JPH0546091B2 - - Google Patents
Info
- Publication number
- JPH0546091B2 JPH0546091B2 JP58128912A JP12891283A JPH0546091B2 JP H0546091 B2 JPH0546091 B2 JP H0546091B2 JP 58128912 A JP58128912 A JP 58128912A JP 12891283 A JP12891283 A JP 12891283A JP H0546091 B2 JPH0546091 B2 JP H0546091B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- cooling
- baking
- temperature
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001816 cooling Methods 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 37
- 238000011161 development Methods 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 description 20
- 238000012545 processing Methods 0.000 description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 238000010894 electron beam technology Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- -1 poly(2,2,2-trifluoroethyl-α-chloroacrylate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58128912A JPS6021522A (ja) | 1983-07-15 | 1983-07-15 | レジストパタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58128912A JPS6021522A (ja) | 1983-07-15 | 1983-07-15 | レジストパタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6021522A JPS6021522A (ja) | 1985-02-02 |
| JPH0546091B2 true JPH0546091B2 (ko) | 1993-07-13 |
Family
ID=14996435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58128912A Granted JPS6021522A (ja) | 1983-07-15 | 1983-07-15 | レジストパタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6021522A (ko) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR860002082B1 (ko) * | 1983-01-19 | 1986-11-24 | 가부시기가이샤 도시바 | 레지스트 패턴의 형성 방법 및 장치 |
| DE3689606T2 (de) * | 1985-10-22 | 1994-05-19 | Kuraray Co | Herstellungsverfahren für Phasengitter vom zusammengesetzten Muster-Refraktionstyp. |
| JPS63107116A (ja) * | 1986-10-24 | 1988-05-12 | Fujitsu Ltd | レジストベ−キング方法 |
| JPS63161803U (ko) * | 1987-04-10 | 1988-10-21 | ||
| JPS63259559A (ja) * | 1987-04-16 | 1988-10-26 | Hitachi Condenser Co Ltd | 印刷配線板のパタ−ン形成方法 |
| JPH01133621U (ko) * | 1988-02-29 | 1989-09-12 | ||
| EP0761317B1 (en) * | 1994-12-28 | 2002-07-10 | Toray Industries, Inc. | Coating method and coating apparatus |
| WO2004070820A1 (ja) | 2003-02-05 | 2004-08-19 | Semiconductor Energy Laboratory Co., Ltd. | 配線の作製方法 |
| JP5767991B2 (ja) * | 2012-03-23 | 2015-08-26 | カヤバ工業株式会社 | 流体圧シリンダ |
-
1983
- 1983-07-15 JP JP58128912A patent/JPS6021522A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6021522A (ja) | 1985-02-02 |
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