JPH0548213A - Sub-mount for semiconductor laser - Google Patents

Sub-mount for semiconductor laser

Info

Publication number
JPH0548213A
JPH0548213A JP3229504A JP22950491A JPH0548213A JP H0548213 A JPH0548213 A JP H0548213A JP 3229504 A JP3229504 A JP 3229504A JP 22950491 A JP22950491 A JP 22950491A JP H0548213 A JPH0548213 A JP H0548213A
Authority
JP
Japan
Prior art keywords
semiconductor laser
submount
heat sink
hole
mount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3229504A
Other languages
Japanese (ja)
Inventor
Chiharu Ishikura
千春 石倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP3229504A priority Critical patent/JPH0548213A/en
Publication of JPH0548213A publication Critical patent/JPH0548213A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

Abstract

PURPOSE:To reduce manhours when assembling, by providing a through hole in a sub-mount, and by connecting electrically a semiconductor laser oscillation element with a heat sink, and further, by making bondings by wires and barrel coatings unnecessary. CONSTITUTION:In a sub-mount 7 made of an insulation material, which is located between a semiconductor laser oscillation element 3 and a heat sink 4, a through hole 6 is provided. By the metallized layer formed on the inner surface of the through hole 6, the semiconductor laser oscillation element 3 makes continuity with the heat sink 4, which are provided respectively on both surfaces of the sub-mount 7. Thereby, bondings by wires are made unnecessary, and manhours when assembling are reduced, and further, the generations of faulty continuity caused by the disconnections of wires are eliminated. Also, on a machining process, a dicing-cut is performed in a final process. Therefore, machining can be treated in the state of an AlN base board, and it is facilitated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体レーザーの発振
素子を、Cu製で表面にAuめっきを施したヒートシン
クにマウントする基板に係り、発振素子とヒートシンク
間の導電性と良好な熱伝導率を持ち合わせた機能を有す
る半導体レーザーのサブマウントに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for mounting an oscillation element of a semiconductor laser on a heat sink made of Cu and having an Au plating on its surface. The substrate has good conductivity and good thermal conductivity. The present invention relates to a submount of a semiconductor laser having a function having both.

【0002】[0002]

【従来の技術】従来の半導体レーザーのサブマウントの
1つは、図6に示すAlN基板1の両面に、図7に示す
ようにTi/Pt/Au又はCr/Ni/Au等をスパ
ッタ法によりコーティングしてメタライズ層2を作り次
に図8に示すように所定のサイズにダイシングカットを
行った後、図9に示すように片面にレーザー発振素子3
を、他の片面にヒートシンク4を半田等によりボンディ
ングしていた。そしてAlN基板1自体は導電性が無
く、周面はダイシングカットにより導通が無い為、レー
ザー発振素子3側のAlN基板1のメタライズ層2とヒ
ートシンク4の表面を図10に示すようにワイヤー5をボ
ンディングして導通をとっていた。また、ワイヤーボン
ディングしない従来の半導体レーザーのサブマウントの
他の1つは、図11に示すAlN基板1を図12に示すよう
に所定のサイズにダイシングカットを行った後、スパッ
タ法又は真空蒸着法によりTi/Pt/Auをバレルコ
ーティングし、図13に示すようにサブマウント全周にメ
タライズ層2を作り、次に図14に示すように片面にレー
ザー発振素子3を、他の片面にヒートシンク4を半田等
によりボンディングして、メタライズ層2により導通を
とっていた。
2. Description of the Related Art One of conventional semiconductor laser submounts is a sputtering method in which Ti / Pt / Au or Cr / Ni / Au or the like is sputtered on both sides of an AlN substrate 1 shown in FIG. The metallized layer 2 is formed by coating, and then a dicing cut is performed to a predetermined size as shown in FIG. 8, and then the laser oscillation element 3 is formed on one surface as shown in FIG.
The heat sink 4 was bonded to the other side by soldering or the like. Since the AlN substrate 1 itself is not conductive and the peripheral surface is not conductive due to the dicing cut, the surfaces of the metallized layer 2 and the heat sink 4 of the AlN substrate 1 on the laser oscillation element 3 side are covered with the wire 5 as shown in FIG. It was bonded and made conductive. Another one of the conventional semiconductor laser submounts not wire-bonded is a sputtering method or a vacuum deposition method after dicing the AlN substrate 1 shown in FIG. 11 to a predetermined size as shown in FIG. Barrel-coat Ti / Pt / Au with a metallized layer 2 on the entire circumference of the submount as shown in FIG. 13. Next, as shown in FIG. 14, a laser oscillator 3 is provided on one side and a heat sink 4 is provided on the other side. Was bonded with solder or the like, and the metallized layer 2 was used for electrical conduction.

【0003】ところで、前者の場合は、ワイヤー5の断
線が生じることがあり、またワイヤー5をボンディング
する為のスペースの確保が必要となる。ワイヤー5の断
線は信頼性を低下し、スペースの確保は小型化を阻害す
ることとなる。また後者の場合は、AlN基板1のダイ
シングカット後のバレルコーティングに手間がかかる。
しかもダイシングカットしたチップの洗浄、乾燥が必要
であり、またばらばらになったチップの取扱いが甚だ厄
介となる。
By the way, in the former case, the wire 5 may be broken, and it is necessary to secure a space for bonding the wire 5. Breakage of the wire 5 lowers reliability, and securing a space hinders miniaturization. In the latter case, the barrel coating after dicing and cutting the AlN substrate 1 is troublesome.
In addition, it is necessary to clean and dry the chips that have been cut by dicing, and the handling of the separated chips becomes very troublesome.

【0004】[0004]

【発明が解決しようとする課題】そこで本発明は、ワイ
ヤーボンディングせず、またバレルコーティングせず
に、レーザー発振素子とヒートシンクの導通をとること
のできる半導体レーザーのサブマウントを提供しようと
するものである。
SUMMARY OF THE INVENTION Therefore, the present invention is intended to provide a semiconductor laser submount capable of establishing electrical continuity between a laser oscillator and a heat sink without wire bonding or barrel coating. is there.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
の本発明の半導体レーザーのサブマウントは、半導体レ
ーザー発振素子とヒートシンクと前記両者の間に位置す
る絶縁材のサブマウントよりなる半導体レーザーに於い
て、前記サブマウントにスルホールを設け、このスルホ
ールの内面にメタライズ層を形成して、半導体レーザー
発振素子とヒートシンクの導通をとったことを特徴とす
るものである。
A submount of a semiconductor laser according to the present invention for solving the above-mentioned problems is a semiconductor laser including a semiconductor laser oscillator, a heatsink and a submount of an insulating material located between the two. In this case, a through hole is provided in the submount, and a metallization layer is formed on the inner surface of the through hole to establish electrical continuity between the semiconductor laser oscillator and the heat sink.

【0006】[0006]

【作用】上記のように本発明の半導体レーザーのサブマ
ウントは、スルホールを設けて、このスルホール内面に
形成したメタライズ層により両面の半導体レーザー発振
素子とヒートシンクの導通をとっているので、ワイヤー
によるボンディングが不要となり、組立時の工数削減及
びワイヤー断線による導通不良の発生が解消される。ま
た加工工程上、最終工程でダイシングカットを行うこと
となるので、最終までAlN基板の状態で取り扱うこと
ができ、加工が容易となる。
As described above, in the semiconductor laser submount according to the present invention, the through holes are provided, and the semiconductor laser oscillation elements on both sides are electrically connected to the heat sink by the metallized layers formed on the inner surfaces of the through holes. Is unnecessary, and the number of man-hours at the time of assembly is reduced and the occurrence of defective conduction due to wire breakage is eliminated. In addition, since the dicing cut is performed in the final step in the processing step, it can be handled in the state of the AlN substrate until the end, and the processing becomes easy.

【0007】[0007]

【実施例】本発明の半導体レーザーのサブマウントの一
実施例と従来例について説明する。先ず実施例について
説明すると、図1に示す長さ75mm、幅75mm、厚さ 0.3mm
の鏡面仕上げ(表面粗さRa1000Å程度)のAlN基板
1に、図2に示すようにレーザー加工にて直径 0.1mmの
スルホール6を1mmピッチにて4900個穿設した。次に図
3に示すようにAlN基板1の表裏両面にRF 500W、
3分間のスパッタエッチングをした後にTi(1000Å)
/Pt(3000Å)/Au(2000Å)をスパッタ法(DC
1KW)によりコーティングしてメタライズ層2を形成
すると共にスルホール6の内面にもコーティングしてメ
タライズ層2を形成して表裏両面の導通をとった。この
時のスパッタ処理は、Ti、Pt、Au夫々DC1KW
であり、到達真空度5×10-6Torr、Arガス圧3×
10-3Torrである。次いでこの表面及びスルホール6
の内面にメタライズ層2を形成したAlN基板1を、図
4に示すようにダイサーにてスルホール6を1個ずつ中
心に据えて一辺 1.0mmの方形にカットしてサブマウント
7を作成した。このサブマウント7を図5に示すように
ヒートシンク4の表面にAuSn20wt%の半田にてボン
ディングし、サブマウント7の表面にレーザー発振素子
3をAuSn20wt%の半田にてボンディングした。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a semiconductor laser submount according to the present invention and a conventional example will be described. First, an example will be described. A length of 75 mm, a width of 75 mm, and a thickness of 0.3 mm shown in FIG.
As shown in FIG. 2, 4900 through holes 6 having a diameter of 0.1 mm were bored at a 1 mm pitch by laser processing on an AlN substrate 1 having a mirror finish (surface roughness Ra 1000 Å). Next, as shown in FIG. 3, RF 500W is applied to both front and back surfaces of the AlN substrate 1.
Ti (1000Å) after sputter etching for 3 minutes
/ Pt (3000Å) / Au (2000Å) sputter method (DC
1 KW) to form the metallized layer 2 and also to coat the inner surface of the through hole 6 to form the metallized layer 2 so that electrical conduction can be established between the front and back surfaces. The sputtering process at this time was DC1KW for Ti, Pt, and Au, respectively.
And the ultimate vacuum is 5 × 10 −6 Torr, Ar gas pressure is 3 ×
It is 10 -3 Torr. Then this surface and through hole 6
As shown in FIG. 4, the AlN substrate 1 having the metallized layer 2 formed on the inner surface thereof was cut into a square of 1.0 mm on each side with one through hole 6 placed at the center with a dicer to form a submount 7. As shown in FIG. 5, the submount 7 was bonded to the surface of the heat sink 4 with AuSn 20 wt% solder, and the laser oscillator 3 was bonded to the surface of the submount 7 with AuSn 20 wt% solder.

【0008】一方、従来例について説明すると、図6に
示す実施例と同一のAlN基板1の両面に、図7に示す
ように実施例と同じTi(1000Å)/Pt(3000Å)/
Au(2000Å)をスパッタ法によりコーティングしてメ
タライズ層2を形成し、次に図8に示すようにダイサー
にて一辺1.0mmの方形にカットしてサブマウントを作っ
た後、図9に示すようにヒートシンク4の表面にAuS
n20wt%の半田にてボンディングし、サブマウントの表
面にAuSn20wt%の半田にてレーザー発振素子3をボ
ンディングし、然る後図10に示すようにレーザー発振素
子3側のAlN基板1のメタライズ層2とヒートシンク
4の表面に直径50μmのAuワイヤー5をボンディング
して導通をとった。
On the other hand, to explain the conventional example, as shown in FIG. 7, the same Ti (1000Å) / Pt (3000Å) / Pt (3000Å) /
Au (2000Å) is coated by a sputtering method to form a metallized layer 2, and then, as shown in FIG. 8, a dicer is used to cut a square with a side of 1.0 mm to form a submount, and then as shown in FIG. AuS on the surface of the heat sink 4
Bonding with n20wt% solder, laser bonding element 3 is bonded to the surface of the submount with AuSn20wt% solder, and then the metallization layer 2 of the AlN substrate 1 on the laser oscillation element 3 side is bonded as shown in FIG. Then, an Au wire 5 having a diameter of 50 μm was bonded to the surface of the heat sink 4 to establish conduction.

【0009】然してこれら各々 100個の半導体レーザー
のサブマウントの上面とヒートシンクの上面の位置で抵
抗値を測定した処、従来例のものは平均抵抗値が 0.1Ω
でAuワイヤー5が断線する導通破壊が2個もあったの
に対し、実施例のものは、平均抵抗値が0.06Ωで導通破
壊は皆無であった。
However, when the resistance values were measured at the positions of the upper surface of the submount of each of these 100 semiconductor lasers and the upper surface of the heat sink, the average resistance value of the conventional example was 0.1Ω.
In contrast, there were two conductive breakdowns in which the Au wire 5 was broken, whereas in the example, the average resistance value was 0.06Ω and no conductive breakdown was observed.

【0010】[0010]

【発明の効果】以上の通り本発明の半導体レーザーのサ
ブマウントは、スルホールを設け、このスルホールの内
面にメタライズ層を形成して、両面のレーザー発振素子
とヒートシンクの導通をとっているので、従来のような
ワイヤーによるボンディングは不要であり、またバレル
コーティングも必要がなく、組立時の工数が削減され、
ワイヤー断線による導通不良が解消される。また加工工
程上、最終工程でダイシングカットを行うこととなるの
で、最後までAlN基板の状態で取り扱うことができ、
品質、性能の安定したものを得ることができる。
As described above, in the semiconductor laser submount of the present invention, the through hole is provided, and the metallization layer is formed on the inner surface of the through hole to establish the conduction between the laser oscillation element and the heat sink on both sides. There is no need for wire bonding, and no barrel coating is required, reducing the number of steps during assembly,
Conduction failure due to wire breakage is eliminated. In addition, since the dicing cut is performed in the final step in the processing step, it can be handled in the state of the AlN substrate until the end.
It is possible to obtain stable quality and performance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体レーザーのサブマウントの一実
施例の製作工程を示す図である。
FIG. 1 is a diagram showing a manufacturing process of an embodiment of a semiconductor laser submount according to the present invention.

【図2】本発明の半導体レーザーのサブマウントの一実
施例の製作工程を示す図である。
FIG. 2 is a diagram showing a manufacturing process of an embodiment of a semiconductor laser submount according to the present invention.

【図3】本発明の半導体レーザーのサブマウントの一実
施例の製作工程を示す図である。
FIG. 3 is a diagram showing a manufacturing process of an embodiment of a semiconductor laser submount according to the present invention.

【図4】本発明の半導体レーザーのサブマウントの一実
施例の製作工程を示す図である。
FIG. 4 is a diagram showing a manufacturing process of an embodiment of the semiconductor laser submount according to the present invention.

【図5】本発明の半導体レーザーのサブマウントの一実
施例の製作工程を示す図である。
FIG. 5 is a diagram showing a manufacturing process of an embodiment of the semiconductor laser submount according to the present invention.

【図6】従来の半導体レーザーのサブマウントの一例の
製作工程を示す図である。
FIG. 6 is a diagram showing a manufacturing process of an example of a conventional semiconductor laser submount.

【図7】従来の半導体レーザーのサブマウントの一例の
製作工程を示す図である。
FIG. 7 is a diagram showing a manufacturing process of an example of a conventional semiconductor laser submount.

【図8】従来の半導体レーザーのサブマウントの一例の
製作工程を示す図である。
FIG. 8 is a diagram showing a manufacturing process of an example of a conventional semiconductor laser submount.

【図9】従来の半導体レーザーのサブマウントの一例の
製作工程を示す図である。
FIG. 9 is a diagram showing a manufacturing process of an example of a conventional semiconductor laser submount.

【図10】従来の半導体レーザーのサブマウントの一例の
製作工程を示す図である。
FIG. 10 is a diagram showing a manufacturing process of an example of a conventional semiconductor laser submount.

【図11】従来の半導体レーザーのサブマウントの他の例
の製作工程を示す図である。
FIG. 11 is a diagram showing a manufacturing process of another example of the conventional semiconductor laser submount.

【図12】従来の半導体レーザーのサブマウントの他の例
の製作工程を示す図である。
FIG. 12 is a diagram showing a manufacturing process of another example of the conventional semiconductor laser submount.

【図13】従来の半導体レーザーのサブマウントの他の例
の製作工程を示す図である。
FIG. 13 is a diagram showing a manufacturing process of another example of the conventional semiconductor laser submount.

【図14】従来の半導体レーザーのサブマウントの他の例
の製作工程を示す図である。
FIG. 14 is a diagram showing a manufacturing process of another example of the conventional semiconductor laser submount.

【符号の説明】[Explanation of symbols]

1 AlN基板 2 AlN基板の上下両面及びスルホール内面のメタラ
イズ層 3 レーザー発振素子 4 ヒートシンク 6 スルホール 7 サブマウント
1 AlN substrate 2 Metallized layer on both upper and lower surfaces of AlN substrate and through hole inner surface 3 Laser oscillator 4 Heat sink 6 Through hole 7 Submount

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体レーザー発振素子とヒートシンク
と前記両者の間に位置する絶縁材のサブマウントよりな
る半導体レーザーに於いて、前記サブマウントにスルホ
ールを設け、このスルホールの内面にメタライズ層を形
成して、半導体レーザー発振素子とヒートシンクの導通
をとったことを特徴とする半導体レーザーのサブマウン
ト。
1. A semiconductor laser comprising a semiconductor laser oscillator, a heat sink, and a submount made of an insulating material located between the two, wherein a through hole is provided in the submount, and a metallized layer is formed on an inner surface of the through hole. The semiconductor laser submount is characterized in that the semiconductor laser oscillator and the heat sink are electrically connected.
JP3229504A 1991-08-15 1991-08-15 Sub-mount for semiconductor laser Pending JPH0548213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3229504A JPH0548213A (en) 1991-08-15 1991-08-15 Sub-mount for semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3229504A JPH0548213A (en) 1991-08-15 1991-08-15 Sub-mount for semiconductor laser

Publications (1)

Publication Number Publication Date
JPH0548213A true JPH0548213A (en) 1993-02-26

Family

ID=16893212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3229504A Pending JPH0548213A (en) 1991-08-15 1991-08-15 Sub-mount for semiconductor laser

Country Status (1)

Country Link
JP (1) JPH0548213A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0755074A2 (en) * 1995-07-18 1997-01-22 Tokuyama Corporation Submount
JP2002100826A (en) * 2000-09-21 2002-04-05 Toshiba Corp Submount material
JP2002329928A (en) * 2001-02-27 2002-11-15 Ricoh Co Ltd Optical communication system
WO2003075341A1 (en) * 2002-03-06 2003-09-12 Sumitomo Electric Industries, Ltd. Submount and semiconductor device
JP2005005511A (en) * 2003-06-12 2005-01-06 Fanuc Ltd Semiconductor laser apparatus
JP2013236010A (en) * 2012-05-10 2013-11-21 Mitsubishi Electric Corp Semiconductor device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0755074A2 (en) * 1995-07-18 1997-01-22 Tokuyama Corporation Submount
EP0755074A3 (en) * 1995-07-18 1998-04-01 Tokuyama Corporation Submount
US5770821A (en) * 1995-07-18 1998-06-23 Tokuyama Corporation Submount
JP2002100826A (en) * 2000-09-21 2002-04-05 Toshiba Corp Submount material
JP2002329928A (en) * 2001-02-27 2002-11-15 Ricoh Co Ltd Optical communication system
WO2003075341A1 (en) * 2002-03-06 2003-09-12 Sumitomo Electric Industries, Ltd. Submount and semiconductor device
EP1482544A1 (en) * 2002-03-06 2004-12-01 Sumitomo Electric Industries, Ltd. Submount and semiconductor device
EP1482544A4 (en) * 2002-03-06 2006-09-27 Sumitomo Electric Industries Submount and semiconductor device
US7298049B2 (en) 2002-03-06 2007-11-20 Sumitomo Electric Industries, Ltd. Submount for mounting semiconductor device
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