JPH0536998A - Formation of electrode - Google Patents
Formation of electrodeInfo
- Publication number
- JPH0536998A JPH0536998A JP3189679A JP18967991A JPH0536998A JP H0536998 A JPH0536998 A JP H0536998A JP 3189679 A JP3189679 A JP 3189679A JP 18967991 A JP18967991 A JP 18967991A JP H0536998 A JPH0536998 A JP H0536998A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- opening
- laser
- solar battery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Electrodes Of Semiconductors (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、スクリーン印刷法によ
る電極の形成方法の改良に関するもので、太陽電池の微
細電極に使用するときは特に有用なものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in the method of forming electrodes by screen printing, and is particularly useful when used for fine electrodes of solar cells.
【０００２】[0002]
【従来の技術】スクリーン印刷による電極の代表的なも
のとして、以下太陽電池の例について述べる。2. Description of the Related Art An example of a solar cell will be described below as a typical electrode by screen printing.
【０００３】太陽電池の高効率化を図るためには、受光
面電極の電極占有面積を電極の直列抵抗を増加させない
範囲で、できるだけ低減させる必要がある。これは、電
極は半導体への光を遮蔽するばかりでなく、電極とシリ
コン結晶との接触部分での少数キャリアの再結合が無限
大であるからである。また、表面パッシベーション太陽
電池では、酸化膜による表面での少数キャリアの再結合
低減を目的としているため、電極占有面積の低減は、パ
ッシベーション効果を高め、太陽電池特性（短絡電流、
開放電圧）の向上につながる。また、電極を微細にし高
密度化して配置すれば、同じ電極占有面積であっても、
Ｆ．Ｆ．（曲線因子）の向上が期待できる。In order to increase the efficiency of the solar cell, it is necessary to reduce the electrode occupying area of the light-receiving surface electrode as much as possible without increasing the series resistance of the electrode. This is because the electrode not only blocks light to the semiconductor, but also recombination of minority carriers at the contact portion between the electrode and the silicon crystal is infinite. Further, in the surface passivation solar cell, since the purpose is to reduce the recombination of minority carriers on the surface by the oxide film, the reduction of the electrode occupation area enhances the passivation effect, and the solar cell characteristics (short circuit current,
Open circuit voltage). Also, if the electrodes are made fine and arranged with high density, even if the electrodes occupy the same area,
F. F. (Curve factor) can be expected to improve.
【０００４】電極形成には、工程が簡略化でき、製造コ
ストの低減化につながる、金属ペーストを用いたスクリ
ーン印刷法が広く使われている。For the electrode formation, a screen printing method using a metal paste is widely used because the process can be simplified and the manufacturing cost can be reduced.
【０００５】[0005]
【発明が解決しようとする課題】従来の金属ペーストを
用いたスクリーン印刷法では、スクリーンマスクのパタ
ーン精度から、約４％の電極占有率（線幅にして１００
ミクロン）が限界であり、これ以上の電極の微細化は困
難であった。In the conventional screen printing method using a metal paste, the electrode occupancy ratio (line width is 100%) is about 4% because of the pattern accuracy of the screen mask.
(Micron) is the limit, and it has been difficult to further miniaturize the electrode.
【０００６】[0006]
【課題を解決するための手段】本発明においては、所望
の電極パターンの形状のレーザ加工による開口部を有す
るフィルムを介して基板に金属ペーストを印刷し、その
後フィルムを剥がして焼成を行なうようにした。In the present invention, a metal paste is printed on a substrate through a film having an opening formed by laser processing in the shape of a desired electrode pattern, and then the film is peeled off and baked. did.
【０００７】[0007]
【作用】レーザ加工をすることにより、フィルムに微細
な電極パターンの開口部を設けることができるから、微
細電極の形成が可能になる。フィルムを剥がすとき開口
部からはみでた余分のペーストが除去される。By performing laser processing, it is possible to form fine electrode pattern openings in the film, so that fine electrodes can be formed. When the film is peeled off, excess paste that has overflowed from the opening is removed.
【０００８】[0008]
【実施例】図１（ａ）〜（ｇ）は、本発明により形成さ
れた微細電極を有する太陽電池の製造工程の一例を示す
略断面図である。EXAMPLES FIGS. 1A to 1G are schematic cross-sectional views showing an example of a manufacturing process of a solar cell having fine electrodes formed according to the present invention.
【０００９】まず、図１（ａ）に示されるように、Ｐ型
シリコン基板４の表面にＮ+ 型拡散層３、ＳｉＯ2 膜の
ような表面のパッシベーション膜２、およびＴｉＯ2 膜
のような反射防止膜１を順次積層して形成する。裏面に
は、ＢＳＦ層となるＰ+ 型拡散層５および裏面電極６を
形成する。First, as shown in FIG. 1A, an N + type diffusion layer 3, a surface passivation film 2 such as a SiO 2 film, and a TiO 2 film such as a SiO 2 film are formed on the surface of a P type silicon substrate 4. The antireflection film 1 is sequentially laminated and formed. On the back surface, a P + type diffusion layer 5 to be a BSF layer and a back surface electrode 6 are formed.
【００１０】次に、同図（ｂ）に示されるように、反射
防止膜１の表面にフィルム７を張付ける。本実施例で
は、市販の２５ミクロン厚さのポリイミドフィルムを使
用した。Next, as shown in FIG. 1B, a film 7 is attached to the surface of the antireflection film 1. In this example, a commercially available 25 micron thick polyimide film was used.
【００１１】次に、同図（ｃ）に示されるように、この
素子を短波長レーザ装置のＸ−Ｙステージに保持し、Ｈ
2 ガス雰囲気中で線幅を６０ミクロンとしＸｅＣｌエキ
シマレーザ光（λ＝３０８ｎｍ）を電極形成予定位置に
照射し、ポリイミドフィルムに開口部を設ける。Next, as shown in FIG. 1C, this element is held on the XY stage of the short wavelength laser device, and H
An XeCl excimer laser beam (λ = 308 nm) is applied to the electrode formation planned position in a 2 gas atmosphere with a line width of 60 μm to form an opening in the polyimide film.
【００１２】同図（ｄ）はポリイミドフィルムに開口部
が設けられた状態である。加工幅はエキシマレーザ１シ
ョット当たり０．２ミクロンである。FIG. 1D shows a state in which an opening is provided in the polyimide film. The processing width is 0.2 micron per excimer laser shot.
【００１３】レーザ照射条件を下記の表に示す。The laser irradiation conditions are shown in the table below.
【００１４】[0014]
【表１】 [Table 1]
【００１５】次に、同図（ｅ）に示すように、開口部に
Ａｇのような金属ペースト８を印刷する。このとき金属
ペースト８は開口部よりも広く塗布される。Next, as shown in FIG. 2E, a metal paste 8 such as Ag is printed on the opening. At this time, the metal paste 8 is applied wider than the opening.
【００１６】次に同図（ｆ）に示されるように、フィル
ム７を余分な金属ペーストごと除去する。Next, as shown in FIG. 3F, the film 7 is removed together with the excess metal paste.
【００１７】次に、同図（ｇ）に示されるように、焼成
を行なうと、金属ペーストは反射防止膜１およびパッシ
ベーション膜２を貫通して微細な表面の電極８−１が形
成される。Next, as shown in FIG. 1G, when firing is performed, the metal paste penetrates the antireflection film 1 and the passivation film 2 to form an electrode 8-1 having a fine surface.
【００１８】本実施例では、ＸｅＣｌレーザ（λ＝３０
８ｎｍ）を用いたが、ＫｒＦレーザ差（λ＝２４８ｎ
ｍ）を使用しても、同様に微細な電極パターンの開口部
を形成することが可能である。In this embodiment, a XeCl laser (λ = 30) is used.
8 nm) was used, but KrF laser difference (λ = 248n
Even if m) is used, it is possible to form an opening having a fine electrode pattern.
【００１９】また、本実施例では、ポリイミドフィルム
を素子表面に張付けてからレーザにより開口部を設けた
が、予めレーザにより開口部を設けたフィルムを張付け
ても同様の効果が得られる。Further, in this embodiment, the polyimide film is attached to the surface of the element and then the opening is provided by the laser. However, the same effect can be obtained by attaching the film having the opening provided by the laser in advance.
【００２０】上記の実施例による太陽電池と従来のスク
リーン印刷法による太陽電池の特性を下記の表に示す。The characteristics of the solar cell according to the above-mentioned embodiment and the solar cell according to the conventional screen printing method are shown in the following table.
【００２１】[0021]
【表２】 [Table 2]
【００２２】表２においては、実施例の電極線幅は６０
ミクロンとされているが、さらに細くすることも可能で
ある。In Table 2, the electrode line width of the example is 60.
It is said to be micron, but it can be made thinner.
【００２３】以上は太陽電池に微細な電極を設ける場合
について述べたが、スクリーン印刷による微細な電極を
必要とする他の装置にも応用することができるであろ
う。Although the case where the fine electrodes are provided in the solar cell has been described above, the present invention can be applied to other devices that require fine electrodes by screen printing.
【００２４】[0024]
【発明の効果】本発明によれば、従来のスクリーンマス
クを用いた電極形成法に比べて、微細な電極の形成が可
能となり、前述の表２のように、短絡電流、開放電圧が
向上する。これは、電極占有面積が減少し、入射光の遮
蔽される割合が減少した効果と、パッシベーション効果
が大きくなったためである。According to the present invention, finer electrodes can be formed, as compared with the conventional electrode forming method using a screen mask, and the short circuit current and open circuit voltage are improved as shown in Table 2 above. . This is because the area occupied by the electrodes is reduced, the effect of blocking the incident light is reduced, and the passivation effect is increased.
【００２５】また、極めて細い電極を多数配置するとい
うＦ．Ｆ．の向上の一手段としても適合しており、太陽
電池の高効率化が可能となる。In addition, according to F. F. It is also suitable as a means for improving the efficiency of solar cells, which makes it possible to increase the efficiency of solar cells.
【図１】（ａ）〜（ｇ）は、本発明による太陽電池の製
造工程の一例の略断面図である。1A to 1G are schematic cross-sectional views of an example of a manufacturing process of a solar cell according to the present invention.
１ 反射防止膜 ２ パッシベーション膜 ３ Ｎ+ 型拡散層 ４ Ｐ型シリコン基板 ５ Ｐ+ 型拡散層 ６ 裏面電極 ７ フィルム ８ 金属ペースト ８−１ 電極1 Antireflection Film 2 Passivation Film 3 N + Type Diffusion Layer 4 P Type Silicon Substrate 5 P + Type Diffusion Layer 6 Backside Electrode 7 Film 8 Metal Paste 8-1 Electrode
───────────────────────────────────────────────────── フロントページの続き (72)発明者 南森 孝幸 大阪市阿倍野区長池町22番22号 シヤープ 株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takayuki Minamimori 22-22 Nagaikecho, Abeno-ku, Osaka
Claims (1)
による開口部を有するフィルムを介して基板に金属ペー
ストを印刷し、その後フィルムを剥がして焼成を行なう
ことを特徴とする電極の形成方法。Claim: What is claimed is: 1. A metal paste is printed on a substrate through a film having an opening formed by laser processing in the shape of a desired electrode pattern, and then the film is peeled off and baked. Method of forming electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3189679A JPH0536998A (en) | 1991-07-30 | 1991-07-30 | Formation of electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3189679A JPH0536998A (en) | 1991-07-30 | 1991-07-30 | Formation of electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0536998A true JPH0536998A (en) | 1993-02-12 |
Family
ID=16245368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3189679A Withdrawn JPH0536998A (en) | 1991-07-30 | 1991-07-30 | Formation of electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0536998A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011010373A1 (en) * | 2009-07-22 | 2011-01-27 | 三菱電機株式会社 | Solar battery cell and method for manufacturing the solar battery cell |
| WO2012077567A1 (en) * | 2010-12-06 | 2012-06-14 | 信越化学工業株式会社 | Solar cell and solar-cell module |
| WO2013030935A1 (en) * | 2011-08-29 | 2013-03-07 | 株式会社日立製作所 | Solar cell |
| KR101498619B1 (en) * | 2009-06-05 | 2015-03-05 | 엘지전자 주식회사 | Method of preparing electrode of solar cell and Solar cell using the said method |
| KR101542583B1 (en) * | 2009-05-28 | 2015-08-07 | 인텔렉츄얼 키스톤 테크놀로지 엘엘씨 | Solar cell and method for manufacturing the same |
| US9224888B2 (en) | 2010-12-06 | 2015-12-29 | Shin-Etsu Chemical Co., Ltd. | Solar cell and solar-cell module |
| CN111584654A (en) * | 2020-03-31 | 2020-08-25 | 天津爱旭太阳能科技有限公司 | Method for preparing crystalline silicon solar cell electrode |
| CN113385890A (en) * | 2021-06-01 | 2021-09-14 | 山东力诺光伏高科技有限公司 | Assembly packaging process for laser cutting of battery piece |
-
1991
- 1991-07-30 JP JP3189679A patent/JPH0536998A/en not_active Withdrawn
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101542583B1 (en) * | 2009-05-28 | 2015-08-07 | 인텔렉츄얼 키스톤 테크놀로지 엘엘씨 | Solar cell and method for manufacturing the same |
| KR101498619B1 (en) * | 2009-06-05 | 2015-03-05 | 엘지전자 주식회사 | Method of preparing electrode of solar cell and Solar cell using the said method |
| US9647147B2 (en) | 2009-07-22 | 2017-05-09 | Mitsubishi Electric Corporation | Solar battery cell and production method thereof |
| WO2011010373A1 (en) * | 2009-07-22 | 2011-01-27 | 三菱電機株式会社 | Solar battery cell and method for manufacturing the solar battery cell |
| CN102576776A (en) * | 2009-07-22 | 2012-07-11 | 三菱电机株式会社 | Solar battery cell and method for manufacturing the solar battery cell |
| EP2458641A4 (en) * | 2009-07-22 | 2014-01-01 | Mitsubishi Electric Corp | Solar battery cell and method for manufacturing the solar battery cell |
| JP5410526B2 (en) * | 2009-07-22 | 2014-02-05 | 三菱電機株式会社 | Method for manufacturing solar battery cell |
| EP2458641A1 (en) * | 2009-07-22 | 2012-05-30 | Mitsubishi Electric Corporation | Solar battery cell and method for manufacturing the solar battery cell |
| US8975109B2 (en) | 2009-07-22 | 2015-03-10 | Mitsubishi Electric Corporation | Solar battery cell and production method thereof |
| WO2012077567A1 (en) * | 2010-12-06 | 2012-06-14 | 信越化学工業株式会社 | Solar cell and solar-cell module |
| US9224888B2 (en) | 2010-12-06 | 2015-12-29 | Shin-Etsu Chemical Co., Ltd. | Solar cell and solar-cell module |
| US9887312B2 (en) | 2010-12-06 | 2018-02-06 | Shin-Etsu Chemical Co., Ltd. | Solar cell and solar-cell module |
| JPWO2013030935A1 (en) * | 2011-08-29 | 2015-03-23 | 株式会社日立製作所 | Solar cell |
| WO2013030935A1 (en) * | 2011-08-29 | 2013-03-07 | 株式会社日立製作所 | Solar cell |
| CN111584654A (en) * | 2020-03-31 | 2020-08-25 | 天津爱旭太阳能科技有限公司 | Method for preparing crystalline silicon solar cell electrode |
| CN113385890A (en) * | 2021-06-01 | 2021-09-14 | 山东力诺光伏高科技有限公司 | Assembly packaging process for laser cutting of battery piece |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19981008 |