JP2003095435A - Rectangular substrate conveying robot - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a rectangular substrate conveying robot capable of conveying a rectangular photomask substrate without dropping it even if bringing the substrate into rotational movement. SOLUTION: The rectangular substrate conveying robot for conveying a rectangular substrate includes hands 513A and B having substrate mounting parts 517A and B at their respective tips for mounting a substrate W thereon, the hands moving the substrate mounting parts linearly from the tips to the front side in the direction of a horizontal axis and rotating about a vertical axis of rotation at the front side; and guides 514A and B for guiding in the direction of the horizontal axis the substrate W mounted on the substrate mounting parts, at positions including the axis of rotation. The substrate mounting parts have substrate retaining parts 520A, B, 521A and B for guiding the two opposite sides of the substrate W in a horizontal direction perpendicular to the horizontal axis. The guides are adapted to rotate about the axis of rotation in synchronization with the hands.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer robot for transferring a quadrilateral substrate, and more particularly to a transfer robot for transferring a quadrilateral substrate to be polished and cleaned.

[0002]

2. Description of the Related Art When polishing a quadrilateral substrate, a quadrilateral hole is machined in a holder having a circular outer periphery, and the quadrilateral substrate is fitted into this hole to form a disk-shaped substrate. As a result, it was transported by a transport robot and polished and washed.

[0003]

In polishing the quadrilateral substrate as described above, when the quadrilateral substrate is fitted in the holder and is transported to the polishing apparatus by the transport robot and polished, the holes of the holder and the quadrangle are removed. The slurry entered the gap between the substrate and the slurry and adhered to the quadrilateral substrate. Therefore, even if the substrate is directly conveyed to the cleaning device for cleaning, the slurry attached to the side surface and the back surface of the substrate cannot be removed cleanly. Therefore, after the processing by the polishing apparatus, a cleaning step of removing the substrate from the holder and cleaning the substrate is always necessary.

In other words, so-called post-cleaning is performed, which has been a cause of increase in processing cost and processing time. Further, since the substrate is fitted into the hole of the holder with the side surface in contact with the holder, scratches may occur on the side surface of the substrate, and improvement in quality has been desired. Therefore, in order to avoid the adhesion of the slurry, it is possible to convey and polish the quadrilateral substrate without using a holder.

When the quadrilateral substrate is conveyed, the substrates are opposed to each other in order to securely hold the substrate so as not to scratch it.
It is desirable to hold it by the side. The two sides are the front side and the tip side as seen from the transfer robot. However, in this case, in order to carry along the optimum route and improve the board carrying efficiency,
When the photomask substrate is rotated and moved, the photomask substrate may be dropped.

SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a quadrilateral substrate transfer robot capable of reliably transferring a quadrilateral photomask substrate without rotating it even if the photomask substrate is rotated.

[0007]

In order to achieve the above object, a quadrilateral substrate transfer robot 501 according to the first aspect of the present invention conveys a quadrilateral substrate as shown in FIG. In the robot; substrate mounting portions 517A and 517A for mounting the substrate W are provided on the tip side, and the substrate mounting portion 5
A hand 513A, B that moves 17A, B linearly from the tip side to the front side in the horizontal axis direction, the hand 513A configured to rotate on the front side about a vertical rotation axis. B and substrate mounting portion 517A,
Guides 514A, B for guiding the substrate W placed on B in the horizontal axis direction; substrate rests 517A, B
Is a board pressing portion 520A, B, 521A for guiding two opposite sides of the board W in a horizontal direction perpendicular to the horizontal axis.
B; the guides 514A, B are configured to rotate about the axis of rotation in synchronization with the hands 513A, B.

With this structure, the substrate mounting portion 517
Since the hands 513A and B having A and B on the front end side and the guides 514A and B are provided, the substrate mounting portions 517A and B are provided.
The substrate W is placed on and the hands 513A and B are placed on the hand 513.
The substrate W can be transported in that direction by linearly moving from the front end side to the front side in the horizontal axis direction of A and B. At this time, the substrate pressing portions 520A, B, 521A, B
Since the two opposite sides of the substrate W are guided in the horizontal direction perpendicular to the horizontal axis, the substrate pressing portions 520A, B, 521A, B
Regulates the movement of the substrate W in the horizontal axis direction with respect to the substrate rests 517A and 517B.
It does not come off. In addition, typically, the hand 51
It is also possible to linearly move the hands 3A and 3B in the horizontal axis direction of the hands 513A and B from the front side to the tip side and transport the substrate W in that direction.

Since the hands 513A and 513 rotate on the front side about the vertical rotation axis, the substrate W can be conveyed while being rotated. Guide 51 at this time
4A and B rotate around the rotation axis in synchronization with the hands 513A and B, and the guides 514A and B include the rotation axis and the substrate W placed on the substrate placement units 517A and B at the horizontal axis. Since the guides 514A and 514 guide the substrate W in the direction, the movement of the substrate W in the horizontal direction perpendicular to the horizontal axis direction with respect to the substrate mounting portions 517A and B is restricted, and the substrate W is moved to the substrate mounting portion 5.
It does not come off from 17A and B.

A quadrilateral substrate transfer robot 501 according to a second aspect of the present invention is, for example, as shown in FIG. 1, in the quadrilateral substrate transfer robot according to the first aspect, guides 514A and 514B are provided.
Are two rollers 527A, B that contact and guide vertically lower edges of two sides of the substrate W parallel to the horizontal axis.
It is configured to include.

The guides 514A and 514B include two rollers 527A and 527B that contact and guide the vertically lower edges of the two sides parallel to the horizontal axis of the substrate W, respectively.
The guides 514A and 514B can guide the substrate W without damaging it. Further, the centering of the substrate W can be performed by the rollers 527A and 527B.

A quadrilateral substrate transfer robot 501 according to claim 3 is the quadrilateral substrate transfer robot according to claim 1 or 2, as shown in FIG. 7, for example. , B has openings 539′A, B for discharging water drops falling from the placed substrate W when the wet substrate W is placed.

Openings 539 are formed in the substrate mounting portions 517A and B '.
Since'A and B are formed, the substrate mounting portion 517 '
When a substrate W having wet A and B is placed, water droplets that drop from the placed substrate W are discharged, and water droplets that may be a generation source of particles are placed on the substrate placement portions 517′A and B. Adhesion can be reduced.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. In each drawing, the same or corresponding members are designated by the same reference numerals or similar reference numerals, and redundant description will be omitted.

FIG. 1 is a front view of a quadrilateral substrate transfer robot 501 as a transfer device according to the present invention. The quadrilateral substrate transfer robot 501 includes a cylindrical body body 511.
And a disc-shaped upper body 512 arranged on the upper side of the body 511, and a hand mechanism 502 arranged on the upper body 512. The upper body 512 can move up and down and twist with respect to the body 511. The center line Z of the upper body 512 is the axis of rotation of the present invention.

The hand mechanism 502 includes an upper hand 513A as a hand according to the present invention, a lower hand 513B as a hand according to the present invention, an upper hand frame 514A as a guide according to the present invention, and a lower hand as a guide according to the present invention. Hand frame 51
4B, a tray 515, an upper hand driving unit 516A that drives the upper hand 513A, and a lower hand driving unit 516B that drives the lower hand 513B. The upper hand 513A and the lower hand 513B are independently driven.

The upper hand 513A is placed on the upper side of the lower hand 513B, and the upper hand frame 514A is placed on the upper side of the lower hand frame 514B. Further, a receiving tray 515 is arranged on the lower side so as to overlap the lower hand 513B and the lower hand frame 514B. Further saucer 5
An upper hand drive unit 516A is arranged on the lower left side of FIG. 15 and a lower hand drive unit 516B is arranged on the lower right side of FIG. The upper hand 513A, the upper hand frame 514A, the lower hand 513B, and the lower hand frame 514B are arranged at substantially the same height.

As shown in FIG. 2 (A), the upper hand 513
A and the lower hand 513B (indicated by a chain double-dashed line) have horizontal axis lines XA and B and have an elongated plate shape.
Substrate mounting portions 517A and 517A having a concave shape are formed on the front end side. The substrate mounting portions 517A and 517B have bottom surfaces 519A and
B, and the first inclined flat surface portion 520A, B closer to the tip,
It is composed of the second inclined flat surface portions 521A and 521 farther from the tip. The line of intersection between the plane obtained by extending the first inclined plane portions 520A, B and the plane obtained by extending the second inclined plane portions 521A, B is
It forms a right angle with the horizontal axes XA and B, and the first inclined plane portion 520
A and B and the second inclined flat surface portions 521A and 521 are the substrate pressing portion of the present invention. In the figure, the upper hand 513A and the lower hand 513B are the upper hand frame 514A and the lower hand frame 514B.
It shows a state in which it slightly protrudes from the most retracted position.

Further, in FIG. 2B, the substrate mounting portion 517A,
The horizontal enlarged line XA of B and the partially expanded sectional view of B direction are shown. FIG. 2C shows a partially enlarged sectional view in a direction perpendicular to the horizontal axis XA, B direction. As shown in FIG. 2C, the bottom surface portion 51
9A and 9B have inclined surfaces that are inclined with respect to a vertical surface that passes through the horizontal axes XA and B, and when the photomask substrate W on which the substrate mounting portions 517A and B are wet is mounted, the substrate mounting portion 517 is provided.
The structure is such that water droplets falling from the photomask substrate W placed on A and B flow down along the inclined surface.

The first inclined plane portions 520A, B and the second inclined plane portions 521A, B guide the photomask substrate W as the substrate of the present invention in the horizontal direction perpendicular to the horizontal axes XA, B, and this direction. The movement of the photomask substrate W is not restricted except that a frictional force acts. On the other hand, when the upper hand 513A and the lower hand 513B move in the horizontal axes XA and B directions (YA and B directions (see FIG. 5)), the photomask substrate W is moved in the same direction with respect to the substrate mounting portions 517A and B. Of the first inclined plane portion 520A and the second inclined plane portion 5 as long as the movement acceleration is within an appropriate range.
21A, B is regulated by the inclination. The photomask substrate W is typically placed on either the upper hand 513A or the lower hand 513B.

Returning to FIG. 1, description will be made. Upper hand 513A
One end of the coupling member 522A is connected to the other end side of the above from the upper side, and the other end of the coupling member 522A is connected to the upper hand driving unit 516A as described later. One end of the coupling member 522B is connected from the lower side to the opposite tip side of the lower hand 513B, and the other end of the coupling member 522B is connected to the lower hand drive unit 516B as described later.

FIG. 3 is a plan view showing a case where the upper hand 513A is at the most retracted position, that is, the upper hand 513A is located on the side opposite to the tip side (front side). As shown in the figure, in this state, the upper hand frame 514A is
3A and a part of the photomask substrate W placed on the upper hand 513A are arranged so as to horizontally surround the photomask substrate W. The upper hand frame 514A horizontally surrounds a tip portion 523A that encloses a portion of the photomask substrate W placed on the upper hand 513A and a portion that horizontally encloses a portion of the upper hand 513A on which the photomask substrate W is not placed. 538A. A pair of substrate guides 524A is attached to the inside of the tip portion 523A in the vicinity of the tip thereof so as to be inclined downward. Further, the figure shows a state in which the photomask substrate W placed on the upper hand 513A has entered the tip portion 523A deepest in the horizontal direction.

As shown in FIG. 4, the substrate guide 524A
Is the tip 523 of the upper hand frame 514A (see FIG. 3).
It is configured to include a pin 526A attached to an inclined surface 525A formed inside A and a roller 527A rotatably attached to the pin 526A. Roller 52
The photomask substrate W comes into contact with 7A at the chamfered portion W1 formed on the edge thereof, and is guided by the roller 527A rotating.

Lower hand 513B, lower hand frame 514
B and the board guide 524B are also shown in FIGS.
The same description as the upper hand 513A, the upper hand frame 514A, and the substrate guide 524A is established, and “upper” is referred to as “lower” in the above description and the description of FIGS. 3 and 4.
Since "A" may be read as "B", the description is omitted. In addition, the dried photomask substrate W has the upper hand 5
The photomask substrate W wet to 13A may be placed on the lower hand 513B. Alternatively, the photomask substrate W is placed on the lower hand 513B when the uncleaned surface is placed after polishing the photomask substrate W, and the upper hand 513A is placed when the cleaned surface is placed after polishing. It is good to put it on.

As shown in FIG. 5 (the upper hand driving unit 516A and the lower hand driving unit 516B are omitted), the lower hand 513 is used.
On the lower side of B, a tray 515 is arranged. The tray 515 is fixed to the upper body 512 by the lower support 535. An upper support 536 is attached to the upper side of the lower support 535 with the tray 515 interposed therebetween. A mounting plate 528 is provided on the right side of the upper support 536 in the drawing, and the upper hand frame 51 is attached to the mounting plate 528 as described above.
4A and the lower hand frame 514A are horizontally attached. A drain pipe 537 is attached to the bottom portion of the tray 515 on the right side in the drawing, which drains the polishing liquid, the cleaning liquid, and the like that have fallen from the photomask substrate W and stored in the tray 515.

Returning to FIG. 1, description will be made. Upper hand drive unit 5
16A includes a first upper hand arm 529A, a second upper hand arm 530A, and a third upper hand arm 531.
A, a first upper hand rotation shaft 532A fixed to the first upper hand arm 529A and rotatably attached to the upper body 512, and a second upper hand arm 530A fixed to the first upper hand arm 530A. A second upper hand rotation shaft 533A that is rotatably attached to the arm 529A, and a third upper hand rotation that is fixed to the third upper hand arm 531A and is rotatably attached to the second upper hand arm 530A. The shaft 534A is included.

First upper hand rotating shaft 532A, second upper hand rotating shaft 533A, third upper hand rotating shaft 534A.
The rotation of the upper hand 5 is controlled by a controller (not shown).
13A linearly moves from the position on the side opposite to the front end to the YA direction on the front end side (see FIG. 3), and rotates linearly from the position on the front end side toward the direction YA opposite the front end side. The YA direction is the horizontal axis direction from the front side to the tip side, and
The direction is the horizontal axis direction from the front end side to the front side.

As for the lower hand drive unit 516B, the same explanation as that of the upper hand drive unit 516A relating to FIG. 1 described above is established, and in the above description, "upper" is "lower" and reference symbol "A" is "B". Therefore, the description will be omitted. The shape of the lower hand drive unit 516B is symmetrical to the shape of the upper hand drive unit 516A when the lower hand 513B is in a position overlapping the upper hand 513A as shown in the figure. Further, the YA direction and the YB direction (see FIG. 5) are parallel to each other.

FIG. 6 shows an upper hand 513A and a lower hand 51.
Upper hand frame 51 when both 3B are closest to the tip side
4A, first to third upper hand arms 529A to 531
A, first to third lower hand arms 529B to 531B,
The positional relationship of the upper hand 513A is shown. Lower hand frame 51
4B is in a position overlapping the upper hand frame 514A, and the lower hand 513B is in a position overlapping the upper hand 513A. The first upper hand arm 529A and the second upper hand arm 530A are arranged in a straight line, and the first lower hand arm 529B and the second lower hand arm 530B are arranged.
Are similarly arranged on a straight line.

Next, the operation of the quadrilateral substrate transfer robot 501 will be described with reference to FIGS. The quadrilateral substrate transfer robot 501 is mounted on a rail (not shown) and is configured to move on the rail. A case where the quadrilateral substrate transfer robot 501 uses the upper hand 513A to deliver the photomask substrate W will be described.

The quadrilateral substrate transfer robot 501 moves on a rail on which it is placed and receives the photomask substrate W.
Is present in front of an unillustrated device (for example, load / unload unit, quadrilateral substrate reversing machine, pusher, quadrilateral substrate cleaning machine, etc.). Next, the upper body 512 is rotated so that the upper hand 513A faces the photomask substrate W, the upper body 512 is raised or lowered, and the height of the upper hand 513A is used to access the photomask substrate W. Adjust to a suitable height. When the upper body 512 rotates, the upper hand 513A and the upper hand frame 514A rotate in synchronization.

The upper hand drive unit 516A drives the upper hand 513A to linearly move the upper hand 513A in the YA direction from the most retracted position shown in FIG. 3 to access the photomask substrate W and place it on the substrate. The portion 517A stops at a position directly below the photomask substrate W. Then, the upper body 512 is slightly lifted to place the photomask substrate W on the substrate platform 517A. At this time, the central axis WX of the photomask substrate W and the upper hand 513A
And the horizontal axis XA of the two are vertically parallel to each other. Further, the chamfered portion W1 (FIG. 2) facing the bottom surface of the photomask substrate W is disposed.
(See (B)) is in contact with the first inclined flat surface portion 520A and the second inclined flat surface portion 521A, respectively.

In this state, even if the upper hand 513A linearly moves in the YA direction and the anti-YA direction, the photomask substrate W has the first inclined flat surface portion 520A and the second inclined flat surface portion 52.
Since it horizontally moves at a right angle to the direction parallel to 1A, the movement of the photomask substrate W with respect to the substrate mounting portion 517A is restricted by the first inclined flat surface portion 520A and the second inclined flat surface portion 521A, and the substrate mounting portion 517A. It is placed stably on top,
It does not fall off due to movement.

The upper hand 513A on which the photomask substrate W is placed is driven by the upper hand driving unit 516A and moves linearly in the direction opposite to YA. Therefore, the photomask substrate W also moves in the same direction, and the chamfered portions W1 (see FIG. 4) at the lower side surfaces facing each other, which are located at right angles to the anti-YA direction of the photomask substrate W, have the upper hand frame. 5
Since the roller 527A rotates on the roller 527A of 14A, the photomask substrate W is guided by the roller 527A. Therefore, the photomask substrate W can be centered by the roller 527A.

As shown in FIG. 3, after the upper hand 513A is driven by the upper hand drive unit 516A to reach the most retracted position, the quadrilateral substrate transfer robot 501 rotates the upper body 512 as necessary. Let the upper hand 513A
However, the photomask substrate W is directed toward the substrate placing portion (not shown) of the device (not shown) for delivering the photomask substrate W. At this time, since the photomask substrate W rotates at a position surrounded by the upper hand frame 514A, the movement of the photomask substrate W in the YA direction / anti-YA direction with respect to the substrate mounting portion 517A is the first inclined plane portion 520A and the second inclined plane. It is regulated by the plane portion 521A, and further, the movement relative to the substrate placing portion 517A in the direction perpendicular to the YA direction is regulated by the roller 527A of the upper hand frame 514A.
Therefore, the photomask substrate W does not fall off from the substrate platform 517A due to the linear movement and rotation of the upper hand 513A.

After that, the quadrilateral substrate transfer robot 501
Moves to a device for delivering the photomask substrate W and stops. At this position, the quadrilateral substrate transfer robot 501 rotates the upper body 512 so that the upper hand 513A faces the substrate placing portion (not shown) of the device (not shown) for delivering the photomask substrate W. Good. Next, the upper hand 513A on which the photomask substrate W is placed is driven by the upper hand drive unit 516A to linearly move in the YA direction,
The photomask substrate W is stopped on the substrate platform of the device. If necessary, the upper hand 513A is moved up and down, and the photomask substrate W is transferred by mutual operation with a device for receiving the photomask substrate W.

Although the operation of the quadrilateral substrate transfer robot 501 has been described above in the case of the upper hand 513A, the same applies to the case of the lower hand 513B, and in the description of the above operation, "up" is referred to as "down". Since “A” in “No” may be read as “B”, the description of the operation in the case of the lower hand 513B is omitted.

As shown in FIG. 7, the upper hand 513'A,
The lower hands 513'B have openings 539'A, B, respectively.
The structure may be formed. Opening 539'A, B
Two are formed on each of the substrate placing portions 517'A and 517'A and B of the upper hand 513'A and the lower hand 513'B, each having an elongated rectangular shape, and arranged in parallel and in parallel. Opening 539 '
Upper hand 513 ′ of edge portions 540′A and B surrounding A and B
A cross section of the lower hand 513'B in the direction perpendicular to the horizontal axis X'A, B direction has a triangle, and the photomask substrate W is placed at the portion corresponding to the apex of the triangle.

In this way, the upper hand 513'A,
Since the lower hand 513′B has a structure in which the openings 539′A and B are formed, when the wet photomask substrate W is placed on the substrate placement portions 517′A and B, the substrate placement portion 5
Most of the water droplets falling from the photomask substrate W placed on 17′A, B are discharged from the openings 539′A, B, so that the water droplets are the upper hand 513′A and the lower hand 513′B. The rate of deposition as a water film on the surface can be greatly reduced. Therefore, it is possible to reduce the possibility that the water droplets dropped from the photomask substrate W will be the generation source of particles. Further, the water droplets that have fallen on the edge portions 540′A, B fall along the portions corresponding to the sides of the triangular section. One opening may be formed in each of the upper hand and the lower hand.

[0040]

As described above, according to the present invention, since the hand having the substrate mounting portion on the tip side and the guide are provided,
It is possible to place the substrate on the substrate placing portion, move the hand linearly from the front end side to the front side in the horizontal axis direction of the hand, and convey the substrate in that direction. At this time, since the substrate pressing portion guides the two opposite sides of the substrate in the horizontal direction perpendicular to the horizontal axis, the substrate pressing portion regulates the movement of the substrate in the horizontal axis direction with respect to the substrate mounting portion, and the substrate is moved. It does not come off from the substrate platform.

Since the hand rotates about the vertical rotation axis on the front side, the substrate can be conveyed while being rotated. At this time, the guide rotates around the rotation axis in synchronization with the hand, and the guide guides the substrate placed on the substrate placement unit in the horizontal axis direction at a position including the rotation axis. The movement of the substrate in the horizontal direction perpendicular to the horizontal axis direction with respect to the substrate mounting portion is restricted, and the substrate does not come off from the substrate mounting portion. Therefore, the quadrilateral substrate transport robot of the present invention can reliably transport the quadrilateral photomask substrate without dropping it even when the quadrilateral photomask substrate is moved linearly or rotationally.

[Brief description of drawings]

FIG. 1 is a front view of a quadrilateral substrate transfer robot according to the present invention.

FIG. 2A is a diagram illustrating the quadrilateral substrate transfer robot of FIG.
It is an arrow view of a hand and a frame for hands. (B) is an enlarged cross-sectional view of the substrate mounting portion.

3 is a plan view of the quadrilateral substrate transfer robot of FIG. 1. FIG.

FIG. 4 is a partially enlarged sectional view of a roller of a guide portion.

5 is a side view of the quadrilateral substrate transfer robot of FIG. 1. FIG.

FIG. 6 is a diagram illustrating a positional relationship between a hand, a hand frame, and a hand driving unit when the hand comes closest to the tip side.

FIG. 7 is a plan view showing the structure of a hand of a quadrilateral substrate transfer robot according to another embodiment.

[Explanation of symbols]

501 quadrilateral substrate transfer robot 502 Hand mechanism 511 body 512 Upper body 513A Upper hand 513'A Upper hand 513B Lower hand 513'B Lower hand 514A Upper hand frame 514B Lower hand frame 515 saucer 516A Upper hand drive unit 516B Lower hand drive unit 517A, B substrate mounting part 517'A, B substrate mounting part 524A, B board guide 527A, B roller 539'A, B opening W photomask substrate

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hiroshi Kojima             11-1 Haneda Asahi-cho, Ota-ku, Tokyo Edo Co., Ltd.             In the original factory F term (reference) 3C007 AS01 AS24 BS15 BS26 CT05                       CY00 DS01 ES17 EV08 EV23                       EW00 NS12                 5F031 CA07 FA04 FA12 GA02 GA03                       GA05 GA06 GA28 GA38 GA44                       GA47 GA48 GA50 MA22 MA23                       PA26

Claims (3)

[Claims] 1. A quadrilateral substrate transfer robot for transferring a quadrilateral substrate; having a substrate mounting part for mounting the substrate on a front end side, and the substrate mounting part from the front end side in a horizontal axis direction. A hand that moves linearly toward the front side, wherein the hand is configured to rotate about a vertical rotation axis line on the front side; and the substrate placed on the substrate placing section is the horizontal axis line. A guide that guides in a direction; the substrate mounting portion includes a substrate pressing portion that guides two opposite sides of the substrate in a horizontal direction perpendicular to the horizontal axis; Centrally configured to rotate synchronously with the hand; a quadrilateral substrate transfer robot. 2. The four guides according to claim 1, wherein the guide includes two rollers that contact and guide two vertically lower edges parallel to the horizontal axis of the substrate. Shaped substrate transfer robot. 3. The substrate mounting portion is formed with an opening for discharging a water drop falling from the mounted substrate when the wet substrate is mounted thereon. Quadrilateral substrate transfer robot.