JPH0527258B2 - - Google Patents

Info

Publication number
JPH0527258B2
JPH0527258B2 JP59078439A JP7843984A JPH0527258B2 JP H0527258 B2 JPH0527258 B2 JP H0527258B2 JP 59078439 A JP59078439 A JP 59078439A JP 7843984 A JP7843984 A JP 7843984A JP H0527258 B2 JPH0527258 B2 JP H0527258B2
Authority
JP
Japan
Prior art keywords
substrate
processed
wafer
electrode
pressing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59078439A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60223125A (ja
Inventor
Masayoshi Serizawa
Tooru Ootsubo
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59078439A priority Critical patent/JPS60223125A/ja
Publication of JPS60223125A publication Critical patent/JPS60223125A/ja
Publication of JPH0527258B2 publication Critical patent/JPH0527258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP59078439A 1984-04-20 1984-04-20 ドライ・プロセス装置における被処理基板の電極上への着脱装置 Granted JPS60223125A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59078439A JPS60223125A (ja) 1984-04-20 1984-04-20 ドライ・プロセス装置における被処理基板の電極上への着脱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59078439A JPS60223125A (ja) 1984-04-20 1984-04-20 ドライ・プロセス装置における被処理基板の電極上への着脱装置

Publications (2)

Publication Number Publication Date
JPS60223125A JPS60223125A (ja) 1985-11-07
JPH0527258B2 true JPH0527258B2 (OSRAM) 1993-04-20

Family

ID=13662065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59078439A Granted JPS60223125A (ja) 1984-04-20 1984-04-20 ドライ・プロセス装置における被処理基板の電極上への着脱装置

Country Status (1)

Country Link
JP (1) JPS60223125A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2886878B2 (ja) * 1989-03-01 1999-04-26 株式会社日立製作所 真空処理装置
JPH02268427A (ja) * 1989-04-11 1990-11-02 Tokyo Electron Ltd プラズマ処理装置
JP2005276886A (ja) * 2004-03-23 2005-10-06 Nikon Corp 静電チャックおよび露光装置

Also Published As

Publication number Publication date
JPS60223125A (ja) 1985-11-07

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