JPH0548355Y2 - - Google Patents
Info
- Publication number
- JPH0548355Y2 JPH0548355Y2 JP1518287U JP1518287U JPH0548355Y2 JP H0548355 Y2 JPH0548355 Y2 JP H0548355Y2 JP 1518287 U JP1518287 U JP 1518287U JP 1518287 U JP1518287 U JP 1518287U JP H0548355 Y2 JPH0548355 Y2 JP H0548355Y2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- faraday cup
- code plate
- rotary table
- rotary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 37
- 238000000609 electron-beam lithography Methods 0.000 claims description 9
- 230000007246 mechanism Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1518287U JPH0548355Y2 (zh) | 1987-02-04 | 1987-02-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1518287U JPH0548355Y2 (zh) | 1987-02-04 | 1987-02-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63174158U JPS63174158U (zh) | 1988-11-11 |
| JPH0548355Y2 true JPH0548355Y2 (zh) | 1993-12-24 |
Family
ID=30805876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1518287U Expired - Lifetime JPH0548355Y2 (zh) | 1987-02-04 | 1987-02-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0548355Y2 (zh) |
-
1987
- 1987-02-04 JP JP1518287U patent/JPH0548355Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63174158U (zh) | 1988-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3894271A (en) | Method and apparatus for aligning electron beams | |
| US5194743A (en) | Device for positioning circular semiconductor wafers | |
| CN107339955B (zh) | 一种高精度透镜中心偏检测仪器及其测量方法 | |
| JPH03241651A (ja) | イオン注入装置における高効率走査のための方法及び装置 | |
| EP2008276A2 (en) | Electron beam recording apparatus | |
| JPH0548355Y2 (zh) | ||
| JP2000011464A (ja) | 電子ビーム照射方法及び装置 | |
| JP2005084490A (ja) | 電子ビーム描画方法および描画装置 | |
| US3811069A (en) | Signal stabilization of an alignment detection device | |
| CN1382954A (zh) | 圆筒体的变形量测定装置 | |
| EP0120535A1 (en) | Beam exposure apparatus comprising a diaphragm drive for an object carrier | |
| JPS6321088Y2 (zh) | ||
| JPH01204419A (ja) | 荷電ビーム露光装置 | |
| JP4302566B2 (ja) | ガスクラスターイオンビームによる形状創成方法及び装置 | |
| JPH09162093A (ja) | 荷電粒子ビーム描画における被描画材料の位置および回転ずれの検出方法ならびに荷電粒子ビーム描画方法 | |
| JPS6348042B2 (zh) | ||
| JPS61232546A (ja) | イオン注入装置 | |
| JPH0733140Y2 (ja) | 放射温度計の照準構造 | |
| JPS5841642Y2 (ja) | 電子線照射分析装置の試料ホルダ− | |
| JPH09147427A (ja) | 光ディスク原盤露光方法及びその装置並びに光ディスク | |
| JPH0582731B2 (zh) | ||
| SU1223105A1 (ru) | Камера дл рентгеноструктурного анализа поликристаллов | |
| JPH0875677A (ja) | 四軸型自動回折装置 | |
| JPS6114816B2 (zh) | ||
| JPH0391228A (ja) | 荷電粒子ビーム径測定方法 |