JPH0536782B2 - - Google Patents

Info

Publication number
JPH0536782B2
JPH0536782B2 JP55501398A JP50139880A JPH0536782B2 JP H0536782 B2 JPH0536782 B2 JP H0536782B2 JP 55501398 A JP55501398 A JP 55501398A JP 50139880 A JP50139880 A JP 50139880A JP H0536782 B2 JPH0536782 B2 JP H0536782B2
Authority
JP
Japan
Prior art keywords
resist
sensitivity
ion
materials
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55501398A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56500627A (enExample
Inventor
Toomasu Matsukusueru Hooru
Arufuretsudo Wagunaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Technologies Inc filed Critical AT&T Technologies Inc
Publication of JPS56500627A publication Critical patent/JPS56500627A/ja
Publication of JPH0536782B2 publication Critical patent/JPH0536782B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10P76/2049—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2065—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam using corpuscular radiation other than electron beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP55501398A 1979-05-31 1980-05-19 Expired - Lifetime JPH0536782B2 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4407379A 1979-05-31 1979-05-31

Publications (2)

Publication Number Publication Date
JPS56500627A JPS56500627A (enExample) 1981-05-07
JPH0536782B2 true JPH0536782B2 (enExample) 1993-05-31

Family

ID=21930389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55501398A Expired - Lifetime JPH0536782B2 (enExample) 1979-05-31 1980-05-19

Country Status (7)

Country Link
EP (1) EP0029061B1 (enExample)
JP (1) JPH0536782B2 (enExample)
CA (1) CA1145483A (enExample)
DE (1) DE3069341D1 (enExample)
ES (1) ES8103477A1 (enExample)
IT (1) IT1130689B (enExample)
WO (1) WO1980002752A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5139925A (en) * 1989-10-18 1992-08-18 Massachusetts Institute Of Technology Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser
US5362606A (en) * 1989-10-18 1994-11-08 Massachusetts Institute Of Technology Positive resist pattern formation through focused ion beam exposure and surface barrier silylation
JPH04130619A (ja) * 1990-09-20 1992-05-01 Mitsubishi Electric Corp 半導体装置の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3143423A (en) * 1962-04-02 1964-08-04 Eastman Kodak Co New photo-resist benzoylazide compositions
US3529960A (en) * 1967-01-24 1970-09-22 Hilbert Sloan Methods of treating resist coatings
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
JPS576578B2 (enExample) * 1973-11-05 1982-02-05
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
JPS5738897B2 (enExample) * 1974-11-19 1982-08-18
DE3015866A1 (de) * 1979-04-24 1980-11-06 Westinghouse Electric Corp Verfahren zum lithographischen herstellen von lochmasken

Also Published As

Publication number Publication date
WO1980002752A1 (en) 1980-12-11
ES491874A0 (es) 1981-02-16
JPS56500627A (enExample) 1981-05-07
CA1145483A (en) 1983-04-26
ES8103477A1 (es) 1981-02-16
EP0029061A1 (en) 1981-05-27
EP0029061A4 (en) 1982-07-13
DE3069341D1 (en) 1984-11-08
IT1130689B (it) 1986-06-18
IT8022403A0 (it) 1980-05-29
EP0029061B1 (en) 1984-10-03

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