JP3051898B2 - Silver halide photographic light-sensitive material and its developing method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a silver halide photographic material having high sensitivity, improved pressure resistance, and excellent rapid processing suitability in short-time exposure at high illuminance. The present invention relates to a photosensitive material and a developing method thereof.

[0002]

2. Description of the Related Art In general, a silver halide photographic light-sensitive material is provided on a support such as a plastic film, paper or paper coated with plastic, glass, etc., a light-sensitive emulsion layer and, if necessary, an intermediate layer, a protective layer, a back layer, Antihalation layer, various combinations of constituent layers such as antistatic layer,
It has been applied. Silver halide photographic materials
Contact parts between various devices and photosensitive materials during handling such as manufacturing, coating, drying, processing, shooting, development, printing, projection, etc., or photosensitive materials such as dust and fiber debris Pressure fog often occurs in the photographic material due to contact friction between the photographic material and the photographic material, such as between the surface of the photographic material and the back surface. As a means for improving the concentration change due to such pressure, a method of incorporating a plasticizer such as a polymer latex or a polyhydric alcohol, a method of reducing the silver halide / gelatin ratio of the silver halide emulsion layer, and a method of increasing the thickness of the protective layer A method is known in which the pressure is relaxed before reaching the silver halide grains by adding a slipping agent or colloidal silica to the protective layer. British Patent No. 738,618 discloses a heterocyclic compound, 738,637 discloses an alkyl phthalate, 738,689 describes an alkyl ester, and U.S. Pat. No. 2,960,404 discloses a polyhydric alcohol. No. 3,121,060 discloses a method using carboxyalkylcellulose, JP-A-49-5017 discloses a method using paraffin and carboxylate, and JP-B-53-28086 discloses a method using alkyl acrylate and organic acid. It has been disclosed. However, the method of adding a plasticizer reduces the mechanical strength of the emulsion layer, so its use amount is limited. When the silver halide / gelatin ratio is reduced, the development progress is delayed, and the suitability for rapid processing is impaired. Having. Also,
Polyhydroxybenzene compounds are introduced into silver halide photographic materials containing hydrazine derivatives for various purposes,
U.S. Pat. No. 4,332,108, U.S. Pat.
No. 5,108, U.S. Pat. No. 4,377,634 and the like, and Japanese Patent Application Laid-Open No. 62-21143 describes a technique for preventing pressure sensitization. However, in the printing industry, work efficiency and speedup are strongly desired, and there is a wide range of needs for high-speed scanning and shortening of processing time for photosensitive materials.
In order to respond to these needs in the printing field, exposure machines (scanners, plotters) are required to have a higher scanning speed and an increased number of lines and a narrower beam for higher image quality. It is desired that the material has high sensitivity, excellent stability and rapid development processing. The rapid development process mentioned here means that after inserting the leading edge of the film into the automatic processor, the film passes through the developing tank, transition section, fixing tank, transition section, washing tank, and drying section, and the leading end of the film exits the drying section. 15 to 6 hours
This is a process that is 0 seconds.

As a method for obtaining a silver halide photographic light-sensitive material having a high sensitivity as described above, a method of sensitizing with a tellurium sensitizer is disclosed in US Pat.
No. 0069, No. 3770311, No. 3531289
No. 3,655,394, No. 4,704,349, British Patent Nos. 2,352,111, 1121,496, 1295
No. 462, No. 1396696, No. 2160993,
Canadian Patent 800958, JP-A-61-67845
No. 1295, for example, which is generally disclosed in US Pat.
462 and 1396696 and Canadian Patent 8009
No. 58 and the like. According to this method, a silver halide photographic light-sensitive material having high sensitivity can be obtained, but the pressure fog is worsened accordingly. With the conventionally known means, a sufficient effect on pressure fog cannot be obtained, and further improvement has been strongly desired.

[0004]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a silver halide photographic material having high sensitivity, improved pressure fog due to contact friction with various substances, and capable of rapid processing. is there.

[0005]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a silver halide photographic photosensitive material having at least one silver halide emulsion layer on a support and at least one protective layer on top of the emulsion layer. This is achieved by a silver halide photographic material characterized in that at least one of the emulsion layers contains silver halide grains sensitized with a tellurium sensitizer and colloidal silica.

The silver halide used in the present invention may be any of silver chloride, silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver iodobromide, silver chloroiodobromide and the like. . In the present invention, among the above silver halides, silver chloroiodobromide, silver chlorobromide, and silver iodobromide are preferable. More preferably, silver iodide is added in an amount of 0 to
Silver chlorobromide or silver chloroiodobromide containing 1 mol% is advantageously used. The average grain size of the silver halide used in the present invention is preferably fine grains (for example, 0.7 μm or less), particularly preferably 0.5 μm or less. The particle size distribution is basically not limited, but is preferably monodispersed. The term “monodispersion” as used herein means at least 95% by weight or number of particles.
Is composed of a group of particles having a size within ± 40% of the average particle size. The silver halide grains in the photographic emulsion may have regular crystals such as cubic or octahedral, or may have irregular crystals such as spherical or plate-like, Alternatively, it may have a composite form of these crystal forms. In the silver halide grains, the inside and the surface layer may be composed of a uniform phase or may be composed of a simple phase. 2 formed separately
A mixture of two or more kinds of silver halide emulsions may be used.
The silver halide emulsion layer may be a single layer or a multilayer (two layers, three layers, etc.). In the case of a multilayer, different silver halide emulsions may be used. Good
The same thing may be used. In the silver halide emulsion used in the present invention, a cadmium salt, a sulfite, a lead salt, a thallium salt, a rhodium salt or a complex salt thereof, an iridium salt or a complex salt thereof, etc. are co-present during the formation of silver halide grains or physical ripening. Is also good. In the present invention, it is preferable to use a water-soluble rhodium salt, typically, rhodium chloride, rhodium trichloride, rhodium ammonium chloride and the like. Further, these complex salts can be used. The addition time of the above rhodium salt is limited before the completion of the first ripening in the production of the emulsion, and it is particularly desirable to add the rhodium salt during grain formation, and the addition amount is 1 × 10 ⁻⁸ mol or more per mol of silver and 1 × 10 ⁻⁸ mol or more. A range of 10 ^-6 mol or less is preferred.

Silver halides particularly suitable for use in the present invention are prepared in the presence of 10 ^-8 to 10 ^-5 moles of iridium salt or complex thereof per mole of silver. In the above, it is desirable to add the above amount of the iridium salt before the completion of physical ripening in the production process of the silver halide emulsion, particularly at the time of grain formation. The iridium salt used here is a water-soluble iridium salt or iridium complex salt, for example, iridium trichloride, iridium tetrachloride, hexachloroiridium (II
I) Potassium acid, potassium hexachloroiridium (IV), ammonium hexachloroiridium (III) and the like. Gelatin is advantageously used as a binder or protective colloid of the photographic emulsion, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol; polyvinyl alcohol partial acetal;
Various kinds of synthetic hydrophilic high molecular substances such as a single or copolymer such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole and polyvinylpyrazole can be used.

The silver halide emulsion used in the present invention may not be chemically sensitized, but may be. As methods for chemically sensitizing silver halide emulsions, sulfur sensitization, selenium sensitization, reduction sensitization and noble metal sensitization are known, and any of these methods can be used alone or in combination. You may sensitize. Among the noble metal sensitization methods, the gold sensitization method is a typical one and uses a gold compound, mainly a gold complex salt.
Noble metals other than gold, for example, complex salts such as platinum, palladium and rhodium may be contained. As the sulfur sensitizer, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines and the like can be used in addition to the sulfur compounds contained in gelatin. Stannous salts, amines, formamidinesulfinic acid, silane compounds and the like can be used as the reduction sensitizer. As the selenium sensitizer, a selenium compound disclosed in a conventionally known patent can be used. That is, the emulsion is usually used by adding an unstable selenium compound and / or a non-unstable selenium compound and stirring the emulsion at a high temperature, preferably at 40 ° C. or higher for a certain period of time. Examples of unstable selenium compounds include JP-B-44-15748 and JP-B-Showa-4.
It is preferable to use the compounds described in JP-A-3-13489, Japanese Patent Application Nos. 2-130976 and 2-229300.

As the tellurium sensitizer used in the present invention, US Pat. Nos. 1,623,499 and 3,320,
Nos. 069 and 3,772,031, British Patent No. 23
Nos. 5,211, 1,121,496 and 1,29
No. 5,462, No. 1,396,696, Canadian Patent No. 800,958, Journal of Chemical Society Chemical Communication (J. Chem. S.)
oc.Chem.Commun.) 635 (1980), ibid 1102
(1979), ibid 645 (1979), Journal of Chemical Society Parkin Transaction (J. Chem. Soc. Perkin Trans.) 1, 219
1 (1980) and the like. Specific examples of tellurium sensitizers include colloidal tellurium and telluroureas (e.g., allyltellurourea, N, N-
Dimethyltellurourea, tetramethyltellurourea, N-carboxyethyl-N ', N'-dimethyltellurourea,
N, N'-dimethylethylene tellurourea, N, N'-diphenylethylene tellurourea), isotellurocyanates (for example, allyl isotellurocyanate), telluroketones (for example, telluroacetone, telluroacetophenone), telluramides (for example, telluroacetamide) ,
N, N-dimethyltellurobenzamide), tellurohydrazide (e.g., N, N ', N'-trimethyltellurobenzhydrazide), telluroester (e.g., t-butyl-t)
-Hexyl telluride esters), phosphine tellurides (e.g. tributylphosphine telluride, tricyclohexylphosphine telluride, triisopropylphosphine telluride, butyl-diisopropylphosphine telluride, dibutylphenylphosphine telluride), other tellurium compounds (e.g. UK) Patent No. 1,295,462, negatively-charged telluride ion-containing gelatin, potassium telluride, potassium tellurocyanate, sodium telluropentathionate, allyl tellurocyanate, and the like. Of these tellurium compounds, the following general formulas (I) and (II) are preferred. General formula (I)

[0010]

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Wherein R ₁ , R ₂ and R ₃ are an aliphatic group,
Aromatic group, heterocyclic group, OR ₄ , NR ₅ (R ₆ ), SR ₇ , O
SiR ₈ (R ₉ ) (R ₁₀ ), X or a hydrogen atom. R ₄
And R ₇ represents an aliphatic group, an aromatic group, a heterocyclic group, a hydrogen atom or a cation, R ₅ and R ₆ represents an aliphatic group, an aromatic group, a heterocyclic group or a hydrogen atom, R _8, R ₉ and R ₁₀ represent an aliphatic group, and X represents a halogen atom.

Next, the general formula (I) will be described in detail. In the general formula (I), R ₁ , R ₂ , R ₃ , R ₄ ,
The aliphatic group represented by R ₅ , R ₆ , R ₇ , R ₈ , R ₉ and R ₁₀ preferably has 1 to 30 carbon atoms, and particularly has 1 to 20 carbon atoms, such as linear, branched or Cyclic alkyl, alkenyl, alkynyl, and aralkyl groups. Examples of the alkyl group, alkenyl group, alkynyl group, and aralkyl group include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, t-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, and cyclopentyl. Group, cyclohexyl group, allyl group, 2-butenyl group,
Examples thereof include a 3-pentenyl group, a propargyl group, a 3-pentynyl group, a benzyl group and a phenethyl group. In the general formula (I), R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆
And aromatic group represented by R ₇ is preferably 6 carbon atoms
30, and particularly a monocyclic or condensed-ring aryl group having 6 to 20 carbon atoms, such as a phenyl group and a naphthyl group. In the general formula (I), R ₁ , R ₂ ,
The heterocyclic group represented by R ₃ , R ₄ , R ₅ , R ₆ and R ₇ is a 3- to 10-membered saturated or unsaturated heterocyclic ring containing at least one of a nitrogen atom, an oxygen atom and a sulfur atom. Group. These may be monocyclic or may form a condensed ring with another aromatic or heterocyclic ring. The heterocyclic group is preferably a 5- to 6-membered aromatic heterocyclic group, and examples thereof include a pyridyl group, a furyl group, a thienyl group, a thiazolyl group, an imidazolyl group, and a benzimidazolyl group. In the general formula (I), R ₄ and R ₇
The cation represented by represents an alkali metal or ammonium. The halogen atom represented by X in the general formula (I) represents, for example, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

The aliphatic group, aromatic group and heterocyclic group may be substituted. Examples of the substituent include the following. Representative substituents include, for example, alkyl groups, aralkyl groups, alkenyl groups, alkynyl groups,
Aryl group, alkoxy group, aryloxy group, amino group, acylamino group, ureido group, urethane group, sulfonylamino group, sulfamoyl group, carbamoyl group, sulfonyl group, sulfinyl group, alkyloxycarbonyl group, aryloxycarbonyl group, acyl group An acyloxy group, a phosphoric amide group, a diacylamino group, an imide group, an alkylthio group, an arylthio group, a halogen atom,
Examples include a cyano group, a sulfo group, a carboxy group, a hydroxy group, a phosphono group, a nitro group, and a heterocyclic group. These groups may be further substituted. When there are two or more substituents, they may be the same or different. R
₁ , R ₂ and R ₃ may be bonded to each other to form a ring together with a phosphorus atom, or R ₅ and R ₆ may be bonded to form a nitrogen-containing heterocyclic ring. In the general formula (I), preferably, R
₁ , R ₂ and R ₃ represent an aliphatic group or an aromatic group,
More preferably, it represents an alkyl group or an aromatic group. General formula (II)

[0014]

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In the formula, R ₁₁ represents an aliphatic group, an aromatic group, a heterocyclic group or —NR ₁₃ (R ₁₄ ), and R ₁₂ represents —NR ₁₅ (R
_16), - represents a _{N (R 17) N (R} 18) R 19 or -OR _20. R ₁₃ , R ₁₄ , R ₁₅ , R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ represent a hydrogen atom, an aliphatic group, an aromatic group, a heterocyclic group or an acyl group. Where R ₁₁ and R ₁₅ , R ₁₁ and R ₁₇ , R ₁₁
And R ₁₈ , R ₁₁ and R ₂₀ , R ₁₃ and R ₁₅ , R ₁₃ and R ₁₇ , R ₁₃ and R _18, and R ₁₃ and R ₂₀ may combine to form a ring.

Next, the general formula (II) will be described in detail. In the general formula (II), R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ ,
The aliphatic group represented by R ₁₅ , R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ preferably has 1 to 30 carbon atoms, and particularly has 1 to 20 carbon atoms, such as linear, branched or Cyclic alkyl, alkenyl, alkynyl, and aralkyl groups. Examples of the alkyl group, alkenyl group, alkynyl group, and aralkyl group include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, t-butyl group, n-octyl group, n-decyl group, n-hexadecyl group, and cyclopentyl. Group, cyclohexyl group, allyl group, 2-butenyl group,
Examples thereof include a 3-pentenyl group, a propargyl group, a 3-pentynyl group, a benzyl group and a phenethyl group. In the general formula (II), R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ , R ₁₅ ,
The aromatic group represented by R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ preferably has 6 to 30 carbon atoms, particularly a monocyclic or condensed aryl group having 6 to 20 carbon atoms. And examples thereof include a phenyl group and a naphthyl group. General formula (II)
In the formula, R ₁₁ , R ₁₂ , R ₁₃ , R ₁₄ , R ₁₅ , R ₁₆ ,
Heterocyclic group represented by R _17, R _18, R ₁₉ and R ₂₀ is a nitrogen atom, 3- to 10-membered heterocyclic group, saturated or unsaturated ring containing at least one oxygen atom and a sulfur atom . These may be monocyclic or may form a condensed ring with another aromatic or heterocyclic ring. The heterocyclic group is preferably a 5- to 6-membered aromatic heterocyclic group, and examples thereof include a pyridyl group, a furyl group, a thienyl group, a thiazolyl group, an imidazolyl group, and a benzimidazolyl group.

In the general formula (II), R ₁₃ , R ₁₄ ,
The acyl group represented by R ₁₅ , R ₁₆ , R ₁₇ , R ₁₈ , R ₁₉ and R ₂₀ preferably has 1 to 30 carbon atoms, and particularly has 1 to 20 carbon atoms. Group,
Examples include an acetyl group, a benzoyl group, a formyl group, a pivaloyl group and a decanoyl group. Where R ₁₁ and R
_15, R ₁₁ and R _17, R ₁₁ and R _18, R ₁₁ and R _20, R ₁₃ and R _15, R ₁₃ and R _17, R ₁₃ and R ₁₈ and R ₁₃ and R ₂₀ combine to form a ring In such a case, examples thereof include an alkylene group, an arylene group, an aralkylene group, and an alkenylene group. Further, the aliphatic group, aromatic group, and heterocyclic group may be substituted with the substituents described in the general formula (I).
In the general formula (II), R ₁₁ preferably represents an aliphatic group, an aromatic group or —NR ₁₃ (R ₁₄ ), and R ₁₂ represents —NR
₁₅ (R ₁₆ ). R ₁₃ , R ₁₄ , R ₁₅ and R ₁₆ represent an aliphatic group or an aromatic group. In the general formula (II), more preferably, R ₁₁ represents an aromatic group or —NR ₁₃ (R ₁₄ );
R ₁₂ represents —NR ₁₅ (R ₁₆ ). R ₁₃ , R ₁₄ , R ₁₅ and R ₁₆ represent an alkyl group or an aromatic group. Where R
_More preferably, ₁₁ and R ₁₅ and R ₁₃ and R ₁₅ form a ring via an alkylene group, an arylene group, an aralkylene group or an alkenylene group. Hereinafter, specific examples of the compounds represented by formulas (I) and (II) of the present invention are shown, but the present invention is not limited thereto.

[0018]

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[0019]

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[0020]

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[0021]

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[0022]

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[0023]

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[0024]

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[0025]

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[0026]

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The compounds represented by formulas (I) and (II) of the present invention can be synthesized according to a known method. For example, Journal of Chemical Society (J. Chem. Soc. (A)) 1969, 2927; Journal of Organometallic Chemistry (J.
Organomet. Chem.) 4, 320 (1965); ibid, 1,
200 (1963); ibid, 113, C35 (197
6); Phosphorus Sulfu
r) 15, 155 (1983); Hemische Berichte (Chem. Ber.) 109, 2996 (1976); Journal of Chemical Society Chemical Communication (J. Chem. Soc. Chem. Commun.) 635 ( 19
80); ibid, 1102 (1979); ibid, 645
(1979); ibid, 820 (1987); Journal of Chemical Society Parkin Transaction (J. Chem. Soc. Perkin. Trans.) 1, 2191.
(1980); The Chemistry of Organo Selenium and Tellurium Campounds (The Ch
emistry of Organo Selenium and Tellurium Compound
s) It can be synthesized by the method described in Vol. 216 to 267 (1987). The addition amount of the tellurium sensitizer used in the present invention varies depending on the activity of the tellurium sensitizer used, the type and size of silver halide, the ripening temperature and time, and the like. 1 × 10 per mole
^-8 mol or more. More preferably, it is 1 × 10 ⁻⁷ mol or more and 1 × 10 ⁻⁵ mol or less. The temperature of chemical ripening when a tellurium sensitizer is used is preferably 45 ° C. or higher. More preferably, it is 50 ° C. or more and 80 ° C. or less. pAg and pH are arbitrary. For example, the effect can be obtained in a wide range of pH from 4 to 9. Tellurium sensitization is more effective when performed in the presence of a silver halide solvent.

The colloidal silica (colloidal silica) used in the present invention has an average particle diameter of 5 μm to 1000 μm, preferably 5 μm to 500 μm, is mainly composed of silicon dioxide, and contains alumina or sodium aluminate as a minor component. May be. These colloidal silicas may contain, as a stabilizer, an inorganic base such as sodium hydroxide, potassium hydroxide, lithium hydroxide, or ammonia, or an organic base such as tetramethylammonium ion. These colloidal silicas are described in JP-A-53-112732, JP-B-57-90551,
It is disclosed in Japanese Patent Publication No. 57-051653. Specific examples of colloidal silica include Snowtex 20 (SiO ₂ / Na ₂ O ≧ 57), Snowtex 30 (SiO ₂ / Na ₂ O ≧ 50), and Snowtex C from Nissan Chemical (Tokyo, Japan).
(SiO ₂ / Na ₂ O ≧ 100), Snowtex O (SiO ₂ / Na ₂
O ≧ 500). here,
(SiO ₂ / Na ₂ O is the content ratio by weight of silicon dioxide (SiO ₂ ) to sodium hydroxide in terms of sodium hydroxide converted to Na ₂ O. The preferred amount of the colloidal silica used in the present invention is 0.05 to 1.0 in terms of a dry weight ratio to gelatin used as a binder of a layer to be added,
Particularly preferably, it is 0.1 to 0.6.

The dynamic friction coefficient (μ _k ) in the present invention is J
It can be determined by the same principle as the friction coefficient test method described in IS K7125. After setting for 1 hour or more under the condition of 25 ° C. and 60% RH, the sapphire needle
Constant load to 5 mm) (Contact force: F _p example 50-200
g) was added, slipped surface of the silver halide light-sensitive material at a constant speed (eg 20 to 100 / min), measured tangential force at that time (F _k), the following is obtained by the number 1.

[0030]

(Equation 1)

For example, a surface property measuring device (H, manufactured by Shinto Kagaku Co., Ltd.)
(EIDON-14 type).

In the present invention, the coefficient of dynamic friction of the outermost layer is set to 0.1.
It is preferable to use a so-called slip agent in order to make it 35 or less. Representative examples of the slip agent used in the present invention include, for example, U.S. Pat. No. 3,042,522, British Patent No. 955,061, U.S. Pat. No. 3,080,317.
Nos. 4,004,927 and 4,047,958
No. 3,489,567 and British Patent No. 1,143.
No. 118, etc., US Pat. Nos. 2,454,043, 2,732,305, 2,976,148, 3,206,311 and German Patent No. 1 Fatty acid-based, alcohol-based, acid-amide-based slip agents described in, for example, U.S. Patent Nos. 1,263,722 and 3,933,516. Metal soaps described in U.S. Pat. Nos. 2,588,765 and 3,121,060; and esters described in British Patent No. 1,198,387,
Ether slip agents, U.S. Pat. No. 3,502,473,
No. 3,042,222, the taurine-based slip agent, the colloidal silica, and the like.

As the slipping agent of the present invention, JP-A-60-1
Preferred are the alkylpolysiloxanes described in JP-A-88945 and liquid paraffin and anionic surfactant in a liquid state at room temperature.

The amount of the slip agent applied is 0.01 to 1.0 by weight, preferably 0.0
5 to 0.5. It is particularly preferably 0.01 to 0.1 g / m ² . When an anionic surfactant is used, it is 0.001 to 0.5 g / m ² , particularly 0.01 to 0.2 g.
/ M ² . The coefficient of dynamic friction (μ _k ) is 0.
It is 35 or less, preferably 0.35 to 0.10.

Next, in the present invention, it is preferable to use a polyhydroxybenzene compound used for the purpose of improving pressure resistance without impairing the sensitivity and improving storage stability. The polyhydroxybenzene compound may be added to the emulsion layer in the light-sensitive material or may be added to a layer other than the emulsion layer.
The amount of addition is effective in the range of 10 ^-5 to 1 mol per mol of silver, and is particularly effective in the range of 10 ^-3 mol to 10 ^-1 mol. Preferred examples of the compound include the following.

[0036]

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[0037]

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In the present invention, the protective layer preferably comprises two or more layers. When the silver halide photosensitive material is stored under low humidity conditions, it has a disadvantage that the hydrophilic colloid layer film becomes brittle. For the purpose of improving this, it is preferable that a polymer latex having a glass transition point (hereinafter referred to as Tg) of 20 ° C. or lower is contained in the emulsion layer and / or the protective layer. In particular, when the protective layer has two or more layers, inclusion in the intermediate layer between the emulsion layer and the outermost layer reduces the film strength in the developing solution and the brittleness without impairing the adhesion between the photosensitive materials under high humidity conditions. It is preferable in terms of improvement. Further, it is preferred that the outermost layer contain colloidal silica together with other slip properties, since the slip properties are improved, and at the same time, the strength of the dried film is improved and the scratch resistance is further improved. The amount of the colloidal silica to be added to the outermost layer is 0.01 to 1.0, preferably 0.1 to 0.5 in weight ratio to the binder amount of the outermost layer.

As the polymer latex to be contained in the protective layer of the present invention, for example, US Pat. No. 2,772,1
Nos. 66, 3,325,286 and 3,411,91
No. 1, 3,311,912, 3,525,620
No., Research Disclos
ure), hydrates of vinyl polymers such as acrylates, methacrylates and styrene, as described in Magazine No. 195 19551 (July 1980). Preferred polymer latex having a Tg of 20 ° C. or lower include methyl acrylate, ethyl acrylate,
Homopolymer of alkyl acrylate such as butyl acrylate or alkyl acrylate and acrylic acid, N-
Copolymer with methylol acrylamide (preferably up to 30% by weight of copolymer component such as acrylic acid), homopolymer of butadiene or copolymer of butadiene with one or more of styrene, butoxymethylacrylamide, acrylic acid And terpolymers of vinylidene chloride-methyl acrylate acrylic acid. The Tg of the polymer latex can be determined by a method based on differential scanning calorimetry (DSC). The preferred range of the average particle size of the polymer latex used in the present invention is from 0.005 to 1 μm, especially from 0.
02 to 0.1 μ. The amount of the polymer latex added is 5 to 200% by weight of the hydrophilic colloid of the layer to be added.
Particularly, 10% to 100% is preferable. Next, in the present invention, T
Specific examples of the polymer latex having a g of 20% or less are shown below, but are not limited thereto.

[0040]

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[0041]

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[0042]

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Gelatin is used as a binder for the silver halide emulsion layer and the protective layer of the present invention, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose nitrates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol; polyvinyl alcohol partial acetal;
Various kinds of synthetic hydrophilic high molecular substances such as a single or copolymer such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole and polyvinylpyrazole can be used. As gelatin, in addition to lime-processed gelatin, acid-processed gelatin may be used, and gelatin hydrolyzate and gelatin enzyme hydrolyzate can also be used. In the present invention, the coated amount of gelatin as a binder is preferably as small as possible in order to obtain rapid processing suitability and improved dimensional stability. In particular, the gelatin coating amount of the protective layer greatly affects the developing speed and the fixing speed, and the total gelatin coating amount including the silver halide emulsion layer affects the drying speed and dimensional stability. Therefore, the gelatin coating amount of the protective layer of the present invention is 0.5 g.
/ G / m ² or less, preferably 0.15 to 0.5 g / m ² , and the total gelatin coating amount on one side of the emulsion layer on the support including the silver halide emulsion layer was 2.5 g / m ² m ² or less, preferably 1.5 to 2.5 g / m ² .

The photosensitive silver halide emulsion of the present invention may be spectrally sensitized to blue light, green light, red light or infrared light having a relatively long wavelength by a sensitizing dye. As the sensitizing dye, a cyanine dye, a merocyanine dye, a complex cyanine dye, a complex merocyanine dye, a holo-holerocyanine dye, a styryl dye, a hemicyanine dye, an oxonol dye, a hemioxonol dye, and the like can be used. Useful sensitizing dyes for use in the present invention include, for example, RESEARCH DISCLOSURE Item 17643 IV-A
(Dec. 1978, p. 23) and Item 1831X (August 1979, p. 437). In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of various scanner light sources can be advantageously selected. For example, A) For an argon laser light source,
No. 62247, JP-A-2-48653, U.S. Pat.
Nos. 161 and 331 and simple merocyanines described in West German Patent 936,071; and B) helium-neon leather light sources.
No. 8726, 59-102229, and C) LED light sources.
No. 42172, No. 51-9609, No. 55-3981
8, thiacarbocyanines described in JP-A-62-284343, and D) tricarbocyanines described in JP-A-59-19032 and JP-A-60-80841 for semiconductor laser light sources. Kind, JP-A-59-19
Dicarbocyanines containing a 4-quinoline nucleus described in No. 2242 are advantageously selected. The representative compounds of these sensitizing dyes are shown below. Specific compound examples of A)

[0045]

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Specific examples of compound B)

[0047]

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Specific examples of compound C): General formula (X)

[0049]

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[Wherein Y ₁ and Y ₂ each represent a non-metallic atomic group necessary for forming a heterocyclic ring such as a benzothiazole ring, a benzoselenazole ring, a naphthothiazole ring, a naphthoselenazole ring, or a quinoline ring. Represents a lower alkyl group, an alkoxy group, a hydroxy group,
It may be substituted with an aryl group, an alkoxycarbonyl group, or a halogen atom. R ₁ and R ₂ each represent a lower alkyl group, a sulfo group, or an alkyl group having a carboxy group. R ₃ represents a lower alkyl group. X ₁ represents an anion. n ₁ and n ₂ represent 1 or 2. m represents 1 or 0, and in the case of an internal salt, m = 0. 〕In particular

[0051]

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[0052]

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Specific compounds of D)

[0054]

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These sensitizing dyes may be used alone or in combination, and the combination of sensitizing dyes is often used particularly for supersensitization. In addition to the sensitizing dye, the emulsion may contain a dye which does not itself have a spectral sensitizing effect or a substance which does not substantially absorb visible light and exhibits supersensitization. Useful sensitizing dyes, combinations of dyes exhibiting supersensitization and substances exhibiting supersensitization are described in Research Disclos.
ure) 176, 17643 (issued December 1978) No. 2
It is described in section J on page 3, IV. The content of the sensitizing dye of the present invention depends on the grain size of the silver halide emulsion, the halogen composition, the method and degree of chemical sensitization, the relationship between the layer containing the compound and the silver halide emulsion, the type of antifoggant compound, and the like. It is desirable to select the optimal amount accordingly, and the methods of testing for that selection are well known to those skilled in the art. Usually, it is preferably from 10 ^-7 mol to 1 × per mol of silver halide.
It is used in an amount of 10 ⁻² mol, particularly 10 ⁻⁶ mol to 5 × 10 ⁻³ mol.

The photographic light-sensitive material of the present invention is disclosed in Japanese Patent Application Laid-Open Nos.
The compounds described in 1-167939 can be added. These may be used alone or in combination of two or more. The light-sensitive material of the present invention may contain various compounds for the purpose of preventing fog during the manufacturing process, storage or photographic processing of the light-sensitive material, or stabilizing photographic performance. That is, azoles such as benzothiazolium salts, nitroindazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzothiazoles, nitrobenzotriazoles Mercaptopyrimidines; mercaptotriazines; thioketo compounds such as oxazolinethione; azaindenes such as triazaindenes and tetraazaindenes (especially 4-hydroxy-substituted (1,3,3a, 7) tetrazain Dens), pentaazaindenes and the like; many known as antifoggants or stabilizers such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonamide, etc. It may be added compound. Of these, preferred are benzotriazoles (eg, 5-methylbenzotriazole) and nitroindazoles (eg, 5-nitroindazole). Further, these compounds may be contained in the treatment liquid.

The light-sensitive material of the present invention may contain a dye or the like for the purpose of preventing halation, improving safelight safety, and improving front / back discrimination. For example, U.S. Pat.
Pyrazolone oxonol dyes described in 274,782, diarylazo dyes described in U.S. Pat. No. 2,956,879, and styryls described in U.S. Pat. Nos. 3,423,207 and 3,384,487. Dyes and dutadienyl dyes; merocyanine dyes described in U.S. Pat. No. 2,527,583; and merocyanine dyes described in U.S. Pat. Merocyanine dyes and oxonol dyes, enaminohemioxonol dyes described in U.S. Pat. No. 3,976,661, and British Patents 584,609 and 1.1
77,429, JP-A-48-85130, JP-A-49-85130.
Nos. 99620, 49-1144220, U.S. Pat. Nos. 2,533,472, 3,148,187, 3,177,078, 3,247,127,
No. 3,540,887 and No. 3,575,704
No. 3,653,905 can be used.

The photographic emulsion and the non-photosensitive hydrophilic colloid of the present invention may contain an inorganic or organic gelatin hardener. For example, active vinyl compounds (1, 3, 5
-Triacryloyl-hexahydro-s-triazine,
Bis (vinylsulfonyl) methyl ether, N, N'-
Methylenebis- [β- (vinylsulfonyl) propionamide]), active halogen compounds (such as 2,4-dichloro-6-hydroxy-s-triazine), mucohalic acids (such as mucochloric acid), and N-carbamoylpyridinium salts (such as (1-morpholy, carbonyl-3-pyridinio) methanesulfonate, etc.) and haloamidinium salts (1- (1-chloro-1-pyridinomethylene) pyrrolidinium, 2-naphthalenesulfonate, etc.) may be used alone or in combination. it can. Among them, JP-A-53-41220, JP-A-53-57257, and JP-A-59-16
Preferred are the active vinyl compounds described in Nos. 2546 and 60-80846 and the active halides described in U.S. Pat. No. 3,325,287.

In the photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention, a coating aid, an antistatic agent, an emulsifying dispersion,
Various surfactants may be included for various purposes such as preventing adhesion and improving photographic properties (eg, accelerating development, increasing contrast, and sensitizing). For example, saponins (steroids), alkylene oxide derivatives (eg, polyethylene glycol, polyethylene glycol / polypropylene glycol condensate, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, poly) Non-ion such as alkylene glycol alkylamines or amides, polyethylene oxide adducts of silicone, glycidol derivatives (eg, alkenyl succinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, and alkyl esters of sugars Surfactants: alkyl carboxylate, alkyl sulfonate, alkylbenzenes Sulfonate, alkylnaphthalene sulfonate, alkyl sulfates,
Carboxy groups, sulfo groups, such as alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfoalkylpolyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, and the like; Anionic surfactants containing acidic groups such as phospho groups, sulfate groups, and phosphate groups; amphoteric interfaces such as amino acid salts, aminoalkyl sulfonic acids, aminoalkyl sulfate or phosphate esters, alkyl betaines, and amine oxides Activators; Cationic surfactants such as alkylamine salts, aliphatic or aromatic quaternary ammonium salts, heterocyclic quaternary ammonium salts such as pyridinium and imidazolium, and phosphonium or sulfonium salts containing aliphatic or heterocyclic rings Using It can be. The photographic light-sensitive material of the present invention may contain a matting agent such as silica, magnesium oxide, or polymethyl methacrylate for the purpose of preventing adhesion to the photographic emulsion layer and other hydrophilic colloid layers.

The light-sensitive material of the present invention may contain a dispersion of a water-soluble or poorly-soluble synthetic polymer for the purpose of improving dimensional stability and the like. For example, alkyl (meth) acrylate, alkoxyalkyl (meth) acrylate,
Glycidyl (meth) acrylate, (meth) acrylamide, vinyl ester (for example, vinyl acetate), acrylonitrile, olefin, styrene or the like alone or in combination, or acrylic acid, methacrylic acid, α, β-unsaturated dicarboxylic acid A polymer having a combination of hydroxyalkyl (meth) acrylate, sulfoalkyl (meth) acrylate, styrenesulfonic acid, or the like as a monomer component can be used. As a support of the light-sensitive material of the present invention, cellulose triacetate,
Cellulose diacetate, nitrocellulose, polystyrene, polyethylene terephthalate, baryta paper, polyethylene coated paper and the like can be used. These supports may be subjected to corona treatment by a known method, or may be subjected to undercoating by a known method as necessary. In addition, a waterproof layer containing a polyvinylidene chloride-based polymer may be provided in order to increase the so-called dimensional stability, in which the dimensions change with changes in temperature and humidity.

Examples of development accelerators suitable for use in the present invention or accelerators for nucleation and infectious development are described in JP-A-53-77.
616, 54-77732, 53-137133,
In addition to the compounds disclosed in JP-A-60-140340 and JP-A-60-14959, various compounds containing an N or S atom are effective.

The developing agent used in the developing solution used in the present invention is not particularly limited, but preferably contains dihydroxybenzenes in that good dot quality is easily obtained. ,
Chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3
-Dichlorohydroquinone, 2,5-dichlorohydroquinone, 2,3-dibromohydroquinone, 2,5-dimethylhydroquinone, etc., with hydroquinone being particularly preferred. As the sulfite preservative used in the present invention, sodium sulfite, potassium sulfite, lithium sulfite,
Examples include ammonium sulfite, sodium bisulfite, potassium metabisulfite, and sodium formaldehyde bisulfite. The sulfite is preferably at least 0.25 mol / l, particularly preferably at least 0.4 mol / l. The upper limit is 2.
It is preferably up to 5 mol / l, especially up to 1.2.

The alkaline agents used for setting the pH include sodium hydroxide, potassium hydroxide, sodium carbonate,
Contains pH adjusters and buffers such as potassium carbonate. Additives other than the above components include compounds such as boric acid and borax, and development inhibitors such as sodium bromide, potassium bromide and potassium iodide: ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve Organic solvents such as hexylene glycol, ethanol and methanol: 1-phenyl-
Antifoggants such as 5-mercaptotetrazole, mercapto-based compounds such as 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, indazole-based compounds such as 5-nitroindazole, and benztriazole-based compounds such as 5-methylbenztriazole; or Black pots (bla
ck pepper) An inhibitor may be contained, and if necessary, a color tone agent, a surfactant, an antifoaming agent, a water softener, a hardening agent, JP-A-56-106244, and JP-A-61-267759.
And an amino compound described in Japanese Patent Application No. 1-291818. The developer used in the present invention contains a compound described in JP-A-56-24347 as a silver stain inhibitor, a compound described in JP-A-62-212651 as a development unevenness inhibitor, and a compound described in JP-A-62-212651 as a dissolution aid. Showa 61-2677
No. 59 can be used.

In the developing solution used in the present invention, boric acid described in Japanese Patent Application No. 61-28708 and
A saccharide (for example, saccharose) according to 0-93433,
Oximes (eg, acetoxime), phenols (eg, 5-sulfosalicylic acid) and the like are used.
The processing method of the present invention can be carried out in the presence of polyalkylene oxide, but in order to contain the polyalkylene oxide in the developer, polyethylene glycol having an average molecular weight of 1,000 to 6,000 is used in the range of 0.1 to 10 g / liter. Is preferred. The fixing solution may contain a water-soluble aluminum compound as a hardener in addition to the fixing agent. An acidic aqueous solution further containing acetic acid and a dibasic acid (for example, tartaric acid, citric acid or a salt thereof), if necessary.
Preferably, the pH is 3.8 or more, more preferably 4.0 to 4.0.
6.5. Sodium thiosulfate as fixing agent,
Examples thereof include ammonium thiosulfate, and ammonium thiosulfate is particularly preferable from the viewpoint of fixing speed. The amount of the fixing agent used can be appropriately changed, and is generally about 0.1 to about 5 mol / mol.
Liters. The water-soluble aluminum salt which mainly acts as a hardening agent in the fixing solution is a compound generally known as a hardening agent for an acidic hardening fixing solution, and examples thereof include aluminum chloride, aluminum sulfate and potassium alum.

As the above-mentioned dibasic acid, tartaric acid or a derivative thereof and citric acid or a derivative thereof can be used alone or in combination of two or more. It is effective that these compounds contain 0.005 mol or more per liter of the fixing solution, and particularly 0.01 to 0.03 mol / l is particularly effective. Specifically, there are tartaric acid, potassium tartrate, sodium tartrate, potassium sodium tartrate, ammonium tartrate, potassium ammonium tartrate, and the like. Examples of citric acid or a derivative thereof effective in the present invention include citric acid, sodium citrate, potassium citrate, and the like.

It is preferable to use a mesoionic compound represented by the following formula (I) in combination with the fixing solution used in the present invention.

[0067]

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[0068] formula, Z is a carbon atom, a nitrogen atom, an oxygen atom, a 5 or 6-membered ring composed of a sulfur atom or a selenium atom, X ^- is ^-O -, -S ^-, or -N, ^-
R (where X represents an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group). Among them, the compound represented by the following general formula (XII) is more preferable.

[0069]

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In the formula, R ₁ and R ₂ represent an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group. However, R ₂ may be a hydrogen atom. Y is -O-, -S-, -N
(R ₃ ) —, wherein R ₃ represents an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an amino group, an acylamino group, a sulfonamide group, a ureido group or a sulfamoylamino group. Express. R ₁ and R ₂ , or R ₂ and R ₃ may be bonded to each other to form a ring.

The compound represented by formula (XII) will be described in detail. In the formula, R ₁ and R ₂ represent a substituted or unsubstituted alkyl group (for example, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group , Dimethylaminoethylthioethyl group, diethylaminoethyl group, aminoethyl group, methylthiomethyl group,
Trimethylammonioethyl group, carboxymethyl group,
Carboxyethyl group, carboxypropyl group, sulfoethyl group, sulfomethyl group, phosphonomethyl group, phosphonoethyl group, etc., substituted or unsubstituted cycloalkyl group (for example, cyclohexyl group, cyclopentyl group,
-Methylcyclohexyl group, etc.), substituted or unsubstituted alkenyl group (eg, allyl group, 2-methylallyl group, etc.), substituted or unsubstituted alkynyl group (eg, propargyl group, etc.), substituted or unsubstituted aralkyl group (E.g., benzyl, phenethyl, 4-methoxybenzyl, etc.), aryl (e.g., phenyl,
A naphthyl group, a 4-methylphenyl group, a 4-methoxyphenyl group, a 4-carboxyphenyl group, a 4-sulfophenyl group or the like) or a substituted or unsubstituted heterocyclic group (eg, a 2-pyridyl group, a 3-pyridyl group) , 4-pyridyl, 2-phenyl, 1-pyrazolyl, 1-imidazolyl, 2-tetrahydrofuryl, etc.).

However, R ₂ may be a hydrogen atom.
R ₃ is a substituted or unsubstituted alkyl group (for example, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group, dimethylaminoethylthioethyl Group, diethylaminoethyl group, aminoethyl group,
Methylthiomethyl group, trimethylammonioethyl group,
Carboxymethyl group, carboxyethyl group, carboxypropyl group, sulfoethyl group, sulfomethyl group, phosphonomethyl group, phosphonoethyl group, etc., substituted or unsubstituted cycloalkyl group (for example, cyclohexyl group, cyclopentyl group, 2-methylcyclohexyl group, etc.) ),
A substituted or unsubstituted alkenyl group (for example, an allyl group,
2-methylallyl group, etc.), substituted or unsubstituted alkynyl group (eg, propargyl group, etc.), substituted or unsubstituted aralkyl group (eg, benzyl group, phenethyl group, 4-methoxybenzyl group, etc.), aryl group (E.g., phenyl, naphthyl, 4-methylphenyl,
4-methoxyphenyl group, 4-carboxyphenyl group,
4-sulfophenyl group, etc.) or substituted or unsubstituted heterocyclic group (for example, 2-pyridyl group, 3-pyridyl group, 4-pyridyl group, 2-thenyl group, 1-pyrazolyl group, 1-imidazolyl group, 2-tetrahydrofuryl group,
etc),

A substituted or unsubstituted amino group (for example, an unsubstituted amino group, a dimethylamino group, a methylamino group,
Etc.), acylamino group (for example, acetylamino group, benzoylamino group, methoxypropionylamino group,
), Sulfonamide group (for example, methanesulfonamide group, benzenesulfonamide group, 4-toluenesulfonamide group, etc.), ureido group (for example, unsubstituted ureido group, 3-methylureido group, etc.), sulfamoyl It may be an amino group (for example, an unsubstituted sulfamoylamino group, a 3-methylsulfamoylamino group, etc.). In the general formula (XII), preferably, Y represents —N (R ₃ ) —
₁ , R ₃ represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group. R ₃ is preferably a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group. Hereinafter, specific examples of the compound of the present invention are shown, but the present invention is not limited thereto.

[0074]

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The compound of the present invention is used in a fixing solution or a replenisher for a fixing solution in the range of 1 × 10 ⁻⁵ mol / l to 10 mol / l, especially 1 × 10 ⁻³ mol / l to 3 mol / l. Preferably. Here, when the silver halide emulsion in the light-sensitive material to be processed has a halogen composition of silver iodobromide, it is preferably used in an amount of 0.5 to 2 mol / l, and is preferably silver bromide, silver chlorobromide, or high silver bromide. Silver chloride emulsion (silver chloride 8
Silver halide containing 0 mol% or more)
It is preferable to use in the range of 0.05 to 1 mol / liter. The fixing solution may further contain a preservative (eg, sulfite, bisulfite), a pH buffer (eg, acetic acid, boric acid), a pH adjuster (eg, ammonia, sulfuric acid), an image preserving agent (eg, Potassium iodide) and a chelating agent. Here, the pH buffer is 10 to 40 g / liter, more preferably 18 to 25, because the pH of the developer is high.
Use about g / liter.

The washing water may contain a fungicide (for example, Horiguchi's "Bactericidal and Preventive Chemistry", JP-A-62-115154).
), A washing accelerator (such as a sulfite), a chelating agent and the like. According to the above method, the developed and fixed photographic material is washed with water and dried.
The water washing is performed to almost completely remove the silver salt dissolved by the fixing, and is preferably performed at about 20 ° C. to about 50 ° C. for 10 seconds to 3 minutes. Drying is performed at about 40 ° C. to about 100 ° C., and the drying time may be appropriately changed depending on the surrounding conditions, but is usually about 5 seconds to 3 minutes 30 seconds. As for the roller transport type automatic developing machine, U.S. Pat.
No. 45971 and the like, and are simply referred to as a roller transport type processor in this specification. The roller transport type processor has four steps of development, fixing, washing and drying, and the method of the present invention does not exclude other steps (for example, a stop step), but most preferably follows these four steps. . The replenishment amount of washing water is 12
It may be 00 ml / m ² or less (including 0). The case where the replenishment amount of the washing water (or the stabilizing solution) is 0 means a washing method by a so-called pooled water washing method. As a method for reducing the amount of replenishment, a multi-stage countercurrent method (eg, two-stage, three-stage,
Are known.

[0086] For the problem that occurs when the replenishing amount of the washing water is small, good processing performance can be obtained by combining the following techniques. R. bath or stable bath, R.
T. Kreiman, J. Image, Tech. Vol. 10 No. 624
2 (1984),
Research Disclosure (RD) Volume 205,
No. 20526 (May 1981), isothiazoline compounds, Vol. 228, No. 22845
(April 1983), isothiazoline compounds described in JP-A-61-115154 and JP-A-62-2.
No. 09532, and the like.
biocide). In addition, "The Chemistry of Bactericidal and Fungicide" by Hiroshi Horiguchi, Sankyo Shuppan (Showa 57), "Bacterial and Fungicide Technical Handbook", Japan Society of Bactericidal and Fungicide Hakuhodo (Showa 61), LE West "Water Quallity Criteria" Phot
o Sci & Eng. Vol. 9 No. 6 (1965), MW Beac
h “Microbiological Growths in Motion Picture Proc
essing ”SMPTE Journal Vol.85 (1976), RO
Deegan “PhotoProcessing Wash Water Biocides” J. Im
aging Tech. Vol. 10 No. 6 (1984).

In the method of the present invention, when rinsing with a small amount of rinsing water, use the method described in JP-A-63-18350 and JP-A-62-28.
More preferably, a squeeze roller and a crossover rack cleaning tank described in No. 7252 and the like are provided. Furthermore,
Some or all of the overflow liquid from the washing or stabilizing bath produced by replenishing the washing or stabilizing bath with antifungal means according to the treatment is disclosed in JP-A-60-23.
As described in JP-A No. 5133 and JP-A-63-129343, it is also possible to use a processing solution having a fixing ability, which is the preceding processing step. Further, a water-soluble surfactant or an antifoaming agent is used in order to prevent unevenness of water bubbles easily generated when washing with a small amount of washing water and / or to prevent a treatment agent component attached to a squeeze roller from being transferred to a treated film. It may be added. Further, a dye adsorbent described in JP-A-63-163456 may be provided in the washing tank to prevent contamination by the dye eluted from the light-sensitive material. The developer used in the present invention is preferably stored in a packaging material having low oxygen and low moisture permeability described in JP-A-61-73147. As the developer used in the present invention, a replenishing system described in JP-A-62-91939 can be preferably used.

Since the silver halide photographic light-sensitive material of the present invention gives a high Dmax, when it is subjected to a power-reducing treatment after image formation, a high density is maintained even if the dot area is reduced. There are no particular restrictions on the reducer used in the present invention, for example, Mees, The Theory of the Photograph
ic Process ”, pp. 738-744 (1954, Macm
illan), Tetsuo Yano, Photo Processing Theory and Practice, 16
6-169 (1978, Kyoritsu Shuppan), etc., as well as JP-A-50-27543 and JP-A-52-68429,
Nos. 55-17123, 55-79444, 57
No.-10140, No.57-142639, No.61-6
No. 1155, JP-A-1-282551, JP-A-2-25
No. 846 can be used. That is, as an oxidizing agent, permanganate, persulfate, ferric salt, cupric salt, ceric salt, red blood salt, dichromate, or the like, alone or in combination, and further if necessary A reducing solution containing an inorganic acid such as sulfuric acid or an alcohol, or an oxidizing agent such as red blood salt or ferric ethylenediaminetetraacetate, and a halogen such as thiosulfate, rodane salt, thiourea or a derivative thereof. A reducing solution containing a silver halide solvent and, if necessary, an inorganic acid such as sulfuric acid is used.

Typical examples of the reducer used in the present invention include so-called Farmer reducer, ferric ethylenediaminetetraacetate, potassium permanganate, ammonium persulfate reducer (Kodak R-5), Cerium cerium reducer. The conditions of the reduction treatment are generally 10 ° C to 40 ° C,
In particular, it is preferable that the heating can be completed at a temperature of 15 ° C. to 30 ° C. within a time period of several seconds to several tens of minutes, and particularly several minutes. If the photosensitive material for plate making of the present invention is used, a sufficiently wide reduction range can be obtained within the range of these conditions. The reducer acts on the recorded image formed in the emulsion layer via the non-photosensitive upper layer containing the compound of the present invention. Specifically, there are various methods, for example, a method of immersing a plate-making photosensitive material in a reducer and stirring the liquid, or applying the reducer to the surface of the plate-making photosensitive material with a brush, a roller, or the like. Is available.

The photosensitive material of the present invention has a total processing time of 15 seconds to
It shows excellent performance in rapid development processing by an automatic developing machine for 60 seconds. In the rapid development processing of the present invention, the temperature and time for development and fixing are each about 25 ° C. to 50 ° C. for 25 seconds or less, preferably 30 ° C. to 40 ° C. for 4 seconds to 15 seconds. In the present invention, after the photosensitive material is developed and fixed, it is subjected to washing or stabilizing treatment. Here, in the rinsing step, water can be saved by using a two- or three-stage countercurrent rinsing method. When washing with a small amount of washing water, a squeeze roller washing tank is preferably provided. Further, part or all of the overflow solution from the washing bath or the stabilizing bath can be used as a fixing solution as described in JP-A-60-235133. By doing so, the amount of waste liquid is reduced, which is more preferable. In the present invention, the photosensitive material that has been developed, fixed and washed with water is dried through a squeeze roller. Drying at 40 ° C to 80 ° C for 4 seconds to 3
Performed in 0 seconds. The total processing time in the present invention means that after inserting the leading end of the film into the insertion opening of the automatic developing machine, a developing tank, a transfer section, a fixing tank, a transfer section, a washing tank, a transfer section,
This is the total time from the drying section until the leading edge of the film comes out of the drying outlet. The silver halide light-sensitive material of the present invention can reduce the amount of gelatin used as a binder in the emulsion layer and the protective layer without impairing pressure fog, so that the total processing time can be reduced even in rapid processing of 15 to 60 seconds. Development processing can be performed without impairing the speed, fixing speed, and drying speed. Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited thereto.

[0082]

【Example】

Example 1 (1) Preparation of emulsion Liquid I Water 1000 ml Gelatin 20 g Sodium chloride 20 g 1,3-Dimethylimidazolidin-2-thione 20 mg Sodium benzenesulfonate 6 mg Liquid II 400 mg Silver nitrate 100 g III Liquid water 400 ml Sodium chloride 30.5 g Potassium bromide 14 g Potassium hexachloroiridium (III) solution (0.001% aqueous solution) 15 ml Ammonium hexabromorhodate (III) (0.001% aqueous solution) 1.5 ml I kept at 38 ° C. and pH = 4.5 Solution II and Solution III were simultaneously added to the solution with stirring over a period of 10 minutes.
μm core particles were formed. Then, the following IV solution and V solution
Added over minutes. Further potassium iodide 0.15
g was added to terminate the particle formation. IV solution water 400 ml silver nitrate 100 g V solution water 400 ml sodium chloride 30.5 g potassium bromide 14 g K ₄ Fe (CN) ₆ 1 × 10 ⁻⁵ mol / mol Ag Then, water was washed by flocculation according to a conventional method. 40 g of gelatin was added.

This was divided into two equal parts, and one emulsion (A) was adjusted to pH
= 5.5, pAg = 7.5, 3.7 mg of sodium thiosulfate and 6.2 mg of chloroauric acid were added, and the mixture was chemically sensitized at 65 ° C. so as to obtain an optimum sensitivity. The other emulsion (B)
Was adjusted to pH = 5.3, pAg = 7.5, and added sodium thiosulfate 2.6 mg, chloroauric acid 5.0 mg and tellurium sensitizer 3.0 mg, sodium benzenethiosulfonate 4 mg, benzene 1.0 mg of sodium sulfinate was added, and chemically sensitized at 55 ° C. so as to obtain an optimum sensitivity. Finally, a silver iodochlorobromide cubic grain emulsion containing 80 mol% of silver chloride and having an average grain size of 0.21 μm was prepared. did. (2) Preparation of Coated Sample A sensitizing dye was added to the emulsions (A) and (B) in an amount of 5 × 10 ⁻⁴ mol / mol Ag to perform ortho-sensitization. Furthermore, hydroquinone as an antifoggant, 1-phenyl-5-mercaptotetrazole each 2.5g per mole of Ag,
50 mg of colloidal silica (Snowtex C, manufactured by Nissan Chemical Industries, average particle size 0.015 μm) in an amount shown in Table 1 and a polyethyl acrylate latex (0.05 μm) as a plasticizer.
m) was 40% by weight based on gelatin, and as a hardening agent, 2-
Bis (vinylsulfonylacetamido) ethane was added in an amount of 30 mg / g of total gelatin, and Ag 3.0 g / m ² and gelatin 1.2 g / g on a polyethylene terephthalate support.
It was coated so as to be in m ^2. A lower protective layer and an upper protective layer having the following composition were simultaneously coated thereon. <Lower layer of protective layer> 0.25 g of gelatin per m ² 4 mg of sodium benzenethiosulfonate 25 mg of 25 mg of 1,5-dihydroxy-2-benzaldoxime 125 mg of polyethyl acrylate latex <upper layer of protective layer> 0.25 g of gelatin per m ² 2. 5 μm silica matting agent 50 mg compound (dispersion of gelatin in slip agent) Table 1 Colloidal silica (Nissan Chemical Snowtex C) 30 mg compound-5 mg sodium dodecylbenzenesulfonate 22 mg

[0084]

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The support of the sample used in this example has a back layer and a back protective layer having the following compositions. <Back layer> Gelatin 2.0 g / m ² Sodium dodecylbenzenesulfonate 80 mg / m ² compound 70 mg / m ² compound 70 mg / m ² compound 90 mg / m ² 1,3-divinylsulfonyl-2-propanol 60 mg / m ² < Back protective layer> Gelatin 0.5 g / m ² Polymethyl methacrylate fine particles (average particle size 3.6 μm) 40 mg / m ² Sodium dodecylbenzenesulfonate 20 mg / m ² compound (gelatin dispersion of slip agent) 100 mg / m ² compound 2mg / m ²

[0086]

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The samples thus obtained were evaluated for photographic properties, slick fog and dynamic friction coefficient. The evaluation method is shown below. (1) Evaluation of photographic properties The obtained sample was exposed to xenon flash light having an emission time of 10 ^-6 seconds through an interference filter having a peak at 488 nm and a continuous density wedge.
Using an automatic developing machine FG-710NH manufactured under the following developing conditions, the relative sensitivity of the exposure amount giving a density of 3.0 was determined. The developing solution and the fixing solution used were processing solutions having the following compositions. The replenishment amount at this time is 200 ml / m ² for both the developing solution and the fixing solution. Developing conditions Current image 38 ° C 14.0 seconds Fixed 37 ° C 9.7 seconds Rinse 26 ° C 9.0 seconds Squeeze 2.4 seconds Drying 55 ° C 8.3 seconds Total 43.4 seconds Linear speed 2800mm / Min

Developer solution Sodium 1,2-dihydroxybenzene-3,5-disulfonate 0.5 g Diethylenetriamine-pentaacetic acid 2.0 g Sodium carbonate 5.0 g Boric acid 10.0 g Potassium sulfite 85.0 g Sodium bromide 6.0 g Diethylene glycol 40.0 g 5-Methylbenzotriazole 0.2 g Hydroquinone 30.0 g 4-Hydroxymethyl-4-methyl-1-phenyl-3-pyrazolidone 1.6 g 2-Mercaptobenzimidazole-5-sodium sulfonate 0.3 g Water Add potassium oxide, add water to make 1 liter and adjust the pH to 10.7. 1 liter Fixing solution Ammonium thiosulfate 150 g / l 1,4,5-trimethyl-1,2,4-triazolium-3-thiolate 0.25 mol / l sodium bisulfite 30 g / l disodium ethylenediaminetetraacetate dihydrate Adjust to pH = 6.0 with 0.025 g / l sodium hydroxide. (2) Pressure fog Under a condition of 25 ° C. and 60% RH, the surface of the sample was rubbed with a sapphire needle having a diameter of 0.1 mm under a continuous load of 0 to 200 g. The load at which fogging occurred was determined. (3) Dynamic friction coefficient (μ _k ) After leaving for 1 hour under the condition of 25 ° C. and 60%, using a sapphire needle having a diameter of 1 mm, load 100 g, speed 60 cm / min.
, The dynamic friction coefficient was determined. Table 1 shows the obtained results. As is clear from Table 1, the sample of the present invention has high sensitivity and remarkably good pressure fog.

[0089]

[Table 1]

Example 2 0.5M aqueous silver nitrate solution, 0.1M potassium bromide, 0.44M sodium chloride, hexachloroiridium
(III) potassium salt, an aqueous solution of a halogen salt containing ammonium hexabromorhodium (III), sodium chloride,
To a gelatin aqueous solution containing 1,3-dimethylimidazolidin-2-thione and benzenethiosulfonic acid and adjusted to pH 4.0 was added by a double jet method at 38 ° C. for 10 minutes while stirring, and the average particle size was 0.18 μm. Nuclei were formed by obtaining silver chlorobromide grains having a silver chloride content of 70 mol%. Subsequently, a 0.5M silver nitrate aqueous solution and a halogen salt aqueous solution containing 0.1M potassium bromide, 0.44M sodium chloride and potassium ferrocyanide were similarly added by a double jet method for 10 minutes to complete the grain formation. . The resulting particles have an average particle size of 0.22μ.
m, silver chloride content: 70 mol%, Ir: 3.8 × 10 ⁻⁷ mol, Rh: 6.1 × 10 ⁻⁸ mol, Fe
^Was contained in a silver chlorobromide cubic grain containing 2.3 × 10 ⁻⁵ mol (coefficient of variation: 10%). Thereafter, it was washed with water by a flocculation method according to a conventional method, and 30 g of gelatin was added.
The silver / gelatin weight ratio was 2.5. This emulsion is
Equally divided, emulsions A and B were prepared by the following method. Emulsion A: The pH of the emulsion was adjusted to 5.6, the pAg was adjusted to 7.5, 3.2 mg of sodium thiosulfate, and 4.3 of chloroauric acid.
mg, and subjected to a chemical sensitization treatment at 65 ° C. so as to obtain an optimum sensitivity. As a stabilizer, 4-hydroxy-6-methyl-
75 mg of 1,3,3a, 7-tetraazaindene were added. Emulsion B: The pH of the emulsion was adjusted to 5.1, the pAg was adjusted to 7.5, 2.2 mg of sodium thiosulfate, 2.7 mg of tellurium sensitizer 10, and 3.4 of sodium benzenethiosulfonate.
mg, 0.85 mg of sodium benzenesulfinate and 4.3 mg of chloroauric acid, the ripening time was adjusted at 55 ° C. so as to obtain the optimum sensitivity, and a chemical sensitization treatment was performed. -6-methyl-1,3,3a, 7-
75 mg of tetraazaindene were added.

To the obtained emulsions A and B, 90 mg of a sensitizing dye was added per 1 mol of silver, and 4,4'-bis (4,6
-Dinaphthoxy-pyrimidin-2-ylamino) -stilbene disulfonic acid disodium salt in an amount of 2 per mole of silver
34 mg and 25 mg of 1-phenyl-5-mercaptotetrazole were added. Furthermore, hydroquinone 150 mg / m ² ,
Polyethyl acrylate latex to gelatin
0% by weight, colloidal silica (Snowtex C manufactured by Nissan Chemical Co., Ltd.) in the amount shown in Table 2, 2-bis (vinylsulfonylacetamide) ethane as a hardener was added at 60 mg / m ² , and the undercoat layer having the following composition was added. A silver coating amount of 3.3 g / g on a polyethylene terephthalate support having the layer and the second layer on both sides.
m ² and the amount of gelatin applied was 1.4 g / m ² .
Further, a protective layer having the following composition was simultaneously coated on the emulsion layer.

<First Layer of Undercoat Layer> Aqueous dispersion of copolymer of vinylidene chloride / methyl methacrylate / acrylonitrile / methacrylic acid (90/8/1/1 weight ratio) 15 parts by weight 2,4- Dichloro-6-hydroxy-s-triazine 0.25 {polystyrene fine particles (average particle size: 3μ) 0.05} compound-6 0.20 {water is added to 100} Further, 10% by weight of KOH is added, and pH = The coating solution adjusted to 6 was applied at a drying temperature of 180 ° C. for 2 minutes so that the dry film thickness became 0.9 μm. <Undercoat layer second layer> Gelatin 1 part by weight methylcellulose 0.05 〃 compound -7 0.02 〃 _{C 12 H 25 O (CH 2} CH 2 O) 10 H 0.03 〃 compound -8 3.5 × 10 ^-3 〃 with acetic acid 0.2 〃 water 100 〃 the coating liquid drying temperature 170 ° C. 2 minutes, dry film thickness was coated so as to be 0.1 [mu].

[0093]

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<Protective Layer> Gelatin 0.5 g / m ² Dye 70 mg / m ² Polymethyl methacrylate fine particles (average particle size 2.5 μm) 60 〃 Colloidal silica (particle size 0.010 to 0.015 μm, Nissan Chemical Snowtex C) 70 ナ ト リ ウ ム sodium dodecylbenzenesulfonate 20 化合物 compound 1.5 〃 20 〃 〃 (gelatin dispersion of slip agent) Table-2

[0095]

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A conductive layer having the following composition (surface resistivity: 2 × 10 ¹⁰ Ω at 25 ° C. and 10% RH) was applied on the opposite side of the support, and a back layer and a back protective layer were simultaneously applied thereon. did. <Conductive layer> SnO ₂ / Sb (9/1 weight ratio, average particle size 0.25 μ) 300 mg / m ² gelatin (Ca ⁺⁺ content 30 ppm) 170 {compound-8 7} sodium dodecylbenzenesulfonate 10} dihexyl -Α-sulfosuccinate sodium salt 40 {polystyrene sulfonic acid sodium salt 9} (back layer) gelatin 2.0 g / m ² sodium dodecylbenzene sulfonate 80 mg / m ² dye 160 mg / m ² ４０40 mg / m ² 〃120 mg / m ² 1,3-divinylsulfone-2-propanol 60 mg / m ² (back protective layer) gelatin 0.5 g / m ² polymethyl methacrylate (particle size 4.7 μm) 30 mg / m ² sodium dodecylbenzenesulfonate 20 mg / m ² compounds 2 mg / m ² compounds 100 mg / m ²

[0097]

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The sample thus obtained was evaluated in the same manner as in Example-1. In addition, (1) evaluation of photographic properties was performed in the same manner as in Example 1, except that the interference filter was changed to an interference filter having a peak at 633 nm. Table 2 shows the obtained results. As is apparent from Table 2, the sample of the present invention has high sensitivity and remarkably good pressure fog. In particular, it can be seen that the effect is greater when the dynamic friction coefficient of the outermost layer is 0.35 or less.

[0099]

[Table 2]

Example 3 A sensitizing dye was added to the emulsions (A) and (B) of Example 1 by using Ag1.
80 mg per mol, and then, as supersensitizers and stabilizers, 4-4'-bis (4,6-dinaphthoxy-pyrimidin-2-ylamino) -stilbene disulfonic acid disodium salt and 2,5-dimethyl -3-allyl-benzothiazole iodide salt was added in an amount of 300 m
g and 450 mg were added, and infrared sensitization was performed. Further, an antifoggant, a plasticizer, a hardener, and colloidal silica were added in the amounts shown in Table 3, and Ag was added on a polyethylene terephthalate support.
Coating was carried out so as to obtain 3.0 g / m ² and gelatin at 1.2 g / m ² . On this, a lower layer and an upper layer of a protective layer having the following composition were simultaneously applied. (Lower layer of protective layer) Gelatin Table-3 Compound-9 20 mg / m ² Compound-10 10 {Sodium dodecylbenzenesulfonate 20} Polyethyl acrylate latex (0.05μ) 150 {(Upper layer of protective layer) Gelatin Table-3 Polymethyl Methacrylate fine particles (average particle size 3.4 μ) 60 mg / m ² Colloidal silica (Nissan Chemical Snowtex C) 30 mg / m ² Compound- (Gelatin dispersion of slip agent) 40 mg / m ² Sodium dodecylbenzenesulfonate 40 mg / m ² Compound-11 10〃

[0101]

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Next, on the opposite side, a back layer and a protective layer having the following formulation were applied. (Back Layer) Gelatin 2.0 g / m ² Compound -12 34 mg / m ² Compound -13 90 〃 compound -14 70 〃 polyethyl acrylate latex (particle size 0.05 .mu.m) 400 〃 sodium dodecylbenzenesulfonate 35 〃 1, 3-divinylsulfonyl-2-propanol 50 {sodium polystyrene sulfonate 20} (protective layer) gelatin 0.5 g / m ² polymethyl methacrylate fine particles (average particle size 3.4 μ) 40 mg / m ² sodium dodecyl benzene sulfonate 10 { Compound-15 2 {Sodium acetate 25}

[0103]

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[0104]

[Table 3]

The sample thus obtained was evaluated in the same manner as in Example 1. (1) Evaluation of photographic properties was performed in the same manner as in Example 1, except that the interference filter was changed to an interference filter having a peak at 780 nm. Table 4 shows the obtained results. Table 4 As is clear from, the sample is highly sensitive to the present invention, and is a good lay pressure fog Silurian, also gelatin coating amount of the protective layer is 0.5 g / m ² or less samples sensitivity It can be seen that there is no reduction and the suitability for rapid processing is excellent.

[0106]

[Table 4]

Example 4 A sensitizing dye was added to Emulsions A and B of Example 1 in an amount of 50 mg per mol of Ag, and then as supersensitizers and stabilizers,
4-4'-bis (4,6-dinaphthoxy-pyridine-2
-Ylamino) stilbene disulfonic acid disodium salt and 2,5-dimethyl-3-allyl-benzothiazole iodide salt each in an amount of 400 mg and 500 mg per mole of Ag.
mg was added for infrared sensitization. Further, colloidal silica (same as in Example-1) was used in an amount shown in Table 5 as a plasticizer, and ethyl acrylate latex (particle size: 0.05 µ
m) 250 mg / m ² , 2-bis (vinylsulfonylacetamido) ethane as a hardening agent 80 mg / m ² , and sodium polystyrene sulfonate as a thickener 30 mg / m ^2, and 1.3 g of Ag m ² , gelatin 0.5
g / m ² , a polyethylene-laminated paper having a primer layer on both sides (paper: 75 μm, polyethylene: 20 μm)
m). At this time, an antihalation layer having the following composition was simultaneously coated below the emulsion layer, and a protective layer having the following composition was coated above the emulsion layer.

(Antihalation layer) Gelatin 1.3 g / m ² 5-methylbenzotriazole 7 mg / m ² Compound-930 {} -10 30 {} -17 115 {hydroquinone 33} ethyl acrylate latex (particle size: 0,3) 05 μm) 800 {sodium polystyrene sulfonate 23} (protective layer) gelatin 0.5 g / m ² SiO ₂ fine particles (average particle size 3.5 μm) 25 mg / m ² 1-phenyl-5-mercapto-tetrazole 0.04 {1} 5,5-dihydroxy-2-benzaldoxime 8 {sodium polystyrene sulfonate 5} ethyl acrylate latex (particle size 0.05 μm) 300 {compound-18 100}

[0109]

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The support of the sample used in this example has a back layer and a back protective layer having the following composition. (Back layer) Gelatin 1.5 g / m ² Compound-8 3 mg / m ² {-420} {-1925} Sodium polystyrene sulfonate 20 {1,3-divinylsulfonyl-2-propanol 80} (Back protective layer ) Gelatin 0.8 g / m ² compound-8 2 mg / m ² 〃195 〃 −２21 〃 〃-20 10 〃Sodium acetate 20 ポ リ Fine particles of polymethyl methacrylate (average particle size 3.4 μm) 40 〃

[0111]

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The sample obtained in this manner was cut to a quarter size (254 × 305 mm) with tungsten light.
% Exposure, and using the same developing solution and fixing solution as in Example 1, using an FG-460A automatic developing machine manufactured by Fuji Photo Film Co., Ltd., processing 250 sheets per day, and developing After continuous treatment for 2 weeks under the conditions and the replenishment amounts shown in Table 5, evaluation by photographic was performed under the same exposure conditions as in Example-3. At this time, the replenishment rate of the fixing solution was 180 ml / m ^2.
It is. Evaluation of dynamic friction coefficient and pressure fog was performed in Example-1.
The same was done. Developing conditions Current image 38 ° C 11.1 seconds Fixing 36 ° C 10.5 seconds Rinse 25 ° C 10.1 seconds Drying 55 ° C 13.3 seconds Total 45.0 seconds Line speed 1849 mm / min It is shown in Table-5. As is clear from Table 5, the sample of the present invention has high sensitivity, remarkably good pressure fog, and can reduce the replenishment amount of the developer without impairing the photographic performance. I understand.

[0113]

[Table 5]

 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-118566 (JP, A) JP-A-61-114236 (JP, A) JP-A-64-61748 (JP, A) JP-A 61-114 140939 (JP, A) JP-A-60-238841 (JP, A) JP-A-2-161425 (JP, A) JP-A-2-129626 (JP, A) JP-A-2-69741 (JP, A)

Claims (6)

(57) [Claims] 1. A silver halide photographic material having at least one silver halide emulsion layer on a support and at least one protective layer on the emulsion layer, wherein at least one of the emulsion layers has And a silver halide grain sensitized with a tellurium sensitizer and colloidal silica. 2. The outermost layer of the protective layer has a coefficient of dynamic friction of 0.
2. The silver halide photographic material according to claim 1, wherein the photographic material is 35 or less. 3. The gelatin coating amount of the protective layer is 0.5 g.
^{3. The} silver halide photographic light-sensitive material according to claim 1, wherein the coating amount of the gelatin including the emulsion layer is 2.5 g / m ² or less. 4. The silver halide photographic light-sensitive material according to claim 1, wherein the processing is performed by an automatic developing machine having a total processing time of 15 to 60 seconds. 5. The silver halide photographic light-sensitive material according to claim 1, wherein processing is carried out on an automatic processing machine having a line speed of 1000 mm / min or more. 6. A method of subjecting a silver halide photographic light-sensitive material to at least development, fixing, and water-washing treatment using an automatic developing machine after exposure, wherein a replenishing amount of a developing solution and / or a fixing solution is 200 ml or less per 1 m ^{2 of the} light-sensitive material. 3. The method for developing a silver halide photographic light-sensitive material according to claim 1, wherein: