JPH0539628Y2 - - Google Patents
Info
- Publication number
- JPH0539628Y2 JPH0539628Y2 JP5698187U JP5698187U JPH0539628Y2 JP H0539628 Y2 JPH0539628 Y2 JP H0539628Y2 JP 5698187 U JP5698187 U JP 5698187U JP 5698187 U JP5698187 U JP 5698187U JP H0539628 Y2 JPH0539628 Y2 JP H0539628Y2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- reaction gas
- gas outlet
- wafer
- reactive gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012495 reaction gas Substances 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 7
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 22
- 239000010409 thin film Substances 0.000 description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5698187U JPH0539628Y2 (en:Method) | 1987-04-14 | 1987-04-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5698187U JPH0539628Y2 (en:Method) | 1987-04-14 | 1987-04-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63164213U JPS63164213U (en:Method) | 1988-10-26 |
| JPH0539628Y2 true JPH0539628Y2 (en:Method) | 1993-10-07 |
Family
ID=30886276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5698187U Expired - Lifetime JPH0539628Y2 (en:Method) | 1987-04-14 | 1987-04-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0539628Y2 (en:Method) |
-
1987
- 1987-04-14 JP JP5698187U patent/JPH0539628Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63164213U (en:Method) | 1988-10-26 |
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