal sensitization are known, and any of these may be used alone or in combination. You may sensitize. The gold sensitization method is a typical one of the noble metal sensitization methods, and a gold compound, mainly a gold complex salt is used.
Noble metals other than gold, for example, complex salts of platinum, palladium, rhodium, etc. may be contained. As the sulfur sensitizer, various sulfur compounds such as thiosulfates, thioureas, thiazoles, and rhodanines can be used in addition to the sulfur compounds contained in gelatin. As the reduction sensitizer, a primary tin salt, an amine, formamidinesulfinic acid, a silane compound or the like can be used. As the selenium sensitizer, the selenium compounds disclosed in conventionally known patents can be used. That is, it is usually used by adding an unstable selenium compound and / or a non-unstable selenium compound and stirring the emulsion at a high temperature, preferably 40 ° C. or higher for a certain time. Unstable selenium compounds are disclosed in Japanese Examined Patent Publications Nos. 44-15748 and 4
It is preferable to use the compounds described in JP-A-3-13489, Japanese Patent Application No. 2-130976, Japanese Patent Application No. 2-229300 and the like.

The tellurium sensitizers used in the present invention include US Pat. Nos. 1,623,499 and 3,320.
069, 3,772,031, British Patent No. 23
No. 5,211, No. 1,121,496, No. 1,29
5,462, 1,396,696, Canadian Patent 800,958, Journal of Chemical Society Chemical Communication (J. Chem.S.
oc.Chem.Commun.) 635 (1980), ibid 1102
(1979), ibid 645 (1979), Journal of Chemical Society Perkin Trans (J. Chem. Soc. Perkin Trans.) 1, 219.
1 (1980) and the like are preferably used. Specific tellurium sensitizers include colloidal tellurium and telluroureas (eg, allyl tellurourea, N, N-).
Dimethyl tellurourea, tetramethyl tellurourea, N-carboxyethyl-N ', N'-dimethyl tellurourea,
N, N'-dimethylethylene tellurourea, N, N'-diphenylethylene tellurourea), isotellocyanates (for example, allyl isotellurocyanate), telluroketones (for example, telluroacetone, telluroacetophenone), telluroamides (for example, telluroacetamide). ,
N, N-dimethyl tellurobenzamide), tellurohydrazide (eg N, N ′, N′-trimethyltelulobenzhydrazide), telluroester (eg t-butyl-t)
-Hexyl telluroester), phosphine tellurides (eg tributylphosphine telluride, tricyclohexylphosphine telluride, triisopropylphosphine telluride, butyl-diisopropylphosphine telluride, dibutylphenylphosphine telluride), other tellurium compounds (eg United Kingdom Examples thereof include negatively charged telluride ion-containing gelatin described in Japanese Patent No. 1,295,462, potassium telluride, potassium tellurocyanate, telluropentathionate sodium salt, and allyl tellurocyanate). Of these tellurium compounds, the following general formulas (I) and (II) are preferable. General formula (I)

[0010]

[Chemical 1]

Wherein R ₁ , R ₂ and R ₃ are aliphatic groups,
Aromatic group, heterocyclic group, OR ₄ , NR ₅ (R ₆ ), SR ₇ , O
SiR ₈ (R ₉ ) (R ₁₀ ), X or a hydrogen atom. R ₄
And R ₇ represents an aliphatic group, an aromatic group, a heterocyclic group, a hydrogen atom or a cation, R ₅ and R ₆ represent an aliphatic group, an aromatic group, a heterocyclic group or a hydrogen atom, and R ₈ and R ₉ and R ₁₀ represent an aliphatic group, and X represents a halogen atom.

Next, the general formula (I) will be described in detail. In the general formula (I), R ₁ , R ₂ , R ₃ , R ₄ ,
R _5, the aliphatic group represented by _{R 6, R 7, R 8} , R 9 and R ₁₀ are preferably be of 1 to 30 carbon atoms, especially straight-chain having 1 to 20 carbon atoms, branched or Cyclic alkyl groups, alkenyl groups, alkynyl groups, and aralkyl groups. Examples of the alkyl group, alkenyl group, alkynyl group and aralkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, t-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, cyclopentyl group. Group, cyclohexyl group, allyl group, 2-butenyl group,
Examples thereof include a 3-pentenyl group, a propargyl group, a 3-pentynyl group, a benzyl group and a phenethyl group. In the general formula (I), R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆
And the aromatic group represented by R ₇ preferably has 6 to 6 carbon atoms.
It is a monocyclic or condensed aryl group having 30 to 20 carbon atoms, and examples thereof include a phenyl group and a naphthyl group. In the general formula (I), R ₁ , R ₂ ,
The heterocyclic group represented by R ₃ , R ₄ , R ₅ , R ₆ and R ₇ is a 3- to 10-membered saturated or unsaturated heterocyclic ring containing at least one of a nitrogen atom, an oxygen atom and a sulfur atom. It is a base. These may be monocyclic or may form a condensed ring with other aromatic ring or heterocycle. The heterocyclic group is preferably a 5- or 6-membered aromatic heterocyclic group, and examples thereof include a pyridyl group, a furyl group, a thienyl group, a thiazolyl group, an imidazolyl group, and a benzimidazolyl group. In the general formula (I), R ₄ and R ₇
The cation represented by represents an alkali metal or ammonium. The halogen atom represented by X in the general formula (I) represents, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

The aliphatic group, aromatic group and heterocyclic group may be substituted. The following are mentioned as a substituent. Representative substituents include, for example, alkyl groups, aralkyl groups, alkenyl groups, alkynyl groups,
Aryl group, alkoxy group, aryloxy group, amino group, acylamino group, ureido group, urethane group, sulfonylamino group, sulfamoyl group, carbamoyl group, sulfonyl group, sulfinyl group, alkyloxycarbonyl group, aryloxycarbonyl group, acyl group , An acyloxy group, a phosphoric acid amide group, a diacylamino group, an imide group, an alkylthio group, an arylthio group, a halogen atom,
Examples thereof include a cyano group, a sulfo group, a carboxy group, a hydroxy group, a phosphono group, a nitro group, and a heterocyclic group. These groups may be further substituted. When there are two or more substituents, they may be the same or different. R
₁ , R ₂ and R ₃ may be bonded to each other to form a ring together with a phosphorus atom, and R ₅ and R ₆ may be bonded to form a nitrogen-containing heterocycle. In the general formula (I), preferably R
₁ , R ₂ and R ₃ represent an aliphatic group or an aromatic group,
More preferably, it represents an alkyl group or an aromatic group. General formula (II)

[0014]

[Chemical 2]

In the formula, R ₁₁ represents an aliphatic group, an aromatic group, a heterocyclic group or --NR ₁₃ (R ₁₄ ), and R ₁₂ represents --NR ₁₅ (R
_16), - represents a _{N (R 17) N (R} 18) R 19 or -OR _20. R ₁₃ , R ₁₄ , R ₁₅ , R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ represent a hydrogen atom, an aliphatic group, an aromatic group, a heterocyclic group or an acyl group. Here, R ₁₁ and R ₁₅ , R ₁₁ and R ₁₇ , R ₁₁
And R ₁₈ , R ₁₁ and R ₂₀ , R ₁₃ and R ₁₅ , R ₁₃ and R ₁₇ , R ₁₃ and R _18, and R ₁₃ and R ₂₀ may combine to form a ring.

Next, the general formula (II) will be described in detail. In the general formula (II), R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ ,
The aliphatic group represented by _{R 15, R 16, R 17} , R 18, R 19 and R ₂₀ are preferably be those having 1 to 30 carbon atoms, especially straight-chain having 1 to 20 carbon atoms, branched or Cyclic alkyl groups, alkenyl groups, alkynyl groups, and aralkyl groups. Examples of the alkyl group, alkenyl group, alkynyl group and aralkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, t-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, cyclopentyl group. Group, cyclohexyl group, allyl group, 2-butenyl group,
Examples thereof include a 3-pentenyl group, a propargyl group, a 3-pentynyl group, a benzyl group and a phenethyl group. In the general formula (II), R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ , R ₁₅ ,
The aromatic group represented by R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ is preferably an aromatic group having 6 to 30 carbon atoms, particularly a monocyclic or condensed aryl group having 6 to 20 carbon atoms. And examples thereof include a phenyl group and a naphthyl group. General formula (II)
In, R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ , R ₁₅ , R ₁₆ ,
The heterocyclic group represented by R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ is a 3- to 10-membered saturated or unsaturated heterocyclic group containing at least one of nitrogen atom, oxygen atom and sulfur atom. . These may be monocyclic or may form a condensed ring with other aromatic ring or heterocycle. The heterocyclic group is preferably a 5- or 6-membered aromatic heterocyclic group, and examples thereof include a pyridyl group, a furyl group, a thienyl group, a thiazolyl group, an imidazolyl group, and a benzimidazolyl group.

In the general formula (II), R ₁₃ , R ₁₄ ,
_{R 15, R 16, R 17} , R 18, acyl group represented by R ₁₉ and R ₂₀ are preferably be of 1 to 30 carbon atoms, especially straight-chain or branched acyl having 1 to 20 carbon atoms The base,
Examples thereof include acetyl group, benzoyl group, formyl group, pivaloyl group, decanoyl group and the like. Where R ₁₁ and R
₁₅ , R ₁₁ and R ₁₇ , R ₁₁ and R ₁₈ , R ₁₁ and R ₂₀ , R ₁₃ and R ₁₅ , R ₁₃ and R ₁₇ , R ₁₃ and R _18, and R ₁₃ and R ₂₀ combine to form a ring. In that case, for example, an alkylene group, an arylene group, an aralkylene group, an alkenylene group and the like can be mentioned. Further, the aliphatic group, aromatic group and heterocyclic group may be substituted with the substituents mentioned in the general formula (I).
In general formula (II), preferably R ₁₁ represents an aliphatic group, an aromatic group or —NR ₁₃ (R ₁₄ ), and R ₁₂ represents —NR.
Represents ₁₅ (R ₁₆ ). R ₁₃ , R ₁₄ , R ₁₅ and R ₁₆ represent an aliphatic group or an aromatic group. In general formula (II), more preferably R ₁₁ represents an aromatic group or —NR ₁₃ (R ₁₄ ),
R ₁₂ represents -NR ₁₅ a (R _16). R ₁₃ , R ₁₄ , R ₁₅ and R ₁₆ represent an alkyl group or an aromatic group. Where R
It is more preferable that ₁₁ and R ₁₅ and R ₁₃ and R ₁₅ form a ring via an alkylene group, an arylene group, an aralkylene group or an alkenylene group. Specific examples of the compounds represented by formulas (I) and (II) of the present invention are shown below, but the present invention is not limited thereto.

[0018]

[Chemical 3]

[0019]

[Chemical 4]

[0020]

[Chemical 5]

[0021]

[Chemical 6]

[0022]

[Chemical 7]

[0023]

[Chemical 8]

[0024]

[Chemical 9]

[0025]

[Chemical 10]

[0026]

[Chemical 11]

The compounds represented by the general formulas (I) and (II) of the present invention can be synthesized according to already known methods. For example, Journal of Chemical Society (J. Chem. Soc. (A)) 1969, 2927; Journal of Organometallic Chemistry (J.
Organomet. Chem.) 4, 320 (1965); ibid, 1,
200 (1963); ibid, 113, C35 (197
6); Phosphorus Sulfu
r) 15, 155 (1983); Hemische Berichte (Chem. Ber.) 109, 2996 (1976); Journal of Chemical Society Chemical Communication (J. Chem. Soc. Chem. Commun.) 635 ( 19
80); ibid, 1102 (1979); ibid, 645
(1979); ibid, 820 (1987); Journal of Chemical Society Perkin Transaction (J. Chem. Soc. Perkin. Trans.) 1, 2191.
(1980); The Chemistry of Organo Selenium and Tellurium Companies (The Ch
emistry of Organo Selenium and Tellurium Compound
s) It can be synthesized by the method described in Volume 2, 216 to 267 (1987). The addition amount of the tellurium sensitizer used in the present invention varies depending on the activity of the tellurium sensitizer used, the kind and size of silver halide, the temperature and time of ripening, and the like. 1 x 10 per mole
^-8 mol or more. It is more preferably 1 × 10 ⁻⁷ mol or more and 1 × 10 ⁻⁵ mol or less. The temperature of the chemical ripening when the tellurium sensitizer is used is preferably 45 ° C. or higher. It is more preferably 50 ° C. or higher and 80 ° C. or lower. pAg and pH are arbitrary. For example, the effect can be obtained in a wide range of pH from 4 to 9. Tellurium sensitization is more effective when performed in the presence of a silver halide solvent.

The colloidal silica (colloidal silica) used in the present invention has an average particle size of 5 mμ to 1000 mμ, preferably 5 mμ to 500 mμ, the main component is silicon dioxide, and alumina or sodium aluminate as a minor component. You may stay. Further, these colloidal silica may contain, as a stabilizer, an inorganic base such as sodium hydroxide, potassium hydroxide, lithium hydroxide or ammonia, or an organic base such as tetramethylammonium ion. These colloidal silicas are described in JP-A-53-112732, JP-B-57-009051,
It is disclosed in Japanese Examined Patent Publication No. 57-051653. Specific examples of the colloidal silica include Snowtex 20 (SiO ₂ / Na ₂ O ≧ 57), Snowtex 30 (SiO ₂ / Na ₂ O ≧ 50), Snowtex C from Nissan Kagaku (Tokyo, Japan).
(SiO ₂ / Na ₂ O ≧ 100), Snowtex O (SiO ₂ / Na ₂
O ≧ 500), and the like. here,
(SiO ₂ / Na ₂ O represents the content weight ratio of silicon dioxide (SiO ₂ ) and sodium hydroxide in terms of sodium hydroxide converted to Na ₂ O, and both are the values listed in the catalog. The preferred amount of the colloidal silica used in the present invention is 0.05 to 1.0 by dry weight ratio to gelatin used as the binder of the layer to be added,
It is particularly preferably 0.1 to 0.6.

The dynamic friction coefficient (μ _k ) in the present invention is J
It can be determined by the same principle as the friction coefficient test method described in IS K7125. Sapphire needle (eg diameter 0.5 ~
5 mm) with constant load (contact force: F _p example 50-200)
g) is added, the surface of the silver halide light-sensitive material is slid at a constant speed (eg 20 to 100 cm / min), the tangential force (F _k ) at that time is measured, and the value is calculated by the following formula 1.

[0030]

[Equation 1]

For example, a surface quality measuring device (H, manufactured by Shinto Kagaku Co., Ltd.)
EIDON-14 type).

In the present invention, the coefficient of dynamic friction of the outermost layer is set to 0.
It is preferable to use a so-called slipping agent in order to make it 35 or less. Typical examples of the slip agent used in the present invention include US Pat. No. 3,042,522, British Patent No. 955,061, and US Pat. No. 3,080,317.
No. 4,004,927, 4,047,958
No. 3,489,567, British Patent No. 1,143,
118, etc., silicone-based lubricants, US Pat. Nos. 2,454,043, 2,732,305, 2,976,148, 3,206,311 and German Patent No. 1 , 284,295, 1,284,294, etc., higher fatty acid-based, alcohol-based, acid amide-based lubricants, British Patent No. 1,263,722, US Patent No. 3,933,516, etc. The metallic soaps described in US Pat. Nos. 2,588,765 and 3,121,060, and the ester-based compounds described in British Patent 1,198,387,
Ether lubricant, US Pat. No. 3,502,473,
There are the taurine-based slip agents described in JP-A-3,042,222, the colloidal silica, and the like.

The slip agent of the present invention is disclosed in JP-A-60-1.
Alkyl polysiloxanes described in 88945 and liquid paraffins in liquid state at room temperature and anionic surfactants are preferred.

The coating amount of the slip agent is 0.01 to 1.0 by weight ratio with respect to the binder amount of the outermost layer, and preferably 0.0.
It is 5 to 0.5. It is particularly preferably 0.01 to 0.1 g / m ² . When an anionic surfactant is used, it is 0.001 to 0.5 g / m ² , especially 0.01 to 0.2 g.
/ M ² is preferred. The dynamic friction coefficient (μ _k ) is 0.
It is 35 or less, preferably 0.35 to 0.10.

Next, in the present invention, it is preferable to use a polyhydroxybenzene compound used for the purpose of improving pressure resistance without impairing sensitivity and improving storage stability. The polyhydroxybenzene compound may be added to the emulsion layer in the light-sensitive material or to a layer other than the emulsion layer.
The addition amount is effective in the range of 10 ^-5 to 1 mol, and particularly effective in the range of 10 ^-3 to 10 ^-1 mol, per 1 mol of silver. Examples of preferable compounds include the following.

[0036]

[Chemical formula 12]

[0037]

[Chemical 13]

In the present invention, the protective layer preferably comprises two or more layers. When the silver halide light-sensitive material is stored under low humidity conditions, it has a drawback that the film of the hydrophilic colloid layer becomes brittle. For the purpose of improving this, it is preferable that a polymer latex having a glass transition point (hereinafter referred to as Tg) of 20 ° C. or less is contained in the emulsion layer and / or the protective layer. In particular, when the number of protective layers is two or more, inclusion in the intermediate layer between the emulsion layer and the outermost layer can reduce the film strength in the developing solution and the brittleness without deteriorating the adhesion between the sensitive materials under high humidity conditions. It is preferable in terms of improvement. Further, it is preferable that the outermost layer contains colloidal silica together with other slip properties, since the slip properties are improved, and at the same time, the strength of the dry film is improved and the scratch resistance is further improved. The amount of colloidal silica added to the outermost layer is 0.01 to 1.0, preferably 0.1 to 0.5 by weight ratio with respect to the amount of the binder in the outermost layer.

The polymer latex contained in the protective layer of the present invention is, for example, US Pat. No. 2,772,1.
No. 66, No. 3,325, 286, No. 3,411, 91
No. 1, No. 3,311,912, No. 3,525,620
Issue, Research Disclos
ure) magazine No. 195 19551 (July 1980) and the like, hydrates of vinyl polymers such as acrylic acid esters, methacrylic acid esters and styrene. Preferred polymer latexes having Tg of 20 ° C. or lower include methyl acrylate, ethyl acrylate,
Homopolymer of alkyl acrylate such as butyl acrylate or alkyl acrylate and acrylic acid, N-
Copolymers with methylolacrylamide (preferably up to 30% by weight of copolymerization components such as acrylic acid), homopolymers of butadiene and copolymers of butadiene with one or more of styrene, butoxymethylacrylamide, acrylic acid. , Vinylidene chloride-methyl acrylate acrylic acid terpolymer, and the like. The Tg of the polymer latex can be determined by a method using differential scanning calorimetry (DSC). The preferred range of the average particle size of the polymer latex used in the present invention is 0.005 to 1 [mu] m, especially 0.1.
It is from 02 to 0.1 μ. The amount of polymer latex added is 5 to 200% based on the weight of the hydrophilic colloid in the layer to be added.
Particularly, 10 to 100% is preferable. Next, T in the present invention
Specific examples of the polymer latex having g of 20% or less are shown below, but the invention is not limited thereto.

[0040]

[Chemical 14]

[0041]

[Chemical 15]

[0042]

[Chemical 16]

Gelatin is used as the binder of the silver halide emulsion layer and protective layer of the present invention, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose, cellulose nitrate esters, sugar derivatives such as sodium alginate and starch derivatives, polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-
A wide variety of synthetic hydrophilic polymeric substances such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, polyvinylpyrazole, and other single or copolymers can be used. As the gelatin, acid-treated gelatin may be used in addition to lime-treated gelatin, and gelatin hydrolyzate and gelatin enzyme-decomposed product may also be used. In the present invention, the coating amount of gelatin as a binder is preferably as small as possible in order to obtain rapid processing suitability and dimensional stability improvement. In particular, the gelatin coating amount of the protective layer greatly affects the developing rate and the fixing rate, and the total gelatin coating amount including the silver halide emulsion layer affects the drying rate and dimensional stability. Therefore, the gelatin coating amount of the protective layer of the present invention is 0.5 g.
/ M ² or less, preferably 0.15 to 0.5 g / m ² , and the total gelatin coating amount on the side including the silver halide emulsion layer on the support side is 2.5 g / m ^2. m ² or less, preferably 1.5 to 2.5 g / m ² .

The photosensitive silver halide emulsion of the present invention may be spectrally sensitized by a sensitizing dye to blue light, green light, red light or infrared light having a relatively long wavelength. As the sensitizing dye, a cyanine dye, a merocyanine dye, a complex cyanine dye, a complex merocyanine dye, a holoholer cyanine dye, a styryl dye, a hemicyanine dye, an oxonol dye, a hemioxonol dye and the like can be used. Useful sensitizing dyes used in the present invention are, for example, RESEARCH DISCLOSURE Item 17643 IV-A.
Item (Dec. 1978, p.23) and Item 1831X Item (August, 1979, p.437) or cited in the literature. In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of various scanner light sources can be advantageously selected. For example, as for A) an argon laser light source, JP-A-60-1
62247, JP-A-2-48653, US Pat.
No. 161,331, simple merocyanines described in West German Patent No. 936,071, and B) helium-neon laser light source are disclosed in JP-A Nos. 50-62425 and 54-1.
Nos. 8726 and 59-102229, for trinuclear cyanine dyes and C) LED light source, Japanese Patent Publication No. 48-
No. 42172, No. 51-9609, No. 55-3981.
No. 8, thiacarbocyanines described in JP-A No. 62-284343 and D) tricarbocyanines described in JP-A-59-191032 and JP-A-60-80841 for semiconductor laser light sources. , JP-A-59-19
The dicarbocyanines containing a 4-quinoline nucleus described in 2242 are advantageously selected. The representative compounds of these sensitizing dyes are shown below. Specific compound examples of A)

[0045]

[Chemical 17]

Specific compound examples of B)

[0047]

[Chemical 18]

Specific Compound Examples of C) General Formula (X)

[0049]

[Chemical 19]

[Wherein Y ₁ and Y ₂ are each a group of non-metal atoms necessary for forming a heterocycle such as a benzothiazole ring, a benzoselenazole ring, a naphthothiazole ring, a naphthoselenazole ring, or a quinoline ring] Represents a lower alkyl group, an alkoxy group, a hydroxy group,
It may be substituted with an aryl group, an alkoxycarbonyl group, or a halogen atom. R ₁ and R ₂ each represent an alkyl group having a lower alkyl group, a sulfo group, or a carboxy group. R ₃ represents a lower alkyl group. X ₁ represents an anion. n ₁ and n ₂ represent 1 or 2. m represents 1 or 0, and when it is an intramolecular salt, it represents m = 0. 〕In particular

[0051]

[Chemical 20]

[0052]

[Chemical 21]

Specific compounds of D)

[0054]

[Chemical formula 22]

These sensitizing dyes may be used alone or in combination, and the combination of sensitizing dyes is often used especially for the purpose of supersensitization. Along with the sensitizing dye, a dye having no spectral sensitizing effect itself or a substance that does not substantially absorb visible light and exhibits supersensitization may be contained in the emulsion. Useful sensitizing dyes, combinations of dyes exhibiting supersensitization, and substances exhibiting supersensitization are described in Research Disclos
ure) Volume 176, 17643 (issued in December 1978) Second
See J, page 3, IV. The content of the sensitizing dye of the present invention depends on the grain size of the silver halide emulsion, the halogen composition, the method and degree of chemical sensitization, the relationship between the layer containing the compound and the silver halide emulsion, the kind of the antifoggant compound, etc. It is desirable to select the optimum amount accordingly, and the test method for the selection is well known to those skilled in the art. Normally, preferably 10 ^-7 to 1 × mol per mol of silver halide.
It is used in the range of 10 ^-2 mol, especially 10 ^-6 mol to 5 × 10 ^-3 mol.

The photographic light-sensitive material of the present invention is disclosed in JP-A-60-140340 and pp.
The compounds described in No. 1-167939 can be added. These may be used alone or in combination of two or more. The light-sensitive material of the present invention may contain various compounds for the purpose of preventing fog during the manufacturing process of the light-sensitive material, during storage or during photographic processing, or stabilizing photographic performance. That is, azoles such as benzothiazolium salts, nitroindazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzothiazoles, nitrobenzotriazoles. , Etc .; mercaptopyrimidines; mercaptotriazines; thioketo compounds such as oxazolinethione; azaindenes, such as triazaindenes, tetraazaindenes (especially 4-hydroxy-substituted (1,3,3a, 7) tetrazaine) Dens), pentaazaindenes, etc .; many known as antifoggants or stabilizers such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonic acid amide, etc. It may be added compound. Among these, preferred are benzotriazoles (for example, 5-methylbenzotriazole) and nitroindazoles (for example, 5-nitroindazole). Further, these compounds may be contained in the treatment liquid.

The light-sensitive material of the present invention may contain a dye or the like for the purpose of preventing halation, improving safety of safelight, and improving front / back distinction. For example, US Pat.
274,782, pyrazolone oxonol dyes, US Pat. No. 2,956,879, diarylazo dyes, US Pat. Nos. 3,423,207 and 3,384,487, styryls. Dyes and zutadienyl dyes, merocyanine dyes described in U.S. Pat. No. 2,527,583, U.S. Pat. Nos. 3,486,897, 3,652,284 and 3,718,472 Merocyanine dyes and oxonol dyes, enaminohemioxonol dyes described in US Pat. No. 3,976,661, and British Patents 584,609 and 1,1.
77,429, JP-A-48-85130 and 49-
99620, 49-1144220, U.S. Patents 2,533,472, 3,148,187, 3,177,078, 3,247,127,
No. 3,540,887, No. 3,575,704
Nos. 3,653,905 can be used.

The photographic emulsion and the non-photosensitive hydrophilic colloid of the present invention may contain an inorganic or organic gelatin hardening agent. For example, active vinyl compounds (1, 3, 5
-Triacryloyl-hexahydro-s-triazine,
Bis (vinylsulfonyl) methyl ether, N, N'-
Methylene bis- [β- (vinylsulfonyl) propionamide] etc.), active halogen compounds (2,4-dichloro-6-hydroxy-s-triazine etc.), mucohalogen acids (mucochloric acid etc.), N-carbamoylpyridinium salts ( (1-morpholin, carbonyl-3-pyridinio) methanesulfonate, etc.), haloamidinium salts (1- (1-chloro-1-pyridinomethylene) pyrrolidinium, 2-naphthalenesulfonate, etc.) may be used alone or in combination. it can. Among them, JP-A-53-41220, JP-A-53-57257, and JP-A-59-16.
2546 and 60-80846 and the active halides described in US Pat. No. 3,325,287 are preferred.

In the photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention, a coating aid, an antistatic agent, an emulsion dispersion agent,
Various surfactants may be included for various purposes such as adhesion prevention and photographic property improvement (for example, development acceleration, hardening, and sensitization). For example, saponins (steroidal), alkylene oxide derivatives (eg, polyethylene glycol, polyethylene glycol / polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkylaryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, poly Nonionics such as alkylene glycol alkyl amines or amides, polyethylene oxide adducts of silicones), glycidol derivatives (eg, alkenyl succinic acid polyglycerides, alkyl phenol polyglycerides), fatty acid esters of polyhydric alcohols, alkyl esters of sugars, etc. Surfactants: alkyl carboxylates, alkyl sulfonates, alkylbenzenes Sulfonate, alkylnaphthalene sulfonate, alkyl sulfates,
Carboxyl groups, sulfo groups, such as alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfoalkyl polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, etc. Anionic surfactants containing acidic groups such as phospho group, sulfate group and phosphate group; amphoteric interfaces such as amino acid salts, aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphates, alkyl betaines and amine oxides Activators; alkylamine salts, aliphatic or aromatic quaternary ammonium salts, heterocyclic quaternary ammonium salts such as pyridinium and imidazolium, and cationic surfactants such as phosphonium or sulfonium salts containing aliphatic or heterocycles To use It can be. The photographic light-sensitive material of the present invention may contain a matting agent such as silica, magnesium oxide and polymethylmethacrylate in the photographic emulsion layer and other hydrophilic colloid layers for the purpose of preventing adhesion.

The light-sensitive material of the present invention may contain a dispersion of a water-soluble or sparingly soluble synthetic polymer for the purpose of improving dimensional stability. For example, alkyl (meth) acrylate, alkoxyalkyl (meth) acrylate,
Glycidyl (meth) acrylate, (meth) acrylamide, vinyl ester (for example, vinyl acetate), acrylonitrile, olefin, styrene, etc., alone or in combination, or with these, acrylic acid, methacrylic acid, α, β-unsaturated dicarboxylic acid It is possible to use a polymer having a monomer component of a combination of, a hydroxyalkyl (meth) acrylate, a sulfoalkyl (meth) acrylate, and styrenesulfonic acid. The support of the light-sensitive material of the present invention, cellulose triacetate,
Cellulose diacetate, nitrocellulose, polystyrene, polyethylene terephthalate, baryta paper, polyethylene coated paper and the like can be used. These supports may be subjected to corona treatment by a known method, or may be subjected to undercoating processing by a known method, if necessary. In addition, a waterproof layer containing a polyvinylidene chloride-based polymer may be provided in order to improve so-called dimensional stability, which changes in dimension due to changes in temperature and humidity.

Development accelerators or nucleation-infectious development accelerators suitable for use in the present invention are disclosed in JP-A-53-77.
616, ibid. 54-37732, ibid. 53-137133,
In addition to the compounds disclosed in JP-A-60-140340 and JP-A-60-14959, various compounds containing N or S atoms are effective.

The developing agent used in the developing solution used in the present invention is not particularly limited, but it is preferable to contain dihydroxybenzenes from the viewpoint of easily obtaining good halftone dot quality, and hydroquinone is used as the dihydroxybenzene developing agent. ,
Chlorohydroquinone, bromhydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3
-Dichlorohydroquinone, 2,5-dichlorohydroquinone, 2,3-dibromohydroquinone, 2,5-dimethylhydroquinone, etc., but hydroquinone is particularly preferable. As a preservative of sulfite used in the present invention, sodium sulfite, potassium sulfite, lithium sulfite,
Examples include ammonium sulfite, sodium bisulfite, potassium metabisulfite, and formaldehyde sodium bisulfite. The sulfite content is preferably 0.25 mol / liter or more, and particularly preferably 0.4 mol / liter or more. The upper limit is 2.
It is preferably up to 5 mol / liter, particularly up to 1.2.

The alkaline agents used for setting the pH are sodium hydroxide, potassium hydroxide, sodium carbonate,
It contains a pH adjuster such as potassium carbonate and a buffer. As additives used in addition to the above components, compounds such as boric acid and borax, development inhibitors such as sodium bromide, potassium bromide and potassium iodide: ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve , Organic solvents such as hexylene glycol, ethanol, methanol: 1-phenyl-
Antifoggants such as 5-mercaptotetrazole, mercapto-based compounds such as 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, indazole-based compounds such as 5-nitroindazole, benztriazole-based compounds such as 5-methylbenztriazole, or the like. Black pot (bla
ck pepper) inhibitor: If necessary, a toning agent, a surfactant, a defoaming agent, a water softener, a film hardener, JP-A-56-106244, JP-A-61-267759.
And an amino compound described in Japanese Patent Application No. 1-291818. In the developer used in the present invention, a compound described in JP-A-56-24347 as a silver stain inhibitor, a compound described in JP-A-62-212651 as a development unevenness inhibitor, and a dissolution aid are disclosed. 61-2677
The compound described in No. 59 can be used.

In the developing solution used in the present invention, boric acid described in Japanese Patent Application No. 61-28708 is used as a buffer, and JP
0-93433 sugars (eg saccharose),
Oximes (eg acetoxime), phenols (eg 5-sulfosalicylic acid) and the like are used.
The processing method of the present invention can be carried out in the presence of polyalkylene oxide, but in order to contain polyalkylene oxide in the developer, polyethylene glycol having an average molecular weight of 1000 to 6000 is used in the range of 0.1 to 10 g / liter. Preferably. The fixing solution may contain a water-soluble aluminum compound as a hardening agent in addition to the fixing agent. If necessary, an acidic aqueous solution containing acetic acid and a dibasic acid (eg tartaric acid, citric acid or salts thereof),
The pH is preferably 3.8 or higher, and more preferably 4.0 or higher.
Have a 6.5. Sodium thiosulfate as a fixing agent,
Ammonium thiosulfate and the like are preferable, and ammonium thiosulfate is particularly preferable from the viewpoint of the fixing speed. The amount of the fixing agent used can be appropriately changed and is generally about 0.1 to about 5 mol /
It is a liter. The water-soluble aluminum salt that mainly acts as a hardening agent in the fixing solution is a compound generally known as a hardening agent for an acidic hardening fixing solution, and examples thereof include aluminum chloride, aluminum sulfate, and potassium alum.

As the above-mentioned dibasic acid, tartaric acid or its derivative, citric acid or its derivative can be used alone or in combination of two or more kinds. It is effective that these compounds contain 0.005 mol or more per liter of the fixer, and particularly 0.01 mol / liter to 0.03 mol / liter is particularly effective. Specific examples include tartaric acid, potassium tartrate, sodium tartrate, potassium sodium tartrate, ammonium tartrate, potassium ammonium tartrate, and the like. Examples of citric acid or its derivative effective in the present invention include citric acid, sodium citrate, potassium citrate, and the like.

The fixing solution used in the present invention preferably contains a mesoionic compound represented by the following general formula (I) in combination.

[0067]

[Chemical formula 23]

[0068] formula, Z is a carbon atom, a nitrogen atom, an oxygen atom, a 5 or 6-membered ring composed of a sulfur atom or a selenium atom, X ^- is ^-O -, -S ^-, or -N, ^-
R (wherein X represents an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group). Among these, compounds represented by the following general formula (XII) are more preferable.

[0069]

[Chemical formula 24]

In the formula, R ₁ and R ₂ represent an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group. However, R ₂ may be a hydrogen atom. Y is -O-, -S-, -N
(R ₃₎ - represents, R ₃ is an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an amino group, an acylamino group, a sulfonamido group, a ureido group or a sulfamoylamino group Represent. R ₁ and R ₂ , and R ₂ and R ₃ may be bonded to each other to form a ring.

The compound represented by the above general formula (XII) will be described in detail. In the formula, R ₁ and R ₂ are substituted or unsubstituted alkyl groups (for example, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group). , Dimethylaminoethylthioethyl group, diethylaminoethyl group, aminoethyl group, methylthiomethyl group,
Trimethylammonioethyl group, carboxymethyl group,
Carboxyethyl group, carboxypropyl group, sulfoethyl group, sulfomethyl group, phosphonomethyl group, phosphonoethyl group, etc.), substituted or unsubstituted cycloalkyl group (eg, cyclohexyl group, cyclopentyl group, 2
-Methylcyclohexyl group, etc.), substituted or unsubstituted alkenyl group (eg, allyl group, 2-methylallyl group, etc.), substituted or unsubstituted alkynyl group (eg, propargyl group, etc.), substituted or unsubstituted aralkyl group (Eg, benzyl group, phenethyl group, 4-methoxybenzyl group, etc.), aryl group (eg, phenyl group,
Naphthyl group, 4-methylphenyl group, 4-methoxyphenyl group, 4-carboxyphenyl group, 4-sulfophenyl group, etc. or substituted or unsubstituted heterocyclic group (for example, 2-pyridyl group, 3-pyridyl group) , 4-pyridyl group, 2-cenyl group, 1-pyrazolyl group, 1-imidazolyl group, 2-tetrahydrofuryl group, etc.).

However, R ₂ may be a hydrogen atom.
R ₃ is a substituted or unsubstituted alkyl group (eg, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group, dimethylaminoethylthioethyl group). Group, diethylaminoethyl group, aminoethyl group,
Methylthiomethyl group, trimethylammonioethyl group,
Carboxymethyl group, carboxyethyl group, carboxypropyl group, sulfoethyl group, sulfomethyl group, phosphonomethyl group, phosphonoethyl group, etc.), substituted or unsubstituted cycloalkyl group (eg cyclohexyl group, cyclopentyl group, 2-methylcyclohexyl group, etc.) ),
A substituted or unsubstituted alkenyl group (eg, an allyl group,
2-methylallyl group, etc.), substituted or unsubstituted alkynyl group (eg, propargyl group, etc.), substituted or unsubstituted aralkyl group (eg, benzyl group, phenethyl group, 4-methoxybenzyl group, etc.), aryl group (For example, phenyl group, naphthyl group, 4-methylphenyl group,
4-methoxyphenyl group, 4-carboxyphenyl group,
4-sulfophenyl group, etc.) or a substituted or unsubstituted heterocyclic group (for example, 2-pyridyl group, 3-pyridyl group, 4-pyridyl group, 2-cenyl group, 1-pyrazolyl group, 1-imidazolyl group, 2-tetrahydrofuryl group,
etc),

A substituted or unsubstituted amino group (eg, unsubstituted amino group, dimethylamino group, methylamino group,
Etc.), an acylamino group (for example, an acetylamino group, a benzoylamino group, a methoxypropionylamino group,
Etc.), sulfonamide group (for example, methanesulfonamide group, benzenesulfonamide group, 4-toluenesulfonamide group, etc.), ureido group (for example, unsubstituted ureido group, 3-methylureido group, etc.), sulfamoyl It may be an amino group (for example, an unsubstituted sulfamoylamino group, a 3-methylsulfamoylamino group, etc.). In the general formula (XII), preferably Y is -N (R ₃₎ - a represents R
₁ , R ₃ represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group. R ₃ is preferably a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group or a substituted or unsubstituted heterocyclic group. Specific examples of the compound of the present invention are shown below, but the present invention is not limited thereto.

[0074]

[Chemical 25]

The compound of the present invention is used in the fixer or fixer replenisher in the range of 1 × 10 ^-5 mol / liter to 10 mol / liter, particularly 1 × 10 ^-3 mol / liter to 3 mol / liter. Is preferred. When the halogen composition of the silver halide emulsion in the light-sensitive material to be processed is silver iodobromide, it is preferably used in an amount of 0.5 to 2 mol / liter. Silver chloride emulsion (silver chloride 8
In the case of a silver halide containing 0 mol% or more),
It is preferably used in the range of 0.05 to 1 mol / liter. If desired, the fixer may further contain preservatives (eg, sulfite, bisulfite), pH buffers (eg, acetic acid, boric acid), pH adjusters (eg, ammonia, sulfuric acid), image preservation improving agents (eg, Potassium iodide) and a chelating agent. Here, the pH buffer is 10 to 40 g / liter, more preferably 18 to 25 g, because the pH of the developer is high.
Use about g / liter.

For washing water, an antifungal agent (see, for example, "Chemistry of Antibacterial and Antifungal" by Horiguchi, JP-A-62-115154).
Compound), a water washing accelerator (such as sulfite), and a chelating agent. According to the above method, the developed and fixed photographic material is washed with water and dried.
Washing with water is carried out in order to almost completely remove the silver salt dissolved by fixing, and preferably at about 20 ° C to about 50 ° C for 10 seconds to 3 minutes. Drying is performed at about 40 ° C. to about 100 ° C., and the drying time may be appropriately changed depending on the ambient conditions, but is usually about 5 seconds to 3 minutes 30 seconds. Regarding the roller-conveying type automatic developing machine, US Pat. Nos. 3,025,779 and 35,
No. 45971, etc., and is simply referred to as a roller transport type processor in this specification. The roller transport type processor comprises four steps of development, fixing, washing and drying, and the method of the present invention does not exclude other steps (for example, stopping step), but it is most preferable to follow these four steps. .. The amount of replenishment of flush water is 12
It may be up to 00 ml / m ² (including 0). The case where the replenishment amount of the washing water (or the stabilizing solution) is 0 means a washing method by a so-called accumulated water washing method. As a method of reducing the replenishment amount, a multistage countercurrent method (for example, 2 stages, 3
Dan) are known.

Good processing performance can be obtained by combining the following techniques with the problems that occur when the replenishing amount of washing water is small. For washing bath or stabilizing bath, R.
T. Kreiman J. Image, Tech. Vol. 10 No. 624
2 (1984), isothiazoline compounds,
Research Disclosure (RD) Volume 205,
No. 20526 (May 1981, May issue), isothiazoline compounds, Vol. 228, No. 22845
(April, 1983), isothiazoline compounds described in JP-A-61-115154 and JP-A-62-2.
The compounds described in No. 09532, etc.
It can also be used as a biocide). Others, "The Chemistry of Antibacterial and Antifungal" Hiroshi Horiguchi, Sankyo Publishing (Sho 57), "Handbook of Antibacterial and Antifungal Technology", Japan Society of Antibacterial and Antifungal, Hakuhodo (Showa 61), LE West "Water Quallity Criteria" Phot
o Sci & Eng. Vol. 9 No. 6 (1965), MW Beac
h “Microbiological Growths in Motion Picture Proc
essing ”SMPTE Journal Vol.85 (1976), RO
Deegan “PhotoProcessing Wash Water Biocides” J. Im
Compounds such as those described in Aging Tech. Vol. 10 No. 6 (1984) may be included.

When washing with a small amount of washing water in the method of the present invention, JP-A-63-18350 and JP-A-62-28
It is more preferable to provide a squeeze roller and a crossover rack cleaning tank described in No. 7252. Furthermore,
Part or all of the overflow liquid from the washing or stabilizing bath produced by supplementing the washing or stabilizing bath of the present invention with antifungal water according to the treatment is disclosed in JP-A-60-23.
As described in JP-A No. 5133 and JP-A No. 63-129343, it can also be used in a processing solution having a fixing ability which is a processing step before that. Further, a water-soluble surfactant or an antifoaming agent is added in order to prevent water bubble unevenness that tends to occur when washing with a small amount of washing water and / or to prevent the processing agent component attached to the squeeze roller from being transferred to the processed film. You may add. Further, the dye adsorbent described in JP-A-63-163456 may be installed in a water washing tank to prevent contamination by the dye eluted from the light-sensitive material. The developer used in the present invention is preferably stored in a packaging material having low oxygen and moisture permeability described in JP-A-61-73147. Further, the replenishing system described in JP-A-62-91939 can be preferably used as the developing solution used in the present invention.

Since the silver halide photographic light-sensitive material of the present invention gives a high Dmax, when it is subjected to a reduction treatment after image formation, it maintains a high density even if the halftone dot area is reduced. There is no particular limitation on the reducing fluid used in the present invention. For example, Mies, “The Theory of the Photograph
ic Process ”pp. 738-744 (1954, Macm
illan), Tetsuo Yano “Photo Processing: Theory and Practice” 16
6-169 pages (1978, Kyoritsu Shuppan), etc.
55-17123, 55-79444, 57.
-10140, 57-142639, 61-6
No. 1155, JP-A 1-282551, JP-A 2-25
What was described in No. 846 etc. can be used. That is, as an oxidant, permanganate, persulfate, ferric salt, cupric salt, cerium salt, red blood salt, dichromate, etc. may be used alone or in combination, and if necessary. A reducing solution containing an inorganic acid such as sulfuric acid or an alcohol, or an oxidizing agent such as red blood salt or ferric ethylenediaminetetraacetic acid salt, and a halogen such as thiosulfate salt, rhodan salt, thiourea or a derivative thereof. A reducing solution containing a silver halide solvent and, if necessary, an inorganic acid such as sulfuric acid is used.

Typical examples of the reducer used in the present invention are so-called Farmer reducer, ferric ethylenediaminetetraacetic acid salt, potassium permanganate, ammonium persulfate reducer (Kodak R-5), A second cerium reducing liquid may be used. Generally, the conditions for the reduction treatment are 10 ° C to 40 ° C,
In particular, it is preferable that the temperature can be finished at a temperature of 15 ° C. to 30 ° C. for several seconds to several tens of minutes, especially within several minutes. By using the plate-making photosensitive material of the present invention, a sufficiently wide reduction range can be obtained within the range of these conditions. The reducing liquid acts on the recorded image formed in the emulsion layer through the non-photosensitive upper layer containing the compound of the present invention. Specifically, there are various methods, for example, a method of immersing the plate-making photosensitive material in a reducing liquid and stirring the liquid, or applying the reducing liquid to the surface of the plate-making photosensitive material with a brush, a roller, or the like. Is available.

The light-sensitive material of the present invention has a total processing time of 15 seconds to
It shows excellent performance in rapid development processing by an automatic processor which is 60 seconds. In the rapid development processing of the present invention, the temperature and time of development and fixing are each 25 seconds or less at about 25 ° C. to 50 ° C., and preferably 4 seconds to 15 seconds at 30 ° C. to 40 ° C. In the present invention, the light-sensitive material is subjected to washing or stabilizing treatment after being developed and fixed. Here, in the water washing step, a water saving treatment can be performed by using a countercurrent water washing method of two or three stages. Further, when washing with a small amount of washing water, it is preferable to provide a squeeze roller washing tank. Further, a part or the whole of the overflow solution from the washing bath or the stabilizing bath can be used as the fixing solution as described in JP-A-60-235133. This is more preferable because the amount of waste liquid is reduced. In the present invention, the photosensitive material which has been developed, fixed and washed with water is dried through a squeeze roller. Drying at 40 ° C-80 ° C for 4 seconds-3
It takes 0 seconds. With the total processing time in the present invention, after inserting the tip of the film into the insertion port of the automatic developing machine, the developing tank, the transition portion, the fixing tank, the transition portion, the washing tank, the transition portion,
It is the total time for the leading edge of the film to pass through the drying section and emerge from the drying outlet. Since the silver halide light-sensitive material of the present invention can reduce the amount of gelatin used as a binder for the emulsion layer and the protective layer without impairing the pressure fog, it can be developed even in the rapid processing for a total processing time of 15 to 60 seconds. Development processing can be carried out without impairing the speed, fixing speed, and drying speed. Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited thereto.

[0082]

【Example】

Example 1 (1) Preparation of Emulsion Liquid I Water 1000 ml Gelatin 20 g Sodium chloride 20 g 1,3-Dimethylimidazolidine-2-thione 20 mg Sodium benzenesulfonate 6 mg II liquid water 400 mg Silver nitrate 100 g III liquid water 400 ml Sodium chloride 30.5 g Potassium bromide 14 g Potassium hexachloroiridium (III) (0.001% aqueous solution) 15 ml Ammonium hexabromorhodium (III) (0.001% aqueous solution) 1.5 ml I kept at 38 ° C., pH = 4.5 Add liquid II and liquid III to the liquid at the same time while stirring for 10 minutes, and add 0.17
μm core particles were formed. Then, the following IV solution and V solution 10
Added over minutes. Further potassium iodide 0.15
g was added to complete the grain formation. IV solution Water 400 ml Silver nitrate 100 g V solution Water 400 ml Sodium chloride 30.5 g Potassium bromide 14 g K ₄ Fe (CN) ₆ 1 × 10 ^-5 mol / mole Ag Then, it is washed with water by a flocculation method according to a conventional method, 40 g of gelatin was added.

This was divided into two equal parts, and one emulsion (A) had a pH of
= 5.5, pAg = 7.5, sodium thiosulfate 3.7 mg and chloroauric acid 6.2 mg were added, and chemical sensitization was performed at 65 ° C. to obtain optimum sensitivity. The other emulsion (B)
Is adjusted to pH = 5.3 and pAg = 7.5, sodium thiosulfate 2.6 mg, chloroauric acid 5.0 mg and tellurium sensitizer 3.0 mg are added, sodium benzenethiosulfonate 4 mg, benzene Sodium sulfinate (1.0 mg) was added, and chemical sensitization was performed at 55 ° C. to obtain the optimum sensitivity. Finally, a silver iodochlorobromide cubic grain emulsion containing 80 mol% of silver chloride and having an average grain size of 0.21 μm was prepared. did. (2) Preparation of coating sample A sensitizing dye was added to the emulsions (A) and (B) at 5 × 10 ⁻⁴ mol / mol Ag for ortho-sensitization. Further, hydroquinone and 1-phenyl-5-mercaptotetrazole as antifoggants are 2.5 g per 1 mol of Ag, respectively.
50 mg of colloidal silica (Snowtex C manufactured by Nissan Chemical Industries, average particle diameter 0.015 μm) in the amount shown in Table 1 was used as a plasticizer for polyethyl acrylate latex (0.05 μm).
m) is 40% by weight with respect to gelatin, and as a hardener, 2-
Bis (vinylsulfonylacetamide) ethane was added in an amount of 30 mg per 1 g of total gelatin to obtain 3.0 g / m ² of Ag and 1.2 g / gelatin of gelatin on a polyethylene terephthalate support.
It was applied so as to be m ² . A protective layer lower layer and a protective layer upper layer having the following compositions were simultaneously coated thereon. <Lower layer of protective layer> Gelatin per m ² 0.25 g Sodium benzenethiosulfonate 4 mg 1,5-dihydroxy-2-benzaldoxime 25 mg Polyethyl acrylate latex 125 mg <Upper layer of protective layer> 0.25 g gelatin per m ² Average 2. 5 μm silica matting agent 50 mg Compound (gelatin dispersion of slipping agent) Table-1 Colloidal silica (Nissan Chemical's Snowtex C) 30 mg Compound-5 mg Sodium dodecylbenzenesulfonate 22 mg

[0084]

[Chemical formula 26]

The support of the sample used in this example has a back layer and a back protective layer having the following compositions. <Back layer> Gelatin 2.0 g / m ² Sodium dodecylbenzenesulfonate 80 mg / m ² compound 70 mg / m ² compound 70 mg / m ² compound 90 mg / m ² 1,3-divinylsulfonyl-2-propanol 60 mg / m ² < Back protective layer> Gelatin 0.5 g / m ² Polymethylmethacrylate fine particles (average particle size 3.6 μm) 40 mg / m ² Sodium dodecylbenzenesulfonate 20 mg / m ² compound (gelatin dispersion of lubricant) 100 mg / m ² compound 2 mg / m ²

[0086]

[Chemical 27]

The samples thus obtained were evaluated for their photographic properties, fogging and dynamic friction coefficient. The evaluation method is shown below. (1) Evaluation of photographic properties The obtained sample was exposed to xenon flash light with an emission time of 10 ^-6 seconds through an interference filter having a peak at 488 nm and a continuous density wedge, and was then photographed by Fuji Photo Film Co., Ltd.
Using an automatic developing machine FG-710NH, the processing was carried out under the development processing conditions shown below, and the relative sensitivity of the exposure amount giving a density of 3.0 was determined. As the developing solution and the fixing solution, a processing solution having the composition shown below was used. The replenishing amount at this time is 200 ml / m ² for both the developing solution and the fixing solution. Development conditions Current image 38 ° C 14.0 seconds Fixed 37 ° C 9.7 seconds Water washing 26 ° C 9.0 seconds Squeeze 2.4 seconds Dry 55 ° C 8.3 seconds Total 43.4 seconds Linear velocity 2800mm / Min

Developer solution 1,2-dihydroxybenzene-3,5-disulfonic acid sodium salt 0.5 g Diethylenetriamine-pentaacetic acid 2.0 g Sodium carbonate 5.0 g Boric acid 10.0 g Potassium sulfite 85.0 g Sodium bromide 6.0 g Diethylene glycol 40.0 g 5-Methylbenzotriazole 0.2 g Hydroquinone 30.0 g 4-Hydroxymethyl-4-methyl-1-phenyl-3-pyrazolidone 1.6 g 2-Mercaptobenzimidazole-5-sodium sulfonate 0.3 g Water Add potassium oxide and add water to make 1 liter and adjust the pH to 10.7. 1 liter Fixing solution Ammonium thiosulfate 150 g / liter 1,4,5-Trimethyl-1,2,4-triazolium-3-thiolate 0.25 mol / liter Sodium bisulfite 30 g / liter Disodium ethylenediaminetetraacetate dihydrate Adjust to pH = 6.0 with 0.025 g / liter sodium hydroxide. (2) Pressure fog Under the conditions of 25 ° C. and 60% RH, rub the surface of the sample with a continuous load of 0 to 200 g with a sapphire needle having a diameter of 0.1 mm, and then develop under the development conditions of 1) above. The load causing fogging was determined. (3) Coefficient of dynamic friction (μ _k ) After standing for 1 hour at 25 ° C and 60%, a sapphire needle with a diameter of 1 mm was used to apply a load of 100 g and a speed of 60 cm / min.
, Were used to determine the dynamic friction coefficient. The obtained results are shown in Table 1. As is clear from Table 1, the samples of the present invention have high sensitivity and remarkably good pressure fog.

[0089]

[Table 1]

Example 2 0.5M silver nitrate aqueous solution, 0.1M potassium bromide, 0.44M sodium chloride and hexachloroiridium
(III) potassium salt, an aqueous solution of a halogen salt containing ammonium hexabromorhodium (III), sodium chloride,
An average particle size of 0.18 μm was added to a gelatin aqueous solution containing 1,3-dimethylimidazolidine-2-thione and benzenethiosulfonic acid and adjusted to pH 4.0 by a double jet method at 38 ° C. for 10 minutes while stirring. Nucleation was performed by obtaining silver chlorobromide grains having a silver chloride content of 70 mol%. Subsequently, similarly, a 0.5 M silver nitrate aqueous solution and a halogen salt aqueous solution containing 0.1 M potassium bromide, 0.44 M sodium chloride and potassium ferrocyanide were added for 10 minutes by the double jet method to complete the grain formation. .. The obtained particles have an average particle size of 0.22μ.
m, silver chloride content 70 mol%, Ir 3.8 × 10 ⁻⁷ mol, Rh 6.1 × 10 ⁻⁸ mol, Fe per 1 mol of silver
Was 2.3 × 10 ⁻⁵ mol of silver chlorobromide cubic grains (variation coefficient: 10%). Then, it was washed with water by the flocculation method according to a conventional method, and 30 g of gelatin was added.
The silver / gelatin weight ratio was 2.5. 2 this emulsion
Emulsions A and B were prepared according to the following method. Emulsion A: pH of emulsion was adjusted to 5.6, pAg was adjusted to 7.5, sodium thiosulfate was 3.2 mg, and chloroauric acid was 4.3.
mg was added, and chemical sensitization treatment was performed at 65 ° C. to obtain optimum sensitivity, and 4-hydroxy-6-methyl- was added as a stabilizer.
75 mg of 1,3,3a, 7-tetraazaindene was added. Emulsion B: The pH of the emulsion was adjusted to 5.1 and the pAg was adjusted to 7.5, 2.2 mg of sodium thiosulfate, 2.7 mg of tellurium sensitizer 10 and 3.4 mg of sodium benzenethiosulfonate.
mg, sodium benzenesulfinate 0.85 mg, and chloroauric acid 4.3 mg were added, the aging time was adjusted to obtain the optimum sensitivity at 55 ° C., chemical sensitization treatment was performed, and 4-hydroxy as a stabilizer was used. -6-Methyl-1,3,3a, 7-
75 mg of tetraazaindene was added.

90 mg of a sensitizing dye was added to each of the emulsions A and B thus obtained, and 4,4'-bis (4,6) was added.
-Dinaphthoxy-pyrimidin-2-ylamino) -stilbene disulfonic acid disodium salt, 2 per mol of silver
34 mg and 25 mg of 1-phenyl-5-mercaptotetrazole were added. Furthermore, hydroquinone 150 mg / m ² ,
Polyethyl acrylate latex for gelatin to 4
0% by weight, colloidal silica (Snowtex C, manufactured by Nissan Chemical Industries, Ltd.) in the amount shown in Table-2, and 2-bis (vinylsulfonylacetamide) ethane (60 mg / m ² ) as a hardening agent were added, and an undercoat layer No. 1 having the following composition was added. On a polyethylene terephthalate support having a first layer and a second layer applied on both sides, a silver coating amount of 3.3 g /
m ^2, and applied so as to become the coating amount of gelatin 1.4 g / m ^2.
Further, a protective layer having the following composition was simultaneously coated on the emulsion layer.

<First Layer of Undercoat Layer> Aqueous dispersion of vinylidene chloride / methyl methacrylate / acrylonitrile / methacrylic acid (90/8/1/1 by weight) copolymer 15 parts by weight 2,4- Dichloro-6-hydroxy-s-triazine 0.25〃 Polystyrene fine particles (average particle size 3μ) 0.05〃 Compound-6 0.20〃 Water was added 100〃 Further, 10% by weight of KOH was added, pH = The coating solution adjusted to 6 was applied at a drying temperature of 180 ° C. for 2 minutes so that the dry film thickness was 0.9 μm. <Undercoat layer 2nd layer> Gelatin 1 part by weight Methylcellulose 0.05 〃 Compound-7 0.02 〃 C ₁₂ H ₂₅ O (CH ₂ CH ₂ O) ₁₀ H 0.03 〃 Compound-8 3.5 × 10 ^-3 〃 acetic acid 0.2 〃 water was added 100 〃 This coating solution was applied at a drying temperature of 170 ° C for 2 minutes so that the dry film thickness would be 0.1µ.

[0093]

[Chemical 28]

<Protective layer> Gelatin 0.5 g / m ² Dye 70 mg / m ² Polymethylmethacrylate fine particles (average particle size 2.5 μm) 60 〃 Colloidal silica (particle size 0.010 to 0.015 μm, Snowtex C manufactured by Nissan Kagaku) 70 〃 Sodium dodecylbenzene sulfonate 20 〃 Compound 1.5 〃 〃 20 〃 〃 (Gelatin dispersion of lubricant) Table-2

[0095]

[Chemical 29]

A conductive layer having the following composition (surface resistivity: 2 × 10 ¹⁰ Ω at 25 ° C. and 10% RH) was coated on the opposite side of the support, and a back layer and a back protective layer were simultaneously coated thereon. did. <Conductive layer> SnO ₂ / Sb (9/1 weight ratio, average particle size 0.25μ) 300 mg / m ² gelatin (Ca ⁺⁺ content 30 ppm) 170 〃 compound-8 7 〃 sodium dodecylbenzene sulfonate 10 〃 dihexyl -α- sulfosuccinates sodium salt 40 〃 polystyrene sulfonic acid sodium salt 9 〃 (back layer) gelatin 2.0 g / m ² sodium dodecylbenzenesulfonate 80 mg / m ² dye 160 mg / m ² 〃 40 mg / m ² 〃 120 mg / m ² 1,3-divinylsulfone-2-propanol 60 mg / m ² (back protective layer) gelatin 0.5 g / m ² polymethylmethacrylate (particle size 4.7 μm) 30 mg / m ² sodium dodecylbenzenesulfonate 20 mg / m ² compounds 2 mg / m ² compounds 100 mg / m ²

[0097]

[Chemical 30]

The sample thus obtained was evaluated in the same manner as in Example-1. In addition, (1) Evaluation of photographic properties was performed in the same manner as in Example 1 except that the interference filter was changed to an interference filter having a peak at 633 nm. The obtained results are shown in Table-2. As is clear from Table 2, the samples of the present invention have high sensitivity and remarkably good pressure fog. In particular, it can be seen that the effect is greater when the coefficient of dynamic friction of the outermost layer is 0.35 or less.

[0099]

[Table 2]

Example 3 Ag1 was added to the emulsions (A) and (B) of Example-1 with a sensitizing dye.
80 mg per mol was added, and then 4-4'-bis (4,6-dinaphthoxy-pyrimidin-2-ylamino) -stilbene disulfonic acid disodium salt and 2,5-dimethyl were used as supersensitizers and stabilizers. Add 3-m-allyl-benzothiazole iodo salt to 300 m / Ag mole.
Infrared sensitization was performed by adding g and 450 mg. Further, an antifoggant, a plasticizer, a hardener, and colloidal silica were added in the amounts shown in Table 3, and Ag was added onto the polyethylene terephthalate support.
The coating was carried out so that the amount was 3.0 g / m ² and the gelatin was 1.2 g / m ² . A lower layer and an upper layer of a protective layer having the following composition were simultaneously coated thereon. (Protective layer lower) Gelatin Table 3 Compound -9 20 mg / m ² Compound -10 10 〃 sodium dodecylbenzenesulfonate 20 〃 polyethyl acrylate latex (0.05 .mu.m) 0.99 〃 (upper protective layer) Gelatin Table 3 polymethyl Methacrylate fine particles (average particle size 3.4μ) 60 mg / m ² Colloidal silica (Snowtex C manufactured by Nissan Kagaku) 30 mg / m ² Compound- (gelatin dispersion of lubricant) 40 mg / m ² Sodium dodecylbenzene sulfonate 40 mg / m ² compounds-11 10 〃

[0101]

[Chemical 31]

Then, on the opposite side, a back layer and a protective layer having the following formulations were applied. (Back layer) Gelatin 2.0 g / m ² compound-12 34 mg / m ² compound-13 90 〃 compound -14 70 〃 polyethyl acrylate latex (particle size 0.05 μ) 400 〃 sodium dodecylbenzene sulfonate 35 〃 1, 3-divinylsulfonyl-2-propanol 50 〃 Sodium polystyrene sulfonate 20 〃 (protective layer) Gelatin 0.5 g / m ² Polymethylmethacrylate fine particles (average particle size 3.4 µ) 40 mg / m ² Sodium dodecylbenzene sulfonate 10 〃 Compound-15 2〃 Sodium acetate 25〃

[0103]

[Chemical 32]

[0104]

[Table 3]

The sample thus obtained was evaluated in the same manner as in Example-1. In addition, (1) Evaluation of photographic properties was performed in the same manner as in Example-1 except that the interference filter was changed to an interference filter having a peak at 780 nm. The obtained results are shown in Table 4. As is clear from Table 4, the samples of the present invention have high sensitivity and markedly good pressure fog, and the samples having a protective layer gelatin coating amount of 0.5 g / m ² or less have sensitivity. It can be seen that there is no decrease and the suitability for rapid processing is excellent.

[0106]

[Table 4]

Example 4 To the emulsions A and B of Example-1, 50 mg of a sensitizing dye was added per mol of Ag, and then, as a supersensitizer and a stabilizer,
4-4'-bis (4,6-dinaphthoxy-pyridine-2
-Ylamino) stilbene disulfonic acid disodium salt and 2,5-dimethyl-3-allyl-benzothiazole iodo salt were added to 400 mg and 500, respectively, per mol of Ag.
Infrared sensitization was performed by adding mg. Further, colloidal silica (the same as in Example-1) was used in the amount shown in Table-5, and as an plasticizer, ethyl acrylate latex (particle size: 0.05 μm).
m) 250 mg / m ² , as a hardening agent, 2-bis (vinylsulfonylacetamido) ethane 80 mg / m ² , and as a thickener, sodium polystyrene sulfonate 30 mg / m ² , so that Ag 1.3 g / m ² is added. m ² , gelatin 0.5
Polyethylene laminated paper with undercoat layers on both sides to achieve g / m ² (paper: 75 μm, polyethylene: 20 μ
m). At this time, an antihalation layer having the following composition was coated below the emulsion layer, and a protective layer having the following composition was simultaneously coated above the emulsion layer.

(Antihalation Layer) Gelatin 1.3 g / m ² 5-Methylbenzotriazole 7 mg / m ² Compound-9 30 〃 〃 -10 30 〃 〃 -17 115 〃 Hydroquinone 33 〃 Ethyl acrylate latex (particle size 0. 05 μm) 800 〃 Polystyrene sodium sulfonate 23 〃 (Protective layer) Gelatin 0.5 g / m ² SiO ₂ fine particles (average particle diameter 3.5 μm) 25 mg / m ² 1-Phenyl-5-mercapto-tetrazole 0.04 〃 1 , 5-dihydroxy-2-benzaldoxime 8〃 sodium polystyrene sulfonate 5〃 ethyl acrylate latex (particle size 0.05µm) 300〃 compound-18 100〃

[0109]

[Chemical 33]

The sample support used in this example has a back layer and a back protective layer having the following compositions. (Back layer) Gelatin 1.5 g / m ² compound-8 3 mg / m ² 〃 -4 20 〃 〃 -19 25 〃 Sodium polystyrene sulfonate 20〃 1,3-divinylsulfonyl-2-propanol 80 〃 (Back protective layer) ) Gelatin 0.8 g / m ² compound-8 2 mg / m ² 〃 -19 5 〃 〃 -21 〃 〃 -20 10 〃 Sodium acetate 20 〃 Polymethylmethacrylate fine particles (average particle size 3.4 µm) 40 〃

[0111]

[Chemical 34]

With respect to the sample thus obtained, a quarter size (254 × 305 mm) was measured with a tungsten light at 50.
% After blackening exposure, using the same developing solution and fixing solution as in Example-1, using an FG-460A automatic developing machine manufactured by Fuji Photo Film Co., Ltd., processing 250 sheets per day, and developing as shown below. After continuous treatment for 2 weeks under the conditions and the replenishment amount shown in Table 5, photographic evaluation was performed under the same exposure conditions as in Example-3. At this time, the replenishing amount of the fixer is 180 ml / m ²
Is. Evaluation of dynamic friction coefficient and pressure fog was carried out in Example-1.
Same as above. Development conditions Current image 38 ° C 11.1 seconds Fixed 36 ° C 10.5 seconds Water washing 25 ° C 10.1 seconds Dry 55 ° C 13.3 seconds Total 45.0 seconds Line speed 1849mm / min It shows in Table-5. As is clear from Table 5, the samples of the present invention have high sensitivity, remarkably good pressure fog, and can reduce the replenishment amount of the developing solution without impairing photographic performance. I understand.

[0113]

[Table 5]

Claims (6)

[Claims] 1. A silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support and at least one protective layer on the emulsion layer, wherein at least one of the emulsion layers is provided. A silver halide photographic light-sensitive material comprising a silver halide grain sensitized with a tellurium sensitizer and colloidal silica. 2. The coefficient of dynamic friction of the outermost layer of the protective layer is 0.
The silver halide photographic light-sensitive material according to claim 1, which is 35 or less. 3. The gelatin coating amount of the protective layer is 0.5 g
^{3. The} silver halide photographic light-sensitive material according to claim 1 or ^{2, wherein} the total gelatin coating amount including the emulsion layer is 2.5 g / m ² or less. 4. The silver halide photographic light-sensitive material according to claim 1, which is processed by an automatic processor having a total processing time of 15 to 60 seconds. 5. The silver halide photographic light-sensitive material according to claim 1, which is processed by an automatic developing machine having a line speed of 1000 mm / min or more. 6. A method in which a silver halide photographic light-sensitive material is subjected to at least development / fixing / washing treatment using an automatic processor after exposure, and the replenishment amount of the developing solution and / or the fixing solution is 200 ml or less per 1 m ^{2 of the} light-sensitive material. 3. The method for developing and processing a silver halide photographic light-sensitive material according to claim 1, wherein