JPH0545489B2 - - Google Patents

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Publication number
JPH0545489B2
JPH0545489B2 JP27432285A JP27432285A JPH0545489B2 JP H0545489 B2 JPH0545489 B2 JP H0545489B2 JP 27432285 A JP27432285 A JP 27432285A JP 27432285 A JP27432285 A JP 27432285A JP H0545489 B2 JPH0545489 B2 JP H0545489B2
Authority
JP
Japan
Prior art keywords
workpiece
mask substrate
mounting table
sides
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27432285A
Other languages
Japanese (ja)
Other versions
JPS62136428A (en
Inventor
Nobuyuki Iizuka
Tsunemi Fukushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP27432285A priority Critical patent/JPS62136428A/en
Publication of JPS62136428A publication Critical patent/JPS62136428A/en
Publication of JPH0545489B2 publication Critical patent/JPH0545489B2/ja
Granted legal-status Critical Current

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  • Special Conveying (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、角形のマスク基板検査装置などに
おいて、収納カセツトとの間に角形マスク基板
(ワーク)を移送するための角形マスク基板移送
機構に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a square mask substrate transfer mechanism for transferring a square mask substrate (work) between a storage cassette and the like in a square mask substrate inspection apparatus or the like. It is something.

半導体製品であるICデバイスを製造する場合、
第1段階としてマスク基板がつくられる。マスク
基板の素材(サブストレート)は水晶またはガラ
スによるもので、形状は最近では専ら角形(正方
形)のものが用いられており、大きさとして1辺
が4〜7インチ(約10〜18cm)の各種がある。
When manufacturing IC devices, which are semiconductor products,
As a first step, a mask substrate is created. The mask substrate material (substrate) is made of crystal or glass, and recently the shape is exclusively rectangular (square), and the size is 4 to 7 inches (approximately 10 to 18 cm) on a side. There are various types.

サブストレートは順次各種のプロセスを経て、
その表面に回路パタンが形成されてマスク基板と
なり、これをもととして投影法によりICが製造
される。このように、マスク基板はICの母体で
あるので、そしその表面に疵または塵埃などが混
存するときは、製造されるすべてのICの不良の
原因となり影響するところが非常に大きいので、
各プロセスはもちろん、処理または検査装置の間
におけるワークの着脱・移送の際、表面に接触す
ることは極力避けることが必要とされている。ま
た、各種の処理・検査装置またはそれら付随する
着脱・移送の機構における発塵についても厳重に
防止を図らなければらない。
The substrate goes through various processes sequentially,
A circuit pattern is formed on its surface to form a mask substrate, and ICs are manufactured using the projection method based on this mask substrate. In this way, since the mask substrate is the mother body of the IC, if there are any flaws or dust on its surface, it will cause and have a large effect on the failure of all ICs manufactured.
It is necessary to avoid contact with surfaces as much as possible during each process, as well as during loading/unloading/transfer of workpieces between processing or inspection equipment. In addition, strict measures must be taken to prevent dust generation from various processing/inspection devices or their accompanying attachment/detachment/transfer mechanisms.

従来、マスク基板の検査装置においては、収納
カセツトに対する供試ワークの移送には、プラス
チツクのベルトが使用されているが、ベルトがワ
ークの裏面に接触するため疵を生ずる虞がある。
またワークの取り出しおよび挿入には、引き出し
台といわれる機構が用いられているが、機構が複
雑で寸法が大きいばかりでなく、各種のワークサ
イズに対応するためには、機構の1部の段取りを
変えることが必要であるなど不便であり、満足す
べきものではない。
Conventionally, in a mask substrate inspection apparatus, a plastic belt is used to transfer a sample workpiece to a storage cassette, but the belt comes into contact with the back surface of the workpiece, which may cause flaws.
In addition, a mechanism called a drawer table is used to take out and insert workpieces, but it is not only complex and large in size, but also requires the setup of a part of the mechanism in order to accommodate various workpiece sizes. It is inconvenient that it is necessary to change, and it is not something that should be satisfied.

[発明の目的] この発明は、角形のマスク基板を収納カセツト
に挿入するための移送・押し込みの機構におい
て、ワークの表面に非接触で、また各種のサイズ
のワークに対して段取り替えを必要とせず、構造
が単純な角形マスク基板の移送機構を提供するこ
とを目的とするものである。
[Object of the Invention] The present invention provides a transfer/pushing mechanism for inserting a square mask substrate into a storage cassette without contacting the surface of the workpiece and without requiring setup changes for workpieces of various sizes. First, it is an object of the present invention to provide a transport mechanism for a rectangular mask substrate that has a simple structure.

[問題点を解決するための手段] この発明においては、角形マスク基板であるワ
ークの移送・押し込みを機械的に行うものである
が、その機構とワークの接触はワークの側面およ
び側面と表・裏面のなす稜線に限るものである。
[Means for Solving the Problems] In the present invention, the workpiece, which is a rectangular mask substrate, is transferred and pushed mechanically, but the mechanism and the workpiece come into contact with each other on the sides of the workpiece and on the side surface and the front side. This is limited to the ridgeline formed on the back side.

第1図aはこの発明に用いたV字形のワーク載
置台2を示すもので、ワーク(角形マスク基板)
1は載置台2のV字をなす2辺の上に側面の稜線
で接触して載置されている。
Figure 1a shows a V-shaped workpiece mounting table 2 used in the present invention, in which a workpiece (square mask substrate) is mounted.
1 is placed on the two sides of the V-shape of the mounting table 2 so as to be in contact with each other at the side ridge lines.

第1図bはこの発明に用いたテーパ付きローラ
3を示すもので、ローラ3は中央部へ互いに下傾
する搬送面をもつ。そして、ワーク1は相対する
ローラ3(1対のみ図示)の上にワーク1の対向
する2辺の稜線で接触して載置されている。ここ
で押出機構としての押出具4でワーク1の側面を
矢印Bの方向に押すときは、ワーク1の進行につ
れてローラ3が自由回転をするが、両者の接触は
ワーク1の対向する2辺の稜線に限られている。
FIG. 1b shows a tapered roller 3 used in the present invention, and the roller 3 has conveying surfaces that are inclined downward toward the center. The workpiece 1 is placed on opposing rollers 3 (only one pair is shown) with the ridge lines of two opposing sides of the workpiece 1 in contact with each other. When pushing the side surface of the workpiece 1 in the direction of arrow B with the extrusion tool 4 as the extrusion mechanism, the roller 3 rotates freely as the workpiece 1 advances, but the contact between the two is on the two opposing sides of the workpiece 1. Limited to ridges.

第1図cは、ワーク1、ワーク載置台2および
テーパ付きローラ3の配置図である。図中の5は
前段階に行われた検査の位置からワーク載置台2
までワーク1を搬送するための搬送チヤツクを示
す。
FIG. 1c is a layout diagram of the workpiece 1, the workpiece mounting table 2, and the tapered roller 3. 5 in the figure is the workpiece mounting table 2 from the position of the inspection performed in the previous stage.
The conveyance chuck for conveying the workpiece 1 up to the point shown in FIG.

第2図は、この発明におけるワーク1の移送の
手順を説明する各段階の垂直断面図である。図中
でイは、上記した搬送チヤツク5にチヤツクされ
たワーク1を示し、これが下降すると図ロのよう
に、ワーク1は載置台2の上に稜線を接して載置
される。さらに載置台2が降下して図ハの状態と
なると、載置台2は無関係となり、ワーク1はロ
ーラ3に移される。ここで、押出具4によりワー
クの側面を矢印Bの方向に押圧すると、上述の通
りワーク1はワーク1の対向する2辺の稜線で接
触して移送される。
FIG. 2 is a vertical cross-sectional view of each stage of the procedure for transferring the workpiece 1 according to the present invention. In the figure, A indicates the work 1 chucked on the above-mentioned transport chuck 5, and when the chuck is lowered, the work 1 is placed on the mounting table 2 with the ridge line in contact with it, as shown in the figure B. When the mounting table 2 further descends to the state shown in FIG. 3C, the mounting table 2 becomes irrelevant and the work 1 is transferred to the rollers 3. Here, when the side surface of the workpiece is pressed in the direction of the arrow B by the extrusion tool 4, the workpiece 1 is brought into contact with the ridge lines of two opposing sides of the workpiece 1 and transferred as described above.

[実施例] 第3図にこの発明による角形マスク基板移送機
構の1実施例を示す。ベース板6の中央部に垂直
移動軸8に結合した垂直軸8′を設け、該垂直軸
8′の上部にV字形のワーク載置台2をとりつけ
る。モータ9はワーク載置台2の昇降用である。
ワーク載置台2を挟んで両側に2枚のフレームバ
ー7を平行に固定して、それぞれに1連のテーパ
付きローラ3を軸支して配列する。これらのロー
ラ3は中央部へ互いに下傾する搬送面をもつ。
[Embodiment] FIG. 3 shows an embodiment of a square mask substrate transfer mechanism according to the present invention. A vertical shaft 8' connected to the vertical movement shaft 8 is provided at the center of the base plate 6, and a V-shaped workpiece mounting table 2 is attached to the upper part of the vertical shaft 8'. The motor 9 is used to raise and lower the workpiece mounting table 2.
Two frame bars 7 are fixed in parallel on both sides with the workpiece mounting table 2 in between, and a series of tapered rollers 3 are supported and arranged on each frame bar. These rollers 3 have conveying surfaces that are inclined downward toward the center.

載置台2およびローラ3の大きさ、ならびにロ
ーラ3の隣接の間隔、あるいは対向する間隔など
は、供試されるワークサイズのうちの最小、最大
のものを考慮して、各種のサイズのワークに適用
できるように選定するものである。現行の4〜7
インチ(約10〜18cm)のワークに対して、これは
十分可能である。また、このようにすることによ
り、ワークサイズの変更に対して段取り替えが不
要となる 押出具4は、2本のガイド棒13に沿つて可動
の移動子14に取り付けられており、またモータ
12はスチールベルト11を介して移動子14を
移動するものである。
The sizes of the mounting table 2 and rollers 3, as well as the spacing between adjacent rollers 3 or opposing spacing, etc., are determined based on the minimum and maximum sizes of the workpieces being tested. The selection should be made so that it can be applied. Current 4-7
This is quite possible for inch (approximately 10 to 18 cm) workpieces. In addition, by doing this, there is no need to change the setup when changing the workpiece size. The mover 14 is moved via the steel belt 11.

いま、前述した搬送チヤツク5により、ワーク
1が載置台2の上に載置されると、シーケンサな
どの制御によりモータ9が回転して載置台2が降
下し、ワーク1はローラ3に移される。ついでモ
ータ12の回転により、押出具4が押出されてワ
ーク1は収納カセツト15の方に移送されるもの
である。
Now, when the workpiece 1 is placed on the mounting table 2 by the aforementioned transport chuck 5, the motor 9 is rotated under the control of a sequencer, the mounting table 2 is lowered, and the workpiece 1 is transferred to the rollers 3. . Next, the pushing tool 4 is pushed out by the rotation of the motor 12, and the workpiece 1 is transferred to the storage cassette 15.

[発明の効果] この発明による角形マスク基板移送機構によれ
ば、当初に述べた従来のベルト方式においてワー
クに生ずる疵、塵埃の問題および収納カセツトの
引き出し台における機構の複雑さと段取り替えの
必要性がすべて排除されている。すなわち、V字
形の載置台およびテーパ付きローラを導入してワ
ークの稜線のみに接触し表・裏面には非接触で移
送する方式であるので、ワークの品質を低下する
虞が全くない。また、ワーク載置台2およびテー
パ付きローラ3はともに各種のサイズのワークに
対応できるので、段取り替えが不要であり、かつ
これらは単純な原理および簡単な構造のものであ
るなど優れた性能を有しており、半導体生産技術
に寄与するところ大きいものがある。
[Effects of the Invention] The rectangular mask substrate transfer mechanism according to the present invention solves the problems of scratches and dust that occur on the workpiece in the conventional belt method mentioned earlier, as well as the complexity of the mechanism and the need for setup changes in the storage cassette drawer stand. are all excluded. That is, since the method uses a V-shaped mounting table and tapered rollers to contact only the ridgeline of the workpiece and transfer the workpiece without contacting the front and back surfaces, there is no risk of degrading the quality of the workpiece. In addition, both the workpiece mounting table 2 and the tapered roller 3 can accommodate workpieces of various sizes, so there is no need to change setups, and they have excellent performance due to their simple principles and simple structure. There are significant contributions to semiconductor production technology.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aはこの発明による角形マスク基板移送
機構に用いるV字形ワーク載置台にワークを載置
した図、第1図bはこの発明による角形マスク基
板移送機構に用いるテーパ付きローラにワークを
載置した図、第1図cはこの発明による角形マス
ク基板移送機構における各部の相互位置を示す配
置図、第2図はこの発明による角形マスク基板移
送機構におけるワークの移送手順の説明図、第3
図はこの発明による角形マスク基板移送機構の1
実施例の斜視外観図である。 1……ワーク、2……ワーク載置台、3……テ
ーパ付きローラ、4……押出具、5……搬送チヤ
ツク、6……ベース板、7……フレームバー、8
……垂直駆動機構、8′……垂直移動軸、9…1
2……モータ、10……滑車、11……スチール
ベルト、13……ガイド棒、14……移動子、1
5……収納カセツト部。
FIG. 1a is a diagram showing a workpiece placed on a V-shaped workpiece mounting table used in the square mask substrate transfer mechanism according to the present invention, and FIG. 1b is a diagram showing a workpiece placed on a tapered roller used in the square mask substrate transfer mechanism according to the present invention. FIG. 1c is a layout diagram showing the relative positions of various parts in the square mask substrate transfer mechanism according to the present invention, FIG. 2 is an explanatory diagram of the workpiece transfer procedure in the square mask substrate transfer mechanism according to the present invention,
The figure shows one of the square mask substrate transfer mechanisms according to the present invention.
FIG. 3 is a perspective external view of the embodiment. DESCRIPTION OF SYMBOLS 1...Workpiece, 2...Workpiece mounting table, 3...Tapered roller, 4...Extrusion tool, 5...Transportation chuck, 6...Base plate, 7...Frame bar, 8
...Vertical drive mechanism, 8'...Vertical movement axis, 9...1
2... Motor, 10... Pulley, 11... Steel belt, 13... Guide rod, 14... Mover, 1
5...Storage cassette section.

Claims (1)

【特許請求の範囲】[Claims] 1 ベース板の中心部に設けられ、垂直断面がV
字形をなし、該V字形の上に角形マスク基板(ワ
ーク)を該ワークの2辺の稜線で支承しかつ垂直
の方向に可動のワーク載置台と、該ワーク載置台
の両側にあつて、上記ベース板に固定された2枚
の平行なフレームバーの相対する2面に水平に軸
支され、中央部へ互いに下傾する搬送面をもち、
該ワーク載置台の下降により上記ワークを該ワー
ク載置台から載置替えし、該ワークをこれの対向
する2辺の稜線で支承する2組のテーパ付きのロ
ーラと、該ローラの端部にあつて該ローラの上に
載置されている該ワークの側面を押出して該ワー
クを移送する押出機構とよりなることを特徴とす
る角形マスク基板移送機構。
1 Provided at the center of the base plate, with a vertical cross section of V
A workpiece mounting table having a V-shape and supporting a rectangular mask substrate (workpiece) on the ridge lines of two sides of the workpiece and movable in a vertical direction, and on both sides of the workpiece mounting table, the above-mentioned It is horizontally supported on two opposing sides of two parallel frame bars fixed to the base plate, and has conveying surfaces that tilt downward toward each other toward the center.
The workpiece is transferred from the workpiece table by lowering the workpiece table, and two sets of tapered rollers supporting the workpiece at the ridge lines of two opposing sides thereof, A rectangular mask substrate transfer mechanism comprising: an extrusion mechanism that transfers the workpiece by pushing out a side surface of the workpiece placed on the roller.
JP27432285A 1985-12-07 1985-12-07 Rectangular mask substrate transfer device Granted JPS62136428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27432285A JPS62136428A (en) 1985-12-07 1985-12-07 Rectangular mask substrate transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27432285A JPS62136428A (en) 1985-12-07 1985-12-07 Rectangular mask substrate transfer device

Publications (2)

Publication Number Publication Date
JPS62136428A JPS62136428A (en) 1987-06-19
JPH0545489B2 true JPH0545489B2 (en) 1993-07-09

Family

ID=17540032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27432285A Granted JPS62136428A (en) 1985-12-07 1985-12-07 Rectangular mask substrate transfer device

Country Status (1)

Country Link
JP (1) JPS62136428A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2547783Y2 (en) * 1991-03-29 1997-09-17 大日本スクリーン製造株式会社 Substrate surface treatment equipment
US5746234A (en) 1994-11-18 1998-05-05 Advanced Chemill Systems Method and apparatus for cleaning thin substrates
US5720813A (en) 1995-06-07 1998-02-24 Eamon P. McDonald Thin sheet handling system
US6517303B1 (en) * 1998-05-20 2003-02-11 Applied Komatsu Technology, Inc. Substrate transfer shuttle
JP2003095435A (en) * 2001-09-27 2003-04-03 Ebara Corp Rectangular substrate conveying robot
IT1394327B1 (en) * 2009-04-15 2012-06-06 Antonello TRAFFIC DEVICE FOR PHOTOVOLTAIC CELLS OR THEIR SUBSTRATES DURING THE PROCESS OF MANUFACTURE OF PHOTOVOLTAIC CELLS
US20130121802A1 (en) * 2011-11-14 2013-05-16 Memc Electronic Materials, Inc. Wafer Transport Cart

Also Published As

Publication number Publication date
JPS62136428A (en) 1987-06-19

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