JPH0555832B2 - - Google Patents

Info

Publication number
JPH0555832B2
JPH0555832B2 JP58172938A JP17293883A JPH0555832B2 JP H0555832 B2 JPH0555832 B2 JP H0555832B2 JP 58172938 A JP58172938 A JP 58172938A JP 17293883 A JP17293883 A JP 17293883A JP H0555832 B2 JPH0555832 B2 JP H0555832B2
Authority
JP
Japan
Prior art keywords
scintillator
ions
film
electrons
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58172938A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6066174A (ja
Inventor
Hifumi Tamura
Tooru Ishitani
Kaoru Umemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58172938A priority Critical patent/JPS6066174A/ja
Publication of JPS6066174A publication Critical patent/JPS6066174A/ja
Publication of JPH0555832B2 publication Critical patent/JPH0555832B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
JP58172938A 1983-09-21 1983-09-21 試料分析装置 Granted JPS6066174A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58172938A JPS6066174A (ja) 1983-09-21 1983-09-21 試料分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58172938A JPS6066174A (ja) 1983-09-21 1983-09-21 試料分析装置

Publications (2)

Publication Number Publication Date
JPS6066174A JPS6066174A (ja) 1985-04-16
JPH0555832B2 true JPH0555832B2 (cs) 1993-08-18

Family

ID=15951129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58172938A Granted JPS6066174A (ja) 1983-09-21 1983-09-21 試料分析装置

Country Status (1)

Country Link
JP (1) JPS6066174A (cs)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54123987A (en) * 1978-03-20 1979-09-26 Toshiba Corp Radiation detector
JPS58101458U (ja) * 1981-12-29 1983-07-09 株式会社島津製作所 質量分析装置

Also Published As

Publication number Publication date
JPS6066174A (ja) 1985-04-16

Similar Documents

Publication Publication Date Title
KR940009764B1 (ko) 기체환경에서 사용되는 전자 검출기를 가진 환경 주사형 전자 현미경
US4211924A (en) Transmission-type scanning charged-particle beam microscope
US4810882A (en) Mass spectrometer for positive and negative ions
US5945672A (en) Gaseous backscattered electron detector for an environmental scanning electron microscope
US3889115A (en) Ion microanalyzer
Neděla et al. The simulation of energy distribution of electrons detected by segmental ionization detector in high pressure conditions of ESEM
Trimeche et al. Ion and electron ghost imaging
US4841143A (en) Charged particle beam apparatus
CZ284288B6 (cs) Detekční systém rastrovacího elektronového mikroskopu
US4107527A (en) Ion-emission microanalyzer microscope
US3946268A (en) Field emission gun improvement
Danilatos Design and construction of an environmental SEM (part 4)
US7470915B2 (en) Detector system of secondary and backscattered electrons for a scanning electron microscope
JPH0555832B2 (cs)
CN113840441B (zh) 基于离子束高次电离原理的x射线光束位置信息探测器
Gersch et al. Postionization of sputtered neutrals by a focused electron beam
US6833546B2 (en) Scanning electron microscope
JP4146103B2 (ja) 電界放射型電子銃を備えた電子ビーム装置
JP3965691B2 (ja) 走査電子顕微鏡
JP3514783B2 (ja) イオン検出器及びそれを用いたｓｉｍ像検出方法
JPH076609Y2 (ja) 集束イオンビーム加工装置
JPH03295141A (ja) 検出器
JPS58158848A (ja) 電子検出器
JPS60185351A (ja) 荷電粒子ビ−ム制御法
JPH04233149A (ja) 試料面分析装置