JPH05266847A - Electron beam deflector - Google Patents

Abstract

PURPOSE:To reduce the deviation of the center of an electron beam deflection due to combination of a plurality of electrode supporter devices by highly precisely disposing and attaching a plurality of electrodes each of which forms a deflector, to one electrode supporter device. CONSTITUTION:An electrode 21 is disposed and attached to an electrode supporter device 22 by the use of a circular column shaped electrode support member 23. Since this support member 23 is an insulator in the course of an electron beam, a shield plate 24 is provided or alternatively the electrode 21 is overlapped to effect shielding. A deflection control device 13 supplies an optimized voltage to each electrode. In this structure, since the electrodes 21 constituting individual deflectors are disposed and attached to one supporter device 22 by the use of the support member 23, it is possible to decrease the influence of fitting due to combination. Since the electron beam deflector center is less deviated in this way, distortion of electron beam at the time of deflection thereof can be made small.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam drawing apparatus and a deflector used in an electron beam application apparatus, and more particularly to an apparatus for reducing distortion of an electron beam during deflection.

[0002]

2. Description of the Related Art A deflector in a conventional device is operated by dividing a cylindrical member or the like into electrodes and applying a voltage according to the amount of deflection to each electrode.

FIG. 2 shows a conventional structure of a deflector used in an HL-700 type electron beam drawing apparatus. It is composed of an electrode 21, an electrode supporter 22, and a deflection control system 13 for applying a voltage to the electrode to drive it, which is manufactured by dividing a cylinder into four parts. Here, for the electrode 21, the member is accurately processed into a cylindrical shape and divided into four equal parts. The divided electrodes are attached to the electrode supporter 22 using a jig. The mounting accuracy of each electrode with respect to the electron beam deflection center in the deflector of this configuration depends on the processing accuracy of each electrode support, particularly when a plurality of deflectors are arranged in combination when the electrode is mounted on the electrode support. .. Therefore, since the deflection centers of the deflectors are different from each other, when the electron beam is deflected by the lower deflector, the electron beam deviates from the deflection center, which causes a large distortion at the time of deflecting the electron beam. ing.

[0004]

The deflector in the above-mentioned conventional device is constructed as one deflector by attaching electrodes manufactured by dividing a cylinder or the like to an electrode supporter, and a plurality of deflectors are provided. In the case of combining the above, there is a problem that the electron beam deflection center of each deflector differs due to the mounting accuracy of each electrode to the electrode support and the processing accuracy of the electrode support, and the distortion during electron beam deflection is increased.

An object of the present invention is to reduce the deviation of the electron beam deflection center due to the combination of a plurality of electrode supports by accurately disposing and mounting the electrodes constituting a plurality of deflectors on one electrode support. And

[0006]

In order to achieve the above-mentioned object, in order to arrange and attach the electrodes for constituting a plurality of deflectors to one electrode support, the electrodes are attached using a cylindrical member. It was done. Further, in order to prevent the cylindrical member from being charged up by the electron beam, the electrodes are overlapped in each deflector, or a shield is provided on the back of the electrodes.

[0007]

By using the cylindrical member to arrange and attach the electrodes corresponding to the respective deflectors to one electrode supporter, the deflection centers of the respective deflectors can be accurately aligned, and the influence of the processing precision can be reduced. be able to.

[0008]

EXAMPLE An example of the present invention will be described. FIG. 1 shows the overall configuration of the present invention. Electron beam 2 emitted from electron gun 1
Is irradiated onto the sample with its shape and current density controlled by the diaphragm 3 and the electron lens 4. The blanker 5 and the blanker control system 6 control ON / OFF of the electron beam 2. Sample 12
Is mounted on stage 11, while stage 11
Is accurately measured by a laser control system 17 and a laser interferometer 19. The laser interferometer 19 controls not only the position measurement but also the DC servo motor 18 and the motor control system 16, and controls the movement of the stage 11 to the target position and the positioning control. The electron beam 2 is positioned on the sample 12 by the deflection control system 13 and the deflector 8. The edge detection of the pattern formed on the sample 12 is performed by the sample 12
Secondary electrons emitted from the detector are detected by the detector 10,
The detection circuit 14 performs arithmetic processing. The computer 15 controls the entire apparatus. The standard mark 20 is used for calibration of the deflection system and testing of the device. An astigmatism correction device 9 is mounted in the objective lens, and the shape of the electron beam 2 is controlled by the astigmatism correction control system 7 according to an instruction from the deflection control system 13.

FIG. 2 shows a conventional one-stage deflector. It is composed of an electrode 21 manufactured by dividing a cylinder, and a cylindrical electrode supporter 22. FIG. 3 shows a multistage deflector having a plurality of conventional deflectors. Each deflector is constructed by arranging and mounting electrodes on the electrode support, and these deflectors are combined by fitting in the electrode support to form a multistage deflector. Therefore, the deviation of the electron beam deflection center of each deflector occurs. Since the deviation depends on the combination of the deflectors fitted together, the deviation of the electron beam deflection center increases as the number of deflectors increases.

FIG. 4 shows a deflector configuration according to the present invention. The electrode 21 is composed of a columnar electrode supporting member 23, and
2 is installed and attached. The cylindrical electrode support member 23 is
Since it becomes an insulator in the electron beam path, the shield plate 24
Is provided or the electrodes 21 are overlapped to perform shielding. The deflection control system 13 supplies an optimized voltage to each electrode. In this structure, since the electrodes 21 constituting the individual deflectors are arranged and attached to one electrode support by the columnar electrode support member 23, the influence of the fitting due to the combination can be reduced, and the electron beam deflection center can be reduced. Can be reduced, and distortion at the time of electron beam deflection can be reduced.

[0011]

According to the present invention, the electrodes of the multistage deflector composed of a plurality of deflectors can be arranged and attached by one electrode supporter, so that the deviation of the deflection center of each deflector can be reduced. It is possible to reduce the distortion when the electron beam is deflected.

[Brief description of drawings]

FIG. 1 is a principle view of an electron beam drawing apparatus showing an embodiment of the present invention.

FIG. 2 is a configuration diagram of a conventional deflector.

FIG. 3 is a diagram showing a multistage deflector according to a conventional configuration.

FIG. 4 is a configuration diagram of a deflector according to the present invention.

[Explanation of symbols]

1 ... Electron gun, 2 ... Electron beam, 3 ... Aperture, 4 ... Electron lens,
5 ... Blanker, 6 ... Blanker control system, 7 ... Astigmatism correction control system, 8 ... Deflector, 9 ... Astigmatism correction device, 10 ... Detector, 11 ... Stage, 12 ... Sample, 13 ... Deflection control system, 14 ... Detection circuit, 15 ... Computer, 16 ... Motor control part, 17 ... Laser control system, 18 ... DC motor, 1
9 ... Laser interferometer, 20 ... Standard mark, 21 ... Electrode, 2
2 ... Electrode support, 23 ... Cylindrical electrode support member, 24 ... Shield.

Claims (1)

[Claims] 1. A multi-stage electron beam deflector comprising a plurality of electrodes, an electrode supporter, and a deflector control system used in an electron beam application apparatus such as an electron beam drawing apparatus, wherein the electrodes of the deflector are cylindrical or circular. An electron beam deflector characterized by using a columnar member, enabling a plurality of electrodes to be arranged and attached to one electrode supporter, and combining and integrating a plurality of deflectors.