JPH0525087B2 - - Google Patents
Info
- Publication number
- JPH0525087B2 JPH0525087B2 JP59169640A JP16964084A JPH0525087B2 JP H0525087 B2 JPH0525087 B2 JP H0525087B2 JP 59169640 A JP59169640 A JP 59169640A JP 16964084 A JP16964084 A JP 16964084A JP H0525087 B2 JPH0525087 B2 JP H0525087B2
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- systems
- concave
- concave mirror
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59169640A JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
US06/764,001 US4701035A (en) | 1984-08-14 | 1985-08-09 | Reflection optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59169640A JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6147915A JPS6147915A (ja) | 1986-03-08 |
JPH0525087B2 true JPH0525087B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-04-09 |
Family
ID=15890235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59169640A Granted JPS6147915A (ja) | 1984-08-14 | 1984-08-14 | 反射光学系 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6147915A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2603225B2 (ja) * | 1986-07-11 | 1997-04-23 | キヤノン株式会社 | X線投影露光装置及び半導体製造方法 |
US5071240A (en) * | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
US5052763A (en) * | 1990-08-28 | 1991-10-01 | International Business Machines Corporation | Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations |
WO2006087978A1 (ja) * | 2005-02-15 | 2006-08-24 | Nikon Corporation | 投影光学系、露光装置、およびデバイスの製造方法 |
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1984
- 1984-08-14 JP JP59169640A patent/JPS6147915A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6147915A (ja) | 1986-03-08 |