JP2794228B2 - Developing method of silver halide photographic material - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for developing a silver halide photographic light-sensitive material, and more particularly, to a method of developing a light-sensitive material in an automatic processing apparatus which has rapid processing suitability and improves dimensional stability. The present invention relates to a developing method.

[0002]

2. Description of the Related Art In recent years, a scanner system has been widely used in the field of printing and plate making. There are various types of recording apparatuses that use a scanner-type image forming method, and the recording light source of these scanner-type recording apparatuses is a glow lamp, a xenon lamp, a tungsten lamp, an LED, or a He-Ne laser, argon There are a laser and a semiconductor laser. Various characteristics in the light-sensitive material used for these scanners are required, in particular 10 ^-3
Even under such conditions, high sensitivity and high contrast are indispensable conditions because the exposure is performed with a short exposure time of 10 ^-7 seconds. However, in the printing industry, work efficiency and speedup are strongly desired, and there is a wide range of needs for high-speed scanning and shortening of processing time for photosensitive materials. In order to respond to these needs in the printing field, exposure machines (scanners, plotters) are required to have a higher scanning speed and an increased number of lines and a narrower beam for higher image quality. It is desired that the material be highly sensitive, have excellent stability, and be developed quickly. The rapid development processing here means that after inserting the leading edge of the film into the automatic developing machine, the developing tank, the transition part, the fixing tank,
This is a process in which the time when the leading end of the film passes through the crossing section, the washing tank, and the drying section and comes out of the drying section is 15 to 60 seconds.

[0003] A silver halide photographic light-sensitive material generally comprises a support having on at least one side thereof a layer containing a hydrophilic colloid such as gelatin as a binder. Such a hydrophilic colloid layer has a disadvantage that it easily expands and contracts with changes in humidity and temperature. The dimensional change of the photographic light-sensitive material due to the expansion and contraction of the hydrophilic colloid layer is a very serious defect particularly in photographic light-sensitive materials for printing and the like. Several methods for improving dimensional stability of photographic photosensitive materials for printing have been proposed. For example, a technique for defining the thickness ratio between the hydrophilic colloid layer and the base (US Pat. No. 3,201,250), a technique for incorporating a polymer latex into the hydrophilic colloid layer (Japanese Patent Publication Nos. 39-4272 and 39-17702).
Nos. 43-13482, 45-5331, U.S. Pat. Nos. 2,376,005, 2,763,625, and 27.
No. 72166, No. 2852386, No. 2853457
Nos. 3397988, 3411911, 34
No. 11912) and a technique of providing a waterproof coating layer on the undercoat of the support surface (Japanese Patent Application Laid-Open No. 60-3627). However, even if the light-sensitive material itself is improved in this way, it is essentially difficult to improve the dimensional stability under any temperature and humidity environment as long as it has a layer using a hydrophilic colloid such as gelatin as a binder. . Further, a technique for improving the dimensional stability of a light-sensitive material in an automatic processing apparatus has not existed as far as we can know.

Hitherto, various methods have been proposed for controlling the drying conditions of a drying section of an automatic developing apparatus by controlling the drying conditions with a heater or the like. (JP-A-56-0952
No. 39, JP-A-63-49760, JP-A-63-2
In these conventional control methods, a better drying method has been sought mainly from the viewpoints of quick drying, energy economy, emulsion film quality, light-sensitive material transportability, and the like. For example, the method of applying dry air in the first half is weaker and the latter half is stronger, so as to speed up the process. When there is no photosensitive material, a method of improving the energy economy by lowering the heater preheating temperature, and an automatic development processor have been installed. Detects indoor temperature and humidity (hereinafter referred to as "atmosphere temperature and humidity"), and uses that information to prevent excessive drying of the photosensitive material and prevent deterioration of the film quality. There is a method for preventing a transportation failure from occurring due to a shortage.
However, in these conventional methods, it was impossible to improve the dimensional stability of the photosensitive material under all temperature and humidity conditions. For example, in a low humidity period such as winter, the drying temperature of the processing apparatus is set to be high, so that the photosensitive material is excessively dried. A phenomenon occurs. Also, during periods of high humidity, such as during the rainy season,
If the drying air temperature is set so that the photosensitive material is finally dried, a phenomenon occurs in which the dimensions of the photosensitive material shrink. The industry describes this phenomenon as poor dimensional stability with processing. This is a serious drawback particularly in photosensitive materials for printing.

On the other hand, in many fields from the viewpoint of environmental protection,
Resources, generated gas, wastewater, waste, etc. are being reviewed. In the field of photographic processing, resource conservation, reduction of wastewater,
From the viewpoint of reducing the number of containers used, the necessity of reducing the replenishment amount of the processing solution used for processing the photosensitive material is increasing. However, Silurian properly developing speed reducing the replenishing amount of the developer becomes slow, and since the Silurian properly fixer rate reducing the replenishing amount of the fixing solution is slow, the conventional fairly large amount (photosensitive material 1 m ²
250 to 500 ml of developer and 500 to 80 fixer
0 ml). In order to increase the developing speed and the fixing speed, the processing temperature is increased and the stirring conditions during the processing are strengthened. However, there are various problems such as generation of odor and increase in the cost of the apparatus. Thus, there has been a strong demand for improvements in silver halide photographic light-sensitive materials and automatic processing equipment which have rapid processing suitability, are excellent in dimensional stability, and can reduce the replenishment amount of processing solutions.

[0006]

SUMMARY OF THE INVENTION An object of the present invention is to provide a silver halide photographic light-sensitive material and an automatic development processing apparatus having rapid processing suitability, excellent dimensional stability, and capable of reducing the replenishing amount of a processing solution. Is to provide.

[0007]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support and at least one protective layer on top of the emulsion layer. In the method in which the material tail is exposed and then developed using an automatic processor, the protective layer has a gelatin coating amount of 0.5 g / m ² or less and a total gelatin coating amount including the emulsion layer of ² g / m ² or less. 0.5 g / m ² or less and having the photosensitive material immediately after squeezing the photosensitive material after washing with water in a drying section of an automatic developing apparatus for developing the silver halide photographic photosensitive material. The drying air temperature after drying 65% of the moisture is indicated by the shaded area in FIG. 1 and the drying air temperature is higher than the ambient temperature based on the ambient temperature and humidity conditions at the installation location of the automatic developing apparatus. Set the conditions and dry It was achieved by the development method for processing a silver halide photographic material according to symptoms.

The silver halide used in the present invention may be any of silver chloride, silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver bromoiodide, silver chloroiodobromide and the like. . In the present invention, among the above silver halides, silver chloroiodobromide, silver chlorobromide, and silver iodobromide are preferable. More preferably, silver iodide is added in an amount of 0 to
Silver chlorobromide or silver chloroiodobromide containing 1 mol% is advantageously used. The average grain size of the silver halide used in the present invention is preferably fine grains (for example, 0.7 μm or less), particularly preferably 0.5 μm or less. The particle size distribution is basically not limited, but is preferably monodispersed. The term “monodispersion” as used herein means at least 95% by weight or number of particles
Is composed of a group of particles having a size within ± 40% of the average particle size. The silver halide grains in the photographic emulsion may have regular crystals such as cubic or octahedral, or may have irregular crystals such as spherical or plate-like, Alternatively, it may have a composite form of these crystal forms. In the silver halide grains, the inside and the surface layer may be composed of a uniform phase or may be composed of a simple phase. 2 formed separately
A mixture of two or more kinds of silver halide emulsions may be used.
The silver halide emulsion layer may be a single layer or a multilayer (two layers, three layers, etc.). In the case of a multilayer, different silver halide emulsions may be used. Good
The same thing may be used. In the silver halide emulsion used in the present invention, a cadmium salt, a sulfite, a lead salt, a thallium salt, a rhodium salt or a complex salt thereof, an iridium salt or a complex salt thereof and the like are co-present in the course of forming silver halide grains or physical ripening. Is also good. In the present invention, it is preferable to use a water-soluble rhodium salt, typically, rhodium chloride, rhodium trichloride, rhodium ammonium chloride and the like. Further, these complex salts can be used. The addition time of the above rhodium salt is limited before the completion of the first ripening in the production of the emulsion, and it is particularly desirable to add the rhodium salt during grain formation, and the addition amount is 1 × 10 ⁻⁸ mol or more per mol of silver and 1 × 10 ⁻⁸ mol or more. A range of 10 ^-6 mol or less is preferred.

Silver halides particularly suitable for use in the present invention are prepared in the presence of 10 ^-8 to 10 ^-5 moles of iridium salt or complex thereof per mole of silver. In the above, it is desirable to add the above amount of the iridium salt before the completion of physical ripening in the production process of the silver halide emulsion, particularly at the time of grain formation. The iridium salt used here is a water-soluble iridium salt or iridium complex salt, for example, iridium trichloride, iridium tetrachloride, hexachloroiridium (II
I) Potassium acid, potassium hexachloroiridate (IV), ammonium hexachloroiridate (III) and the like. Gelatin is advantageously used as a binder or protective colloid of the photographic emulsion, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol; polyvinyl alcohol partial acetal;
Various kinds of synthetic hydrophilic polymer substances such as a single or copolymer such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, and polyvinylpyrazole can be used. The silver halide emulsion used in the present invention may not be chemically sensitized, but may be. As methods of chemical sensitization of silver halide emulsions, sulfur sensitization, reduction sensitization and noble metal sensitization are known, and any of these can be used alone or in combination with chemical sensitization. Is also good. Among the noble metal sensitization methods, the gold sensitization method is a typical one and uses a gold compound, mainly a gold complex salt. Precious metals other than gold, such as platinum,
Complex salts such as palladium and rhodium may be contained. Examples of the sulfur sensitizer include sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfate,
Thioureas, thiazoles, rhodanines and the like can be used. Stannous salts, amines, formamidinesulfinic acid, silane compounds and the like can be used as the reduction sensitizer.

The photographic light-sensitive material of the present invention is disclosed in JP-A-60-140340 and JP-A-6-140340 for the purpose of promoting high sensitivity and high contrast.
The compounds described in 1-167939 can be added. These may be used alone or in combination of two or more. In the photosensitive material of the present invention, in the manufacturing process of the photosensitive material, to prevent fogging during storage or photographic processing,
Alternatively, various compounds can be contained for the purpose of stabilizing photographic performance. That is, azoles such as benzothiazolium salts, nitroindazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzothiazoles, nitrobenzotriazoles Mercaptopyrimidines; mercaptotriazines; thioketo compounds such as oxazolinethione; azaindenes such as triazaindenes, tetraazaindenes (especially 4-hydroxy-substituted (1,3,3a, 7) tetrazain Dens), pentaazaindenes and the like; many known as antifoggants or stabilizers such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonamide, etc. It may be added compound. Of these, preferred are benzotriazoles (eg, 5-methylbenzotriazole) and nitroindazoles (eg, 5-nitroindazole). Further, these compounds may be contained in the treatment liquid.

The photosensitive silver halide emulsion of the present invention may be spectrally sensitized to blue light, green light, red light or infrared light having a relatively long wavelength by a sensitizing dye. As the sensitizing dye, a cyanine dye, a merocyanine dye, a complex cyanine dye, a complex merocyanine dye, a holo-holerocyanine dye, a styryl dye, a hemicyanine dye, an oxonol dye, a hemioxonol dye, and the like can be used. Useful sensitizing dyes for use in the present invention include, for example, RESEARCH DISCLOSURR Item 17643 IV-A.
Item (p.23, December 1978), Item 1831X
(August 1979, p. 437). In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of various scanner light sources can be advantageously selected. For example, A) For an argon laser light source,
No. 62247, JP-A-2-48653, U.S. Pat.
Nos. 161 and 331 and simple merocyanines described in West German Patent 936,071; and B) helium-neon leather light sources are disclosed in JP-A-50-62425 and JP-A-54-1.
No. 8726, 59-102229, and C) LED light sources.
No. 42172, No. 51-9609, No. 55-3981
No. 8; thiacarbocyanines described in JP-A-62-284343; and D) tricarbocyanines described in JP-A-59-19032 and JP-A-60-80841 for semiconductor laser light sources. Kind, JP-A-59-19
Dicarbocyanines containing a 4-quinoline nucleus described in No. 2242 are advantageously selected. The representative compounds of these sensitizing dyes are shown below. Specific compound examples of A)

[0012]

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Specific examples of compound B)

[0014]

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Examples of specific compounds of C): General formula [I]

[0016]

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[Wherein Y ₁ and Y ₂ each represent a non-metallic atomic group required to form a heterocyclic ring such as a benzothiazole ring, a benzoselenazole ring, a naphthothiazole ring, a naphthoselenazole ring, or a quinoline ring; Represents a lower alkyl group, an alkoxy group, a hydroxy group,
It may be substituted with an aryl group, an alkoxycarbonyl group, or a halogen atom. R ₁ and R ₂ each represent a lower alkyl group, a sulfo group, or an alkyl group having a carboxy group. R ₃ represents a lower alkyl group. X ₁ represents an anion. n ₁ and n ₂ represent 1 or 2. m represents 1 or 0, and in the case of an internal salt, m = 0. 〕In particular

[0018]

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[0019]

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Specific compounds of D)

[0021]

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These sensitizing dyes may be used alone or in combination. The combination of sensitizing dyes is often used particularly for supersensitization. Along with the sensitizing dye, the emulsion may contain a dye which does not itself have a spectral sensitizing effect or a substance which does not substantially absorb visible light and exhibits supersensitization. Useful sensitizing dyes, combinations of dyes exhibiting supersensitization, and substances exhibiting supersensitization are described in Research Disclosur.
e) Vol. 176, Volume 17643 (December 1978) No. 23
It is described in section J on page IV. The content of the sensitizing dye of the present invention depends on the particle size of the silver halide emulsion, the halogen composition, the method and degree of chemical sensitization, the relationship between the layer containing the compound and the silver halide emulsion, the type of antifoggant compound, and the like. It is desirable to select the optimal amount accordingly, and the methods of testing for that selection are well known to those skilled in the art. Usually, it is preferably from 10 ^-7 mol to 1 × 1 per mol of silver halide.
It is used in an amount of 0 ^-2 mol, especially 10 ^-6 to 5 × 10 ^-3 mol.

Gelatin is used as a binder for the silver halide emulsion layer and the protective layer of the present invention, but other hydrophilic colloids can also be used. For example, gelatin derivatives, graft polymers of gelatin and other polymers,
Proteins such as albumin and casein; cellulose derivatives such as hydroxyethylcellulose, carboxymethylcellulose and cellulose sulfates; sugar derivatives such as sodium alginate and starch derivatives; polyvinyl alcohol; polyvinyl alcohol partial acetal;
Various kinds of synthetic hydrophilic polymer substances such as a single or copolymer such as vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, and polyvinylpyrazole can be used. As gelatin, in addition to lime-processed gelatin, acid-processed gelatin may be used, and gelatin hydrolyzate and gelatin enzyme hydrolyzate can also be used. In the present invention, the coated amount of gelatin as a binder is preferably as small as possible in order to obtain rapid processing suitability and improved dimensional stability. In particular, the gelatin coating amount of the protective layer greatly affects the developing speed and the fixing speed, and the total gelatin coating amount including the silver halide emulsion layer affects the drying speed and dimensional stability. Therefore, the gelatin coating amount of the protective layer of the present invention is 0.5 g.
/ G / m ² or less, preferably 0.15 to 0.5 g / m ² , and the total gelatin coating amount on one side of the emulsion layer on the support including the silver halide emulsion layer was 2.5 g / m ^2. m ² or less, preferably 1.5 to 2.5 g / m ² .

The colloidal silica (colloidal silica) used in the present invention has an average particle size of 5 μm to 1000 μm, preferably 5 μm to 500 μm, is mainly composed of silicon dioxide, and contains alumina or sodium aluminate as a minor component. May be. These colloidal silicas may contain, as a stabilizer, an inorganic base such as sodium hydroxide, potassium hydroxide, lithium hydroxide, or ammonia, or an organic base such as tetramethylammonium ion. These colloidal silicas are described in JP-A-53-112732, JP-B-57-90551,
It is disclosed in Japanese Patent Publication No. 57-051653. Specific examples of colloidal silica, Nissan Chemical (Tokyo, Japan) from Snowtex _{20 (SiO 2 / Na 2 O} ≧ 57), Snowtex _{30 (SiO 2 / Na 2 O} ≧ 50), Snowtex C
(SiO ₂ / Na ₂ O ≧ 100), Snowtex O (SiO ₂ / Na
₂ O ≧ 500). here,
(SiO ₂ / Na ₂ O is the content ratio of silicon dioxide (SiO ₂ ) to sodium hydroxide in terms of sodium hydroxide converted to Na ₂ O, and both values are listed in the catalog. The preferred amount of the colloidal silica used in the present invention is 0.05 to 1.0 in terms of a dry weight ratio to gelatin used as a binder of a layer to be added.
And particularly preferably 0.1 to 0.6.

The dynamic friction coefficient (μk) in the present invention can be determined by the same principle as the friction coefficient test method described in JIS K7125. After leaving the silver halide light-sensitive material at 25 ° C. and 60% RH for 1 hour or more, a constant load (contact force: 50 to 200 g in Fp example) is applied to a sapphire needle (eg, 0.5 to 5 mm in diameter). The surface of the silver halide photosensitive material is moved at a constant speed (eg, 20 to 100 cm).
/ Min), the dynamic frictional force (Fk) at that time is measured, and it is obtained by the following equation (1).

[0026]

(Equation 1)

For example, a surface property measuring device (HE, manufactured by Shinto Kagaku Co., Ltd.)
IDON-14).

In the present invention, the coefficient of dynamic friction of the outermost layer is set to 0.1.
It is preferable to use a so-called slip agent in order to make it 35 or less. Representative examples of the slip agent used in the present invention include, for example, U.S. Pat. No. 3,042,522, British Patent No. 955,061, U.S. Pat. No. 3,080,317.
Nos. 4,004,927 and 4,047,958
No. 3,489,567 and British Patent No. 1,143.
No. 118, etc., US Pat. Nos. 2,454,043, 2,732,305, 2,976,148, 3,206,311 and German Patent No. 1 Fatty acid-based, alcohol-based, acid amide-based slip agents described in, for example, U.S. Patent Nos. 1,263,722 and 3,933,516. Metal soaps described in U.S. Pat. Nos. 2,588,765 and 3,121,060; and esters described in British Patent No. 1,198,387,
Ether slip agents, U.S. Pat. No. 3,502,473,
No. 3,042,222, the taurine-based slip agent, the colloidal silica, and the like.

As the slip agent of the present invention, alkyl polysiloxane and liquid paraffin in a liquid state at room temperature are preferable. Representative examples of the compounds are shown below.

[0030]

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[0031]

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[0032]

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[0033]

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[0034]

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In the present invention, it is more preferable to use an anionic surfactant represented by the following general formula [I]. General formula [I]

[0036]

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In the formula, R represents a substituted or unsubstituted alkyl group, alkenyl group or aryl group having 3 to 30 carbon atoms, and R 'represents a hydrogen atom, a substituted or unsubstituted alkyl group or alkenyl group having 1 to 10 carbon atoms. Represents a group or an aryl group. n represents the number of 2-6. M represents a hydrogen atom, an inorganic or organic cation. Specific examples of the compound of the anionic surfactant used in the present invention are shown below.

[0038]

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The amount of the slip agent to be applied is 0.01 to 1.0 by weight, preferably 0.0
5 to 0.5. It is particularly preferably 0.01 to 0.1 g / m ² . Further, when the anionic surfactant of the general formula [I] is used, the amount is preferably 0.001 to 0.5 g / m ² , particularly 0.1 g / m ² .
It is preferably from 0.01 to 0.2 g / m ² . The coefficient of dynamic friction (μ _k ) is 0.35 or less, preferably 0.35 to 0.1
0.

Next, in the present invention, it is preferable to use a polyhydroxybenzene compound used for the purpose of improving pressure resistance without impairing sensitivity and improving storage stability. The polyhydroxybenzene compound is preferably a compound having any of the following structures.

[0041]

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X and Y are each -H, -OH, a halogen atom, -OM (M is an alkali metal ion), -alkyl group, phenyl group, amino group, carbonyl group, sulfone group, sulfonated phenyl group, sulfonated group. Alkyl group, sulfonated amino group, sulfonated carbonyl group, carboxyphenyl group, carboxyalkyl group, carboxyamino group, hydroxyphenyl group, hydroxyalkyl group,
An alkyl ether group, an alkylphenyl group, an alkylthioether group, or a phenylthioether group. More preferably, -H, -OH, -Cl, -Br, -C
_{OOH, -CH 2 CH 2 COOH,} -CH 3, -CH 2
_{CH 3, -CH (CH 3)} 2, -C (CH 3) 3, -OCH
_{3, -CHO, -SO 3 Na,} -SO 3 H, -SCH 3

[0043]

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And so on. X and Y may be the same or different. Preferred examples of the compounds are as follows.

[0045]

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[0046]

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[0047]

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The polyhydroxybenzene compound may be added to the emulsion layer in the light-sensitive material or may be added to a layer other than the emulsion layer. The addition amount is effective in the range of 10 ^-5 to 1 mol per 1 mol of silver, and particularly effective in the range of 10 ^-3 to 10 ^-1 mol.

In the present invention, the protective layer is preferably composed of two or more layers. When the silver halide photosensitive material is stored under low humidity conditions, it has a disadvantage that the hydrophilic colloid layer film becomes brittle. For the purpose of improving this, it is preferable that a polymer latex having a glass transition point (hereinafter referred to as Tg) of 20 ° C. or lower is contained in the emulsion layer and / or the protective layer. Especially when there are two or more protective layers, inclusion in the intermediate layer between the emulsion layer and the outermost layer is brittle without impairing the film strength in the developing solution and the adhesion between the photosensitive materials under high humidity conditions. It is preferable in that it improves. Further, it is preferred that colloidal silica be contained in the outermost layer together with another slipping agent, since the sliding property is improved, and at the same time, the strength of the dried film is improved and the scratch resistance is further improved. The amount of the colloidal silica to be added to the outermost layer is 0.01 to 1.0, preferably 0.1 to 0.5 in weight ratio to the binder amount of the outermost layer.

As the polymer latex to be contained in the protective layer of the present invention, for example, US Pat. No. 2,772,1
Nos. 66, 3,325,286 and 3,411,91
No. 1, 3,311,912, 3,525,620
No., Research Disclosur
e) Hydrates of vinyl polymers such as acrylates, methacrylates and styrene, as described in Magazine No. 195 19551 (July 1980). Preferred polymer latexes having a Tg of 20 ° C. or lower include homopolymers of alkyl acrylates such as methyl acrylate, ethyl acrylate and butyl acrylate, and copolymers of alkyl acrylates with acrylic acid, N-methylol acrylamide (preferably acrylic acid). Copolymer components such as up to 30% by weight), butadiene homopolymer or copolymer of butadiene with one or more of styrene, butoxymethylacrylamide, acrylic acid, vinylidene chloride-methyl acrylate acrylic acid terpolymer And the like. The Tg of the polymer latex can be determined by a method based on differential scanning calorimetry (DSC). The preferred range of the average particle size of the polymer latex used in the present invention is 0.005 to 1 μm, particularly 0.0
2 to 0.1 μm. The addition amount of the polymer latex is preferably 5 to 200%, more preferably 10 to 100%, based on the weight of the hydrophilic colloid in the layer to be added. Next, Tg in the present invention
Are specific examples of polymer latex having a temperature of 20 ° C. or lower, but are not limited thereto.

[0051]

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[0052]

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[0053]

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The light-sensitive material of the present invention may contain a dye or the like for the purpose of preventing halation, improving safelight safety, and improving front / back discrimination. For example, U.S. Pat.
Pyrazolone oxonol dyes described in 274,782, diarylazo dyes described in U.S. Pat. No. 2,956,879, and styryls described in U.S. Pat. Nos. 3,423,207 and 3,384,487. Dyes and dutadienyl dyes; merocyanine dyes described in U.S. Pat. No. 2,527,583; and merocyanine dyes described in U.S. Pat. Nos. 3,486,897, 3,652,284, and 3,718,472. Merocyanine dyes and oxonol dyes, enaminohemioxonol dyes described in U.S. Pat. No. 3,976,661 and British Patent Nos. 584,609 and 1,1.
77,429, JP-A-48-85130, JP-A-49-85130.
No. 99620, No. 49-1144220, U.S. Pat. Nos. 2,533,472, 3,148,187, 3,177,078, 3,247,127,
No. 3,540,887 and No. 3,575,704
No. 3,653,905 can be used.

The photographic emulsion and the non-photosensitive hydrophilic colloid of the present invention may contain an inorganic or organic gelatin hardener. For example, active vinyl compounds (1, 3, 5
-Triacryloyl-hexahydro-s-triazine,
Bis (vinylsulfonyl) methyl ether, N, N'-
Methylenebis- [β- (vinylsulfonyl) propionamide], an active halogen compound (eg, 2,4-dichloro-6-hydroxy-s-triazine), a mucohalic acid (eg, mucochloric acid), an N-carbamoylpyridinium salt (eg, Haloamidinium salts (such as 1- (1-chloro-1-pyridinomethylene) pyrrolidinium and 2-naphthalene sulfonate) can be used alone or in combination (such as (1-morpholy, carbonyl-3-pyridinio) methanesulfonate). . In particular,
3-41220, 53-57257, 59-162
Preferred are the active vinyl compounds described in 546 and 60-80846 and the active halides described in U.S. Pat. No. 3,325,287.

In the photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention, a coating aid, an antistatic agent, an emulsified dispersion,
Various surfactants may be included for various purposes such as preventing adhesion and improving photographic properties (eg, accelerating development, increasing contrast, and sensitizing). For example, saponins (steroids), alkylene oxide derivatives (for example, polyethylene glycol, polyethylene glycol / polypropylene glycol condensate, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, poly) Non-ionics such as alkylene glycol alkylamines or amides, polyethylene oxide adducts of silicone, glycidol derivatives (eg, alkenyl succinic acid polyglyceride, alkylphenol polyglyceride), fatty acid esters of polyhydric alcohols, alkyl esters of sugars, etc. Surfactants: alkyl carboxylate, alkyl sulfonate, alkylbenzenes Sulfonate, alkylnaphthalene sulfonate, alkyl sulfates,
Carboxy groups, sulfo groups, such as alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfoalkylpolyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, and the like; Anionic surfactant containing an acidic group such as a phospho group, a sulfate group or a phosphate group; an amphoteric interface such as an amino acid, an aminoalkyl sulfonic acid, an aminoalkyl sulfate or a phosphate, an alkyl betaine, and an amine oxide; Activators; Cationic surfactants such as alkylamine salts, aliphatic or aromatic quaternary ammonium salts, heterocyclic quaternary ammonium salts such as pyridinium and imidazolium, and phosphonium or sulfonium salts containing aliphatic or heterocyclic rings Using It can be. The photographic light-sensitive material of the present invention may contain a matting agent such as silica, magnesium oxide, or polymethyl methacrylate for the purpose of preventing adhesion to the photographic emulsion layer and other hydrophilic colloid layers.

The light-sensitive material of the present invention may contain a dispersion of a water-soluble or poorly-soluble synthetic polymer for the purpose of improving dimensional stability and the like. For example, alkyl (meth) acrylate, alkoxyalkyl (meth) acrylate,
Glycidyl (meth) acrylate, (meth) acrylamide, vinyl ester (for example, vinyl acetate), acrylonitrile, olefin, styrene and the like alone or in combination, or acrylic acid, methacrylic acid, α, β-unsaturated dicarboxylic acid A polymer having a combination of hydroxyalkyl (meth) acrylate, sulfoalkyl (meth) acrylate, styrenesulfonic acid, or the like as a monomer component can be used. As a support of the light-sensitive material of the present invention, cellulose triacetate,
Cellulose diacetate, nitrocellulose, polystyrene, polyethylene terephthalate and the like can be used, but a polyethylene terephthalate film is most preferred. These supports may be corona-treated by a known method, or may be subbed by a known method as necessary. In addition, a waterproof layer containing a polyvinylidene chloride-based polymer may be provided in order to increase the so-called dimensional stability, in which the dimensions change with changes in temperature and humidity.

The developing agent used in the developer for use in the present invention is not particularly limited, but preferably contains dihydroxybenzenes in that good halftone dot quality can be easily obtained, and hydroquinone is preferably used as the dihydroxybenzene developing agent. ,
Chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3
-Dichlorohydroquinone, 2,5-dichlorohydroquinone, 2,3-dibromohydroquinone, 2,5-dimethylhydroquinone, etc., and hydroquinone is particularly preferred. As the sulfite preservative used in the present invention, sodium sulfite, potassium sulfite, lithium sulfite,
Examples include ammonium sulfite, sodium bisulfite, potassium metabisulfite, and sodium formaldehyde bisulfite. The sulfite is preferably at least 0.25 mol / l, particularly preferably at least 0.4 mol / l. The upper limit is 2.
It is preferably up to 5 mol / l, especially up to 1.2. Alkali agents used for setting the pH include pH adjusters and buffers such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate.

Additives other than the above-mentioned components include compounds such as boric acid and borax, and development inhibitors such as sodium bromide, potassium bromide and potassium iodide: ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide Organic solvents such as methylcellosolve, hexylene glycol, ethanol and methanol: 1-phenyl-5-mercaptotetrazole, 2-
Antifoggants such as mercapto-based compounds such as mercaptobenzimidazole-5-sulfonic acid sodium salt, indazole-based compounds such as 5-nitroindazole, and benztriazole-based compounds such as 5-methylbenztriazole, or black pepper (black pepper) prevention And a color tone agent, a surfactant, an antifoaming agent, a water softener, a hardening agent, JP-A-56-106244, JP-A-61-267,759, and Japanese Patent Application No. It may contain an amino compound described in JP-A-1-29418. In the developer used in the present invention, a silver stain inhibitor is disclosed in JP-A-56-24.
No. 347, a compound described in JP-A-62-212651, and a compound described in JP-A-61-267,759 as a dissolution aid can be used. In the developer used in the present invention, boric acid as described in Japanese Patent Application No. 61-28708, saccharides (for example, saccharose), oximes (for example, acetoxime), and phenol described in Japanese Patent Application No. 60-93433 may be used as buffering agents. (For example, 5-sulfosalicylic acid) and the like. The developer used in the present invention is described in JP-A-61-731.
It is preferable to store in a packaging material having low oxygen permeability described in No. 47. As the developer used in the present invention, a replenishing system described in JP-A-62-91939 can be preferably used.

The processing method of the present invention can be carried out in the presence of a polyalkylene oxide, but in order to contain the polyalkylene oxide in the developing solution, the average molecular weight is 1000.
0.1 to 10 g of ~ 6000 polyethylene glycol
Per liter. The fixing solution may contain a water-soluble aluminum compound as a hardening agent in addition to the fixing agent. If necessary, an acidic aqueous solution containing acetic acid and a dibasic acid (for example, tartaric acid, citric acid or a salt thereof), Preferably, it has a pH of 3.8 or more, more preferably 4.0 to 6.5. Examples of the fixing agent include sodium thiosulfate and ammonium thiosulfate, and ammonium thiosulfate is particularly preferable from the viewpoint of fixing speed. The amount of the fixing agent used can be appropriately changed. Generally about 0.1
~ 5 mol / l. The water-soluble aluminum salt which mainly acts as a hardening agent in the fixing solution is a compound generally known as a hardening agent for an acidic hardening fixing solution, and examples thereof include aluminum chloride, aluminum sulfate and potassium alum. As the above-mentioned dibasic acid, tartaric acid or a derivative thereof, citric acid or a derivative thereof can be used alone or in combination of two or more. It is effective that these compounds contain 0.005 mol or more per liter of the fixing solution, and particularly 0.01 to 0.03 mol / l is particularly effective. Specifically, there are tartaric acid, potassium tartrate, sodium tartrate, potassium sodium tartrate, ammonium tartrate, potassium ammonium tartrate, and the like. Examples of citric acid or a derivative thereof effective in the present invention include citric acid, sodium citrate, potassium citrate, and the like.

It is preferable that a mesoionic compound represented by the following general formula (II) is used in combination with the fixing solution used in the present invention. General formula (II)

[0062]

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[0063] formula, Z is a carbon atom, a nitrogen atom, an oxygen atom, a 5 or 6-membered ring composed of a sulfur atom or a selenium atom, X ^- is ^-O -, -S ^-, or -N, ^-
R (where X represents an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group). Among them, the compound represented by the following general formula (III) is more preferable. General formula (III)

[0064]

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In the formula, R ₁ and R ₂ represent an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group or a heterocyclic group. However, R ₂ may be a hydrogen atom. Y is -O-, -S-, -N
(R ₃ ) —, wherein R ₃ represents an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an amino group, an acylamino group, a sulfonamide group, a ureido group or a sulfamoylamino group. Express. R ₁ and R ₂ , or R ₂ and R ₃ may be bonded to each other to form a ring.

The compound represented by formula (III) will be described in detail. In the formula, R ₁ and R ₂ represent a substituted or unsubstituted alkyl group (for example, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group , Dimethylaminoethylthioethyl group, diethylaminoethyl group, aminoethyl group, methylthiomethyl group,
Trimethylammonioethyl group, carboxymethyl group,
A carboxyethyl group, a carboxypropyl group, a sulfoethyl group, a sulfomethyl group, a phosphonomethyl group, a phosphonoethyl group, etc., a substituted or unsubstituted cycloalkyl group (for example, cyclohexyl group, cyclopentyl group, 2-
A methylcyclohexyl group, etc.), a substituted or unsubstituted alkenyl group (eg, an allyl group, a 2-methylallyl group,
Substituted or unsubstituted alkynyl group (for example, propargyl group, etc.) substituted or unsubstituted aralkyl group (for example, benzyl group, phenethyl group, 4-methoxybenzyl group, etc.), aryl group (for example, phenyl group, naphthyl group) A 4-methylphenyl group, a 4-methoxyphenyl group,
4-carboxyphenyl group, 4-sulfophenyl group,
Etc.) or substituted or unsubstituted heterocyclic groups (for example,
2-pyridyl group, 3-pyridyl group, 4-pyridyl group, 2
-Thienyl group, 1-pyrazolyl group, 1-imidazolyl group, 2-tetrahydrofuryl group, etc.).

However, R ₂ may be a hydrogen atom.
R ₃ is a substituted or unsubstituted alkyl group (for example, methyl group, ethyl group, n-propyl group, t-butyl group, methoxyethyl group, methylthioethyl group, dimethylaminoethyl group, morpholinoethyl group, dimethylaminoethylthioethyl Group, diethylaminoethyl group, aminoethyl group,
Methylthiomethyl group, trimethylammonioethyl group,
Carboxymethyl group, carboxyethyl group, carboxypropyl group, sulfoethyl group, sulfomethyl group, phosphonomethyl group, phosphonoethyl group, etc., substituted or unsubstituted cycloalkyl group (for example, cyclohexyl group, cyclopentyl group, 2-methylcyclohexyl group, etc.) ),
A substituted or unsubstituted alkenyl group (for example, an allyl group,
Substituted or unsubstituted alkynyl group (eg, propargyl group, etc.) substituted or unsubstituted aralkyl group (eg, benzyl group, phenethyl group, 4-methoxybenzyl group, etc.), aryl group (eg, 2-methylallyl group, etc.) Phenyl group, naphthyl group, 4-methylphenyl group, 4
-Methoxyphenyl group, 4-carboxyphenyl group, 4
-Sulfophenyl group, etc.) or a substituted or unsubstituted heterocyclic group (eg, 2-pyridyl group, 3-pyridyl group, 4-pyridyl group, 2-thienyl group, 1-pyrazolyl group, 1-imidazolyl group, 2 A tetrahydrofuryl group,
etc),

A substituted or unsubstituted amino group (for example, an unsubstituted amino group, a dimethylamino group, a methylamino group,
Etc.), acylamino group (for example, acetylamino group, benzoylamino group, methoxypropionylamino group,
), Sulfonamide group (for example, methanesulfonamide group, benzenesulfonamide group, 4-toluenesulfonamide group, etc.), ureido group (for example, unsubstituted ureido group, 3-methylureido group, etc.), sulfamoyl It may be an amino group (for example, an unsubstituted sulfamoylamino group, a 3-methylsulfamoylamino group, etc.). In formula (II), preferably Y is -N (R ₃₎ - a represents R
₁ , R ₃ represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group. R ₂ is preferably a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group. Hereinafter, specific examples of the compound of the present invention are shown, but the present invention is not limited thereto.

[0069]

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The compound of the present invention is used in a fixing solution or a replenisher for a fixing solution in the range of 1 × 10 ⁻⁵ mol / l to 10 mol / l, particularly 1 × 10 ⁻³ mol / l to 3 mol / l. Preferably. Here, when the silver halide emulsion in the light-sensitive material to be processed has a halogen composition of silver iodobromide, it is preferably used in an amount of 0.5 to 2 mol / l. Silver chloride emulsion (silver chloride 8
Silver halide containing 0 mol% or more)
It is preferable to use in the range of 0.05 to 1 mol / liter. The fixing solution may further contain a preservative (eg, sulfite, bisulfite), a pH buffer (eg, acetic acid, boric acid), a pH adjuster (eg, ammonia, sulfuric acid), an image preserving agent (eg, Potassium iodide) and a chelating agent. Here, a pH buffer is used because the pH of the developer is high.
To 40 g / liter, more preferably about 18 to 25 g / liter.

The washing water may contain a fungicide (for example, Horiguchi's “Bacterial and Chemical Protection Chemistry”, JP-A-62-115154).
(Compounds described in (1)), washing accelerators (sulfites and the like), chelating agents and the like. According to the above method, the developed and fixed photographic material is washed with water and dried.
The washing with water is performed in order to almost completely remove the silver salt dissolved by the fixing, and it is preferable that the temperature is about 20 ° C. to about 50 ° C. for 10 seconds to 3 minutes. The roller transport type automatic developing machine is described in U.S. Pat. Nos. 3,025,779 and 3,545,971 and the like, and is simply referred to as a roller transport type processor in the present invention. The roller transport type processor has four steps of development, fixing, washing and drying, and the method of the present invention does not exclude other steps (for example, a stop step), but most preferably follows these four steps. . The replenishing amount of the washing water may be 1200 ml / m ² or less (including 0). Washing water (or stabilizing solution)
The case where the replenishment amount is 0 means a water washing method by a so-called pooled water washing method. As a method for reducing the amount of replenishment, a multi-stage countercurrent method (for example, two-stage, three-stage, etc.) has been known for a long time.

The problem that occurs when the replenishing amount of the washing water is small can be combined with the following techniques to obtain good processing performance. R. bath or stable bath, R.
T. Kreiman, J. Image, Tech. Vol. 10 No. 624
2 (1984),
Research Disclosure (RD) Volume 205, N
o. 20526 (May 1981), isothiazoline compounds, Vol. 228, No. 22845
(April 1983), isothiazoline-based compounds described in JP-A-61-115,154 and JP-A-62-162.
No. 209,532 can be used in combination as a microbiocide. In addition, "The chemistry of antibacterial and fungicide" by Hiroshi Horiguchi, Sankyo Publishing (Showa 5)
7) "Bactericidal and Fungicide Handbook", Japan Society of Bacterial and Fungicide Hakuhodo (Showa 61), LE West "Water Quallity C"
riteria "Photo Sci & Eng. Vol.9 No.6 (196
5), MW Beach "Microbiological Growths in Moti
on Picture Processing "SMPTE Journal Vol. 85 (1
976), RO Deegan "Photo Processing Wash Wate
r Biocides "J. Imaging Tech. Vol. 10 No. 6 (19
84).

In the method of the present invention, when rinsing with a small amount of rinsing water is described in JP-A-63-18,350 and JP-A-62-2.
It is more preferable to provide a squeeze roller and a crossover rack cleaning tank described in No. 87,252. Further, a part or all of the overflow liquid from the washing or stabilizing bath produced by replenishing the water subjected to the antifungal means to the washing or stabilizing bath according to the present invention is disclosed in
As described in JP-A-235-133 and JP-A-63-129343, the present invention can also be applied to a processing solution having a fixing ability, which is a preceding processing step. Further, a water-soluble surfactant and / or an antifoaming agent are used to prevent unevenness of water bubbles easily generated when washing with a small amount of washing water and / or to prevent a treatment agent component attached to a squeeze roller from being transferred to a treated film. It may be added. Further, a dye adsorbent described in JP-A-63-163456 may be provided in the washing tank to prevent contamination by the dye eluted from the light-sensitive material. The light-sensitive material of the present invention exhibits excellent performance in rapid development processing by an automatic processor in which the total processing time is 15 seconds to 60 seconds. In the rapid development processing of the present invention, the temperature and time for development and fixing are about 25 ° C.
25 seconds or less at ~ 50 ° C, preferably 30 ° C
4 to 15 seconds at ４40 ° C. The total processing time in the present invention means that after inserting the leading end of the film into the insertion opening of the automatic developing machine, the developer passes through a developing tank, a transfer section, a fixing tank, a transfer section, a washing tank, a transfer section, and a drying section. This is the total time for the tip of the to come out of the drying outlet.

The method of drying a silver halide photographic light-sensitive material in the present invention after it is developed by an automatic processing apparatus is referred to as a method of drying the light-sensitive material immediately after squeezing it after washing with water in the drying section. 65 of water you have
% Of the photosensitive material after drying is set to the condition indicated by the hatched portion in FIG. 1 based on the conditions of the ambient temperature and humidity at the place where the automatic developing apparatus is installed. . In particular, under conditions where the atmospheric humidity is relatively high, the photosensitive material may not dry. In that case, the drying section of the automatic developing apparatus must be lengthened. This is disadvantageous in terms of space saving. Therefore, the drying processing section of the automatic development processing apparatus is divided into two zones of a front part and a rear part, and the temperatures of the respective drying processing zones are independently set based on the conditions of the atmosphere temperature and humidity when installed. In the front part, 30 to 65%, preferably 40% of the water content of the photosensitive material immediately after squeezing the photosensitive material after the washing process.
This problem can be solved by drying about 65% and setting the drying air temperature at the rear of the drying processing section to the condition indicated by the shaded area in FIG. In the present invention, the development processing means development, fixing, and washing with water. Squeezing refers to removing water from the surface of the photosensitive material by a method such as a rubber roller, a resin roller, or the like, or an air squeeze that blows air after washing with water.

Next, FIG. 1 will be described. FIG. 1 shows a region in which the drying temperature condition excellent in dimensional stability is obtained when the temperature is set in a hatched region surrounded by the boundary lines a and b. Here, the boundary line a represents the atmospheric humidity as R (% RH).
And the drying air temperature is D (° C.), D = ２ * R
+ (Ambient temperature) +5. Boundary line b is 0 ≦ R ≦
At 60, D = Ｄ * R + (atmospheric temperature) −35
D = − ／ * R at 60 ≦ R ≦ 100
+ (Atmospheric temperature) +45. However, D must be higher than the dew point in the range of 60 ≦ R ≦ 100. As a specific method of achieving these, for example, there is a method of dividing the drying section of the automatic developing machine into two zones of the first half and the second half, and controlling the temperatures of the two zones separately. The drying air temperature in the first half zone is set higher than the room temperature so that the photosensitive material dries quickly, and the second half zone is set to the temperature condition indicated by the hatched area in FIG. By doing so, the drying of the photosensitive material does not become insufficient, and the dimensional stability is also improved.

In the present invention, 65% of the water content of the photosensitive material immediately after squeezing the photosensitive material after the water washing process
The following can be dried by radiant heat or high frequency heating. For example, drying methods by far-infrared irradiation, microwave irradiation, and high-frequency heating described in JP-A-1-260445, JP-A-1-260449, and JP-A-1-241004 are preferably used. Further, these means may be combined with means using hot air. Further, Japanese Patent Application Laid-Open No. 1-24
As described in Japanese Patent No. 1005, means for selecting a drying control pattern according to the type of photosensitive material and controlling a drying unit may be included. Next, the present invention will be further described with reference to examples, but the present invention is not limited thereto.

[0077]

【Example】

Example 1 [1] Preparation of emulsion Liquid I Water 1000 ml Gelatin 20 g Sodium chloride 20 g 1,3-Dimethylimidazolidin-2-thione 20 mg Sodium benzenethiosulfonate 8 mg Liquid II 400 ml Silver nitrate 100 g III Liquid water 400 ml Sodium chloride 27. 1 g Potassium bromide 21.0 g Potassium hexachloroiridate (III) 15 ml (0.001% aqueous solution) Ammonium hexabromorhodate (III) 1.5 ml (0.001% aqueous solution) Maintain at 38 ° C., pH = 4.5 Solution II and Solution III were added simultaneously to the solution I with stirring over 10 minutes.
m of core particles were formed. Subsequently, the following solutions IV and V were added over 10 minutes. 0.15g of potassium iodide
Was added to terminate the particle formation. IV liquid water 400 ml Silver nitrate 100 g V liquid water 400 ml sodium chloride 27.1 g potassium bromide 21.0 g potassium hexacyanoiron (II) potassium (0.1% aqueous solution) 5 ml (1 × 10 ⁻⁵ mol / mol Ag)

Thereafter, according to a conventional method, water was washed by flocculation, and gelatin was added. Next, the pH was adjusted to 5.1 and the pAg was adjusted to 7.5, and sensitizing dye was added in an amount of 200 mg per mol of silver to perform ortho sensitization. Then, sodium thiosulfate 8 mg and chloroauric acid 1
2 mg, and chemically sensitized at 65 ° C. so as to obtain an optimum sensitivity. As a stabilizer, 6-methyl-4-hydroxy-1,3,3a, 7-tetraazaindene 200 m
g, phenoxyethanol as a preservative. Finally, an emulsion A containing silver iodochlorobromide cubic grains (coefficient of variation: 9%) containing 70 mol% of silver chloride and having an average grain size of 0.2 μm was obtained.

[0079]

Embedded image

[2] Preparation of coated sample Emulsion A thus prepared was used as an antifoggant
Hydroquinone, 1-phenyl-5-methylcapto
2.5 g, 5 g of tetrazole per mole of Ag
0mg, polyethyl acrylate latek as plasticizer
(Average particle size: 0.05 μm) with gelatin
%, 2-bis (vinylsulfonylacetate) as a hardener
Toacid) ethane 70mg / m²And colloid
Dal silica (average particle size 15mμ)
% By weight of a polyethylene terephthalate support (1
00 μm) and 3.0 g / m of silver², Gelatin Table 1
It was applied so that On this, a lower layer of a protective layer having the following composition
And the upper layer of the protective layer were simultaneously coated. Lower protective layer> Gelatin 4 mg / m Sodium benzenethiosulfonate shown in Table 1_z  1,5-dihydroxy-2-benzaldoxime 25 {polyethyl acrylate latex (average particle size 0.05 μm) 130} upper protective layer> gelatin 0.25 g / m²  SiO₂Fine particles (average particle size 4 μm) 50 mg / m²  Compound (gelatin dispersion) 30 Colloidal silica (average particle size 15 μm) 30 Compound 5 sodium sodium todecylbenzenesulfonate 25

[0081]

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On the opposite side of the support, a back layer and a back protective layer having the following compositions were applied. <Back layer> Gelatin 2.0 g / m ² Sodium dodecylbenzenesulfonate 80 mg / m ² Compound 70 化合物 Compound 85 化合物 Compound 90 １ ， 1,3-bis (vinylsulfonyl) -propanol-2 110 〃 <Back protective layer> Gelatin 0.7 g / m ² polymethyl methacrylate (average particle size: 3.6 μm) 50 mg / m ² sodium dodecylbenzenesulfonate 20 Compound (gelatin dispersion) 100 Compound 2

[0083]

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The samples thus obtained were evaluated for the following items. Table 2 shows the results. 1) Suitability for rapid processing The obtained sample was exposed to xenon flash light having an emission time of 10 ^-6 seconds through an interference filter having a peak at 488 nm and a continuous density wedge, and an automatic developing machine FG manufactured by Fuji Photo Film Co., Ltd. Using -710NH, processing was performed under the following development processing conditions (A) and (B), the relative sensitivity of the exposure amount giving a density of 3.0 was determined, and the sensitivity difference between (A) and (B) (△ The log E) was used to evaluate the suitability for rapid processing. In addition,
Processing solutions having the following compositions were used as the developing solution and the fixing solution. Development processing conditions (A) (B) Current image 38 ° C 14.0 seconds 20.0 seconds Fix 37 ° C 9.7 ° 13.9 ° Rinse 26 ° C 9.0 ° 12.9 ° Squeeze 2.4 ° 3.4〃 Drying 55 ℃ 8.3〃 11.8〃 Total 43.4〃 62.0〃 Line speed 2800mm / min 1960mm / min

Developer Potassium hydroxide 10 g / l 1-Hydroxyethylidene-1,1-diphosphonic acid 2.6 {potassium bromide 3.3} 5-methylbenzotriazole 0.08} 2-mercaptobenzimidazole-5 Sulfonic acid 0.3 {Sodium potassium sulfite 83} Hydroquinone 35 {4-Hydroxymethyl-4-methyl-1-phenyl 1.3} -3-Pyrazolidone diethylene glycol 30} Adjust the pH to 10.7 with sodium hydroxide. Fixing solution Ammonium thiosulfate 150 g / liter 1,4,5-trimethyl-1,2,4-triazo 0.25 mol / liter lithium-3-thiolate sodium bisulfite 30 g / liter disodium ethylenediaminetetraacetate 0.025 g / liter Adjust the pH to 6.0 with dihydrate sodium hydroxide. 2) Evaluation of Fixing Loss Using the developing solution and the fixing solution, the replenishing amount of the developing solution and the fixing solution was 180 ml / day at a size of 50 sheets per day (developing blackening rate of one film of 40%). Using a running fixing solution that had been subjected to m ² running treatment for 6 days, the time required for clearing at 32 ° C. was determined.

3) Dimensional stability The drying section of the FG-710NH automatic developing machine was divided into two zones, a front part and a rear part, and the two parts were modified so that the temperature conditions could be set individually. Using. Here, the front portion of the drying section is referred to as a first drying zone, and the rear portion thereof is referred to as a second drying zone. Table 1 shows the temperature of the drying section.
The conditions were as shown in the following. The amount of water (%) dried in the first drying zone is defined as a weight of the photosensitive material immediately after squeezing with a rubber roller after passing through liquid processing of development, fixing and washing.
(A unit g), the weight of the photosensitive material immediately after passing through the first drying zone is b (unit g), and the weight of the photosensitive material after processing is sufficiently adjusted to the ambient temperature and humidity is c (a
−b) / (ac) × 100. The dry air volume is 25 ° C3 for environmental conditions in both the first and second zones.
At 0% RH, 40 liters / s, 25 ° C 60%
At RH, it is 80 l / s. The dimensional change due to the processing conditions was measured by drilling two holes with a diameter of 200mm at intervals of 200mm on the sample before exposure and exposing the whole surface with a pin gauge of 1 / 1000mm accuracy. did. The dimension at this time is defined as X (unit: mm). Then, after developing, fixing, washing and drying with an automatic developing machine, the dimension after 5 minutes is defined as Y (unit: mm). The dimensional change rate (%) due to the treatment was evaluated by the value of (YX) / 200 × 100.
Here, the elongation of 20 μm or more and 20 μm
When the following shrinkage occurs, a dimensional deviation generally referred to in the art occurs. Therefore, the dimensional change rate due to processing -0.0
1% or more and 0.01 or less were judged to be good. The dimensional change was measured under the environmental conditions and drying conditions shown in Table 2.

[0087]

[Table 1]

[0088]

[Table 2]

As is clear from Tables 1 and 2, according to the sample and the drying method of the present invention, it has rapid processing suitability and excellent dimensional stability.

[Brief description of the drawings]

FIG. 1 shows a drying temperature condition of a drying processing section in an automatic developing apparatus having good dimensional stability with respect to atmospheric humidity. The horizontal axis represents the atmospheric humidity (% RH), and the vertical axis represents the drying air temperature (° C.). A hatched portion surrounded by the boundary line a, the boundary line b, and the dew point is a region having good dimensional stability.

Claims (5)

(57) [Claims] 1. A light-sensitive silver halide photographic material having at least one silver halide emulsion layer on a support and at least one protective layer on the emulsion layer is developed using an automatic processor after exposure. In the processing method, the protective layer has a gelatin coating amount of 0.5 g / m ² or less, the total gelatin coating amount including the emulsion layer is 2.5 g / m ² or less, and In a drying processing section of an automatic processing apparatus for developing a silver photographic light-sensitive material, the water content of the light-sensitive material immediately after squeezing the light-sensitive material after a water-washing process is obtained.
% Is set based on the conditions of the ambient temperature and humidity at the installation location of the automatic development processing apparatus, and the drying air temperature of the drying section is set to the condition shown by the hatched portion in FIG. 1 and higher than the ambient temperature. And developing the silver halide photographic material. 2. The method according to claim 1, wherein at least one of the emulsion layers contains colloidal silica, and the outermost layer of the protective layer has a dynamic friction coefficient of 0.35 or less. A method for developing a silver halide photographic material. 3. The drying section of the automatic developing apparatus is divided into two zones, a front section and a rear section, and the temperatures of the respective drying processing zones are independently set based on the conditions of the ambient temperature and humidity in the installation place. At the front of the drying section, 30 to 65% of the water content of the photosensitive material immediately after squeezing the photosensitive material after the water washing process is dried, and the temperature of the drying air at the rear of the drying section is shown in FIG. 2. The method for developing a silver halide photographic light-sensitive material according to claim 1, wherein the conditions are set as indicated by a shaded portion. 4. The silver halide photographic light-sensitive material according to claim 1, wherein the total processing time is 15 to 60 seconds, and the run speed of the automatic development processor is 1500 mm / min or more. Material development processing method. 5. After the silver halide photosensitive material is exposed, at least development, fixing, washing with water,
A method for processing silver halide photographic material as in claim 1, wherein the fourth term, wherein the replenishing amount of developer and / or fixer is not more than the silver halide photographic light-sensitive material 1 m ² per 200ml Development processing method.