JPH0545128B2 - - Google Patents
Info
- Publication number
- JPH0545128B2 JPH0545128B2 JP6813185A JP6813185A JPH0545128B2 JP H0545128 B2 JPH0545128 B2 JP H0545128B2 JP 6813185 A JP6813185 A JP 6813185A JP 6813185 A JP6813185 A JP 6813185A JP H0545128 B2 JPH0545128 B2 JP H0545128B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- temperature
- evaporation
- solid material
- period
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 239000011343 solid material Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 238000009529 body temperature measurement Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 description 48
- 238000001704 evaporation Methods 0.000 description 22
- 230000008020 evaporation Effects 0.000 description 21
- 239000013078 crystal Substances 0.000 description 19
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000010355 oscillation Effects 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 238000005162 X-ray Laue diffraction Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
- G01K11/30—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using measurement of the effect of a material on X-radiation, gamma radiation or particle radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6813185A JPS61225625A (ja) | 1985-03-29 | 1985-03-29 | 表面温度計測法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6813185A JPS61225625A (ja) | 1985-03-29 | 1985-03-29 | 表面温度計測法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61225625A JPS61225625A (ja) | 1986-10-07 |
| JPH0545128B2 true JPH0545128B2 (enExample) | 1993-07-08 |
Family
ID=13364878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6813185A Granted JPS61225625A (ja) | 1985-03-29 | 1985-03-29 | 表面温度計測法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61225625A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007327766A (ja) * | 2006-06-06 | 2007-12-20 | Central Res Inst Of Electric Power Ind | 温度測定装置、温度測定方法および電子顕微鏡 |
| JP2012018937A (ja) * | 2011-10-11 | 2012-01-26 | Central Res Inst Of Electric Power Ind | 温度測定装置、温度測定方法および電子顕微鏡 |
-
1985
- 1985-03-29 JP JP6813185A patent/JPS61225625A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007327766A (ja) * | 2006-06-06 | 2007-12-20 | Central Res Inst Of Electric Power Ind | 温度測定装置、温度測定方法および電子顕微鏡 |
| JP2012018937A (ja) * | 2011-10-11 | 2012-01-26 | Central Res Inst Of Electric Power Ind | 温度測定装置、温度測定方法および電子顕微鏡 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61225625A (ja) | 1986-10-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5456205A (en) | System for monitoring the growth of crystalline films on stationary substrates | |
| US3718757A (en) | Temperature monitoring | |
| US5767489A (en) | Enhanced resolution liquid crystal microthermography method and apparatus | |
| EP0329447B1 (en) | Apparatus for determining the temperature of wafers or thin layers | |
| GB2238868A (en) | Silicon wafer temperature measurement by optical transmission monitoring. | |
| Takahashi et al. | Laser-flash calorimetry I. Calibration and test on alumina heat capacity | |
| JPH0545128B2 (enExample) | ||
| JPS5992998A (ja) | 分子線結晶成長方法 | |
| US20020113971A1 (en) | Method for measuring characteristics, especially the temperature of a multi-layer material while the layers are being built up | |
| Olson et al. | Integrated multi-sensor system for real-time monitoring and control of HgCdTe MBE | |
| JPH01114727A (ja) | 放射温度測定装置 | |
| EP0171694A1 (en) | A process for controlling the growth of a crystal | |
| JP2818124B2 (ja) | 半導体装置の製法 | |
| JPH04239742A (ja) | 半導体装置製造における膜厚測定方法 | |
| JPH10507834A (ja) | サファイア光学鏡を有する循環式冷却鏡露点湿度計 | |
| JPH1019693A (ja) | 半導体装置のストレス測定方法 | |
| Orchard et al. | Laser calorimetry as a tool for the optimisation of mid-infrared OPO materials | |
| Bezemer et al. | The melting temperature of platinum measured from continually melting and freezing ribbons | |
| JP2970020B2 (ja) | コーティング薄膜の形成方法 | |
| JPH067072B2 (ja) | 基板温度の測定法 | |
| Edwards | A glass disk calorimeter for pulsed lasers | |
| Westphal et al. | Application of advanced sensors to the liquid phase epitaxy (LPE) growth of MCT | |
| JPS62195139A (ja) | 基板温度測定方法および装置 | |
| JPS59114834A (ja) | 半導体中に含まれる深い不純物準位或いは結晶欠陥準位の測定方法 | |
| JPS5893320A (ja) | 分子線結晶成長装置の温度測定方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |