JPH0525230Y2 - - Google Patents
Info
- Publication number
- JPH0525230Y2 JPH0525230Y2 JP17329685U JP17329685U JPH0525230Y2 JP H0525230 Y2 JPH0525230 Y2 JP H0525230Y2 JP 17329685 U JP17329685 U JP 17329685U JP 17329685 U JP17329685 U JP 17329685U JP H0525230 Y2 JPH0525230 Y2 JP H0525230Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- semiconductor wafer
- wavelength
- semiconductor
- heating container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 58
- 235000012431 wafers Nutrition 0.000 claims description 44
- 238000010438 heat treatment Methods 0.000 claims description 37
- 239000000498 cooling water Substances 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 description 9
- 150000002367 halogens Chemical class 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17329685U JPH0525230Y2 (ko) | 1985-11-11 | 1985-11-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17329685U JPH0525230Y2 (ko) | 1985-11-11 | 1985-11-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6282730U JPS6282730U (ko) | 1987-05-27 |
JPH0525230Y2 true JPH0525230Y2 (ko) | 1993-06-25 |
Family
ID=31110622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17329685U Expired - Lifetime JPH0525230Y2 (ko) | 1985-11-11 | 1985-11-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0525230Y2 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2783410B2 (ja) * | 1988-11-07 | 1998-08-06 | 株式会社日立製作所 | 半導体装置の製造方法および製造装置 |
US8548311B2 (en) * | 2008-04-09 | 2013-10-01 | Applied Materials, Inc. | Apparatus and method for improved control of heating and cooling of substrates |
JP4978684B2 (ja) * | 2009-11-06 | 2012-07-18 | ウシオ電機株式会社 | シリコン薄膜の処理方法およびフラッシュランプ照射装置 |
-
1985
- 1985-11-11 JP JP17329685U patent/JPH0525230Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6282730U (ko) | 1987-05-27 |
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