JPH05275042A - Focusing method for scanning electron microscope - Google Patents

Focusing method for scanning electron microscope

Info

Publication number
JPH05275042A
JPH05275042A JP4071087A JP7108792A JPH05275042A JP H05275042 A JPH05275042 A JP H05275042A JP 4071087 A JP4071087 A JP 4071087A JP 7108792 A JP7108792 A JP 7108792A JP H05275042 A JPH05275042 A JP H05275042A
Authority
JP
Japan
Prior art keywords
sample
focusing
scanning
signal
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4071087A
Other languages
Japanese (ja)
Other versions
JP3114335B2 (en
Inventor
Masashi Uno
昌史 宇野
Akihiko Haraguchi
明彦 原口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Original Assignee
NIPPON DENSHI TEKUNIKUSU KK
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENSHI TEKUNIKUSU KK, Jeol Ltd filed Critical NIPPON DENSHI TEKUNIKUSU KK
Priority to JP04071087A priority Critical patent/JP3114335B2/en
Publication of JPH05275042A publication Critical patent/JPH05275042A/en
Application granted granted Critical
Publication of JP3114335B2 publication Critical patent/JP3114335B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To realize a focusing method in a scanning electron microscope which can correctly focus on a remarked part of a sample in a short time. CONSTITUTION:While displaying a secondary electron image in an optional region of a sample 4 on a cathode ray tube 16, a luminescent line signal from a luminescent line generating circuit is supplied to an adder 9. As a result, a rectangular luminescent line L superimposed on a secondary electron image is displayed on a screen of a cathode-ray tube 16. A position of this rectangle can be optionally set up by operating a consol panel 17. An operator moves a rectangular luminescent line to a part desired to be focused while observing the secondary electron image. A control circuit 14 obtains an information on the rectangular luminescent line L so as to control driving power supply 19 based on this information in order to perform scanning of an electron beam only in a sample region surrounded by the rectangular luminescent line. Further, the control circuit 14 controls the driving power supply 18 so as to stepwise change the excitation strength of an object lens 3. In this state, focusing operation is performed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、自動的に焦点合わせを
行うための焦点合わせ機能を有した走査電子顕微鏡に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning electron microscope having a focusing function for automatically focusing.

【0002】[0002]

【従来の技術】走査電子顕微鏡などの焦点合わせでは、
対物レンズの励磁をステップ状に変化させ、各ステップ
状の対物レンズの励磁状態において、試料の特定領域を
電子ビームで走査し、各走査毎に試料からの2次電子あ
るいは反射電子を検出し、この検出信号強度から信号強
度の最大値の時がフォーカス点として、その時の励磁状
態に対物レンズを固定するようにしている。
2. Description of the Related Art In focusing of a scanning electron microscope or the like,
The excitation of the objective lens is changed stepwise, and in a stepped excitation state of the objective lens, a specific region of the sample is scanned with an electron beam, and secondary electrons or backscattered electrons from the sample are detected for each scanning. From this detected signal strength, when the maximum value of the signal strength is set as the focus point, the objective lens is fixed in the excited state at that time.

【0003】[0003]

【発明が解決しようとする課題】上述した焦点合わせに
おいては、試料の特定走査領域全体からの信号を利用し
ており、その特定走査領域の平均的な信号によって焦点
合わせが行われる。その結果、試料の特定領域が平均的
に凹凸が存在する場合は良いが、部分的に凹凸の程度が
相違すると、特定領域の一部の注目点には正確に焦点が
合わなくなる。例えば、特定走査領域中に凹凸が激しい
部分と比較的滑らかな部分とが存在し、比較的滑らかな
部分に焦点を合わせて像の観察を行いたい場合でも、従
来の焦点合わせでは、むしろ凹凸の激しい部分に焦点が
合いがちとなる。
In the focusing described above, signals from the entire specific scanning area of the sample are used, and the focusing is performed by the average signal of the specific scanning area. As a result, it is preferable that the specific region of the sample has unevenness on average, but if the degree of unevenness is partially different, it becomes impossible to accurately focus on some points of interest in the specific region. For example, even if there is a portion with a large amount of unevenness and a relatively smooth portion in the specific scanning area and you want to focus on a relatively smooth portion to observe an image, conventional focusing does not cause unevenness. The focus tends to be on the intense part.

【0004】本発明は、このような点に鑑みてなされた
もので、その目的は、短時間に試料の注目部分に正確に
焦点合わせを行うことができる走査電子顕微鏡における
焦点合わせ方法を実現するにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to realize a focusing method in a scanning electron microscope capable of accurately focusing on a target portion of a sample in a short time. It is in.

【0005】[0005]

【課題を解決するための手段】本発明に基づく走査電子
顕微鏡における焦点合わせ方法は、電子ビームを試料上
に集束するための対物レンズと、試料上の電子ビームの
照射位置を走査するための走査手段と、試料への電子ビ
ームの照射によって得られた信号を検出する検出器と、
対物レンズの励磁強度を変えることにより試料上の電子
ビームの集束状態をステップ状に変化させる手段とを備
えた走査電子顕微鏡において、各集束状態のときに試料
の所定領域を電子ビームで走査し、その際、検出器によ
って検出された信号を処理して合焦点の程度を表わす評
価値信号を得、各電子ビームの集束状態ごとの評価値に
応じて電子ビームの焦点合わせを行うようにした焦点合
わせ方法において、試料上の任意の領域の走査像を得、
この走査像中の所望領域を選択し、選択された領域部分
の検出信号に基づいて焦点合わせを行うようにしたこと
を特徴としている。
A focusing method in a scanning electron microscope according to the present invention includes an objective lens for focusing an electron beam on a sample and a scanning for scanning an irradiation position of the electron beam on the sample. Means and a detector for detecting the signal obtained by irradiating the sample with the electron beam,
In a scanning electron microscope equipped with means for changing the focusing state of the electron beam on the sample in a stepwise manner by changing the excitation intensity of the objective lens, a predetermined region of the sample is scanned with the electron beam in each focusing state, At that time, the focus detected by processing the signal detected by the detector to obtain an evaluation value signal indicating the degree of focusing, and focusing the electron beam according to the evaluation value for each focusing state of each electron beam. In the alignment method, a scan image of an arbitrary area on the sample is obtained,
A feature is that a desired area in the scan image is selected and focusing is performed based on the detection signal of the selected area portion.

【0006】[0006]

【作用】本発明に基づく走査電子顕微鏡における焦点合
わせ方法は、試料上の任意の領域の走査像を得、この走
査像中の所望領域を選択し、選択された領域部分の検出
信号に基づいて焦点合わせを行う。
A focusing method in a scanning electron microscope according to the present invention obtains a scan image of an arbitrary region on a sample, selects a desired region in this scan image, and based on a detection signal of the selected region portion. Focus on.

【0007】[0007]

【実施例】以下、図面を参照して本発明の実施例を詳細
に説明する。図1は、本発明の方法を実施するための走
査電子顕微鏡の一例を示しており、1は電子銃である。
電子銃1から発生した電子ビームEBは、集束レンズ2
と対物レンズ3によって試料4上に細く集束される。ま
た、電子ビームEBは、偏向コイル5によって偏向さ
れ、試料4上の電子ビームの照射位置は走査される。試
料4への電子ビームの照射によって発生した2次電子
は、2次電子検出器6によって検出される。検出器6の
検出信号は、増幅器7によって増幅された後、ハイパス
フィルタ8と加算器9に供給される。ハイパスフィルタ
8を通過した信号は、AD変換器12を介してピーク検
出回路13に供給される。ピーク検出回路13で検出さ
れたピーク値は、制御回路14に供給される。
Embodiments of the present invention will now be described in detail with reference to the drawings. FIG. 1 shows an example of a scanning electron microscope for carrying out the method of the present invention, 1 being an electron gun.
The electron beam EB generated from the electron gun 1 is focused by the focusing lens 2
And the objective lens 3 finely focuses the light on the sample 4. The electron beam EB is deflected by the deflection coil 5, and the irradiation position of the electron beam on the sample 4 is scanned. Secondary electrons generated by the irradiation of the sample 4 with the electron beam are detected by the secondary electron detector 6. The detection signal of the detector 6 is amplified by the amplifier 7 and then supplied to the high-pass filter 8 and the adder 9. The signal that has passed through the high-pass filter 8 is supplied to the peak detection circuit 13 via the AD converter 12. The peak value detected by the peak detection circuit 13 is supplied to the control circuit 14.

【0008】加算器9では、増幅器7からの信号と、輝
線信号発生回路15からの信号を加算し、加算した信号
を陰極線管16に供給する。17は操作盤であり、操作
盤17は、輝線信号発生回路15や制御回路14に指示
信号を送る。制御回路14は、対物レンズ3の駆動電源
18と偏向コイル5の駆動電源19を制御する。このよ
うな構成の動作は次の通りである。
The adder 9 adds the signal from the amplifier 7 and the signal from the bright line signal generating circuit 15 and supplies the added signal to the cathode ray tube 16. Reference numeral 17 denotes an operation panel, and the operation panel 17 sends an instruction signal to the bright line signal generation circuit 15 and the control circuit 14. The control circuit 14 controls the drive power supply 18 for the objective lens 3 and the drive power supply 19 for the deflection coil 5. The operation of such a configuration is as follows.

【0009】通常の2次電子像を観察する場合、操作盤
17からの指示信号に基づき、制御回路14は駆動電源
19を制御し、駆動電源19から所定の走査信号が偏向
コイル5に供給され、試料4上の任意の領域が電子ビー
ムEBによって走査される。試料4への電子ビームの照
射によって発生した2次電子は、検出器6によって検出
される。その検出信号は、増幅器7を介して偏向コイル
5への走査信号と同期した陰極線管16に供給され、陰
極線管16には試料の任意の領域の2次電子像が表示さ
れる。
When observing a normal secondary electron image, the control circuit 14 controls the drive power supply 19 based on an instruction signal from the operation panel 17, and the drive power supply 19 supplies a predetermined scanning signal to the deflection coil 5. , An arbitrary region on the sample 4 is scanned by the electron beam EB. Secondary electrons generated by irradiating the sample 4 with the electron beam are detected by the detector 6. The detection signal is supplied to the cathode ray tube 16 synchronized with the scanning signal to the deflection coil 5 via the amplifier 7, and the cathode ray tube 16 displays a secondary electron image of an arbitrary region of the sample.

【0010】次に、通常の電子ビームの焦点合わせ動作
を行う場合について説明する。操作盤17を操作し、焦
点合わせモードの指示を行うと、制御回路14は、対物
レンズ3の駆動電源18と偏向コイル5の駆動電源19
とを制御する。この結果、駆動電源18は対物レンズ3
にステップ状に変化する励磁電流を供給し、駆動電源1
9はステップ状の励磁電流の変化の都度、試料の所定領
域の操作を行うための走査信号を偏向コイル5に供給す
る。各ステップ状の励磁電流によるフォーカスの状態に
おける検出器6によって検出された2次電子信号は、増
幅器7によって増幅された後、ハイパスフィルタ8によ
って直流分が除去される。さらに、AD変換器12によ
ってディジタル信号に変換された後、ピーク検出回路1
3に供給される。
Next, a case where a normal electron beam focusing operation is performed will be described. When the operation panel 17 is operated and a focusing mode is instructed, the control circuit 14 causes the drive power supply 18 for the objective lens 3 and the drive power supply 19 for the deflection coil 5 to operate.
And control. As a result, the drive power source 18 is operated by the objective lens 3
To the driving power supply 1
Reference numeral 9 supplies a scanning signal to the deflection coil 5 for operating a predetermined region of the sample each time the stepwise excitation current changes. The secondary electron signal detected by the detector 6 in the focus state by the stepwise excitation current is amplified by the amplifier 7, and then the direct current component is removed by the high-pass filter 8. Further, after being converted into a digital signal by the AD converter 12, the peak detection circuit 1
3 is supplied.

【0011】ピーク検出回路13においては、対物レン
ズ3の各励磁ステップごとに得られたピーク値を記憶す
る。図2はこのときの記憶されたピーク値の変化を示し
ており、縦軸がピーク値、横軸が対物レンズ3の励磁強
度である。ピーク検出回路13は、記憶されたピーク値
の変化曲線の値が最大となる時の対物レンズ3の励磁強
度を検出し、その励磁強度値は制御回路14に供給され
る。制御回路14は、駆動電源18を制御してピークの
時の励磁強度に対物レンズ3を設定し、このようにして
焦点合わせ動作が行われる。
The peak detection circuit 13 stores the peak value obtained at each excitation step of the objective lens 3. FIG. 2 shows the change in the stored peak value at this time, where the vertical axis is the peak value and the horizontal axis is the excitation intensity of the objective lens 3. The peak detection circuit 13 detects the excitation intensity of the objective lens 3 when the value of the stored change curve of the peak value becomes maximum, and the excitation intensity value is supplied to the control circuit 14. The control circuit 14 controls the driving power supply 18 to set the objective lens 3 to the excitation intensity at the peak, and the focusing operation is performed in this manner.

【0012】次に、本発明に基づく焦点合わせ動作を説
明する。まず、試料4の任意領域の2次電子像を陰極線
管16上に表示すると共に、輝線信号発生回路15から
の輝線信号を加算器9に供給する。この結果、陰極線管
16の画面上には、図3に示すように、2次電子像に重
ねて矩形状の輝線Lが表示される。この矩形の位置は、
操作盤17を操作することにより、任意に設定すること
ができる。操作者は、2次電子像を観察しながら、焦点
を合わせたい部分に矩形の輝線Lを移動させる。なお、
この際、矩形の位置と大きさが操作盤17によって任意
に変えられる。焦点を合わせたい部分への矩形の輝線の
設定動作が終了した後、操作盤17を操作し、焦点合わ
せモードの指示を行う。この指示により、制御回路14
は矩形の輝線Lの情報を得、この情報に基づいて駆動電
源19を制御し、矩形の輝線Lで囲まれた試料領域のみ
の電子ビームの走査を行う。さらに、制御回路14は、
駆動電源18を制御し、ステップ状に対物レンズ3の励
磁強度を変化させる。この状態で前記したと同様な焦点
合わせ動作が行われる。従って、焦点合わせは矩形の輝
線Lで囲まれた試料領域の情報に基づいて行われるた
め、試料の注目点に正確に焦点が合うことになる。
Next, the focusing operation according to the present invention will be described. First, a secondary electron image of an arbitrary area of the sample 4 is displayed on the cathode ray tube 16 and the bright line signal from the bright line signal generating circuit 15 is supplied to the adder 9. As a result, a rectangular bright line L is displayed on the screen of the cathode ray tube 16 so as to overlap the secondary electron image, as shown in FIG. The position of this rectangle is
It can be set arbitrarily by operating the operation panel 17. The operator moves the rectangular bright line L to a portion to be focused while observing the secondary electron image. In addition,
At this time, the position and size of the rectangle can be arbitrarily changed by the operation panel 17. After the setting operation of the rectangular bright line to the portion to be focused is completed, the operation panel 17 is operated to instruct the focusing mode. By this instruction, the control circuit 14
Obtains information on the rectangular bright line L, controls the drive power supply 19 based on this information, and scans the electron beam only in the sample region surrounded by the rectangular bright line L. Further, the control circuit 14
The drive power source 18 is controlled to change the excitation intensity of the objective lens 3 stepwise. In this state, the same focusing operation as described above is performed. Therefore, focusing is performed based on the information of the sample area surrounded by the rectangular bright line L, so that the focus point of the sample is accurately focused.

【0013】図4は本発明の他の実施例の要部を示して
おり、図1の実施例と同一部分は同一番号が付されてい
る。この実施例では、2次電子検出器6の検出信号を増
幅する増幅器7とハイパスフィルタ8との間にスイッチ
回路20(ゲート回路でも良い)が配置されている。こ
のスイッチ回路20は、輝線信号発生回路15からの信
号に基づき、輝線で囲まれた試料領域を電子ビームEB
が走査しているときのみ、2次電子検出信号をハイパス
フィルタ8に供給する。この結果、輝線で囲まれた試料
領域からの2次電子のみによって焦点合わせ動作が行わ
れ、試料の注目点の観察を焦点の合った状態で行うこと
ができる。
FIG. 4 shows the essential parts of another embodiment of the present invention. The same parts as those of the embodiment of FIG. 1 are designated by the same reference numerals. In this embodiment, a switch circuit 20 (may be a gate circuit) is arranged between the amplifier 7 for amplifying the detection signal of the secondary electron detector 6 and the high pass filter 8. The switch circuit 20 uses the signal from the bright line signal generation circuit 15 to scan the sample area surrounded by the bright line with the electron beam EB.
The secondary electron detection signal is supplied to the high-pass filter 8 only when scanning is performed. As a result, the focusing operation is performed only by the secondary electrons from the sample region surrounded by the bright line, and the observation of the target point of the sample can be performed in a focused state.

【0014】図5は本発明の他の実施例の要部を示して
おり、図1の実施例と同一部分は同一番号が付されてい
る。この実施例では、増幅器7によって増幅された2次
電子検出信号は、メモリ21に供給されて記憶される。
焦点合わせ動作のときには、輝線信号発生回路15から
参照信号が供給されている読み出し制御回路22によっ
て輝線で囲まれた領域の信号のみが、メモリ21から読
み出され、ハイパスフィルタ8に供給される。この結
果、輝線で囲まれた試料領域からの2次電子のみによっ
て焦点合わせ動作が行われ、試料の注目点の観察を焦点
の合った状態で行うことができる。また、この実施例で
は、各対物レンズの励磁強度ごとに1回の電子ビームの
走査によって得られた信号に基づき、焦点合わせのため
の信号処理を行うことができるので、試料への電子ビー
ムの照射回数を減少させることができ、試料のチャージ
アップの影響を避けることができる。なお、この実施例
の変形として、特定領域外をマスクして変化させないデ
ータとして全体処理を行うこともできる。
FIG. 5 shows the essential parts of another embodiment of the present invention. The same parts as those of the embodiment of FIG. 1 are designated by the same reference numerals. In this embodiment, the secondary electron detection signal amplified by the amplifier 7 is supplied to and stored in the memory 21.
During the focusing operation, only the signal in the area surrounded by the bright line is read from the memory 21 and supplied to the high-pass filter 8 by the read control circuit 22 to which the reference signal is supplied from the bright line signal generation circuit 15. As a result, the focusing operation is performed only by the secondary electrons from the sample region surrounded by the bright line, and the observation of the target point of the sample can be performed in a focused state. Further, in this embodiment, since signal processing for focusing can be performed based on the signal obtained by scanning the electron beam once for each excitation intensity of each objective lens, the electron beam to the sample is The number of irradiations can be reduced and the influence of sample charge-up can be avoided. As a modification of this embodiment, the whole process can be performed by masking the outside of the specific region and making it unchanged.

【0015】以上本発明の一実施例を詳述したが、本発
明はこの実施例に限定されない。例えば、2次電子を検
出したが、反射電子を検出してもよい。また、注目点を
陰極線管上で輝線で囲むようにして選択するようにした
が、注目点の輝度を上昇させるようにしても良い。さら
に、矩形状の輝線などを複数陰極線管上に表示できるよ
うにし、注目点の選択を単一ではなく複数できるように
構成しても良い。その場合、複数の注目点に優先順位を
付けて焦点合わせを行ったり、また、注目点の全体の総
合で焦点合わせを行うように構成しても良い。このよう
に、注目領域の比較や演算により、目的に応じた自動焦
点合わせが可能となる。
Although one embodiment of the present invention has been described in detail above, the present invention is not limited to this embodiment. For example, although secondary electrons are detected, reflected electrons may be detected. Further, although the attention point is selected on the cathode ray tube by being surrounded by the bright line, the luminance of the attention point may be increased. Furthermore, a rectangular bright line or the like may be displayed on a plurality of cathode ray tubes, and a plurality of points of interest may be selected instead of a single point. In that case, a plurality of points of interest may be prioritized for focusing, or the entire points of interest may be focused as a whole. In this way, it is possible to perform automatic focusing according to the purpose by comparing and calculating the attention areas.

【0016】上述した実施例においては、ハイパスフィ
ルターを通過した検出信号のピーク値を検出し、この検
出値を合焦点の程度を表す評価信号とするようにした
が、ハイパスフィルターを通過した検出信号を絶対値回
路に供給し、絶対値回路の出力信号を積分してその積分
値を表す信号を評価信号にするようにしても良いし、検
出信号を微分し、その微分信号の絶対値を積分して評価
信号としたり、検出信号を周波数分析して高周波成分の
割合を求め、この割合を表す信号を評価信号とするよう
にしても良い。
In the above-described embodiment, the peak value of the detection signal passed through the high pass filter is detected, and this detection value is used as the evaluation signal representing the degree of focusing, but the detection signal passed through the high pass filter is used. May be supplied to the absolute value circuit and the output signal of the absolute value circuit may be integrated to use the signal representing the integrated value as the evaluation signal, or the detection signal may be differentiated and the absolute value of the differentiated signal may be integrated. The evaluation signal may be used as an evaluation signal, or the detection signal may be frequency-analyzed to obtain the ratio of high-frequency components, and the signal representing this ratio may be used as the evaluation signal.

【0017】また、上述した実施例においては、種々の
集束状態を生じさせるため対物レンズの励磁電流をステ
ップ状に変化させるようにしたが、対物レンズの近傍に
補助対物レンズを配置、この補助対物レンズの励磁電流
をステップ状に変化させるようにしても良い。
Further, in the above-mentioned embodiment, the exciting current of the objective lens is changed stepwise in order to generate various focusing states. However, an auxiliary objective lens is arranged in the vicinity of the objective lens, and the auxiliary objective lens is arranged. The exciting current of the lens may be changed stepwise.

【0018】[0018]

【発明の効果】以上説明したように、本発明に基づく走
査電子顕微鏡における焦点合わせ方法は、試料上の任意
の領域の走査像を得、この走査像中の所望領域を選択
し、選択された領域部分の検出信号に基づいて焦点合わ
せを行うようにしたので、短時間に試料の注目部分に正
確に焦点合わせを行うことができる。
As described above, the focusing method in the scanning electron microscope based on the present invention obtains a scan image of an arbitrary region on a sample, selects a desired region in this scan image, and selects the selected region. Since the focusing is performed based on the detection signal of the area portion, the focusing portion of the sample can be accurately focused in a short time.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の方法を実施するための走査電子顕微鏡
の一例を示す図である。
FIG. 1 is a diagram showing an example of a scanning electron microscope for carrying out the method of the present invention.

【図2】対物レンズの励磁強度と積分値との関係を示す
図である。
FIG. 2 is a diagram showing a relationship between an excitation intensity of an objective lens and an integrated value.

【図3】陰極線管上の像と輝線Lとを示す図である。FIG. 3 is a diagram showing an image on a cathode ray tube and a bright line L.

【図4】本発明の方法を実施するための走査電子顕微鏡
の他の例を示す図である。
FIG. 4 is a diagram showing another example of a scanning electron microscope for carrying out the method of the present invention.

【図5】本発明の方法を実施するための走査電子顕微鏡
の他の例を示す図である。
FIG. 5 is a diagram showing another example of a scanning electron microscope for carrying out the method of the present invention.

【符号の説明】[Explanation of symbols]

1 電子銃 2 集束レンズ 3 対物レンズ 4 試料 5 偏向コイル 6 検出器 7 増幅器 8 ハイパスフィルタ 9 加算器 12 AD変換器 13 ピーク検出回路 14 制御回路 15 輝線信号発生回路 16 陰極線管 17 操作盤 18,19 駆動電源 DESCRIPTION OF SYMBOLS 1 Electron gun 2 Focusing lens 3 Objective lens 4 Sample 5 Deflection coil 6 Detector 7 Amplifier 8 High pass filter 9 Adder 12 AD converter 13 Peak detection circuit 14 Control circuit 15 Bright line signal generation circuit 16 Cathode ray tube 17 Operation panel 18, 19 Drive power supply

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電子ビームを試料上に集束するための対
物レンズと、試料上の電子ビームの照射位置を走査する
ための走査手段と、試料への電子ビームの照射によって
得られた信号を検出する検出器と、対物レンズの励磁強
度を変えることにより試料上の電子ビームの集束状態を
ステップ状に変化させる手段とを備えた走査電子顕微鏡
において、各集束状態のときに試料の所定領域を電子ビ
ームで走査し、その際、検出器によって検出された信号
を処理して合焦点の程度を表わす評価値信号を得、各電
子ビームの集束状態ごとの評価値に応じて電子ビームの
焦点合わせを行うようにした焦点合わせ方法において、
試料上の任意の領域の走査像を得、この走査像中の所望
領域を選択し、選択された領域部分の検出信号に基づい
て焦点合わせを行うようにした走査電子顕微鏡における
焦点合わせ方法。
1. An objective lens for focusing an electron beam on a sample, a scanning means for scanning an irradiation position of the electron beam on the sample, and a signal obtained by irradiating the sample with the electron beam. In a scanning electron microscope equipped with a detector for changing the excitation intensity of the objective lens and a means for changing the focusing state of the electron beam on the sample in a stepwise manner, a predetermined region of the sample is electronized in each focusing state. Scanning with a beam, at that time, the signal detected by the detector is processed to obtain an evaluation value signal indicating the degree of focusing, and the electron beam is focused according to the evaluation value for each focusing state of each electron beam. In the focusing method that I did,
A focusing method in a scanning electron microscope, wherein a scanning image of an arbitrary region on a sample is obtained, a desired region in the scanning image is selected, and focusing is performed based on a detection signal of the selected region portion.
JP04071087A 1992-03-27 1992-03-27 Focusing method in scanning electron microscope Expired - Lifetime JP3114335B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04071087A JP3114335B2 (en) 1992-03-27 1992-03-27 Focusing method in scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04071087A JP3114335B2 (en) 1992-03-27 1992-03-27 Focusing method in scanning electron microscope

Publications (2)

Publication Number Publication Date
JPH05275042A true JPH05275042A (en) 1993-10-22
JP3114335B2 JP3114335B2 (en) 2000-12-04

Family

ID=13450402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04071087A Expired - Lifetime JP3114335B2 (en) 1992-03-27 1992-03-27 Focusing method in scanning electron microscope

Country Status (1)

Country Link
JP (1) JP3114335B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009110969A (en) * 1999-07-09 2009-05-21 Hitachi Ltd Method and device for measuring pattern dimension

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009110969A (en) * 1999-07-09 2009-05-21 Hitachi Ltd Method and device for measuring pattern dimension

Also Published As

Publication number Publication date
JP3114335B2 (en) 2000-12-04

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