JPH0525383B2 - - Google Patents

Info

Publication number
JPH0525383B2
JPH0525383B2 JP25012286A JP25012286A JPH0525383B2 JP H0525383 B2 JPH0525383 B2 JP H0525383B2 JP 25012286 A JP25012286 A JP 25012286A JP 25012286 A JP25012286 A JP 25012286A JP H0525383 B2 JPH0525383 B2 JP H0525383B2
Authority
JP
Japan
Prior art keywords
developer
development
ion concentration
resist film
hydrogen ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25012286A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63104331A (ja
Inventor
Shinji Kishimura
Masayuki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP25012286A priority Critical patent/JPS63104331A/ja
Publication of JPS63104331A publication Critical patent/JPS63104331A/ja
Publication of JPH0525383B2 publication Critical patent/JPH0525383B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP25012286A 1986-10-20 1986-10-20 現像処理方法 Granted JPS63104331A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25012286A JPS63104331A (ja) 1986-10-20 1986-10-20 現像処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25012286A JPS63104331A (ja) 1986-10-20 1986-10-20 現像処理方法

Publications (2)

Publication Number Publication Date
JPS63104331A JPS63104331A (ja) 1988-05-09
JPH0525383B2 true JPH0525383B2 (enrdf_load_html_response) 1993-04-12

Family

ID=17203149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25012286A Granted JPS63104331A (ja) 1986-10-20 1986-10-20 現像処理方法

Country Status (1)

Country Link
JP (1) JPS63104331A (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638399B2 (ja) * 1989-03-15 1994-05-18 松下電器産業株式会社 現像装置
JP2839280B2 (ja) * 1989-03-15 1998-12-16 松下電器産業株式会社 着色フォトレジストの現像装置
JP5953715B2 (ja) * 2010-12-01 2016-07-20 大日本印刷株式会社 露光用マスクの表面イオン濃度のモニター方法およびモニターシステム、該モニターシステムを備えた露光用マスク洗浄装置、並びに露光用マスクの製造方法

Also Published As

Publication number Publication date
JPS63104331A (ja) 1988-05-09

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