JPH0343650Y2 - - Google Patents

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Publication number
JPH0343650Y2
JPH0343650Y2 JP4507283U JP4507283U JPH0343650Y2 JP H0343650 Y2 JPH0343650 Y2 JP H0343650Y2 JP 4507283 U JP4507283 U JP 4507283U JP 4507283 U JP4507283 U JP 4507283U JP H0343650 Y2 JPH0343650 Y2 JP H0343650Y2
Authority
JP
Japan
Prior art keywords
sample
electron beam
scanning
horizontal
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4507283U
Other languages
Japanese (ja)
Other versions
JPS59150155U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4507283U priority Critical patent/JPS59150155U/en
Publication of JPS59150155U publication Critical patent/JPS59150155U/en
Application granted granted Critical
Publication of JPH0343650Y2 publication Critical patent/JPH0343650Y2/ja
Granted legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は走査電子顕微鏡等において、試料上の
水平又は垂直方向の電子線の走査幅の比率を変え
ることにより、像表示手段に水平又は垂直方向の
倍率が異つた試料走査像を表示するようにした装
置に関する。
[Detailed description of the invention] The present invention is used in scanning electron microscopes, etc., by changing the ratio of the scanning width of the electron beam in the horizontal or vertical direction on the specimen, so that the image display means can display the specimen with different magnifications in the horizontal or vertical direction. The present invention relates to a device for displaying a scanned image.

一般に走査電子顕微鏡等においては、試料面上
に電子線を照射すると共に該試料面上の電子線照
射位置を水平(X軸)及び垂直(軸)方向に二次
元的に走査し、該走査と同期したブラウン管へ試
料から発生する信号を検出して映像信号として印
加して試料像を拡大表示する装置が提供されてい
る。
Generally, in a scanning electron microscope, an electron beam is irradiated onto a sample surface, and the electron beam irradiation position on the sample surface is two-dimensionally scanned in the horizontal (X-axis) and vertical (axis) directions. 2. Description of the Related Art There has been provided an apparatus that detects a signal generated from a sample and applies it as a video signal to a synchronized cathode ray tube, thereby enlarging and displaying a sample image.

ところで、これらの装置は電子線を試料面上で
二次元的に走査させるための電子線偏向手段とし
てX軸偏向コイル、Y軸偏向コイルと、該電子線
偏向手段に偏向信号を供給する走査信号発生手段
を具備し、該走査信号発生手段からの出力信号を
倍率制御回路(電流制御回路)を介してX軸偏向
コイル、Y軸偏向コイルに供給する。更に、走査
信号発生手段からの出力信号は、映像信号を表示
するブラウン管内の偏向コイルX及びYにも供給
されており、ブラウン管内の電子線走査は試料面
上の電子線走査と同期しているので、試料よりの
検出信号を増幅器を介して輝度変調用グリツドに
印加すればブラウン管面上には試料表面に関する
試料像が拡大表示される。
Incidentally, these devices include an X-axis deflection coil and a Y-axis deflection coil as electron beam deflection means for two-dimensionally scanning the electron beam on a sample surface, and a scanning signal that supplies a deflection signal to the electron beam deflection means. It is provided with a generating means, and supplies the output signal from the scanning signal generating means to the X-axis deflection coil and the Y-axis deflection coil via a magnification control circuit (current control circuit). Furthermore, the output signal from the scanning signal generating means is also supplied to deflection coils X and Y in the cathode ray tube that displays the video signal, and the electron beam scanning in the cathode ray tube is synchronized with the electron beam scanning on the sample surface. Therefore, if a detection signal from the sample is applied to the brightness modulation grid via an amplifier, an enlarged sample image related to the sample surface is displayed on the cathode ray tube surface.

このようにして得られた試料拡大像は、通常は
水平(X軸)、垂直(Y軸)の拡大倍率が同じで
あり、たとえば、電子線で試料面上の正方形状の
一定区画を走査して該区画の像をブラウン管画面
に拡大表示すると、正方形状の試料拡大像が観察
できる。
The enlarged sample image obtained in this way usually has the same horizontal (X-axis) and vertical (Y-axis) magnification; for example, a fixed square section on the sample surface is scanned with an electron beam. When the image of the section is enlarged and displayed on a cathode ray tube screen, a square-shaped enlarged image of the sample can be observed.

しかしながら、試料がたとえばフイルム状の試料
の断面や、レコードの溝のような幅が狭く、細長
い試料等では該試料を幾度も長手方向に移動させ
ながら観察を行わねばならず、煩わしい操作が必
要とされていた。
However, when the sample is a cross section of a film-like sample or a narrow, long and narrow sample such as the groove of a record, the sample must be moved in the longitudinal direction many times during observation, which requires troublesome operations. It had been.

本考案は以上の点に鑑みなされたもので、電子
線を細く集束した状態で試料に照射し、試料上の
電子線照射位置を電子線偏向手段により二次元的
に走査し、電子線照射により生ずる試料からの情
報信号を検出し、該検出した信号を試料走査と同
期走査される像表示手段に導入して試料像を表示
する走査電子顕微鏡において、前記像表示手段に
おける水平方向と垂直方向の電子線走査幅の比率
を固定した状態において試料上における水平方向
と垂直方向の電子線走査幅の比率を変化させる手
段を設けたことを特徴とする走査電子顕微鏡を特
徴としている。
The present invention has been developed in view of the above points.The electron beam is irradiated onto a sample in a narrowly focused state, and the electron beam irradiation position on the sample is two-dimensionally scanned by an electron beam deflection means. In a scanning electron microscope that detects an information signal generated from a sample and introduces the detected signal into an image display means that scans in synchronization with the sample scan to display a sample image, horizontal and vertical directions of the image display means are The scanning electron microscope is characterized by being provided with means for changing the ratio of the electron beam scanning widths in the horizontal direction and the vertical direction on the sample while the ratio of the electron beam scanning widths is fixed.

以上図面を参照して本考案を詳細に説明する。 The present invention will be described in detail with reference to the drawings.

第1図は本考案を走査電子顕微鏡に適用した一
実施例装置を示す構成略図である。図中1は試料
2に電子線3を照射するための電子銃であり、該
電子線3は集束レンズ4によつて試料2上に細く
集束される。試料2から発生した例えば二次電子
5は検出器6によつて検出され、その検出信号は
増幅器7で経てブラウン管8の輝度変調用電極に
印加される。又、ブラウン管8の水平偏向コイル
9Xと垂直偏向コイル9Yには走査信号発生回路
10から水平方向と垂直方向の鋸歯状走査信号
(電流)が供給されておりその振幅(波高値)の
比率はブラウン管画面の縦横比率と同一に設定さ
れている。11は水平又は垂直方向の走査信号の
振幅を夫々独立に変えることのできる縦横比設定
回路で図示しない水平方向と垂直方向の比率可変
ツマミを操作すると水平又は垂直方向の走査信号
の波高値が×1、×1/2、×1/3、×1/4、×1/5のよう
に変化し、通常の像観察においては共に×1に設
定されている。12は基準倍率回路で、該基準倍
率回路12は入力される水平及び垂直方向の走査
信号に対して共に同じ増幅率で(電流)増幅する
ための回路であり、通常の像倍率はその増幅率を
変えることによつて切り換えられる。
FIG. 1 is a schematic structural diagram showing an embodiment of an apparatus in which the present invention is applied to a scanning electron microscope. In the figure, reference numeral 1 denotes an electron gun for irradiating a sample 2 with an electron beam 3, and the electron beam 3 is narrowly focused onto the sample 2 by a focusing lens 4. For example, secondary electrons 5 generated from the sample 2 are detected by a detector 6, and the detection signal is applied to a brightness modulation electrode of a cathode ray tube 8 via an amplifier 7. Further, sawtooth scanning signals (currents) in the horizontal and vertical directions are supplied from the scanning signal generation circuit 10 to the horizontal deflection coil 9X and vertical deflection coil 9Y of the cathode ray tube 8, and the ratio of the amplitudes (peak values) of the signals is the same as that of the cathode ray tube. It is set to the same aspect ratio as the screen. 11 is an aspect ratio setting circuit that can independently change the amplitude of the horizontal or vertical scanning signal, and when a horizontal and vertical ratio variable knob (not shown) is operated, the peak value of the horizontal or vertical scanning signal is 1, ×1/2, ×1/3, ×1/4, and ×1/5, and in normal image observation, both are set to ×1. Reference numeral 12 denotes a reference magnification circuit. The reference magnification circuit 12 is a circuit for amplifying input horizontal and vertical scanning signals with the same amplification factor (current), and the normal image magnification is the amplification factor. It can be switched by changing .

以上の様に構成された装置において、走査信号
発生回路10よりの水平走査信号と垂直走査信号
を縦横比設定回路11とブラウン管8の水平偏向
コイル9Xと垂直偏向コイル9Yに入力する。縦
横比設定回路11における水平及び垂直方向の走
査信号に対する増幅率が操作ツマミによつて、そ
れぞれ×1倍に設定されている場合には、走査信
号発生回路10より走査信号は、そのまま基準倍
率回路12に入力され基準倍率回路12によつて
試料拡大倍率に対応した走査幅で試料2上を走査
するよう電子線偏向コイル13X及び13Yを制
御する。また、ブラウン管8の水平偏向コイル9
X及び垂直偏向コイル9Yには走査信号発生回路
10よりの走査信号が供給されているので、試料
2からの発生したたとえば二次電子5を検出器6
で検出し、増幅器7を介してブラウン管8の輝度
変調用電極に印加すると、ブラウン管8の画面上
には試料2の二次電子像が表示され、この場合の
水平方向と垂直方向の拡大倍率は同倍率となり、
たとえば第2図の如く表示される。しかしなが
ら、縦横比設定回路11の操作ツマミが水平方向
の走査信号に対する増幅率が×1倍、垂直方向の
走査信号に対する増幅率が×1/2倍に設定されて
いた場合には、走査信号発生回路10よりの走査
信号は縦横比設定回路11で水平(X軸)方向に
ついてはそのまま基準倍率回路12に入力され、
垂直(Y軸)方向については振幅が変えられて基
準倍率回路12に入力される。基準倍率回路12
は入力された水平方向の走査信号に対しても垂直
方向の走査信号に対しても共に倍率設定操作で指
定される同じ増幅率で増幅して偏向コイル13
X、13Yへ供給する。その結果、試料面上の電
子線操作領域の縦横比はブラウン管画面の縦横比
とは異つたものとなる。従つて、この状態で試料
2から発生した2次電子を、前記同様にブラウン
管8に入力すると、ブラウン管8の画面上には試
料2の二次電子像が表示されるが、この場合の水
平方向の試料拡大倍率は基準倍率回路12で指定
された試料拡大倍率で表示されるのに対して、垂
直方向の試料拡大倍率は、水平方向の試料拡大倍
率の2倍で表示され、たとえば第3図の如く表示
される。そのため、例えば従来装置では低倍率に
するとブラウン管画面内に水平方向に帯状にしか
表示されないような試料の視野が、本考案装置に
よればブラウン管面一杯になるように表示するこ
とが可能となるため1回の観察で、長手方向の広
い範囲に渡つて精密な像を観察することができ、
試料の移動の回数を大幅に少くすることが可能と
なる。
In the apparatus configured as described above, horizontal scanning signals and vertical scanning signals from the scanning signal generating circuit 10 are input to the aspect ratio setting circuit 11 and the horizontal deflection coil 9X and vertical deflection coil 9Y of the cathode ray tube 8. When the amplification factors for the horizontal and vertical scanning signals in the aspect ratio setting circuit 11 are set to x1 by the operation knobs, the scanning signals from the scanning signal generation circuit 10 are directly transferred to the reference magnification circuit. 12, the reference magnification circuit 12 controls the electron beam deflection coils 13X and 13Y to scan the sample 2 with a scanning width corresponding to the sample enlargement magnification. Also, the horizontal deflection coil 9 of the cathode ray tube 8
Since the scanning signal from the scanning signal generation circuit 10 is supplied to the X and vertical deflection coils 9Y, the secondary electrons 5 generated from the sample 2 are transmitted to the detector 6.
When detected by the amplifier 7 and applied to the brightness modulation electrode of the cathode ray tube 8, a secondary electron image of the sample 2 is displayed on the screen of the cathode ray tube 8, and in this case, the magnification in the horizontal and vertical directions is Same magnification,
For example, it is displayed as shown in FIG. However, if the operation knob of the aspect ratio setting circuit 11 is set to x1 for the horizontal scanning signal and x1/2 for the vertical scanning signal, the scanning signal will not be generated. The scanning signal from the circuit 10 is input to the reference magnification circuit 12 as it is in the horizontal (X-axis) direction by the aspect ratio setting circuit 11.
In the vertical (Y-axis) direction, the amplitude is changed and input to the reference magnification circuit 12. Reference magnification circuit 12
is amplified by the same amplification factor specified in the magnification setting operation for both the input horizontal direction scanning signal and the vertical direction scanning signal, and then the deflection coil 13
Supply to X, 13Y. As a result, the aspect ratio of the electron beam operation area on the sample surface is different from the aspect ratio of the cathode ray tube screen. Therefore, if the secondary electrons generated from the sample 2 in this state are input to the cathode ray tube 8 in the same manner as described above, a secondary electron image of the sample 2 will be displayed on the screen of the cathode ray tube 8, but in this case, the horizontal direction The sample magnification magnification is displayed at the sample magnification specified by the reference magnification circuit 12, whereas the vertical sample magnification is displayed at twice the horizontal sample magnification; It will be displayed as follows. Therefore, for example, with the conventional device, when the magnification is set to low, the field of view of the sample is displayed only as a horizontal strip on the CRT screen, but with the device of the present invention, it is possible to display the sample so that it fills the CRT surface. In a single observation, a precise image can be observed over a wide range in the longitudinal direction.
It becomes possible to significantly reduce the number of times the sample is moved.

以上のように本考案においては、前記像表示手
段における水平方向と垂直方向の電子線走査幅の
比率を固定した状態において試料上における水平
方向と垂直方向の電子線走査幅の比率を変化させ
る手段を設けるようにしたため、本来なら帯状に
表示されるような試料の観察や測定を迅速且つ容
易に行うことが可能になる。
As described above, in the present invention, there is a means for changing the ratio of the horizontal and vertical electron beam scanning widths on the sample while the ratio of the horizontal and vertical electron beam scanning widths in the image display means is fixed. , it becomes possible to quickly and easily observe and measure a sample that would otherwise be displayed in a band-like manner.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例装置の構成概略図で
あり、第2図及び第3図は本考案を説明するため
の図である。 1:電子銃、2:試料、3:電子線、4:集束
レンズ、5:二次電子、6:検出器、7:増幅
器、8:ブラウン管、9X:水平偏向コイル、9
Y:垂直偏向コイル、10:走査信号発生回路、
11:縦横比設定回路、12:基準倍率回路、1
3X,13Y:電子線偏向コイル。
FIG. 1 is a schematic diagram of the configuration of an embodiment of the present invention, and FIGS. 2 and 3 are diagrams for explaining the present invention. 1: Electron gun, 2: Sample, 3: Electron beam, 4: Focusing lens, 5: Secondary electron, 6: Detector, 7: Amplifier, 8: Braun tube, 9X: Horizontal deflection coil, 9
Y: Vertical deflection coil, 10: Scanning signal generation circuit,
11: Aspect ratio setting circuit, 12: Reference magnification circuit, 1
3X, 13Y: Electron beam deflection coil.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子線を細く集束した状態で試料に照射し、試
料上の電子線照射位置を電子線偏向手段により二
次元的に走査し、電子線照射により生ずる試料か
らの情報信号を検出し、該検出した信号を試料走
査と同期走査される像表示手段に導入して試料像
を表示する走査電子顕微鏡において、前記像表示
手段における水平方向と垂直方向の電子線走査幅
の比率を固定した状態において試料上における水
平方向と垂直方向の電子線走査幅の比率を変化さ
せる手段を設けたことを特徴とする走査電子顕微
鏡。
A sample is irradiated with a narrowly focused electron beam, the electron beam irradiation position on the sample is two-dimensionally scanned by an electron beam deflection means, and an information signal from the sample generated by the electron beam irradiation is detected. In a scanning electron microscope in which a sample image is displayed by introducing a signal into an image display means that scans in synchronization with the sample scan, a sample image is displayed on the sample while the ratio of horizontal and vertical electron beam scanning widths in the image display means is fixed. 1. A scanning electron microscope characterized by comprising means for changing the ratio of horizontal and vertical electron beam scanning widths in the scanning electron microscope.
JP4507283U 1983-03-29 1983-03-29 scanning electron microscope Granted JPS59150155U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4507283U JPS59150155U (en) 1983-03-29 1983-03-29 scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4507283U JPS59150155U (en) 1983-03-29 1983-03-29 scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS59150155U JPS59150155U (en) 1984-10-06
JPH0343650Y2 true JPH0343650Y2 (en) 1991-09-12

Family

ID=30175594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4507283U Granted JPS59150155U (en) 1983-03-29 1983-03-29 scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS59150155U (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007003535A (en) * 2001-08-29 2007-01-11 Hitachi Ltd Sample dimension measuring method, and scanning electron microscope
JP2006138864A (en) * 2001-08-29 2006-06-01 Hitachi Ltd Sample dimension measuring method and scanning electron microscope

Also Published As

Publication number Publication date
JPS59150155U (en) 1984-10-06

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