JPH0542660B2 - - Google Patents

Info

Publication number
JPH0542660B2
JPH0542660B2 JP59053319A JP5331984A JPH0542660B2 JP H0542660 B2 JPH0542660 B2 JP H0542660B2 JP 59053319 A JP59053319 A JP 59053319A JP 5331984 A JP5331984 A JP 5331984A JP H0542660 B2 JPH0542660 B2 JP H0542660B2
Authority
JP
Japan
Prior art keywords
layer
thin film
photosensitive
metal thin
film layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59053319A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60196747A (ja
Inventor
Takeo Morya
Toshio Yamagata
Masako Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP59053319A priority Critical patent/JPS60196747A/ja
Publication of JPS60196747A publication Critical patent/JPS60196747A/ja
Publication of JPH0542660B2 publication Critical patent/JPH0542660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP59053319A 1984-03-19 1984-03-19 感光性画像形成材料 Granted JPS60196747A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59053319A JPS60196747A (ja) 1984-03-19 1984-03-19 感光性画像形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59053319A JPS60196747A (ja) 1984-03-19 1984-03-19 感光性画像形成材料

Publications (2)

Publication Number Publication Date
JPS60196747A JPS60196747A (ja) 1985-10-05
JPH0542660B2 true JPH0542660B2 (enrdf_load_stackoverflow) 1993-06-29

Family

ID=12939395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59053319A Granted JPS60196747A (ja) 1984-03-19 1984-03-19 感光性画像形成材料

Country Status (1)

Country Link
JP (1) JPS60196747A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015024498A (ja) * 2013-06-17 2015-02-05 富士フイルム株式会社 加飾材パターン付き基板およびその製造方法、加飾材形成用積層材料ならびに加飾材パターン含有加飾材形成用積層材料

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51135641A (en) * 1975-05-20 1976-11-24 Kimoto & Co Ltd Photosensitive film
JPS5876833A (ja) * 1981-11-02 1983-05-10 Konishiroku Photo Ind Co Ltd 画像形成材料

Also Published As

Publication number Publication date
JPS60196747A (ja) 1985-10-05

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