JPH0524992B2 - - Google Patents

Info

Publication number
JPH0524992B2
JPH0524992B2 JP58224986A JP22498683A JPH0524992B2 JP H0524992 B2 JPH0524992 B2 JP H0524992B2 JP 58224986 A JP58224986 A JP 58224986A JP 22498683 A JP22498683 A JP 22498683A JP H0524992 B2 JPH0524992 B2 JP H0524992B2
Authority
JP
Japan
Prior art keywords
substrate
cbn
wbn
plasma
containing gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58224986A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60116781A (ja
Inventor
Koichi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP22498683A priority Critical patent/JPS60116781A/ja
Publication of JPS60116781A publication Critical patent/JPS60116781A/ja
Publication of JPH0524992B2 publication Critical patent/JPH0524992B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP22498683A 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法 Granted JPS60116781A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22498683A JPS60116781A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22498683A JPS60116781A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Publications (2)

Publication Number Publication Date
JPS60116781A JPS60116781A (ja) 1985-06-24
JPH0524992B2 true JPH0524992B2 (enrdf_load_stackoverflow) 1993-04-09

Family

ID=16822303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22498683A Granted JPS60116781A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Country Status (1)

Country Link
JP (1) JPS60116781A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61238962A (ja) * 1985-04-16 1986-10-24 Matsushita Electric Ind Co Ltd 膜形成装置
DE3546113A1 (de) * 1985-12-24 1987-06-25 Santrade Ltd Verbundpulverteilchen, verbundkoerper und verfahren zu deren herstellung

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57133636A (en) * 1981-02-13 1982-08-18 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma at low temperature
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma

Also Published As

Publication number Publication date
JPS60116781A (ja) 1985-06-24

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