JPH0544798B2 - - Google Patents
Info
- Publication number
- JPH0544798B2 JPH0544798B2 JP14303685A JP14303685A JPH0544798B2 JP H0544798 B2 JPH0544798 B2 JP H0544798B2 JP 14303685 A JP14303685 A JP 14303685A JP 14303685 A JP14303685 A JP 14303685A JP H0544798 B2 JPH0544798 B2 JP H0544798B2
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- dielectric layer
- waveguide
- plasma
- upper chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 16
- 238000012545 processing Methods 0.000 claims description 13
- 238000004891 communication Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000005684 electric field Effects 0.000 description 5
- -1 polyethylene fluoride Polymers 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Control Of High-Frequency Heating Circuits (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14303685A JPS625600A (ja) | 1985-06-28 | 1985-06-28 | マイクロ波プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14303685A JPS625600A (ja) | 1985-06-28 | 1985-06-28 | マイクロ波プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS625600A JPS625600A (ja) | 1987-01-12 |
| JPH0544798B2 true JPH0544798B2 (pt) | 1993-07-07 |
Family
ID=15329410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14303685A Granted JPS625600A (ja) | 1985-06-28 | 1985-06-28 | マイクロ波プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS625600A (pt) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5611864A (en) * | 1994-03-24 | 1997-03-18 | Matsushita Electric Industrial Co., Ltd. | Microwave plasma processing apparatus and processing method using the same |
| WO1996003019A1 (fr) * | 1994-07-14 | 1996-02-01 | Sumitomo Metal Industries, Ltd. | Dispositif de traitement au plasma |
| US5645644A (en) * | 1995-10-20 | 1997-07-08 | Sumitomo Metal Industries, Ltd. | Plasma processing apparatus |
| EP0771017A1 (en) | 1995-10-27 | 1997-05-02 | Sumitomo Metal Industries, Ltd. | Plasma processing apparatus |
| EP0830052A4 (en) * | 1996-03-28 | 2000-02-02 | Sumitomo Metal Ind | PLASMIC TREATMENT METHOD AND DEVICE |
| TW409487B (en) | 1998-04-10 | 2000-10-21 | Sumitomo Metal Ind | Microwave plasma treatment apparatus and microwave plasma treatment method |
| JP4014300B2 (ja) | 1998-06-19 | 2007-11-28 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP6453727B2 (ja) * | 2015-07-31 | 2019-01-16 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置およびそれを用いた半導体装置の製造方法 |
-
1985
- 1985-06-28 JP JP14303685A patent/JPS625600A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS625600A (ja) | 1987-01-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |