JPH05317768A - Slit mechanism for chemical liquid treatment - Google Patents
Slit mechanism for chemical liquid treatmentInfo
- Publication number
- JPH05317768A JPH05317768A JP4121515A JP12151592A JPH05317768A JP H05317768 A JPH05317768 A JP H05317768A JP 4121515 A JP4121515 A JP 4121515A JP 12151592 A JP12151592 A JP 12151592A JP H05317768 A JPH05317768 A JP H05317768A
- Authority
- JP
- Japan
- Prior art keywords
- chemical liquid
- chemical
- chemical solution
- chamber
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、薬液処理用スリット機
構に関し、特に薬液循環を行いスルーホールを有するプ
リント配線板の化学処理を行う機構全般に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical treatment slit mechanism, and more particularly to a general mechanism for performing chemical treatment on a printed wiring board having through holes by circulating the chemical.
【０００２】[0002]
【従来の技術】従来の薬液処理用スリット機構は、図２
に示すように、内部で薬液処理を行うための薬液処理チ
ャンバー１と、薬液処理チャンバー１内部に複数台水平
方向に平行に設置されたリングローラー２ａと、リング
ローラー２ａの下部でローラーの間から上方に向けて複
数台設置されたスリットノズル３と、薬液処理チャンバ
ー１の下部に設置されチャンバーから薬液を排液するた
めのバルブ４と、スリットノズル３に薬液を移送するた
めの循環ポンプ５と、薬液処理チャンバー１の下部に設
置されチャンバーからオーバーフローした薬液をストッ
クし循環ポンプ５へ薬液を送るための循環タンク６によ
り構成され、薬液処理チャンバー１内でリングローラー
２ａが回転し、入口から搬送されたプリント配線板７が
搬送中にスリットノズル３から吹き上げた薬液により薬
液処理され出口から搬出される機構であった。2. Description of the Related Art A conventional chemical solution processing slit mechanism is shown in FIG.
As shown in FIG. 1, a chemical solution processing chamber 1 for performing chemical solution processing inside, a plurality of ring rollers 2 a installed in the chemical solution processing chamber 1 in parallel in the horizontal direction, and below the ring roller 2 a from between the rollers. A plurality of slit nozzles 3 installed upward, a valve 4 installed at the bottom of the chemical treatment chamber 1 for discharging the chemical from the chamber, and a circulation pump 5 for transferring the chemical to the slit nozzle 3. , A circulation tank 6 installed in the lower part of the chemical treatment chamber 1 for stocking the chemical that overflows from the chamber and sending the chemical to the circulation pump 5. The ring roller 2a rotates in the chemical treatment chamber 1 and is conveyed from the inlet. The printed wiring board 7 thus processed is treated by the chemical liquid blown up from the slit nozzle 3 during transportation and is discharged from the outlet. Was a mechanism to be carried out.
【０００３】[0003]
【発明が解決しようとする課題】この従来の薬液処理用
スリット機構では、搬送されてくるプリント配線板に対
し垂直に薬液を当てようとしても左右のスリットノズル
からの薬液の流れが互いに干渉し合うため下から上への
垂直な薬液の流れを形成しないため薬液処理するプリン
ト配線板のスルーホール内に薬液が入りにくいという問
題点があった。In this conventional chemical solution processing slit mechanism, the chemical solutions flowing from the left and right slit nozzles interfere with each other even when the chemical solution is applied vertically to the conveyed printed wiring board. Therefore, there is a problem that it is difficult for the chemical solution to enter the through holes of the printed wiring board to be treated with the chemical solution because a vertical flow of the chemical solution from the bottom to the top is not formed.
【０００４】本発明の目的は、搬送されてくる基板に対
し、隣接するスリットノズルからの薬液の流れが互いに
阻害し合う事なく、垂直に薬液の流れを当てることでプ
リント配線板スルーホール内の均一な薬液処理を行うこ
とができる薬液処理用スリット機構を提供することにあ
る。It is an object of the present invention to apply a vertical flow of a chemical solution to a substrate to be conveyed without impeding the flow of the chemical solution from adjacent slit nozzles to each other, so that the inside of the through hole of the printed wiring board can be provided. An object of the present invention is to provide a slit mechanism for chemical liquid treatment that can perform uniform chemical liquid treatment.
【０００５】[0005]
【課題を解決するための手段】本発明の薬液処理用スリ
ット機構は、中央部に薬液を溜めることが可能でその前
後にオーバーフローした薬液を下部に落とし込む口を有
する薬液処理チャンバーと、前記薬液処理チャンバー内
の入口及び出口側に上下対称に水平かつ平行に配列設置
されプリント配線板を移送するため回転駆動力を有する
リングローラーと、前記薬液処理チャンバー中央部で前
記リングローラーと同様に上下対称に、水平かつ平行に
配設設置されプリント配線板を移送するための回転駆動
力を有し、左右の薬液の流れを互いに阻害することの無
いようストレート形状となった複数のストレートローラ
ーと、前記ストレートローラーの間に１本づつ並列に設
置され下部より上方に薬液を吹き出す複数のスリットノ
ズルと、前記薬液処理チャンバーの底部に設置され薬液
処理チャンバー内の薬液を排液するためのバルブと、前
記薬液チャンバー下部に設置されオーバーフローした薬
液を溜めておくための循環タンクと、前記循環タンクと
接続し前記スリットノズルに薬液を移送するための循環
ポンプとを有するものである。A chemical solution treatment slit mechanism of the present invention is capable of accumulating a chemical solution in a central portion thereof and has a chemical solution processing chamber having an opening for dropping a chemical solution overflowing before and after the central part into the lower part, and the chemical solution processing chamber. A ring roller having a rotational driving force for vertically and horizontally arranged horizontally and in parallel at the inlet and outlet sides in the chamber for transferring the printed wiring board, and vertically symmetrical in the central part of the chemical treatment chamber like the ring roller. A plurality of straight rollers which are installed horizontally and parallel to each other, have a rotational driving force for transferring the printed wiring board, and have a straight shape so as not to hinder the left and right chemical liquid flows from each other; A plurality of slit nozzles, which are installed in parallel between rollers one by one, and blow the chemical liquid upward from the lower part; A valve installed at the bottom of the processing chamber for draining the chemical solution in the chemical processing chamber; a circulation tank installed at the lower part of the chemical solution chamber for storing the overflowed chemical solution; and a slit connected to the circulation tank. And a circulation pump for transferring the chemical liquid to the nozzle.
【０００６】[0006]
【実施例】次に本発明について図面を参照して説明す
る。図１は本発明の一実施例を示す平面図及び側面図で
ある。図１に示すように、内部で薬液処理を行うための
薬液処理チャンバー１と、薬液処理チャンバー１内部で
前後に設置されたリングローラー２ａと、薬液チャンバ
ー１中央部に設置されたストレートローラー２ｂと、ス
トレートローラー２ｂの下部でローラーの間に設置され
たスリットノズル３と、薬液処理チャンバー１から薬液
を排液するためのバルブ４と、スリットノズル３に薬液
を移送するための循環ポンプ５と、薬液処理チャンバー
１からオーバーフローした薬液をストックするための循
環タンク６を有する。７は、薬液処理されるスルーホー
ルを有するプリント配線板である。The present invention will be described below with reference to the drawings. FIG. 1 is a plan view and a side view showing an embodiment of the present invention. As shown in FIG. 1, a chemical solution processing chamber 1 for performing chemical solution processing inside, a ring roller 2a installed back and forth inside the chemical solution processing chamber 1, and a straight roller 2b installed in the central part of the chemical solution chamber 1. A slit nozzle 3 installed below the straight roller 2b between the rollers, a valve 4 for discharging the chemical liquid from the chemical liquid processing chamber 1, and a circulation pump 5 for transferring the chemical liquid to the slit nozzle 3. It has a circulation tank 6 for stocking the chemical liquid overflowing from the chemical liquid processing chamber 1. Reference numeral 7 is a printed wiring board having through holes that are treated with a chemical solution.
【０００７】次に本発明の動作を説明する。循環タンク
６内の薬液は、循環ポンプ５により薬液処理チャンバー
１に移送される。薬液は、スリットノズル３より吹き出
しバルブ４を閉じることでチャンバー内で溜りオーバー
フローし、循環タンク５に戻される。Next, the operation of the present invention will be described. The chemical liquid in the circulation tank 6 is transferred to the chemical liquid processing chamber 1 by the circulation pump 5. The chemical liquid is accumulated in the chamber by the closing of the blowing valve 4 from the slit nozzle 3, overflows, and is returned to the circulation tank 5.
【０００８】プリント配線板７は、薬液処理チャンバー
１の入口から出口へリングローラー２ａ及びストレート
ローラー２ｂによって搬送される。The printed wiring board 7 is conveyed from the inlet of the chemical treatment chamber 1 to the outlet thereof by the ring roller 2a and the straight roller 2b.
【０００９】搬送途中において、プリント配線板７がス
リットノズル３の上部を通過する際、スリットノズル３
より吹き出た薬液の一部はプリント配線板７のスルーホ
ールを通過するが、他はプリント配線板７と衝突し、水
平方向の流れに変わる。When the printed wiring board 7 passes above the slit nozzle 3 during transportation, the slit nozzle 3
Some of the chemical solution that is blown out passes through the through holes of the printed wiring board 7, but the other collides with the printed wiring board 7 and changes into a horizontal flow.
【００１０】しかし、この薬液の水平方向の流れは、ス
トレートローラー２ｂで遮られ、隣接するスリットノズ
ル３より吹き出す薬液の流れを阻害しない。However, the horizontal flow of the chemical liquid is blocked by the straight roller 2b and does not hinder the flow of the chemical liquid blown out from the adjacent slit nozzle 3.
【００１１】[0011]
【発明の効果】以上、説明したように本発明は、搬送さ
れてくる基板に対し隣接するスリットノズルからの薬液
の流れが互いに阻害しあう事なく垂直に薬液の流れを当
てることでプリント配線板スルーホール内の均一な薬液
処理を行う事が出来るという効果を有する。As described above, according to the present invention, the flow of the chemical liquid from the slit nozzles adjacent to the conveyed substrate is vertically applied to the printed wiring board without interfering with each other. It has an effect that uniform chemical treatment in the through hole can be performed.
【図１】本発明の一実施例の平面図及び側面図である。FIG. 1 is a plan view and a side view of an embodiment of the present invention.
【図２】従来の薬液処理用スリット機構の一例の平面図
及び側面図である。2A and 2B are a plan view and a side view of an example of a conventional slit mechanism for chemical treatment.
１ 薬液処理チャンバー ２ａ リングローラー ２ｂ ストレートローラー ３ スリットノズル ４ バルブ ５ 循環ポンプ ６ 循環タンク ７ プリント配線板 1 Chemical Treatment Chamber 2a Ring Roller 2b Straight Roller 3 Slit Nozzle 4 Valve 5 Circulation Pump 6 Circulation Tank 7 Printed Wiring Board
Claims (1)
前後にオーバーフローした薬液を下部に落とし込む口を
有する薬液処理チャンバーと、前記薬液処理チャンバー
内の入口及び出口側に上下対称に水平かつ平行に配列設
置されプリント配線板を移送するための回転駆動力を有
するリングローラーと、前記薬液処理チャンバー中央部
で前記リングローラーと同様に上下対称に、水平かつ平
行に配列設置されプリント配線板を移送するための回転
駆動力を有する複数のストレートローラーと、前記スト
レートローラーの間に１本づつ並列に設置され下部より
上方に薬液を吹き出す複数のスリットノズルと、前記薬
液処理チャンバーの底部に設置され薬液処理チャンバー
内の薬液を排液するためのバルブと、前記薬液チャンバ
ー下部に設置されオーバーフローした薬液を溜めておく
ための循環タンクと、前記循環タンクと接続し前記スリ
ットノズルに薬液を移送するための循環ポンプとを有す
ることを特徴とする薬液処理用スリット機構。1. A chemical solution treatment chamber having a central portion capable of accumulating a chemical solution and having an inlet for dropping a chemical solution overflowed before and after the chemical solution treatment chamber, and an inlet and an outlet side in the chemical solution treatment chamber are vertically and horizontally parallel to each other. A ring roller having a rotational driving force for transferring the printed wiring board arranged in a row and the printed wiring board arranged vertically and symmetrically and horizontally and in parallel in the central part of the chemical solution processing chamber in the same manner as the ring roller. A plurality of straight rollers having a rotational driving force for operating the slits, a plurality of slit nozzles installed in parallel between the straight rollers to blow a chemical solution upward from a lower portion, and a chemical solution installed at the bottom of the chemical solution processing chamber. A valve for draining the chemical in the processing chamber and an valve installed at the bottom of the chemical chamber. A slit mechanism for treating a chemical liquid, comprising: a circulation tank for storing the overflowing chemical liquid; and a circulation pump connected to the circulation tank for transferring the chemical liquid to the slit nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4121515A JP2735433B2 (en) | 1992-05-14 | 1992-05-14 | Slit mechanism for chemical treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4121515A JP2735433B2 (en) | 1992-05-14 | 1992-05-14 | Slit mechanism for chemical treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05317768A true JPH05317768A (en) | 1993-12-03 |
| JP2735433B2 JP2735433B2 (en) | 1998-04-02 |
Family
ID=14813123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4121515A Expired - Fee Related JP2735433B2 (en) | 1992-05-14 | 1992-05-14 | Slit mechanism for chemical treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2735433B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0967845A1 (en) * | 1998-04-30 | 1999-12-29 | Tokyo Kakoki Co., Ltd. | Liquid injector |
| DE102005062527A1 (en) * | 2005-12-16 | 2007-06-21 | Gebr. Schmid Gmbh & Co. | Substrate surface treatment device for production of solar cell, has suction unit provided for suction of fluid process medium from environment of conveying unit and arranged under transport plane in vertical direction |
| CN106862704A (en) * | 2017-04-21 | 2017-06-20 | 曾庆明 | Horizontal tin jet device and tin-spraying machine and its method |
-
1992
- 1992-05-14 JP JP4121515A patent/JP2735433B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0967845A1 (en) * | 1998-04-30 | 1999-12-29 | Tokyo Kakoki Co., Ltd. | Liquid injector |
| DE102005062527A1 (en) * | 2005-12-16 | 2007-06-21 | Gebr. Schmid Gmbh & Co. | Substrate surface treatment device for production of solar cell, has suction unit provided for suction of fluid process medium from environment of conveying unit and arranged under transport plane in vertical direction |
| US7862661B2 (en) | 2005-12-16 | 2011-01-04 | Gebr. Schmid Gmbh & Co. | Device and method for treating the surfaces of substrates |
| CN106862704A (en) * | 2017-04-21 | 2017-06-20 | 曾庆明 | Horizontal tin jet device and tin-spraying machine and its method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2735433B2 (en) | 1998-04-02 |
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