JPH05259336A - Resin-sealed semiconductor device - Google Patents

Resin-sealed semiconductor device

Info

Publication number
JPH05259336A
JPH05259336A JP4053408A JP5340892A JPH05259336A JP H05259336 A JPH05259336 A JP H05259336A JP 4053408 A JP4053408 A JP 4053408A JP 5340892 A JP5340892 A JP 5340892A JP H05259336 A JPH05259336 A JP H05259336A
Authority
JP
Japan
Prior art keywords
resin
semiconductor chip
semiconductor device
chip
lead terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4053408A
Other languages
Japanese (ja)
Inventor
Toru Kuwata
徹 桑田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP4053408A priority Critical patent/JPH05259336A/en
Publication of JPH05259336A publication Critical patent/JPH05259336A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909Post-treatment of the connector or wire bonding area
    • H01L2224/8592Applying permanent coating, e.g. protective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide a low-cost resin-sealed semiconductor device in which parasitic inductance and parasitic capacitance are reduced. CONSTITUTION:A resin-sealed semiconductor device includes a semiconductor chip 2, and leads 1 connected with the chip through bonding wires 3. The lead receives the chip at its portion 1c, and it is connected through the wire with the chip surface at their bonding points at substantially the same level. The surface of the chip is coated with fluororesin 4, whose dielectric constant is lower than the molding epoxy resin 5.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、樹脂封止型半導体装置
に関し、特に、準マイクロ波帯乃至マイクロ波帯以上の
高周波帯で使用する樹脂封止型半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin-encapsulated semiconductor device, and more particularly to a resin-encapsulated semiconductor device used in a high frequency band from the quasi-microwave band to the microwave band or higher.

【0002】[0002]

【従来の技術】一般に、マイクロ波帯等の高周波帯で用
いられる半導体チップとしてのFET(フィールド・エ
フェクト・トランジスタ)半導体チップをパッケージす
る場合、上記チップを取り巻く材料および上記チップを
収納する容器の形状によって、上記チップへの寄生イン
ダクタンス,寄生キャパシタンスが大きく変化する。し
たがって、上記パッケージに用いる材料および上記パッ
ケージの形状が上記チップの高周波性能に大きく影響を
及ぼす。このため、上記FET半導体チップの性能を十
分に引き出すためには、上記寄生インダクタンスおよび
寄生キャパシタンスができるだけ小さなパッケージを用
いることが必要である。
2. Description of the Related Art Generally, when a FET (field effect transistor) semiconductor chip as a semiconductor chip used in a high frequency band such as a microwave band is packaged, the material surrounding the chip and the shape of the container housing the chip. As a result, the parasitic inductance and parasitic capacitance to the chip change significantly. Therefore, the material used for the package and the shape of the package have a great influence on the high frequency performance of the chip. Therefore, in order to bring out the performance of the FET semiconductor chip sufficiently, it is necessary to use a package in which the parasitic inductance and the parasitic capacitance are as small as possible.

【0003】上記寄生インダクタンスおよび寄生キャパ
シタンスを抑えるためには、通常、図2に示すセラミッ
クパッケージを採用した半導体装置が用いられる。上記
セラミックパッケージは、図2に示すように、セラミッ
ク基板36に導通リード31を接続し、半導体チップ3
2を、メタライズ層34を介して上記セラミック基板3
6にボンディングし、金ワイヤ33で半導体チップ32
とリード端子31とを接続し、上記セラミック基板36
の上端を金属キャップ38で封止した中空の封止構造を
有する。
In order to suppress the above parasitic inductance and parasitic capacitance, a semiconductor device employing a ceramic package shown in FIG. 2 is usually used. As shown in FIG. 2, in the ceramic package, the conductive leads 31 are connected to the ceramic substrate 36, and the semiconductor chip 3
2 through the metallized layer 34 to the ceramic substrate 3
6 is bonded to the semiconductor chip 32 with the gold wire 33.
The lead terminal 31 and the ceramic substrate 36.
Has a hollow sealing structure in which the upper end of is sealed with a metal cap 38.

【0004】上記セラミックパッケージは、セラミック
からなるセラミック基板36の誘電率および誘電体損
が、通常の樹脂パッケージで用いられる樹脂に比べて小
さく、また中空構造になっているので、寄生インピーダ
ンスが低く、半導体チップ32の高周波特性の向上に有
利である。つまり、上記セラミックパッケージを採用し
た半導体装置は、雑音指数が低下し、電力利得が向上
し、入出力インピーダンスの位相回転が抑えられる等の
利点を有する。しかし、上記セラミックパッケージは、
樹脂パッケージに比べて非常に高価であるという欠点が
ある。
In the above ceramic package, since the dielectric constant and the dielectric loss of the ceramic substrate 36 made of ceramic are smaller than that of the resin used in the usual resin package and the hollow structure is formed, the parasitic impedance is low. This is advantageous for improving the high frequency characteristics of the semiconductor chip 32. That is, the semiconductor device employing the ceramic package has advantages such as a reduced noise figure, improved power gain, and suppressed phase rotation of input / output impedance. However, the above ceramic package
It has the drawback of being very expensive compared to resin packages.

【0005】そこで、従来、パッケージ価格を抑えるた
めに、上記セラミックパッケージに比べて格段に安価で
あるエポキシ樹脂封止によるパッケージを採用した半導
体装置が用いられている。上記エポキシ樹脂封止による
パッケージを採用したエポキシ樹脂封止型半導体装置の
構造を、平面図である図3に示す。図3において、41
a,41b,41cはリード端子、42はFET半導体チッ
プ、43は金ワイヤ、45はエポキシ封止樹脂である。
上記エポキシ樹脂封止型半導体装置の樹脂封止パツケー
ジの製造工程を、断面図である図4(A)〜(D)を参照し
ながら説明する。まず、図4(A)に示すように、リード
端子51上の所定位置にFET半導体チップ52をAg
ペーストで接着(ダイボンド)する。次に、図4(B)に示
すように、上記チップ52の各電極とリード端子51と
を金ワイヤ53で電気的に接続する。
Therefore, conventionally, in order to suppress the package price, a semiconductor device using a package sealed with an epoxy resin, which is significantly cheaper than the above ceramic package, has been used. FIG. 3 is a plan view showing the structure of an epoxy resin-sealed semiconductor device that employs the epoxy resin-sealed package. In FIG. 3, 41
Reference numerals a, 41b and 41c are lead terminals, 42 is an FET semiconductor chip, 43 is a gold wire, and 45 is an epoxy sealing resin.
A manufacturing process of the resin-sealed package of the epoxy resin-sealed semiconductor device will be described with reference to FIGS. 4A to 4D which are cross-sectional views. First, as shown in FIG. 4A, the FET semiconductor chip 52 is placed at a predetermined position on the lead terminal 51 by Ag.
Bond (die bond) with paste. Next, as shown in FIG. 4B, each electrode of the chip 52 and the lead terminal 51 are electrically connected by a gold wire 53.

【0006】次に、上記チップ52と金ワイヤ53が取
り付けられたリード端子51を所望形状の金型に入れ、
この金型にエポキシ封止樹脂を充填して、図4(C)に示
すように、パッケージ外形を形作るエポキシ封止樹脂5
5を形成する。次に、図4(D)に示すように、上記リー
ド端子51を、所定の形状に切断,加工して、エポキシ
樹脂封止型の半導体装置が完成する。
Next, the lead terminal 51 to which the chip 52 and the gold wire 53 are attached is put into a mold having a desired shape,
This mold is filled with epoxy sealing resin to form a package outer shape as shown in FIG. 4 (C).
5 is formed. Next, as shown in FIG. 4D, the lead terminals 51 are cut and processed into a predetermined shape to complete an epoxy resin-sealed semiconductor device.

【0007】[0007]

【発明が解決しようとする課題】ところで、図4(D)に
示す上記従来のエポキシ樹脂封止型半導体装置は、機械
的強度,気密性が優れている上に、セラミックに比べて
格段に安価なエポキシ樹脂を用いるので、材料費が安い
ものの、セラミックに比べて誘電率が高い(約4.0程
度)エポキシ封止樹脂55が直接に半導体チップ52を
覆っているので、セラミックパッケージを採用した半導
体装置に比べて寄生キャパシタンスが大巾に大きくなる
という問題がある。
By the way, the conventional epoxy resin-encapsulated semiconductor device shown in FIG. 4 (D) has excellent mechanical strength and airtightness, and is much cheaper than ceramics. Since epoxy resin is used, the material cost is low, but since the epoxy encapsulation resin 55, which has a higher dielectric constant (about 4.0) than ceramics, directly covers the semiconductor chip 52, a ceramic package was adopted. There is a problem that the parasitic capacitance becomes significantly larger than that of the semiconductor device.

【0008】また、平坦なリード端子51上に半導体チ
ップ52の下面を接着し、上記半導体チップ52の上面
と上記平坦なリード端子51との間を金ワイヤ53で接
続しているので、半導体チップ52の上面と下面との間
の厚さが大きい程、金ワイヤ53の長さが長くなり、寄
生インダクタンスが大きくなるという問題もある。
Further, since the lower surface of the semiconductor chip 52 is adhered onto the flat lead terminal 51 and the upper surface of the semiconductor chip 52 and the flat lead terminal 51 are connected by the gold wire 53, the semiconductor chip. There is also a problem that the thicker the thickness between the upper surface and the lower surface of 52, the longer the gold wire 53 and the larger the parasitic inductance.

【0009】このため、上記従来の樹脂封止型半導体装
置では、高周波領域において、雑音指数,電力利得の劣
化が著しく、チップ内素子の入出力インピーダンスの位
相回転が大巾に増大し、半導体チップの性能が十分に引
き出せないという欠点がある。
Therefore, in the conventional resin-encapsulated semiconductor device described above, the noise figure and the power gain are significantly deteriorated in the high frequency region, and the phase rotation of the input / output impedance of the in-chip element is greatly increased. There is a drawback that the performance of can not be fully brought out.

【0010】そこで、本発明の目的は、寄生インダクタ
ンスや寄生キャパシタンスを抑えることができる樹脂封
止型半導体装置を提供することにある。
Therefore, an object of the present invention is to provide a resin-sealed semiconductor device capable of suppressing parasitic inductance and parasitic capacitance.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、半導体チップと、この半導体チップがダ
イボンドされるリード端子と、上記半導体チップと上記
リード端子とを接続するボンディングワイヤとが樹脂封
止された樹脂封止型半導体装置において、上記ボンディ
ングワイヤの一端が接続される上記半導体チップ上面
と、上記ボンディングワイヤの他端が接続されるリード
端子のワイヤ接続面とが略同一面上に位置するように、
上記リード端子に半導体チップ収容段部を形成したこと
を特徴としている。
In order to achieve the above object, the present invention provides a semiconductor chip, a lead terminal to which the semiconductor chip is die-bonded, and a bonding wire connecting the semiconductor chip and the lead terminal. In the resin-sealed semiconductor device sealed with resin, the upper surface of the semiconductor chip to which one end of the bonding wire is connected and the wire connection surface of the lead terminal to which the other end of the bonding wire is connected are substantially on the same plane. To be located in
It is characterized in that a semiconductor chip accommodating step portion is formed on the lead terminal.

【0012】また、上記半導体チップの表面を、上記樹
脂封止に用いる樹脂よりも誘電率が低い樹脂でコーティ
ングしたことが望ましい。
Further, it is desirable that the surface of the semiconductor chip is coated with a resin having a lower dielectric constant than the resin used for the resin sealing.

【0013】[0013]

【作用】上記リード端子に形成された半導体チップ収容
段部に上記半導体チップ下面をダイボンドし、上記ボン
ディングワイヤの一端が接続される上記半導体チップ上
面と、上記ボンディングワイヤの他端が接続されるリー
ド端子のワイヤ接続面とを略同一面上に位置させた。し
たがって、上記半導体チップの厚さがどの様な値であっ
ても、上記半導体チップ上面と上記リード端子のワイヤ
接続面との段差を実質的になくすることができ、上記ボ
ンディングワイヤの長さが最短化される。したがって、
上記半導体チップへの寄生インダクタンスが抑えられ、
高周波領域における上記半導体チップの雑音指数,電力
利得が向上させられ、かつ高周波領域における半導体チ
ップの入出力インピーダンスの位相回転が減少させられ
る。つまり、本発明によれば、高周波特性が向上させら
れた樹脂封止型半導体装置が実現される。
Operation: The lower surface of the semiconductor chip is die-bonded to the semiconductor chip housing step formed on the lead terminal, and the upper surface of the semiconductor chip to which one end of the bonding wire is connected and the lead to which the other end of the bonding wire is connected. The wire connection surface of the terminal was located on substantially the same plane. Therefore, no matter what value the thickness of the semiconductor chip is, the step between the upper surface of the semiconductor chip and the wire connection surface of the lead terminal can be substantially eliminated, and the length of the bonding wire can be reduced. Be minimized. Therefore,
Parasitic inductance to the semiconductor chip is suppressed,
The noise figure and power gain of the semiconductor chip in the high frequency region are improved, and the phase rotation of the input / output impedance of the semiconductor chip in the high frequency region is reduced. That is, according to the present invention, a resin-encapsulated semiconductor device with improved high frequency characteristics is realized.

【0014】また、上記半導体チップの表面を、上記樹
脂封止に用いる樹脂よりも誘電率が低い樹脂でコーティ
ングした場合には、上記半導体チップへの寄生キャパシ
タンスが抑えられ、半導体チップの高周波特性が、一
層、向上させられる。
When the surface of the semiconductor chip is coated with a resin having a dielectric constant lower than that of the resin used for the resin encapsulation, parasitic capacitance to the semiconductor chip is suppressed and high frequency characteristics of the semiconductor chip are improved. , Further improved.

【0015】[0015]

【実施例】以下、本発明の実施例を図示の実施例により
詳細に説明する。
Embodiments of the present invention will be described in detail below with reference to the embodiments shown in the drawings.

【0016】図1(A)〜(F)に基づいて、本発明の実施
例のエポキシ樹脂封止型半導体装置の製造工程を説明す
る。
A process of manufacturing an epoxy resin-sealed semiconductor device according to an embodiment of the present invention will be described with reference to FIGS.

【0017】まず、図1(A)に示すように、半導体チッ
プがダイボンドされるリード端子1を、図1(A)のA−
A面にて切断する。次に、図1(B)に示すように、切断
したリード端子1の一方1bをフォーミング金型で折り
曲げ加工し、半導体チップ収容段部1cを形成する。上
記折り曲げ加工時に、上記半導体チップ収容段部1cの
深さが、この収容段部1cにダイボンドする半導体チッ
プの厚さと同程度の寸法になるように、加工を行なう。
例えば、半導体チップの厚さが0.15mmである場合に
は、上記半導体チップ収容段部1cの深さが0.14〜
0.16mm程度になるように、折り曲げ加工を行なう。
First, as shown in FIG. 1 (A), a lead terminal 1 to which a semiconductor chip is die-bonded is taken as A- in FIG. 1 (A).
Cut at the A side. Next, as shown in FIG. 1B, one side 1b of the cut lead terminal 1 is bent by a forming die to form a semiconductor chip housing step 1c. During the bending process, the semiconductor chip accommodation step 1c is processed so that the depth of the semiconductor chip accommodation step 1c is approximately the same as the thickness of the semiconductor chip die-bonded to the accommodation step 1c.
For example, when the thickness of the semiconductor chip is 0.15 mm, the depth of the semiconductor chip housing step 1c is 0.14 to
Bending is performed so that it becomes about 0.16 mm.

【0018】次に、図1(C)に示すように、上記半導体
チップ収容段部1cにマイクロ波帯用FET半導体チッ
プ2の下面をAgペーストでダイボンドし、続いて、上
記半導体チップ2上面の各電極とリード端子1a,1bと
の間を金ワイヤ3で接続する。
Next, as shown in FIG. 1C, the lower surface of the microwave band FET semiconductor chip 2 is die-bonded to the semiconductor chip housing step 1c with Ag paste, and then the upper surface of the semiconductor chip 2 is covered. A gold wire 3 connects between each electrode and the lead terminals 1a and 1b.

【0019】次に、図1(D)に示すように、上記半導体
チップ2上面に低誘電率の樹脂4をコーティングする。
この樹脂4としては、誘電率2〜3程度であり、樹脂封
止に用いるエポキシ樹脂よりも誘電率が低いポリイミ
ド,フッ素系樹脂等を用いる。
Next, as shown in FIG. 1D, a resin 4 having a low dielectric constant is coated on the upper surface of the semiconductor chip 2.
As the resin 4, polyimide, fluorine resin, or the like having a dielectric constant of about 2 to 3 and a dielectric constant lower than that of an epoxy resin used for resin sealing is used.

【0020】次に、図1(E)に示すように、機械的強度
と信頼性が優れているエポキシ樹脂を封止材として、ト
ランスファーモールド法によって、樹脂封止パッケージ
外形を形作るエポキシ封止樹脂5を形成する。この後、
図1(F)に示すように、上記樹脂封止パッケージをなす
エポキシ封止樹脂5を反転して、上記パッケージから突
き出したリード端子1a,1bを所望の形状に切断,折り曲
げ加工する。
Next, as shown in FIG. 1 (E), an epoxy encapsulation resin that forms an outer shape of the resin encapsulation package by a transfer molding method using an epoxy resin having excellent mechanical strength and reliability as an encapsulation material. 5 is formed. After this,
As shown in FIG. 1 (F), the epoxy encapsulation resin 5 forming the resin encapsulation package is inverted, and the lead terminals 1a and 1b protruding from the package are cut and bent into a desired shape.

【0021】このようにして、製造したエポキシ樹脂封
止型半導体装置は、リード端子1の半導体チップ収容段
部1cの深さを、半導体チップ2の厚さと同程度の寸法
にしたので、半導体チップ2上面と上記金ワイヤ3が接
続されるリード端子1のワイヤ接続面とを略同一面上に
位置させることができる。したがって、上記半導体チッ
プ2上面と上記リード端子1のワイヤ接続面との段差を
実質的になくすることができ、上記金ワイヤの長さを最
短化できる。したがって、上記半導体チップ2への寄生
インダクタンスを抑えることができ、高周波領域におけ
る上記半導体チップ2の雑音指数,電力利得を向上で
き、かつ高周波領域における半導体チップ2の入出力イ
ンピーダンスの位相回転を減少させることができる。つ
まり、上記実施例によれば、高周波特性が優れた安価な
樹脂封止型半導体装置を実現できる。
In the thus manufactured epoxy resin-sealed semiconductor device, the depth of the semiconductor chip accommodating step portion 1c of the lead terminal 1 is set to be approximately the same as the thickness of the semiconductor chip 2. The upper surface of the wire 2 and the wire connecting surface of the lead terminal 1 to which the gold wire 3 is connected can be positioned substantially on the same surface. Therefore, the step between the upper surface of the semiconductor chip 2 and the wire connection surface of the lead terminal 1 can be substantially eliminated, and the length of the gold wire can be minimized. Therefore, the parasitic inductance to the semiconductor chip 2 can be suppressed, the noise figure and power gain of the semiconductor chip 2 in the high frequency region can be improved, and the phase rotation of the input / output impedance of the semiconductor chip 2 in the high frequency region can be reduced. be able to. That is, according to the above-described embodiment, it is possible to realize an inexpensive resin-sealed semiconductor device having excellent high frequency characteristics.

【0022】また、上記半導体チップ2上面を、樹脂封
止に用いるエポキシ封止樹脂5よりも誘電率が低いポリ
イミド,フッ素系樹脂等の低誘電率の樹脂4でコーティ
ングしたので、上記半導体チップ2への寄生キャパシタ
ンスを抑えることができ、上記半導体チップ2の高周波
特性を、更に一層向上させることができる。
Further, since the upper surface of the semiconductor chip 2 is coated with the resin 4 having a low dielectric constant such as polyimide or fluorine resin having a lower dielectric constant than the epoxy sealing resin 5 used for resin sealing, the semiconductor chip 2 is The parasitic capacitance to the semiconductor chip 2 can be suppressed, and the high frequency characteristics of the semiconductor chip 2 can be further improved.

【0023】尚、上記実施例では、マイクロ波帯用FE
T半導体チップを備えた樹脂封止型半導体装置について
述べたが、本発明は、準マイクロ波帯以上で使用するダ
イオード,MMIC(マイクロウェーブ・モノリシック・
インテグレーティッド・サーキット)を有する半導体チ
ップを備えた半導体装置にも適用できる。
In the above embodiment, the FE for microwave band is used.
The resin-encapsulated semiconductor device including the T semiconductor chip has been described. However, the present invention is directed to a diode, MMIC (microwave monolithic device) used in the quasi-microwave band or higher.
It can also be applied to a semiconductor device including a semiconductor chip having an integrated circuit).

【0024】[0024]

【発明の効果】以上の説明より明らかなように、本発明
の樹脂封止型半導体装置は、半導体チップと、この半導
体チップがダイボンドされるリード端子と、上記半導体
チップと上記リード端子とを接続するボンディングワイ
ヤとが樹脂封止された樹脂封止型半導体装置において、
上記リード端子に形成された半導体チップ収容段部に上
記半導体チップ下面をダイボンドし、上記ボンディング
ワイヤの一端が接続される上記半導体チップ上面と、上
記ボンディングワイヤの他端が接続されるリード端子の
ワイヤ接続面とを略同一面上に位置させた。したがっ
て、上記半導体チップの厚さがどの様な値であっても、
上記半導体チップ上面と上記リード端子のワイヤ接続面
との段差を実質的になくすることができ、上記ボンディ
ングワイヤの長さが最短化される。したがって、上記半
導体チップへの寄生インダクタンスが抑えることがで
き、高周波領域における上記半導体チップの雑音指数,
電力利得を向上させることができ、かつ高周波領域にお
ける半導体チップの入出力インピーダンスの位相回転を
減少させることができる。したがって、本発明によれ
ば、高周波特性が優れた安価な樹脂封止型半導体装置を
実現できる。
As is apparent from the above description, in the resin-sealed semiconductor device of the present invention, a semiconductor chip, a lead terminal to which the semiconductor chip is die-bonded, and the semiconductor chip and the lead terminal are connected. In the resin-sealed semiconductor device in which the bonding wire and
A wire of a lead terminal to which the lower surface of the semiconductor chip is die-bonded to the semiconductor chip housing step formed on the lead terminal, and the upper surface of the semiconductor chip to which one end of the bonding wire is connected and the other end of the bonding wire are connected. The connection surface and the connection surface were located on substantially the same plane. Therefore, no matter what the thickness of the semiconductor chip is,
The step between the upper surface of the semiconductor chip and the wire connection surface of the lead terminal can be substantially eliminated, and the length of the bonding wire can be minimized. Therefore, parasitic inductance to the semiconductor chip can be suppressed, the noise figure of the semiconductor chip in the high frequency region,
The power gain can be improved, and the phase rotation of the input / output impedance of the semiconductor chip in the high frequency region can be reduced. Therefore, according to the present invention, an inexpensive resin-sealed semiconductor device having excellent high frequency characteristics can be realized.

【0025】また、上記半導体チップの表面を、上記樹
脂封止に用いる樹脂よりも誘電率が低い樹脂でコーティ
ングした場合には、上記半導体チップへの寄生キャパシ
タンスが抑えられ、半導体チップの高周波特性を特に向
上できる。
When the surface of the semiconductor chip is coated with a resin having a dielectric constant lower than that of the resin used for the resin encapsulation, the parasitic capacitance to the semiconductor chip is suppressed and the high frequency characteristics of the semiconductor chip are improved. Especially it can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の樹脂封止型半導体装置の実施例の製
造工程を説明する断面図である。
FIG. 1 is a cross-sectional view illustrating a manufacturing process of an embodiment of a resin-sealed semiconductor device of the present invention.

【図2】 セラミックパッケージされた半導体装置の断
面図である。
FIG. 2 is a sectional view of a semiconductor device packaged in a ceramic package.

【図3】 従来のエポキシ樹脂封止型半導体装置の平面
図である。
FIG. 3 is a plan view of a conventional epoxy resin-sealed semiconductor device.

【図4】 上記従来の樹脂封止型半導体装置の製造工程
を説明する断面図である。
FIG. 4 is a cross-sectional view illustrating a manufacturing process of the conventional resin-encapsulated semiconductor device.

【符号の説明】[Explanation of symbols]

1,1a,1b リード端子 2 FET半導体チ
ップ 3 金ワイヤ 4 低誘電率の樹脂 5 エポキシ封止樹脂
1,1a, 1b Lead terminal 2 FET semiconductor chip 3 Gold wire 4 Low dielectric constant resin 5 Epoxy encapsulation resin

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/28 A 8617−4M 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location H01L 23/28 A 8617-4M 23/29 23/31

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップと、この半導体チップがダ
イボンドされるリード端子と、上記半導体チップと上記
リード端子とを接続するボンディングワイヤとが樹脂封
止された樹脂封止型半導体装置において、 上記ボンディングワイヤの一端が接続される上記半導体
チップ上面と、上記ボンディングワイヤの他端が接続さ
れるリード端子のワイヤ接続面とが略同一面上に位置す
るように、上記リード端子に半導体チップ収容段部を形
成したことを特徴とする樹脂封止型半導体装置。
1. A resin-sealed semiconductor device in which a semiconductor chip, a lead terminal to which the semiconductor chip is die-bonded, and a bonding wire connecting the semiconductor chip and the lead terminal are resin-sealed, wherein the bonding is performed. The semiconductor chip accommodating step portion is provided on the lead terminal so that the upper surface of the semiconductor chip to which one end of the wire is connected and the wire connecting surface of the lead terminal to which the other end of the bonding wire is connected are located substantially on the same plane. A resin-encapsulated semiconductor device comprising:
【請求項2】 上記半導体チップの表面を、上記樹脂封
止に用いる樹脂よりも誘電率が低い樹脂でコーティング
したことを特徴とする請求項1に記載の樹脂封止型半導
体装置。
2. The resin-encapsulated semiconductor device according to claim 1, wherein the surface of the semiconductor chip is coated with a resin having a dielectric constant lower than that of the resin used for the resin encapsulation.
JP4053408A 1992-03-12 1992-03-12 Resin-sealed semiconductor device Pending JPH05259336A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4053408A JPH05259336A (en) 1992-03-12 1992-03-12 Resin-sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4053408A JPH05259336A (en) 1992-03-12 1992-03-12 Resin-sealed semiconductor device

Publications (1)

Publication Number Publication Date
JPH05259336A true JPH05259336A (en) 1993-10-08

Family

ID=12942001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4053408A Pending JPH05259336A (en) 1992-03-12 1992-03-12 Resin-sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPH05259336A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0637075A1 (en) * 1993-07-27 1995-02-01 Kabushiki Kaisha Toshiba Semiconductor device sealed with molded resin
US5917241A (en) * 1996-05-23 1999-06-29 Mitsubishi Denki Kabushiki Kaisha High frequency semiconductor device having source, drain, and gate leads

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0637075A1 (en) * 1993-07-27 1995-02-01 Kabushiki Kaisha Toshiba Semiconductor device sealed with molded resin
US5717232A (en) * 1993-07-27 1998-02-10 Kabushiki Kaisha Toshiba Semiconductor device sealed with molded resin
US5917241A (en) * 1996-05-23 1999-06-29 Mitsubishi Denki Kabushiki Kaisha High frequency semiconductor device having source, drain, and gate leads

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