JPH0552573B2 - - Google Patents
Info
- Publication number
- JPH0552573B2 JPH0552573B2 JP58174887A JP17488783A JPH0552573B2 JP H0552573 B2 JPH0552573 B2 JP H0552573B2 JP 58174887 A JP58174887 A JP 58174887A JP 17488783 A JP17488783 A JP 17488783A JP H0552573 B2 JPH0552573 B2 JP H0552573B2
- Authority
- JP
- Japan
- Prior art keywords
- reflection layer
- optical
- pattern
- information recording
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 16
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000010408 film Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Description
【発明の詳細な説明】
（技術分野）
本発明は、光学的に再生可能な情報記録体を原
版を用いて製造しうる情報記録体の製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a method for manufacturing an information recording medium by which an optically reproducible information recording medium can be manufactured using an original.
（従来技術）
情報を光学的に記録再生することは既に行なわ
れており、通常はレーザー光を用いて情報記録媒
体上の光学記録層の一部を揮散させるか、反射率
の変化を生じさせる、或いは変形を生じさせ、光
学的な反射率や透過率の差によつて情報を記録
し、或いは再生を行なつている。このような光学
記録再生方式に使用する情報記録媒体は磁気記録
再生方式において使用する情報記録媒体にくら
べ、記録密度が１桁以上高く、従つて記録部を狭
い巾で形成しても記録密度を保つことができる。(Prior art) Recording and reproducing information optically has already been carried out, and usually a laser beam is used to evaporate part of the optical recording layer on the information recording medium or cause a change in reflectance. Alternatively, information is recorded or reproduced by causing deformation and the difference in optical reflectance or transmittance. The information recording medium used in such an optical recording/reproducing method has a recording density that is more than an order of magnitude higher than that of an information recording medium used in a magnetic recording/reproducing method. can be kept.
ところで光学記録用の情報記録体には記録及び
再生の両方を行なう場合と、予め記録された情報
記録体を再生のみ行なう場合とがあり、例えばビ
デオデイスク、デジタルオーデイオデイスクは後
者に当たる。このような再生専用の情報記録体は
レーザー光のような干渉性を有する光を用いて再
生するときは情報を微細な凹凸として記録する
が、タングステンランプの光のような一録の光は
干渉性を有しないため、微細な凹凸から情報を再
生することは不可能であり、光学濃度差による微
細なパターンとすることが望まれる。 By the way, information recording media for optical recording include cases in which both recording and reproduction are performed, and cases in which information recording media previously recorded are only reproduced. For example, video discs and digital audio discs fall under the latter category. When this type of reproduction-only information recording medium is reproduced using coherent light such as a laser beam, information is recorded as fine irregularities, but a single recording of light such as the light from a tungsten lamp causes interference. Therefore, it is impossible to reproduce information from minute irregularities, and it is desirable to create a minute pattern based on optical density differences.
光学濃度差による微細なパターン自体は高解像
度の写真乾板もしくはフイルムを用いて形成で
き、又、複製も行なえるが、濃度の濃淡の差（即
ちコントラスト比）を高くすることができず、
又、金属薄膜にレーザー光を照射する方法によつ
てもパターン形成自体はできるもののレーザー光
を必要箇所にスキヤンさせるため大量生産による
複製には不向きである。 The fine pattern itself due to the difference in optical density can be formed using a high-resolution photographic plate or film, and it can also be reproduced, but it is not possible to increase the difference in density (i.e., contrast ratio).
Furthermore, although a pattern can be formed using a method of irradiating a metal thin film with laser light, it is not suitable for mass production duplication because the laser light must be scanned to the necessary locations.
（発明の目的）
従つて、本発明は、主に再生専用であつて、干
渉性を有しない一般の光ででも再生できる非干渉
性光源再生用の情報記録体を容易にかつ効率よく
複製するための方法を提供することを目的とす
る。(Object of the Invention) Therefore, the present invention is intended to easily and efficiently reproduce an information recording medium for reproduction using an incoherent light source, which is mainly used for reproduction only and can be reproduced even with ordinary light without interference. The purpose is to provide a method for
（発明の構成）
本発明の情報記録体の製造方法は、基材上に光
学的低反射層と光学的高反射層がこの順に積層さ
れてなる情報記録媒体の光学的高反射層上にフオ
トレジストを塗布し、次いで形成されたフオトレ
ジスト層に、微細な濃淡パターンを有する原版を
用いて露光を行ない、その後フオトレジストを現
像してレジストパターンを形成させ、しかる後、
レジストパターンを利用してパターン状にエツチ
ングを行なつて光学的高反射層をパターン状に除
去することにより除去部分において光学的低反射
層を露出させることを特徴とするものである。(Structure of the Invention) The method for producing an information recording medium of the present invention includes a method for manufacturing an information recording medium, in which a photo recording medium is formed on a high optical reflection layer of an information recording medium in which a low optical reflection layer and a high optical reflection layer are laminated in this order on a base material. A resist is applied, and then the formed photoresist layer is exposed to light using an original plate having a fine shading pattern.The photoresist is then developed to form a resist pattern, and then,
This method is characterized in that the optically high reflective layer is removed in a patterned manner by etching in a pattern using a resist pattern, thereby exposing the optically low reflective layer in the removed portion.
以下、図面を用いながら本発明を詳細に説明す
る。 Hereinafter, the present invention will be explained in detail using the drawings.
情報記録媒体
本発明で用いる情報記録媒体１は基材２上に光
学的低反射層３と光学的高反射層４とが記載順に
積層されたものである。Information Recording Medium The information recording medium 1 used in the present invention is one in which an optical low reflection layer 3 and an optical high reflection layer 4 are laminated on a base material 2 in the order described.
上記において基材２は用途に応じた剛性、加工
性を有し、後工程、特にエツチング工程で劣化な
どの影響を受けないものが望ましい。基材２の具
体例としてはポリ塩化ビニル、ポリ塩化ビニリデ
ン、ポリエチレンテレフタレート、ポリエチレン
等のプラスチツクのフイルム若しくはシートの単
独、又はラミネート品が使用される。 In the above, it is preferable that the base material 2 has rigidity and workability depending on the intended use, and is not affected by deterioration in a subsequent process, especially an etching process. As a specific example of the base material 2, a single film or sheet of plastic such as polyvinyl chloride, polyvinylidene chloride, polyethylene terephthalate, polyethylene, or a laminate product is used.
光学的低反射層３は後記光学的高反射層４と比
較して光の反射率が低く、望ましくは黒色に着色
されている。又、表面が粗面状のものも光が乱反
射するために低反射率となるので使用できる。 The optical low reflection layer 3 has a lower light reflectance than the optical high reflection layer 4 described later, and is preferably colored black. Moreover, a material with a rough surface can also be used because light is diffusely reflected and the reflectance is low.
具体的には光学的低反射層３は光学的濃度の高
いインキを用いて印刷法もしくは塗布法により形
成するが、無反射クロムを蒸着するか、或いは着
色されたプラスチツクフイルムをラミネートする
ことにより基材２上に形成できる。 Specifically, the optical low reflection layer 3 is formed by a printing method or a coating method using ink with high optical density. It can be formed on material 2.
光学的高反射層４は金、銀、アルミニウム、
銅、スズ、ニツケルもしくはコバルト等の金属の
薄膜層であつて、これらの層は前記した金属を用
いて例えば真空蒸着するかスパツタリングを行な
うことにより形成することができる。なお、上記
した以外の材料や形成法によつたものであつても
エツチング可能である限り使用可能である。 The optical high reflection layer 4 is made of gold, silver, aluminum,
A thin film layer of a metal such as copper, tin, nickel or cobalt, which can be formed using the above-mentioned metal, for example, by vacuum evaporation or sputtering. Note that materials and formation methods other than those described above can also be used as long as they can be etched.
フオトレジスト層の形成
上記の情報記録媒体１の光学的高反射層４の表
面にフオトレジストを塗布してフオトレジスト層
５を形成する。使用するフオトレジストはポジ
型・ネガ型のいずれかでもよいが、解像力が高
く、パターン露光の際の原版パターンを充分に解
像しうるものを選択して用いる。Formation of Photoresist Layer A photoresist is applied to the surface of the optical high reflection layer 4 of the information recording medium 1 to form the photoresist layer 5. The photoresist used may be either positive type or negative type, but one with high resolution and capable of sufficiently resolving the original pattern during pattern exposure is selected and used.
パターン露光・現像
次に情報記録媒体上のフオトレジスト層５に原
版６を用いて露光を行なう。原版６としては光学
的な透過・反射のいずれかのタイプのパターンに
より情報が点状に記録されたものであればよく、
点の形状は円、長円、長方形等であり、その大き
さは円の場合、直径が5μm〜50μmである。原版
６に形成された点状の記録は複製されるべきもの
と同一の大きさで形成されているものでもよい
が、露光が拡大・縮小を伴なうときはその限りで
はなく、拡大・縮小の率を考慮して適宜に定め
る。また、原版６は繰り返し使用するために光学
的・機械的に耐久性の高いものであることが望ま
しい。Pattern Exposure/Development Next, the photoresist layer 5 on the information recording medium is exposed using the original plate 6. The original plate 6 may be one in which information is recorded in the form of dots using either an optical transmission or reflection pattern.
The shape of the point is a circle, ellipse, rectangle, etc., and in the case of a circle, the diameter is 5 μm to 50 μm. The dotted records formed on the original plate 6 may be formed in the same size as the one to be reproduced, but this is not the case when the exposure involves enlargement or reduction. The rate shall be determined as appropriate. Further, since the original plate 6 can be used repeatedly, it is desirable that it has high optical and mechanical durability.
パターン露光後、使用したフオトレジストに合
わせた現像液を使用して現像を行ない不要部分の
フオトレジスト層を除去して、光学的高反射層上
に原版６のパターンに応じたレジストパターン７
を形成する。 After pattern exposure, development is performed using a developer suitable for the photoresist used to remove unnecessary portions of the photoresist layer, and a resist pattern 7 corresponding to the pattern of the original plate 6 is formed on the optical high reflection layer.
form.
エツチング
このようにして形成されたレジストパターン７
を利用し、光学的高反射層４をエツチングしうる
エツチング液を用いてエツチングを行ない、光学
的高反射層４を選択的に除去し、除去部におい
て、下層の光学的低反射層露出部８を生じさせ、
その後、レジストパターンを除去する。これによ
り、原版６のパターンに応じた箇所に点状の光学
的低反射層露出部８とそれ以外の光学的高反射層
４とを有する情報記録体９を得る。Etching Resist pattern 7 formed in this way
The optical high reflection layer 4 is selectively removed by etching using an etching solution capable of etching the optical high reflection layer 4, and the exposed portion 8 of the lower optical low reflection layer is etched in the removed portion. cause
After that, the resist pattern is removed. As a result, an information recording body 9 having dotted optically low-reflection layer exposed portions 8 and other optically high-reflection layer 4 at locations corresponding to the pattern of the original plate 6 is obtained.
（発明の効果）
本発明によれば、非干渉性の光を用いて再生可
能な情報記録体を、各工程自体は公知の工程を用
いながら効率よく製造でき、得られる情報記録体
は光学的高反射層と光学的低反射層とからなるコ
ントラストの高い記録がなされているものとする
ことができるので、本発明の方法は特に再生専用
の情報記録体の大量複製方法として利用価値が大
きいものである。(Effects of the Invention) According to the present invention, an information recording medium that can be reproduced using incoherent light can be efficiently manufactured using known processes in each step, and the obtained information recording medium can be optically Since high-contrast recording consisting of a high-reflection layer and an optically low-reflection layer can be made, the method of the present invention is particularly useful as a method for mass-duplicating information recording media for reproduction only. It is.
実施例
縦・横共５cm、厚み250μmのカーボンブラツク
練り込みポリエチレンテレフタレートフイルムを
基材とし、その上に真空蒸着法により厚み0.1μm
のアルミニウム層を形成した。Example A carbon black-kneaded polyethylene terephthalate film with a length and width of 5 cm and a thickness of 250 μm is used as the base material, and a film with a thickness of 0.1 μm is deposited on it by vacuum deposition.
An aluminum layer was formed.
得られた情報記録媒体のアルミニウム層上にポ
ジ型フオトレジスト（シプレイ社製、AZ−
1350J）をスピンナーコート法により塗布し、直
径5μmの円が10μm間隔で縦横に配列されたパタ
ーンを有する原版を１：１（原寸）で露光し、所
定の現像液で現像し、レジストパターンを形成
し、続いてリン酸（H3PO4）の10％水溶液を60
℃に加熱したエツチングでエツチングし、エツチ
ング部分の下層の黒色層を露出させた。 A positive photoresist (manufactured by Shipley, AZ-
1350J) using a spinner coating method, an original plate with a pattern in which circles with a diameter of 5 μm are arranged vertically and horizontally at 10 μm intervals is exposed at a ratio of 1:1 (actual size), and developed with a specified developer to form a resist pattern. followed by a 10% aqueous solution of phosphoric acid (H 3 PO 4 ) for 60 min.
Etching was performed using an etching device heated to ℃ to expose the black layer below the etched portion.
得られた情報記録体は濃淡の各部分の反射率の
差が40％あり、良好なコントラストを得ることが
できた。 The obtained information recording medium had a 40% difference in reflectance between the dark and dark parts, and good contrast could be obtained.
第１図〜第６図は本発明の方法の各工程を示す
ための断面図である。
１……情報記録媒体、２……基材、３……光学
的低反射層、４……光学的高反射層、５……フオ
トレジスト層、６……原版、７……レジストパタ
ーン、８……光学的低反射層露出部、９……情報
記録体。
1 to 6 are cross-sectional views showing each step of the method of the present invention. DESCRIPTION OF SYMBOLS 1... Information recording medium, 2... Base material, 3... Optical low reflection layer, 4... Optical high reflection layer, 5... Photoresist layer, 6... Original plate, 7... Resist pattern, 8 ...Exposed portion of optical low reflection layer, 9...Information recording body.
Claims (1)
この順に積層されてなる情報記録媒体の光学的高
反射層上にフオトレジストを塗布し、次いで形成
されたフオトレジスト層に、微細な濃淡パターン
を有する原版を用いて露光を行ない、その後フオ
トレジストを現像してレジストパターンを形成さ
せ、しかる後、レジストパターンを利用してパタ
ーン状にエツチングを行なつて光学的高反射層を
パターン状に除去することにより除去部分におい
て光学的低反射層を露出させることを特徴とする
情報記録体の製造方法。1. A photoresist is applied on the optical high reflection layer of an information recording medium in which an optical low reflection layer and an optical high reflection layer are laminated in this order on a base material, and then a fine pattern is applied to the formed photoresist layer. Exposure is performed using an original plate having a light and shade pattern, and then the photoresist is developed to form a resist pattern.Then, the resist pattern is used to perform pattern etching to form a pattern of the optically high reflective layer. 1. A method for manufacturing an information recording medium, which comprises exposing an optically low reflection layer in a removed portion by removing the layer in a shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17488783A JPS6066346A (en) | 1983-09-21 | 1983-09-21 | Production of information recording body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17488783A JPS6066346A (en) | 1983-09-21 | 1983-09-21 | Production of information recording body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6066346A JPS6066346A (en) | 1985-04-16 |
| JPH0552573B2 true JPH0552573B2 (en) | 1993-08-05 |
Family
ID=15986400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17488783A Granted JPS6066346A (en) | 1983-09-21 | 1983-09-21 | Production of information recording body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6066346A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63181142A (en) * | 1987-01-21 | 1988-07-26 | Toppan Printing Co Ltd | Production of optical recording medium |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5711343A (en) * | 1980-06-04 | 1982-01-21 | Drexler Tech | Method of regenerating data from optical data memory master material |
| JPS57212634A (en) * | 1981-06-23 | 1982-12-27 | Ricoh Co Ltd | Optical information recording medium |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4620988Y1 (en) * | 1966-06-11 | 1971-07-20 |
-
1983
- 1983-09-21 JP JP17488783A patent/JPS6066346A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5711343A (en) * | 1980-06-04 | 1982-01-21 | Drexler Tech | Method of regenerating data from optical data memory master material |
| JPS57212634A (en) * | 1981-06-23 | 1982-12-27 | Ricoh Co Ltd | Optical information recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6066346A (en) | 1985-04-16 |
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