JPH0554692B2 - - Google Patents
Info
- Publication number
- JPH0554692B2 JPH0554692B2 JP61113344A JP11334486A JPH0554692B2 JP H0554692 B2 JPH0554692 B2 JP H0554692B2 JP 61113344 A JP61113344 A JP 61113344A JP 11334486 A JP11334486 A JP 11334486A JP H0554692 B2 JPH0554692 B2 JP H0554692B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- gas
- silicon carbide
- microcrystalline silicon
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61113344A JPS62268128A (ja) | 1986-05-15 | 1986-05-15 | 微結晶炭化珪素膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61113344A JPS62268128A (ja) | 1986-05-15 | 1986-05-15 | 微結晶炭化珪素膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62268128A JPS62268128A (ja) | 1987-11-20 |
JPH0554692B2 true JPH0554692B2 (enrdf_load_stackoverflow) | 1993-08-13 |
Family
ID=14609865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61113344A Granted JPS62268128A (ja) | 1986-05-15 | 1986-05-15 | 微結晶炭化珪素膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62268128A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2616929B2 (ja) * | 1987-08-22 | 1997-06-04 | 株式会社日本自動車部品総合研究所 | 微結晶炭化ケイ素半導体膜の製造方法 |
JP2692091B2 (ja) * | 1987-10-31 | 1997-12-17 | 株式会社日本自動車部品総合研究所 | 炭化ケイ素半導体膜およびその製造方法 |
JPH02185972A (ja) * | 1989-01-11 | 1990-07-20 | Kobe Steel Ltd | 炭化ケイ素膜の合成法 |
US5796116A (en) | 1994-07-27 | 1998-08-18 | Sharp Kabushiki Kaisha | Thin-film semiconductor device including a semiconductor film with high field-effect mobility |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5795677A (en) * | 1980-12-03 | 1982-06-14 | Kanegafuchi Chem Ind Co Ltd | Amorphous silicon type photoelectric tranducer |
JPS58194732A (ja) * | 1982-05-06 | 1983-11-12 | Konishiroku Photo Ind Co Ltd | アモルフアス炭化シリコン層の形成方法 |
JPS58190810A (ja) * | 1983-03-16 | 1983-11-07 | Yoshihiro Hamakawa | P型アモルフアスシリコンカ−バイドの製造方法 |
-
1986
- 1986-05-15 JP JP61113344A patent/JPS62268128A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62268128A (ja) | 1987-11-20 |
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