JPH0525230Y2 - - Google Patents

Info

Publication number
JPH0525230Y2
JPH0525230Y2 JP17329685U JP17329685U JPH0525230Y2 JP H0525230 Y2 JPH0525230 Y2 JP H0525230Y2 JP 17329685 U JP17329685 U JP 17329685U JP 17329685 U JP17329685 U JP 17329685U JP H0525230 Y2 JPH0525230 Y2 JP H0525230Y2
Authority
JP
Japan
Prior art keywords
light
semiconductor wafer
wavelength
semiconductor
heating container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17329685U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6282730U (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17329685U priority Critical patent/JPH0525230Y2/ja
Publication of JPS6282730U publication Critical patent/JPS6282730U/ja
Application granted granted Critical
Publication of JPH0525230Y2 publication Critical patent/JPH0525230Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP17329685U 1985-11-11 1985-11-11 Expired - Lifetime JPH0525230Y2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17329685U JPH0525230Y2 (ko) 1985-11-11 1985-11-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17329685U JPH0525230Y2 (ko) 1985-11-11 1985-11-11

Publications (2)

Publication Number Publication Date
JPS6282730U JPS6282730U (ko) 1987-05-27
JPH0525230Y2 true JPH0525230Y2 (ko) 1993-06-25

Family

ID=31110622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17329685U Expired - Lifetime JPH0525230Y2 (ko) 1985-11-11 1985-11-11

Country Status (1)

Country Link
JP (1) JPH0525230Y2 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2783410B2 (ja) * 1988-11-07 1998-08-06 株式会社日立製作所 半導体装置の製造方法および製造装置
US8548311B2 (en) * 2008-04-09 2013-10-01 Applied Materials, Inc. Apparatus and method for improved control of heating and cooling of substrates
JP4978684B2 (ja) * 2009-11-06 2012-07-18 ウシオ電機株式会社 シリコン薄膜の処理方法およびフラッシュランプ照射装置

Also Published As

Publication number Publication date
JPS6282730U (ko) 1987-05-27

Similar Documents

Publication Publication Date Title
US7949237B2 (en) Heating configuration for use in thermal processing chambers
KR100887813B1 (ko) 매우 신속한 열 처리 챔버 및 사용 방법
US4504323A (en) Method for annealing semiconductors with a planar source composed of flash discharge lamps
JP3484651B2 (ja) 加熱装置と加熱する方法
US6559424B2 (en) Windows used in thermal processing chambers
US6252203B1 (en) Lamp system for uniform semiconductor wafer heating
KR102531865B1 (ko) 회전하는 기판의 레이저 어닐링
KR950006955A (ko) 열 처리장치 및 열처리방법
TW201342480A (zh) 管理基材退火的熱預算
US4543472A (en) Plane light source unit and radiant heating furnace including same
JPH0525230Y2 (ko)
JPS63227014A (ja) ランプ加熱装置
US4100418A (en) Method of and means for filtering the infrared rays from a source of UV radiation
JPH0778830A (ja) 半導体製造装置
JPS6226571B2 (ko)
JP2615783B2 (ja) 加熱装置
JP2515883B2 (ja) 半導体装置製造用ランプアニ―ル装置
JPH0325928A (ja) 半導体ウェハーのランプ式熱処理装置
JP2002151427A (ja) 熱処理装置
JPS6341212B2 (ko)
JPS62181422A (ja) 光照射装置
JPH04354121A (ja) 急速加熱装置
JPH04206141A (ja) ランプ加熱装置
JPH02309629A (ja) ランプアニール装置
JP2003234304A (ja) 熱処理装置