JPH0556463B2 - - Google Patents
Info
- Publication number
- JPH0556463B2 JPH0556463B2 JP60024379A JP2437985A JPH0556463B2 JP H0556463 B2 JPH0556463 B2 JP H0556463B2 JP 60024379 A JP60024379 A JP 60024379A JP 2437985 A JP2437985 A JP 2437985A JP H0556463 B2 JPH0556463 B2 JP H0556463B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen oxide
- oxide sensor
- nox
- agi
- nitrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 71
- 239000007784 solid electrolyte Substances 0.000 claims description 10
- 229910002651 NO3 Inorganic materials 0.000 claims description 9
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 229910002089 NOx Inorganic materials 0.000 description 14
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229910000873 Beta-alumina solid electrolyte Inorganic materials 0.000 description 3
- 239000002228 NASICON Substances 0.000 description 3
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000010416 ion conductor Substances 0.000 description 2
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910003249 Na3Zr2Si2PO12 Inorganic materials 0.000 description 1
- 229910006854 SnOx Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical class [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Measuring Oxygen Concentration In Cells (AREA)
- Conductive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60024379A JPS61184450A (ja) | 1985-02-13 | 1985-02-13 | 窒素酸化物センサ− |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60024379A JPS61184450A (ja) | 1985-02-13 | 1985-02-13 | 窒素酸化物センサ− |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61184450A JPS61184450A (ja) | 1986-08-18 |
| JPH0556463B2 true JPH0556463B2 (de) | 1993-08-19 |
Family
ID=12136550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60024379A Granted JPS61184450A (ja) | 1985-02-13 | 1985-02-13 | 窒素酸化物センサ− |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61184450A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6143165A (en) * | 1994-07-28 | 2000-11-07 | Kabushiki Kaisha Riken | Nox sensor |
| JP3524980B2 (ja) * | 1995-03-10 | 2004-05-10 | 株式会社リケン | 窒素酸化物センサ |
| US5897759A (en) * | 1996-09-11 | 1999-04-27 | Kabushiki Kaisha Riken | NOx sensor |
| GB2348006B (en) | 1999-03-19 | 2003-07-23 | Alphasense Ltd | Gas sensor |
-
1985
- 1985-02-13 JP JP60024379A patent/JPS61184450A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61184450A (ja) | 1986-08-18 |
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