JPH0554515B2 - - Google Patents
Info
- Publication number
- JPH0554515B2 JPH0554515B2 JP60063016A JP6301685A JPH0554515B2 JP H0554515 B2 JPH0554515 B2 JP H0554515B2 JP 60063016 A JP60063016 A JP 60063016A JP 6301685 A JP6301685 A JP 6301685A JP H0554515 B2 JPH0554515 B2 JP H0554515B2
- Authority
- JP
- Japan
- Prior art keywords
- coating film
- weight
- composition
- copolymer
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 27
- 229920001577 copolymer Polymers 0.000 claims description 24
- 239000000178 monomer Substances 0.000 claims description 24
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 6
- 150000007513 acids Chemical class 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 150000008065 acid anhydrides Chemical class 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 4
- 239000011342 resin composition Substances 0.000 claims description 4
- 229920001187 thermosetting polymer Polymers 0.000 claims description 4
- 238000000576 coating method Methods 0.000 description 50
- 239000011248 coating agent Substances 0.000 description 46
- 239000000203 mixture Substances 0.000 description 26
- -1 Grieux Polymers 0.000 description 19
- 239000011521 glass Substances 0.000 description 18
- 239000000758 substrate Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 13
- 239000011241 protective layer Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000004793 Polystyrene Substances 0.000 description 9
- 239000000975 dye Substances 0.000 description 9
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 9
- 229920002223 polystyrene Polymers 0.000 description 9
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- ZYEFVRIXYZSXRA-UHFFFAOYSA-N 4-benzoylbenzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=CC=C1 ZYEFVRIXYZSXRA-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000004043 dyeing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- RDCTZTAAYLXPDJ-UHFFFAOYSA-N 2-trimethoxysilylethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCOC(=O)C(C)=C RDCTZTAAYLXPDJ-UHFFFAOYSA-N 0.000 description 2
- BUJVPKZRXOTBGA-UHFFFAOYSA-N 2-trimethoxysilylethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCOC(=O)C=C BUJVPKZRXOTBGA-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- NMJJFJNHVMGPGM-UHFFFAOYSA-N butyl formate Chemical compound CCCCOC=O NMJJFJNHVMGPGM-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000010556 emulsion polymerization method Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical group C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- PTBAHIRKWPUZAM-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1CO1 PTBAHIRKWPUZAM-UHFFFAOYSA-N 0.000 description 1
- CBKJLMZJKHOGEQ-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCC1CO1 CBKJLMZJKHOGEQ-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 1
- PCPCBNHKCMJOKP-UHFFFAOYSA-N 3-(2,3-dicarboxybenzoyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O PCPCBNHKCMJOKP-UHFFFAOYSA-N 0.000 description 1
- CYXODUIWJAVDAK-UHFFFAOYSA-N 3-(oxiran-2-yl)propyl prop-2-enoate Chemical compound C=CC(=O)OCCCC1CO1 CYXODUIWJAVDAK-UHFFFAOYSA-N 0.000 description 1
- LSBXPXSGSQYOMC-UHFFFAOYSA-N 3-benzoylbenzene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C(C(=O)C=2C=CC=CC=2)=C1C(O)=O LSBXPXSGSQYOMC-UHFFFAOYSA-N 0.000 description 1
- SZXKGVPTMAHAOK-UHFFFAOYSA-N 3-methylbenzene-1,2,4-tricarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC(C(O)=O)=C1C(O)=O SZXKGVPTMAHAOK-UHFFFAOYSA-N 0.000 description 1
- KOBXDXPRULUSCC-UHFFFAOYSA-N 3-phenylbenzene-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C=2C=CC=CC=2)=C1C(O)=O KOBXDXPRULUSCC-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 1
- QRXDISYOHRQJRY-UHFFFAOYSA-N 4-methylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound C(=O)(O)C=1C(=C(C(=C(C(=O)O)C1)C)C(=O)O)C(=O)O QRXDISYOHRQJRY-UHFFFAOYSA-N 0.000 description 1
- MMFMTASDTOCTLC-UHFFFAOYSA-N 4-methylbenzene-1,2,3-tricarboxylic acid Chemical compound CC1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O MMFMTASDTOCTLC-UHFFFAOYSA-N 0.000 description 1
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 description 1
- JSBBGWWJLQNXNQ-UHFFFAOYSA-N 4-phenylbenzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC=C1 JSBBGWWJLQNXNQ-UHFFFAOYSA-N 0.000 description 1
- ORKJFLQNNVDBKY-UHFFFAOYSA-N 4-trimethoxysilylbutyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCCOC(=O)C(C)=C ORKJFLQNNVDBKY-UHFFFAOYSA-N 0.000 description 1
- WTRITBFTBVSESZ-UHFFFAOYSA-N 4-tripropoxysilylbutyl 2-methylprop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCCOC(=O)C(C)=C WTRITBFTBVSESZ-UHFFFAOYSA-N 0.000 description 1
- SSIZVBOERWVGFR-UHFFFAOYSA-N 5-(oxiran-2-yl)pentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCC1CO1 SSIZVBOERWVGFR-UHFFFAOYSA-N 0.000 description 1
- JVDABLPLJMFQPE-UHFFFAOYSA-N 5-benzoylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(=O)C=2C=CC=CC=2)=C1C(O)=O JVDABLPLJMFQPE-UHFFFAOYSA-N 0.000 description 1
- XRSLWQUTPCXICN-UHFFFAOYSA-N 5-methylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound CC1=CC(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O XRSLWQUTPCXICN-UHFFFAOYSA-N 0.000 description 1
- QSIZDIFKUJGWDO-UHFFFAOYSA-N 5-methylbenzene-1,2,3-tricarboxylic acid Chemical compound CC1=CC(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1 QSIZDIFKUJGWDO-UHFFFAOYSA-N 0.000 description 1
- YMYIEXNGMOGPDH-UHFFFAOYSA-N 5-methylbenzene-1,2,4-tricarboxylic acid Chemical compound CC1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O YMYIEXNGMOGPDH-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- HKDYKRFXYCKBCZ-UHFFFAOYSA-N 5-phenylbenzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1 HKDYKRFXYCKBCZ-UHFFFAOYSA-N 0.000 description 1
- NWQWAGHATPZVHV-UHFFFAOYSA-N 5-phenylbenzene-1,2,4-tricarboxylic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 NWQWAGHATPZVHV-UHFFFAOYSA-N 0.000 description 1
- ACJJBVOHLQVPHJ-UHFFFAOYSA-N 6-methylbenzene-1,2,4-tricarboxylic acid Chemical compound CC1=CC(C(O)=O)=CC(C(O)=O)=C1C(O)=O ACJJBVOHLQVPHJ-UHFFFAOYSA-N 0.000 description 1
- OVVVWFBBPATVSO-UHFFFAOYSA-N 6-phenylbenzene-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C(C=2C=CC=CC=2)=C1 OVVVWFBBPATVSO-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- NHDLVKOYPQPGNT-UHFFFAOYSA-N benzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1 NHDLVKOYPQPGNT-UHFFFAOYSA-N 0.000 description 1
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- CJSBUWDGPXGFGA-UHFFFAOYSA-N dimethyl-butadiene Natural products CC(C)=CC=C CJSBUWDGPXGFGA-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical group CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N methyl acetate Chemical compound COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 1
- OZSPGTFJVPJPCG-UHFFFAOYSA-N naphthalene-1,2,3,5-tetracarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C(=O)O)=CC2=C1C(O)=O OZSPGTFJVPJPCG-UHFFFAOYSA-N 0.000 description 1
- ZWCRAIHZBIPVOD-UHFFFAOYSA-N naphthalene-1,2,3,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 ZWCRAIHZBIPVOD-UHFFFAOYSA-N 0.000 description 1
- SRPLTJXMVRECHE-UHFFFAOYSA-N naphthalene-1,2,3,7-tetracarboxylic acid Chemical compound C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C2=CC(C(=O)O)=CC=C21 SRPLTJXMVRECHE-UHFFFAOYSA-N 0.000 description 1
- KVQQRFDIKYXJTJ-UHFFFAOYSA-N naphthalene-1,2,3-tricarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C(=O)O)=CC2=C1 KVQQRFDIKYXJTJ-UHFFFAOYSA-N 0.000 description 1
- WRYWBRATLBWSSG-UHFFFAOYSA-N naphthalene-1,2,4-tricarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 WRYWBRATLBWSSG-UHFFFAOYSA-N 0.000 description 1
- QNTQVXZFUDKAEL-UHFFFAOYSA-N naphthalene-1,2,5,7-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C(C(O)=O)C2=CC(C(=O)O)=CC(C(O)=O)=C21 QNTQVXZFUDKAEL-UHFFFAOYSA-N 0.000 description 1
- HDLRSIQOZFLEPK-UHFFFAOYSA-N naphthalene-1,2,5,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C2=C(C(O)=O)C(C(=O)O)=CC=C21 HDLRSIQOZFLEPK-UHFFFAOYSA-N 0.000 description 1
- OMGMPQSKRWSUHO-UHFFFAOYSA-N naphthalene-1,2,5-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OMGMPQSKRWSUHO-UHFFFAOYSA-N 0.000 description 1
- QVFIXVODASDDMO-UHFFFAOYSA-N naphthalene-1,2,6-tricarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 QVFIXVODASDDMO-UHFFFAOYSA-N 0.000 description 1
- VLGODNIGSPQQAK-UHFFFAOYSA-N naphthalene-1,2,7-tricarboxylic acid Chemical compound C1=CC(C(O)=O)=C(C(O)=O)C2=CC(C(=O)O)=CC=C21 VLGODNIGSPQQAK-UHFFFAOYSA-N 0.000 description 1
- APFZKJNJNQOTKV-UHFFFAOYSA-N naphthalene-1,2,8-tricarboxylic acid Chemical compound C1=CC=C(C(O)=O)C2=C(C(O)=O)C(C(=O)O)=CC=C21 APFZKJNJNQOTKV-UHFFFAOYSA-N 0.000 description 1
- YSRFBCIGFNFMPS-UHFFFAOYSA-N naphthalene-1,3,5,7-tetracarboxylic acid Chemical compound C1=C(C(O)=O)C=C(C(O)=O)C2=CC(C(=O)O)=CC(C(O)=O)=C21 YSRFBCIGFNFMPS-UHFFFAOYSA-N 0.000 description 1
- DSCIZKMHZPGBNI-UHFFFAOYSA-N naphthalene-1,3,5,8-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C2=CC(C(=O)O)=CC(C(O)=O)=C21 DSCIZKMHZPGBNI-UHFFFAOYSA-N 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
〔産業上の利用分野〕
本発明は、カラーフイルター保護膜形成用熱硬
化性樹脂組成物に関する。
〔従来の技術〕
近年、カラーフイルターを備えた液晶表示素子
や固体撮像素子が種々発表されているが、これら
のカラーフイルターは、ガラス等の透明基体や固
体撮像素子上に、例えば、次のような工程を経て
形成される。すなわち、ポリビニルアルコール、
グリユー、ゼラチン等に感光性を付与し基体上に
均一に塗布し、マスク露光法で1色目のパターン
のみ光硬化させ現像し、その他の部分を除去す
る。このパターン部分に所定の分光特性を有する
染料で染色する。次いで透明な防染保護層を被覆
する。2色目のパターン部分についても同様の工
程を用い染色し、防染保護層を被覆する。3色目
のパターン部分についても同様の工程を用い染色
し、最後に表面保護層を形成する。この防染保護
層および表面保護層は、接着性、平滑性、強靭
性、耐熱性、耐光性、耐水性および耐溶剤性の他
に、透明性および染料に染色されないための耐染
性等の性能が要求される。そして、さらに、これ
らの層となる材料は、防染保護層および表面保護
層を形成させるために、溶液として塗布するが、
均一な塗膜を形成させるためにスピンコートによ
る回転塗布法を用いる場合があり、この塗布法に
も適することが要求される。
また、カラーフイルターの製造における保護層
形成材料として、特に、環化ゴムと増感剤を組合
わせたものやポリメタクリル酸メチルが提案され
ている(特開昭59−49507号公報)。しかし、これ
らの材料で保護層を形成しても、保護層に求めら
れる前記の諸性能がバランスよく備わつた保護層
を得ることはできず、特に、環化ゴムと増感剤か
らなる材料は、透明性、耐熱性等が劣り、またポ
リメタクリル酸メチルは染色基質層との溶着性お
よび耐熱性が劣るため、満足できるカラーフイル
ターを得ることができないという問題点を有して
いる。
〔発明が解決しようとする問題点〕
このように、従来の塗膜形成材料では前記の要
求諸特性がバランスよく満たされた塗膜を得るこ
とができず、とりわけ接着性、透明性、耐水性、
耐溶剤性および耐染性を調和させることが困難で
あり、さらに回転塗布法には適しないものが多か
つた。
本発明の目的は、上記従来技術の問題点を解決
し、平滑、強靭で耐熱性および耐光性が高いうえ
に、基体等への接着性、透明性、耐水性、耐溶剤
性および耐染性のいずれの点でも優れている塗膜
を形成でき、かつ該塗膜の硬度が高く、しかも回
転塗布法に適したカラーフイルターの保護層形成
材料として好適な熱硬化性樹脂組成物を提供する
ことである。
〔問題点を解決するための手段〕
本発明は、前記の問題点を解決する手段とし
て、
(A) 一般式():
〔式中、R1は水素原子または低級アルキル
基であり、nは1〜5の整数である〕
で表わされる単量体化合物に由来する単量体ユ
ニツトと
一般式():
〔式中、R2は水素原子または低級アルキル
基であり、R3は低級アルキル基であり、nは
1〜5の整数である〕
で表わされる単量体化合物に由来する単量体ユ
ニツトとを含有する共重合体、および
(B) 芳香族多価カルボン酸および芳香族多価カル
ボン酸の無水物から選ばれる少なくとも1種
を含んでなるカラーフイルター保護膜形成用熱
硬化性樹脂組成物を提供するものである。
本発明の組成物の(A)成分である重合体として
は、一般式()の化合物と一般式()の化合
物との共重合体、および一般式()の化合物と
一般式()の化合物とその他の重合性単量体と
からなる共重合体を挙げることができる。
一般式()の化合物の具体例としては、アク
リル酸グリシジル、メタクリル酸グリシジル、α
−エチルアクリル酸グリシジル、α−n−プロピ
ルアクリル酸グリシジル、α−n−ブチルアクリ
ル酸グリシジル、アクリル酸−3,4−エポキシ
ブチル、メタクリル酸−3,4−エポキシブチ
ル、メタクリル酸−4,5−エポキシペンチル、
アクリル酸−4,5−エポキシペンチル、メタク
リル酸−6,7−エポキシヘプチル、α−エチル
アクリル酸−6,7−エポキシヘプチル等が挙げ
ることができる。これらの化合物の中でも、一般
式()においてRが水素原子、メチル基または
エチル基が好ましく、nは1または2が好まし
い。
一般式()の化合物の具体例としては、2−
アクリロイルオキシエチルトリメトキシシラン、
2−アクリロイルオキシトリエトキシシラン、2
−メタクリロイルオキシトリメトキシシラン、2
−メタクリロイルオキシトリエトキシシラン、3
−アクリロイルオキシプロピルトリメトキシシラ
ン、3−アクリロイロキプロピルトリエトキシシ
ラン、3−アクリロイルオキシプロピルトリプロ
ポキシシラン、3−メタクリロイルオキシプロピ
ルトリメトキシシラン、3−メタクリロイルオキ
シプロピルトリエトキシシラン、3−(α−エチ
ルアクリロイルオキシ)プロピルトリメトキシシ
ラン、4−メタクリロイルオキシブチルトリメト
キシシラン、4−メタクリロイルオキシブチルト
リプロポキキシシラン等を挙げることができる。
これらの化合物の中でも、好ましい化合物は、2
−メタクリロイルオキシエチルトリメトキシシラ
ン、2−アクリロキシエチルトリメトキシシラ
ン、3−メタクリロイルオキシプロピルトリメト
キシシラン、3−アクリロイルオキシプロピルト
リトトキシシラン、3−メタクリロイルオキシプ
ロピルトリエトキシシラン、3−アクリロイルオ
キシプロピルトリエトキシシランである。
(A)成分の共重合体において、一般式()の化
合物に由来する単量体ユニツトは60重量%以上、
一般式()の化合物に由来する単量体ユニツト
は0.1重量%以上上であることが好ましい。一般
式()の化合物に由来する単量体ユニツトが60
重量%未満であると、耐熱性の優れた塗膜が得ら
れにくく、一般式()の化合物に由来する単量
体ユニツトが0.1重量%未満であると、基体に対
する接着性が不十分である。
(A)成分の共重合体の製造において用いる一般式
()および()の単量体化合物以外の他の重
合性単量体化合物としては、例えばアクリル酸メ
チル、メタクリ酸メチル、アクリル酸エチル、メ
タクリル酸エチル、アクリル酸ブチル、メタクリ
ル酸ブチル、メタクリル酸−2−エチルヘキシ
ル、アクリル酸フエニル、メタクリル酸フエニル
等のアクリル酸もしくはメタクリル酸のエステ
ル;スチレン、α−メチルスチレン、p−メチル
スチレン、ビニルナフタレン等のビニル芳香族化
合物を挙げることができる。これらの重合性単量
体のうちでも、アクリル酸もしくはメタクリル酸
のエステルを用いることが、より強靭で透明性の
高い塗膜を形成する点において特に好ましい。し
かし、これらの他の重合性単量体化合物に由来す
る単量体ユニツトは、(A)成分の共重合体において
30重量%を超えない範囲であることが望ましい。
これらの含量が30重量%を超えると、基板に対す
る接着性が低下するのみでなく、回転塗布法によ
り均一で平滑な塗膜を形成することが困難とな
る。
また、重合性単量体としては、アクリル酸、メ
タクリル酸、メタクリ酸ヒドロキシエチル、アク
リル酸ヒドロキシエチル、アクリル酸−2−ヒド
ロキシプロピル、メタクリル酸−2−ヒドロキシ
プロピル、アクリル酸−2−ヒドロキシブチル、
メタクリル酸−2−ヒドロキシブチル等の官能性
アクリル化合物;ブタジエン、イソプレン、ピペ
リレン、ジメチルブタジエン等のジエン系化合物
を使用することもできるが、これらに由来する単
量体ユニツトの含量は(A)成分の重合体の5重量%
を超えない範囲であることが望ましい。これらの
含量が5重量%を超えると、基体に対する接着力
が低下する。(A)成分の共重合体の共重合形態は特
に制限されず、付加重合によるランダム共重合
体、ブロツク共重合体等のいずれでもよく、また
共重合方法も溶液重合法、乳化重合法等のいずれ
でもよい。
(A)成分の共重合体の分子量は、本発明組成物を
基体に均一な膜として塗布することができる限り
特に限定されないが、通常ポリスチレン換算重量
平均分子量が5000〜500000であり、形成する塗膜
の厚さ、塗布方法等の塗膜形成の目的や条件に応
じて適宜選択することができる。
本発明の組成物は、前記(B)成分として芳香族多
価カルボン酸および芳香族多価カルボン酸無水物
から選ばれる少なくとも1種を含有する。該多価
カルボン酸の具体例としては、フタル酸、イソフ
タル酸、テレフタル酸、1,2,3−トリカルボ
キシルベンゼン、1,2,3−トリカルボキシル
−4−メチルベンゼン、1,2,3−トリカルボ
キシル−5−メチルベンゼン、1,2,3−トリ
カルボキシル−4−フエニルベンゼン、1,2,
3−トリカルボキシル−5−フエニルベンゼン、
1,2,4−トリカルボキシルベンゼン(すなわ
ち、トリメリツト酸)、1,2,4−トリカルボ
キシル−3−メチルベンゼン、1,2,4−トリ
カルボキシル−3−フエニルベンゼン、1,2,
4−トリカルボキシル−5−メチルベンゼン、
1,2,4−トリカルボキシル−5−フエニルベ
ンゼン、1,2,4−トリカルボキシル−6−メ
チルベンゼン、1,2,4−トリカルボキシル−
6−フエニルベンゼン、1,2,3,4−テトラ
カルボキシベンゼン、1,2,3,4−テトラカ
ルボキシル−5−メチルベンゼン、1,2,3,
4−テトラカルボキシル−5−フエニルベンゼ
ン、1,2,3,5−テトラカルボキシルベンゼ
ン、1,2,3,5−テトラカルボキシル−4−
メチルベンゼン、1,2,3,5−テトラカルボ
キシル−4−フエニルベンゼン、1,2,4,5
−テトラカルボキシルベンゼン(すなわちピロメ
リツト酸)等のベンゼン誘導体;
1,2,3−トリカルボキシルナフタレン、
1,2,4−トリカルボキシルナフタレン、1,
2,5−トリカルボキシルナフタレン、1,2,
6−トリカルボキシルナフタレン、1,2,7−
トリカルボキシルナフタレン、1,2,8−トリ
カルボキシルナフタレン、1,2,3,4−テト
ラカルボキシルナフタレン、1,2,3,5−テ
トラカルボキシルナフタレン、1,2,3,6−
テトラカルボキシルナフタレン、1,2,3,7
−テトラカルボキシルナフタレン、1,3,5,
6−テトラカルボキシルナフタレン、1,3,
5,7−テトラカルボキシルナフタレン、1,
4,5,6−テトラカルボキシルナフタレン、
1,4,5,7−テトラカルボキシルナフタレ
ン、1,4,5,8−テトラカルボキシルナフタ
レン、等のナフタレン誘導体;
2,2,3−トリカルボキシルベンゾフエノ
ン、2,3,3−トリカルボキシルベンゾフエノ
ン、2,3,4−トリカルボキシルベンゾフエノ
ン、2,3,4−トリカルボキシルベンゾフエノ
ン、3,3,4−トリカルボキシルベンゾフエノ
ン、3,4,4−トリカルボキシルベンゾフエノ
ン、2,3,4−トリカルボキシルベンゾフエノ
ン、2,3,6−トリカルボキシルベンゾフエノ
ン、2,3,4,5−テトラカルボキシルベンゾ
フエノン、2,3,5,6−テトラカルボキシル
ベンゾフエノン、2,2′,3,3′−テトラカルボ
キシルベンゾフエノン、2,3,3′,5−テトラ
カルボキシルベンゾフエノン、3,3′,4,4′−
テトラカルボキシルベンゾフエノン、3,3′,
4,5′−テトラカルボキシルベンゾフエノン等の
ベンゾフエノン誘導体等の芳香族多価カルボン酸
を挙げることができ、該多価カルボン酸無水物と
しては、前記例示化合物の無水物を挙げることが
できる。
上記の芳香族多価カルボン酸および芳香族多価
カルボン酸無水物は、1種単独でも2種以上の組
合せでも用いることができる。
本発明の組成物における(B)成分の配合量は、(A)
成分である重合体100重量部当り0.01〜50重量部
の範囲であり、好ましくは1〜50重量部である。
(B)成分の配合量が0.01重量部未満であると、硬化
が不十分となつて強固な塗膜を形成することがで
きず、また50重量部を超えると塗膜の基体への接
着性が低下する上に回転塗布法により均一で平滑
な塗膜を形成することが困難である。
本発明の組成物には、前記(A)成分および(B)成分
以外の成分を添加することができる。このような
成分としては、
(C)前記一般式()の単量体化合物に由来する
単量体ユニツトを例えば60重量%以上含有する
(共)重合体を挙げることができる。
この(C)成分が共重合体である場合に、一般式
()の単量体化合物と共重合される単量体化合
物としては、前記(A)成分の共重合体の製造におい
て用いられると同様の一般式()および()
の化合物以外の重合性単量体化合物を挙げること
ができる。
上記の重合性単量体化合物と一般式()の化
合物の共重合体の共重合形態も特に制限されず、
付加重合によるランダム共重合体、ブロツク共重
合体等のいずれでもよく、また共重合方法も溶液
重合法、乳化重合法等のいずれでもよい。
(C)成分の(共)重合体の分子量は、特に限定さ
れないが、通常ポリスチレン換算重量平均分子量
が5000〜300000であり、形成する塗膜の厚さ、塗
布方法等の塗膜形成の目的や条件に応じて適宜選
択することができる。
(C)成分の(共)重合体の添加量は通常(A)成分の
共重合体100重量部あたり50重量部以下程度であ
る。
本発明の組成物には、上述した(A)〜(C)の成分の
ほかに、必要に応じて、例えば老化防止剤、紫外
線吸収剤等の安定剤を透明性を損わない程度に添
加することができる。
本発明の組成物は、上記諸成分を均一に混合す
ることにより得られる。これらの成分を混合する
方法としては、通常、これらの成分を適当な溶媒
に溶解することによつて混合する溶液混合法が好
ましい。溶液混合に用いる溶媒としては、上記各
成分を溶解し、かつこれらの成分と反応しないも
のであれば、特に限定されるものではなく、種々
の溶媒を使用することができ、具体例としては、
アセトン、メチルエチルケトン、メチル−n−プ
ロピルケトン、メチルイソプロピルケトン、メチ
ル−n−ブチルケトン、メチルイソブチルケト
ン、メチル−n−アミルケトン、メチル−n−ヘ
キシルケトン、ジエチルケトン、エチル−n−ブ
チルケトン、ジ−n−プロピルケトン、ジイソブ
チルケトン、シクロヘキサノン、ホロン等のケト
ン系溶媒;
エチルエーテル、イソプロピルエーテル、n−
ブチルエーテル、ジイソアミルエーテル、エチレ
ングリコールジメチルエーテル、エチレングリコ
ールジエチルエーテル、ジエチレングリコールジ
メチルエーテル、ジエチレングリコール、ジオキ
サン、テトラヒドロフラン等のエーテル系溶媒、
ギ酸エチル、ギ酸プロピル、ギ酸−n−ブチル、
酢酸エチル、酢酸n−プロピル、酢酸イソプロピ
ル、酢酸n−メチル、酢酸−n−アミル、エチレ
ングリコール、ジメチルエーテルアセタート、エ
チレングリコールモノエチルエーテルアセター
ト、ジエチレングリコールモノメチルエーテルア
セタート、ジエチレングリコールモノエチルエー
テルアセタート等のエステル系溶媒を挙げること
ができる。
本発明の組成物を溶液混合により調製する場合
の混合順序は特に限定するものではなく、例えば
全成分を同時に溶媒に溶解して本発明の組成物の
溶液を調製してもよいし、必要に応じて各成分を
別々に同一または異種の溶媒に溶解して2以上の
溶液とし、これらの溶液を混合して本発明の組成
物の溶液を調製してもよい。例えば(B)成分の溶液
と残りの他の成分の溶液の2種とを調製してお
き、使用直前に所望の比率で混合することによつ
て、各成分の長期にわたる貯蔵安定性を向上させ
たり、2種の溶液の混合比率をかえるだけで、目
的に応じ簡単に塗膜性能を変化させることが可能
になる。
組成物溶液の濃度は、特に限定されるものでは
なく、使用目的に応じて適宜選定することができ
るが、一般的には5〜50重量%程度で使用する。
上記のようにして調製した本発明の組成物の溶
液を基体表面に塗布し、加熱により硬化させるこ
とにより所要の塗膜を得ることができる。
本発明の組成物の溶液を基体表面に塗布する方
法は特に限定されず、例えばスプレー法、ロール
コート法、回転塗布法など各種の方法を用いるこ
とができ、本発明の組成物が回転塗布法にも適し
ている点は本発明の特長の一つである。
本発明組成物の熱硬化条件は、組成物の各成分
の具体的種類、配合割合等によつて適宜選択され
るが、通常80〜250℃で15分〜10時間程度である。
〔実施例〕
次に実施例によつて本発明をさらに詳細に説明
するが、本発明はこれら実施例により限定される
ものではない。
実施例 1
メタクリル酸グリシジル75重量部と3−メタク
リロイルオキシプロピルトリメトキシシラン25重
量部の共重合体(ポリスチレン換算重量平均分子
量約45000)10.2gをエチルセロソルブアセテー
ト95gに溶解した。かくして得られた溶液にトリ
メリツト酸0.5gを加え、均一に混合するまでか
きまぜた。かくして得られた溶液を孔径0.2μmの
フイルターでろ過したのち、スピンコーターを用
いてガラス板上に回転数3000rpmで回転塗布し
た。塗布後ガラス板を150℃のクリーンオーブン
中にて30分間熱処理し塗膜を硬化させた。得られ
た塗膜の表面は、極めて滑らかであり、膜荒れは
全く見られなかつた。触針式膜厚計(タリステツ
プ〔ホブソン・テーラー社製〕)によつて測定し
た膜厚は0.35μmであつた。
以上のようにして作製した塗膜につき以下の試
験を行なつた。まず上記の方法で塗膜をつけたガ
ラス板の吸収スペクトルを、塗布したものと同じ
ガラス板を対照として測定した。350nm〜800nm
の全領域において光線透過率は95%以上であつ
た。次にガラス板に塗布硬化した塗膜の接着性を
調べるためにテープ剥離によるゴバン目試験
(JIS K−5400)を行なつた。その結果剥離は全
く認められなかつた。またこのガラス板を沸騰水
中に入れて5時間放置したのち、同様にしてゴバ
ン目試験を行なつたが、この場合も剥離は全く見
られなかつた。また、上記の塗膜つきのガラス板
をトルエン中に入れて、5時間加熱還流したのち
ゴバン目試験を行なつたが、この場合も剥離は全
く認められなかつた。また、上記と同様にして作
製した塗膜つきのガラス板を200℃のギヤオーブ
ン中で200時間熱処理した結果、塗膜にクラツク
の入ることはなく、また吸収スペクトルの変化も
認められなかつた。
さらに、上記と同様にして作製した塗膜つきの
ガラス板を下記の組成の染色浴中に入れ100℃で
30分間放置したのち、ガラス板をとり出してよく
水洗し乾燥したのち、塗膜の様子を目視で調べた
が、クラツクや膜荒れ等の異常は認められず、ま
た塗膜は無色透明のままで全く染色されていなか
つた。
染色浴
酸性染料(カヤノールミリングレツドRS−125
〔日本化薬製〕) …2g
酢 酸 …2g
蒸留水 100g
以上の結果から本発明の組成物の塗膜で平滑で
あり、透明性、接着性、耐水性、耐溶剤性、耐熱
性および耐染性に極めてすぐれていることが明ら
かである。
実施例 2
メタクリル酸グリシジル75重量部と3−メタク
リロイルオキシプロピルトリメトキシシラン25重
量部の共重合体(ポリスチレン換算重量平均分子
量約45000)4.8gとポリメタクリル酸グリシジル
(ポリスチレン換算重量平均分子量約80000)6g
とをエチルセロソルブアセテート95gに溶解し、
さらにトリメリツト酸0.5gを加え、実施例1と
同様に組成物溶液を調製した。
次いで実施例1と同様にしてガラス板上に膜厚
0.35μmの塗膜を形成した。得られた塗膜につい
て実施例1と同じ試験を行なつた結果は表1に示
す通りであつた。
実施例 3
実施例2におけるメタクリル酸グリシジルと3
−メタクリロイルオキシプロピルトリメトキシシ
ランの共重合体4.8gにかえてメタクリル酸−3,
4−エポキシブチル80重量部と2−メタクリロイ
ルオキシエチルトリメトキシシラン20重量部の共
重合体(ポリスチレン換算重量平均分子量約
50000)5.0gを用い他は実施例1と同様にして組
成物溶液を調製した。次いで実施例1と同様にし
てガラス板上に膜厚0.42μmの塗膜を形成した。
得られた塗膜について実施例1と同じ試験を行な
た結果は表1に示す通りであつた。
実施例 4
実施例2におけるメタクリル酸グリシジルと3
−メタクリロイルオキシプロピルトリメトキシシ
ランの共重合体4.8gにかえて、メタクリル酸グ
リシジル70重量部とメタクリル酸第3ブチル27重
量部と3−メタクロイロキシプロプルトリメトキ
シシラン3重量部の共重合体(ポリスチレン換算
重量平均分子量約50000)5.0gを用い、他は実施
例1と同様にして組成物溶液を調製した。次いで
実施例1と同様にしてガラス板上に膜厚0.40μm
の塗膜を形成させた。塗膜の表面は非常に平滑で
あつた。得られた塗膜について実施例1と同じ試
験を行なつた結果は表1に示す通りであつた。
実施例 5
実施例2におけるトリメリツト酸0.5gをピロ
メリツト酸0.3gにかえて、他は実施例2と同様
にして組成物溶液を調製した。次いで実施例1と
同様にしてガラス基板上に0.32μmの塗膜を形成
させた。得られた塗膜について実施例1と同じ試
験を行なつた結果は表1に示す通りであつた。
実施例 6
実施例2におけるポリメタクリル酸グリシジル
に代えて、メタクリル酸グリシジル62重量部とメ
タクリル酸第3ブチル38重量部の共重合体(ポリ
スチレン換算重量平均分子量150000)6.0gを用
い、他は実施例1と同様にして組成物溶液を調製
し、ガラス基板上に膜厚0.40μmの塗膜を形成し
た。得られた塗膜について実施例1と同様の試験
をした結果は表1に示す通りであつた。
比較例 1
実施例2におけるメタクリル酸グリシジルと3
−メタクリロイルオキシプロピルトリメトキシシ
ランの共重合体4.8gにかえて、メタクリル酸グ
リシジル75重量部とメタクリル酸メチル25重量部
の共重合体(ポリスチレン換算重量平均分子量
50000)5.0gを用い、他は実施例1と同様にし
て、ガラス基板上に膜厚0.38μmの塗膜を形成し
た。得られた塗膜について実施例1と同様の試験
を行なつた結果は表1に示す通りであつた。
[Industrial Field of Application] The present invention relates to a thermosetting resin composition for forming a color filter protective film. [Prior Art] In recent years, various liquid crystal display elements and solid-state image sensors equipped with color filters have been announced. It is formed through several steps. That is, polyvinyl alcohol,
Grieux, gelatin, etc. are imparted with photosensitivity and coated uniformly onto a substrate, and only the first color pattern is photocured and developed using a mask exposure method, and the other portions are removed. This pattern portion is dyed with a dye having predetermined spectral characteristics. A transparent anti-dye protection layer is then applied. The pattern portion of the second color is also dyed using the same process and coated with an anti-dye protection layer. The pattern portion of the third color is also dyed using the same process, and finally a surface protective layer is formed. In addition to adhesion, smoothness, toughness, heat resistance, light resistance, water resistance, and solvent resistance, this anti-dye protection layer and surface protection layer have properties such as transparency and stain resistance so that they are not dyed by dyes. Performance is required. Furthermore, the materials forming these layers are applied as a solution in order to form a dye-resistant protective layer and a surface protective layer.
In order to form a uniform coating film, a spin coating method using spin coating is sometimes used, and the coating method is also required to be suitable for this coating method. In addition, as a material for forming a protective layer in the production of color filters, in particular, a combination of cyclized rubber and a sensitizer and polymethyl methacrylate have been proposed (Japanese Unexamined Patent Publication No. 59-49507). However, even if a protective layer is formed using these materials, it is not possible to obtain a protective layer that has the above-mentioned properties required for a protective layer in a well-balanced manner. has a problem that it is not possible to obtain a satisfactory color filter because polymethyl methacrylate has poor transparency, heat resistance, etc., and polymethyl methacrylate has poor weldability with the dyed substrate layer and heat resistance. [Problems to be Solved by the Invention] As described above, it is not possible to obtain a coating film that satisfies the above-mentioned required properties in a well-balanced manner using conventional coating film forming materials. ,
It was difficult to balance solvent resistance and dye resistance, and many of them were not suitable for spin coating. The purpose of the present invention is to solve the above-mentioned problems of the prior art, and to provide smoothness, toughness, high heat resistance and light resistance, as well as adhesion to substrates, transparency, water resistance, solvent resistance and stain resistance. To provide a thermosetting resin composition that can form a coating film that is excellent in all of the following points, has high hardness, and is suitable as a material for forming a protective layer of a color filter and is suitable for spin coating. It is. [Means for Solving the Problems] The present invention provides, as a means for solving the above problems, (A) general formula (): [In the formula, R 1 is a hydrogen atom or a lower alkyl group, and n is an integer of 1 to 5] A monomer unit derived from a monomer compound represented by the general formula (): [In the formula, R 2 is a hydrogen atom or a lower alkyl group, R 3 is a lower alkyl group, and n is an integer of 1 to 5.] and (B) at least one selected from aromatic polycarboxylic acids and anhydrides of aromatic polycarboxylic acids. This is what we provide. The polymer that is component (A) of the composition of the present invention includes a copolymer of a compound of general formula () and a compound of general formula (), and a copolymer of a compound of general formula () and a compound of general formula (). and other polymerizable monomers. Specific examples of compounds of general formula () include glycidyl acrylate, glycidyl methacrylate, α
- Glycidyl ethyl acrylate, glycidyl α-n-propylacrylate, glycidyl α-n-butylacrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 4,5-methacrylate -epoxypentyl,
Examples include 4,5-epoxypentyl acrylate, 6,7-epoxyheptyl methacrylate, and 6,7-epoxyheptyl α-ethyl acrylate. Among these compounds, R in the general formula () is preferably a hydrogen atom, a methyl group or an ethyl group, and n is preferably 1 or 2. Specific examples of compounds of general formula () include 2-
acryloyloxyethyltrimethoxysilane,
2-acryloyloxytriethoxysilane, 2
-methacryloyloxytrimethoxysilane, 2
-methacryloyloxytriethoxysilane, 3
-acryloyloxypropyltrimethoxysilane, 3-acryloyloxypropyltriethoxysilane, 3-acryloyloxypropyltripropoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane, 3-(α- Examples include ethyl acryloyloxy)propyltrimethoxysilane, 4-methacryloyloxybutyltrimethoxysilane, and 4-methacryloyloxybutyltripropoxysilane.
Among these compounds, preferred compounds are 2
-methacryloyloxyethyltrimethoxysilane, 2-acryloyloxyethyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-acryloyloxypropyltritoxysilane, 3-methacryloyloxypropyltriethoxysilane, 3-acryloyloxypropyltrimethoxysilane It is ethoxysilane. In the copolymer of component (A), the monomer unit derived from the compound of general formula () is 60% by weight or more;
The monomer unit derived from the compound of general formula () is preferably 0.1% by weight or more. 60 monomer units derived from the compound of general formula ()
If the amount is less than 0.1% by weight, it will be difficult to obtain a coating film with excellent heat resistance, and if the amount of monomer units derived from the compound of general formula () is less than 0.1% by weight, the adhesion to the substrate will be insufficient. . Other polymerizable monomer compounds other than the monomer compounds of general formulas () and () used in the production of the copolymer of component (A) include, for example, methyl acrylate, methyl methacrylate, ethyl acrylate, Esters of acrylic acid or methacrylic acid such as ethyl methacrylate, butyl acrylate, butyl methacrylate, 2-ethylhexyl methacrylate, phenyl acrylate, phenyl methacrylate; styrene, α-methylstyrene, p-methylstyrene, vinylnaphthalene Examples include vinyl aromatic compounds such as. Among these polymerizable monomers, it is particularly preferable to use esters of acrylic acid or methacrylic acid in terms of forming a tougher and more transparent coating film. However, monomer units derived from these other polymerizable monomer compounds are not included in the copolymer of component (A).
It is desirable that the amount does not exceed 30% by weight.
If their content exceeds 30% by weight, not only will the adhesion to the substrate deteriorate, but it will also be difficult to form a uniform and smooth coating film by spin coating. In addition, the polymerizable monomers include acrylic acid, methacrylic acid, hydroxyethyl methacrylate, hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate,
Functional acrylic compounds such as 2-hydroxybutyl methacrylate; diene compounds such as butadiene, isoprene, piperylene, dimethylbutadiene, etc. can also be used, but the content of monomer units derived from these is component (A). 5% by weight of the polymer of
It is desirable that the range does not exceed . If their content exceeds 5% by weight, the adhesive strength to the substrate will decrease. The copolymerization form of the copolymer of component (A) is not particularly limited, and may be either a random copolymer or a block copolymer by addition polymerization, and the copolymerization method may also be a solution polymerization method, an emulsion polymerization method, etc. Either is fine. The molecular weight of the copolymer of component (A) is not particularly limited as long as the composition of the present invention can be applied to a substrate as a uniform film, but it usually has a polystyrene equivalent weight average molecular weight of 5,000 to 500,000, and the coating to be formed is It can be appropriately selected depending on the purpose and conditions of coating film formation, such as film thickness and coating method. The composition of the present invention contains at least one selected from aromatic polycarboxylic acids and aromatic polycarboxylic acid anhydrides as the component (B). Specific examples of the polyhydric carboxylic acid include phthalic acid, isophthalic acid, terephthalic acid, 1,2,3-tricarboxylbenzene, 1,2,3-tricarboxyl-4-methylbenzene, 1,2,3- Tricarboxyl-5-methylbenzene, 1,2,3-tricarboxyl-4-phenylbenzene, 1,2,
3-tricarboxyl-5-phenylbenzene,
1,2,4-tricarboxylbenzene (i.e. trimellitic acid), 1,2,4-tricarboxyl-3-methylbenzene, 1,2,4-tricarboxyl-3-phenylbenzene, 1,2,
4-tricarboxyl-5-methylbenzene,
1,2,4-tricarboxyl-5-phenylbenzene, 1,2,4-tricarboxyl-6-methylbenzene, 1,2,4-tricarboxyl-
6-phenylbenzene, 1,2,3,4-tetracarboxybenzene, 1,2,3,4-tetracarboxyl-5-methylbenzene, 1,2,3,
4-tetracarboxyl-5-phenylbenzene, 1,2,3,5-tetracarboxylbenzene, 1,2,3,5-tetracarboxyl-4-
Methylbenzene, 1,2,3,5-tetracarboxyl-4-phenylbenzene, 1,2,4,5
- benzene derivatives such as tetracarboxylbenzene (i.e. pyromellitic acid); 1,2,3-tricarboxylnaphthalene,
1,2,4-tricarboxylnaphthalene, 1,
2,5-tricarboxylnaphthalene, 1,2,
6-tricarboxylnaphthalene, 1,2,7-
Tricarboxylnaphthalene, 1,2,8-tricarboxylnaphthalene, 1,2,3,4-tetracarboxylnaphthalene, 1,2,3,5-tetracarboxylnaphthalene, 1,2,3,6-
Tetracarboxylnaphthalene, 1,2,3,7
-tetracarboxylnaphthalene, 1,3,5,
6-tetracarboxylnaphthalene, 1,3,
5,7-tetracarboxylnaphthalene, 1,
4,5,6-tetracarboxylnaphthalene,
Naphthalene derivatives such as 1,4,5,7-tetracarboxylnaphthalene, 1,4,5,8-tetracarboxylnaphthalene; 2,2,3-tricarboxylbenzophenone, 2,3,3-tricarboxylbenzo Phenone, 2,3,4-tricarboxylbenzophenone, 2,3,4-tricarboxylbenzophenone, 3,3,4-tricarboxylbenzophenone, 3,4,4-tricarboxylbenzophenone , 2,3,4-tricarboxylbenzophenone, 2,3,6-tricarboxylbenzophenone, 2,3,4,5-tetracarboxylbenzophenone, 2,3,5,6-tetracarboxylbenzophenone Phenone, 2,2',3,3'-tetracarboxylbenzophenone, 2,3,3',5-tetracarboxylbenzophenone, 3,3',4,4'-
Tetracarboxylbenzophenone, 3,3′,
Examples of the polyvalent carboxylic acid include aromatic polycarboxylic acids such as benzophenone derivatives such as 4,5'-tetracarboxylbenzophenone, and examples of the polycarboxylic acid anhydrides include the anhydrides of the above-mentioned exemplified compounds. The above-mentioned aromatic polycarboxylic acids and aromatic polycarboxylic acid anhydrides can be used alone or in combination of two or more. The amount of component (B) in the composition of the present invention is (A)
The amount ranges from 0.01 to 50 parts by weight, preferably from 1 to 50 parts by weight, per 100 parts by weight of the component polymer.
If the amount of component (B) is less than 0.01 part by weight, the curing will be insufficient and a strong coating film cannot be formed, and if it exceeds 50 parts by weight, the adhesion of the coating film to the substrate will deteriorate. In addition, it is difficult to form a uniform and smooth coating film by spin coating. Components other than the component (A) and component (B) can be added to the composition of the present invention. Examples of such components include (C) a (co)polymer containing, for example, 60% by weight or more of monomer units derived from the monomer compound of the general formula (). When component (C) is a copolymer, the monomer compound copolymerized with the monomer compound of general formula () is used in the production of the copolymer of component (A). Similar general formulas () and ()
Polymerizable monomer compounds other than the compounds mentioned above can be mentioned. The copolymerization form of the copolymer of the above polymerizable monomer compound and the compound of general formula () is also not particularly limited,
It may be a random copolymer or a block copolymer formed by addition polymerization, and the copolymerization method may be a solution polymerization method, an emulsion polymerization method, or the like. The molecular weight of the (co)polymer of component (C) is not particularly limited, but it usually has a polystyrene equivalent weight average molecular weight of 5,000 to 300,000. It can be selected as appropriate depending on the conditions. The amount of the (co)polymer (C) added is usually about 50 parts by weight or less per 100 parts by weight of the copolymer (A). In addition to the above-mentioned components (A) to (C), the composition of the present invention may optionally contain stabilizers such as anti-aging agents and ultraviolet absorbers to an extent that does not impair transparency. can do. The composition of the present invention can be obtained by uniformly mixing the above components. As a method for mixing these components, a solution mixing method is usually preferred, in which these components are mixed by dissolving them in a suitable solvent. The solvent used for solution mixing is not particularly limited as long as it dissolves each of the above components and does not react with these components, and various solvents can be used. Specific examples include:
Acetone, methyl ethyl ketone, methyl-n-propyl ketone, methyl isopropyl ketone, methyl-n-butyl ketone, methyl isobutyl ketone, methyl-n-amyl ketone, methyl-n-hexyl ketone, diethyl ketone, ethyl-n-butyl ketone, di-n - Ketone solvents such as propyl ketone, diisobutyl ketone, cyclohexanone, and holone; ethyl ether, isopropyl ether, n-
Ether solvents such as butyl ether, diisoamyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol, dioxane, tetrahydrofuran, etc.
Ethyl formate, propyl formate, n-butyl formate,
Ethyl acetate, n-propyl acetate, isopropyl acetate, n-methyl acetate, n-amyl acetate, ethylene glycol, dimethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, etc. The following ester solvents can be mentioned. When preparing the composition of the present invention by solution mixing, the mixing order is not particularly limited. For example, a solution of the composition of the present invention may be prepared by dissolving all components in a solvent at the same time, or as necessary. Accordingly, each component may be dissolved separately in the same or different solvents to form two or more solutions, and these solutions may be mixed to prepare a solution of the composition of the present invention. For example, by preparing a solution of component (B) and a solution of the remaining other components and mixing them in the desired ratio immediately before use, the long-term storage stability of each component can be improved. By simply changing the mixing ratio of the two types of solutions, it becomes possible to easily change the coating film performance depending on the purpose. The concentration of the composition solution is not particularly limited and can be appropriately selected depending on the purpose of use, but it is generally used at about 5 to 50% by weight. A desired coating film can be obtained by applying the solution of the composition of the present invention prepared as described above onto the surface of a substrate and curing it by heating. The method of applying the solution of the composition of the present invention to the substrate surface is not particularly limited, and various methods such as a spray method, roll coating method, and spin coating method can be used. One of the features of the present invention is that it is suitable for The heat curing conditions for the composition of the present invention are appropriately selected depending on the specific types and proportions of each component of the composition, but are usually at 80 to 250°C for about 15 minutes to 10 hours. [Examples] Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples. Example 1 10.2 g of a copolymer of 75 parts by weight of glycidyl methacrylate and 25 parts by weight of 3-methacryloyloxypropyltrimethoxysilane (weight average molecular weight in terms of polystyrene of about 45,000) was dissolved in 95 g of ethyl cellosolve acetate. 0.5 g of trimellitic acid was added to the solution thus obtained and stirred until uniformly mixed. The solution thus obtained was filtered through a filter with a pore size of 0.2 μm, and then spin-coated onto a glass plate at a rotation speed of 3000 rpm using a spin coater. After coating, the glass plate was heat treated in a clean oven at 150°C for 30 minutes to cure the coating film. The surface of the resulting coating film was extremely smooth, and no film roughness was observed at all. The film thickness measured with a stylus-type film thickness meter (Talystep (manufactured by Hobson Taylor)) was 0.35 μm. The following tests were conducted on the coating film prepared as described above. First, the absorption spectrum of a glass plate coated with the above coating was measured using the same glass plate as a control. 350nm~800nm
The light transmittance was 95% or more in all regions. Next, in order to examine the adhesion of the coating film applied and cured to the glass plate, a cross-cut test (JIS K-5400) by tape peeling was conducted. As a result, no peeling was observed at all. Furthermore, after placing this glass plate in boiling water and leaving it for 5 hours, a similar cross-cut test was performed, but no peeling was observed in this case as well. Further, the glass plate with the above-mentioned coating film was placed in toluene, heated under reflux for 5 hours, and then subjected to a cross-cut test, but no peeling was observed in this case as well. Furthermore, when a glass plate with a coating film prepared in the same manner as above was heat-treated in a gear oven at 200°C for 200 hours, no cracks appeared in the coating film, and no change in the absorption spectrum was observed. Furthermore, a glass plate with a coating film prepared in the same manner as above was placed in a dyeing bath with the following composition and heated at 100℃.
After leaving it for 30 minutes, the glass plate was taken out, thoroughly washed with water, dried, and then the condition of the paint film was visually inspected. No abnormalities such as cracks or roughness were observed, and the paint film remained colorless and transparent. It was not stained at all. Dyeing bath acidic dye (Kayanor Milling Red RS-125
[Nippon Kayaku]) ...2g Acetic acid ...2g Distilled water 100g From the above results, the coating film of the composition of the present invention is smooth, has good transparency, adhesion, water resistance, solvent resistance, heat resistance and resistance. It is clear that the dyeing property is extremely good. Example 2 4.8 g of a copolymer of 75 parts by weight of glycidyl methacrylate and 25 parts by weight of 3-methacryloyloxypropyltrimethoxysilane (weight average molecular weight in terms of polystyrene of about 45,000) and polyglycidyl methacrylate (weight average molecular weight in terms of polystyrene of about 80,000) 6g
and dissolved in 95g of ethyl cellosolve acetate,
Furthermore, 0.5 g of trimellitic acid was added, and a composition solution was prepared in the same manner as in Example 1. Then, in the same manner as in Example 1, a film was formed on a glass plate.
A coating film of 0.35 μm was formed. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1. Example 3 Glycidyl methacrylate in Example 2 and 3
-Methacrylic acid-3 in place of 4.8g of copolymer of methacryloyloxypropyltrimethoxysilane,
Copolymer of 80 parts by weight of 4-epoxybutyl and 20 parts by weight of 2-methacryloyloxyethyltrimethoxysilane (weight average molecular weight in terms of polystyrene: approx.
A composition solution was prepared in the same manner as in Example 1 except for using 5.0 g of 50000). Then, in the same manner as in Example 1, a coating film having a thickness of 0.42 μm was formed on a glass plate.
The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1. Example 4 Glycidyl methacrylate in Example 2 and 3
- Copolymer of 70 parts by weight of glycidyl methacrylate, 27 parts by weight of tert-butyl methacrylate, and 3 parts by weight of 3-methacryloyloxypropyltrimethoxysilane in place of 4.8 g of copolymer of methacryloyloxypropyltrimethoxysilane. A composition solution was prepared in the same manner as in Example 1 except that 5.0 g (weight average molecular weight in terms of polystyrene of about 50,000) was used. Then, in the same manner as in Example 1, a film with a thickness of 0.40 μm was formed on a glass plate.
A coating film was formed. The surface of the coating film was very smooth. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1. Example 5 A composition solution was prepared in the same manner as in Example 2 except that 0.5 g of trimellitic acid in Example 2 was replaced with 0.3 g of pyromellitic acid. Then, in the same manner as in Example 1, a coating film of 0.32 μm was formed on a glass substrate. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1. Example 6 In place of the polyglycidyl methacrylate in Example 2, 6.0 g of a copolymer of 62 parts by weight of glycidyl methacrylate and 38 parts by weight of tert-butyl methacrylate (weight average molecular weight in terms of polystyrene 150,000) was used, and the other examples were as follows. A composition solution was prepared in the same manner as in Example 1, and a coating film with a thickness of 0.40 μm was formed on a glass substrate. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1. Comparative Example 1 Glycidyl methacrylate in Example 2 and 3
- Instead of 4.8 g of copolymer of methacryloyloxypropyltrimethoxysilane, a copolymer of 75 parts by weight of glycidyl methacrylate and 25 parts by weight of methyl methacrylate (weight average molecular weight in terms of polystyrene)
A coating film having a thickness of 0.38 μm was formed on a glass substrate in the same manner as in Example 1 except that 5.0 g of 50000) was used. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 1.
【表】
比較例 2
実施例1におけるトリメリツト酸0.5gの代わ
りに、脂環式酸無水物であるヘキサヒドロ無水フ
タル酸(新日本理化社製)0.5gを使用した以外
は実施例1と同様にして、ガラス基板上に膜厚が
0.42μmの塗膜を形成した。得られた塗膜につい
て実施例1と同様の試験を行つた結果は表2に示
す通りであつた。
比較例 3
実施例1におけるトリメリツト酸0.5gの代わ
りに、脂環式酸無水物であるテトラヒドロ無水フ
タル酸(新日本理化社製)0.5gを使用した以外
は実施例1と同様にして、ガラス基板上に膜厚が
0.39μmの塗膜を形成した。得られた塗膜につい
て実施例1と同様の試験を行つた結果は表2に示
す通りであつた。[Table] Comparative Example 2 Same as Example 1 except that 0.5 g of hexahydrophthalic anhydride (manufactured by Shin Nihon Rika Co., Ltd.), which is an alicyclic acid anhydride, was used instead of 0.5 g of trimellitic acid in Example 1. The thickness of the film is increased on the glass substrate.
A coating film of 0.42 μm was formed. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 2. Comparative Example 3 Glass was prepared in the same manner as in Example 1, except that 0.5 g of tetrahydrophthalic anhydride (manufactured by Shin Nippon Chemical Co., Ltd.), which is an alicyclic acid anhydride, was used instead of 0.5 g of trimellitic acid in Example 1. film thickness on the substrate
A coating film of 0.39 μm was formed. The obtained coating film was subjected to the same test as in Example 1, and the results were as shown in Table 2.
本発明のカラーフイルター保護膜形成用組成物
は常温における安定性に優れているため、1液型
熱硬化性樹脂組成物として調製するのに有利であ
る。
本発明の組成物を硬化させて得られるカラーフ
イルターの保護膜用塗膜は、紫外線から可視の領
域にわたる広い範囲の波長域において高い光線透
過率を有して透明性に優れているほか、ガラス、
金属、プラスチツク等の種々の材料からなる基体
に対して優れた接着性を示す。また、この塗膜は
平滑性が高く、高硬度で強靭であるため耐傷性が
高く、耐光性および耐熱性に優れており、長期に
わたる使用によつても変色などの変質を起すこと
がなく、さらに、耐水性、耐溶剤性および耐染性
にも優れたもので、かつ硬度の高いものである。
これらの特徴により、本発明の組成物により形成
される塗膜は、色分離フイルターの防染保護層、
表面保護層等として極めて好適であり、色の鮮明
度や明るさに優れ、信頼性の高い色分離フイルタ
ーを得ることができる。
本発明の組成物により得られる塗膜は、上述の
ように要求諸特性がバランスよく、いずれも良好
であることが大きな特徴である。
Since the composition for forming a color filter protective film of the present invention has excellent stability at room temperature, it is advantageous for preparing it as a one-component thermosetting resin composition. The coating film for the protective film of a color filter obtained by curing the composition of the present invention has high light transmittance in a wide range of wavelengths from ultraviolet to visible regions, and has excellent transparency. ,
Shows excellent adhesion to substrates made of various materials such as metals and plastics. In addition, this coating has high smoothness, high hardness, and toughness, so it has high scratch resistance, and has excellent light and heat resistance, so it will not change in quality such as discoloration even after long-term use. Furthermore, it has excellent water resistance, solvent resistance, and stain resistance, and has high hardness.
Due to these characteristics, the coating film formed by the composition of the present invention can be used as an anti-dye protective layer of a color separation filter,
It is extremely suitable as a surface protective layer, etc., and a highly reliable color separation filter with excellent color clarity and brightness can be obtained. A major feature of the coating film obtained using the composition of the present invention is that, as described above, the required properties are well-balanced and all of them are good.
Claims (1)
基であり、R3は低級アルキル基であり、nは
1〜5の整数である〕 で表される単量体化合物に由来する単量体ユニ
ツトと 一般式(): 〔式中、R2は水素原子または低級アルキル
基であり、nは1〜5の整数である〕 で表わされる単量体化合物に由来する単量体ユ
ニツトとを含有する共重合体、および (B) 芳香族多価カルボン酸および芳香族多価カル
ボン酸の無水物から選ばれる少なくとも1種を
含んでなるカラーフイルター保護膜形成用熱硬
化性樹脂組成物。[Claims] 1 (A) General formula (): [In the formula, R 1 is a hydrogen atom or a lower alkyl group, R 3 is a lower alkyl group, and n is an integer of 1 to 5] A monomer unit derived from a monomer compound represented by and general formula (): [wherein R 2 is a hydrogen atom or a lower alkyl group, and n is an integer of 1 to 5] A copolymer containing a monomer unit derived from a monomer compound represented by B) A thermosetting resin composition for forming a color filter protective film, comprising at least one selected from aromatic polycarboxylic acids and aromatic polycarboxylic acid anhydrides.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6301685A JPS61221218A (en) | 1985-03-27 | 1985-03-27 | Thermosetting resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6301685A JPS61221218A (en) | 1985-03-27 | 1985-03-27 | Thermosetting resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61221218A JPS61221218A (en) | 1986-10-01 |
JPH0554515B2 true JPH0554515B2 (en) | 1993-08-12 |
Family
ID=13217099
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6301685A Granted JPS61221218A (en) | 1985-03-27 | 1985-03-27 | Thermosetting resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61221218A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10353507A1 (en) * | 2003-11-17 | 2005-06-30 | Basf Coatings Ag | Hydrolysates and / or condensates of oligomers and polymers containing epoxide and silane groups, process for their preparation and their use |
JP5691362B2 (en) * | 2010-10-05 | 2015-04-01 | Jnc株式会社 | Thermosetting coloring composition and cured film obtained by firing the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58164659A (en) * | 1982-03-26 | 1983-09-29 | Dainippon Ink & Chem Inc | Resin composition for powdered paint |
JPS5924767A (en) * | 1982-08-02 | 1984-02-08 | Mitsubishi Petrochem Co Ltd | Crosslinking adhesive |
JPS59118243A (en) * | 1982-12-22 | 1984-07-07 | Nissan Motor Co Ltd | Composition for binding molding sand |
-
1985
- 1985-03-27 JP JP6301685A patent/JPS61221218A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58164659A (en) * | 1982-03-26 | 1983-09-29 | Dainippon Ink & Chem Inc | Resin composition for powdered paint |
JPS5924767A (en) * | 1982-08-02 | 1984-02-08 | Mitsubishi Petrochem Co Ltd | Crosslinking adhesive |
JPS59118243A (en) * | 1982-12-22 | 1984-07-07 | Nissan Motor Co Ltd | Composition for binding molding sand |
Also Published As
Publication number | Publication date |
---|---|
JPS61221218A (en) | 1986-10-01 |
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