JPH05241325A - Formation of image cell pattern of color filter - Google Patents

Abstract

PURPOSE:To obviate the generation of the traces of connection by subjecting a substrate surface for a photomask to divided plotting and exposing in accordance with the data for plotting reticule patterns formed by setting vertical and horizontal dividing lines in the middle of unit cells and extracting these lines. CONSTITUTION:The dividing lines V for the vertical direction and the dividing lines H for the horizontal direction for equally dividing the image cell patterns 1 recorded on a recording medium to data for plotting the reticule patterns are so formed as not to cover the regions of respective unit cell patterns 1a. Namely, these lines are set between the unit cell patterns 1a and 1a arranged to face each other and are set by extracting these lines as the data for plotting the reticule patterns. An electron beam exposing device is operated in accordance with such data for plotting the reticule pattern. In addition, a substrate moving base for the photomask is intermittently moved cooperatively with the start and end operations of the scanning for beam exposing. The reticule patterns are successively dividedly plotted and exposed on the substrate surface for the photomask, by which the image cell patterns are produced.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter for bonding used in a liquid crystal color image display or a color CCD (solid-state image sensor), or an on-chip color filter, and an image cell pattern of the color filter, or The present invention relates to a method for producing an image cell pattern of a color filter for producing an image cell pattern of a color filter and an energization pattern.

[0002]

2. Description of the Related Art Conventionally, an image cell pattern of a color filter, or an image cell pattern of a color filter and an energization pattern (pad pattern, wiring pattern) are produced by a process shown in FIG. 6, for example. ing.

First, the specifications of the IC are determined, and the logic design and the circuit design are performed in the design process according to the specifications, and one unit cell pattern for producing the image cell pattern of the color filter is ruled in a large number in the vertical and horizontal directions. The pattern design of the image cell pattern or the pad pattern as the energizing pattern and the wiring pattern is performed.

Subsequently, in a digitizing process, the designed pattern is converted into digital data by a CAD system, and a recording medium such as a magnetic tape is used as image cell pattern drawing data, pad pattern drawing data, and wiring pattern drawing data. Entered in. The image cell pattern drawing data is drawn on the surface of the photomask substrate by operating the electron beam exposure apparatus to form a pattern in which a large number of unit cell patterns are regularly arranged in the vertical direction (row direction) and the horizontal direction (column direction). Data for operating the electron beam exposure apparatus.

Next, as shown in FIG. 7, the image cell pattern drawing data recorded on the recording medium is equally divided in the vertical and horizontal directions at predetermined division intervals (v, h), and each of them is divided. It is set as reticle pattern drawing data for each divided unit for performing divided drawing exposure by the electron beam exposure apparatus in order for each divided area. This is to suppress the electron beam scanning deflection angle of the electron beam exposure apparatus as much as possible by performing the divided image exposure, thereby eliminating the image exposure distortion in the scanning peripheral portion. The scanning of the electron beam of the electron beam exposure apparatus is controlled by the operation signal based on the reticle pattern drawing data for one division unit set in this way.

The electron beam exposure apparatus draws and exposes one unit of the reticle pattern on the basis of the reticle pattern drawing data, and after the exposure, a distance corresponding to the horizontal division interval h of the one unit of the reticle pattern. , Or by moving the photomask substrate in parallel by the intermittent moving table by a distance corresponding to the vertical division interval v, and adjoining the previously exposed area for drawing, and sequentially performing such division for each division unit. Of the reticle pattern are sequentially exposed on the photomask substrate surface in a divided pattern, and the unit cell patterns for each divided region are arranged adjacent to each other in the vertical and horizontal directions on the photomask substrate surface. To obtain a photomask substrate on which a pattern corresponding to the image cell pattern is exposed. After that, the photomask substrate is developed and etched. Ring, by washing process is for producing a photomask for image cell pattern for manufacturing a color filter.

By the way, as described above, the setting of the reticle pattern drawing data by dividing the drawing data in the vertical direction and the horizontal direction in the above-mentioned conventional image cell pattern forming method is performed on the recording medium as shown in FIG. The recorded image cell pattern drawing data of the image cell pattern 1 in which a large number of 1 unit cell patterns 1a are regularly arranged in the vertical and horizontal directions is recorded in the vertical dividing line V and the horizontal dividing line H.
With a predetermined length (spacing), it is equally divided in the vertical direction at intervals v and in the horizontal direction at intervals h, and each divided region is divided into 1
It was set as the reticle pattern drawing data for each unit.

[0008]

Therefore, sometimes,
A vertical dividing line V and a horizontal dividing line H for equally dividing the reticle pattern drawing data are set so as to hang on each unit cell 1a of the image cell pattern 1 of the color filter as shown in FIG. There were cases where it was done.

As described above, the electron beam exposure apparatus performs beam exposure scanning based on the reticle pattern drawing data set with the dividing lines V and H that are applied to the unit cell 1a portion, and the photomask substrate moving base is moved. Then, the exposure dose of the electron beam caused by the overlap scan and the movement error in the accuracy of the moving table body at the connection part of the reticle pattern by the split exposure exposure scan of the photomask obtained by the division exposure And the traces of connection due to the divided exposure are likely to occur in the image cell pattern of the photomask.

The present invention solves the above-mentioned inconvenience, and a vertical dividing line V and a horizontal dividing line H are obtained from image cell pattern drawing data recorded on a recording medium.
By improving the setting method that sets the reticle pattern drawing data for each divided area that is divided by the reticle pattern drawing data, a trace of the connection is generated in the image cell pattern of the photomask by the divided exposure by the electron beam exposure device. To avoid doing it.

[0011]

The first invention of the present invention is as follows:
Image cell pattern of a color filter in which a number of unit cells are regularly arranged in the row direction and the column direction. A drawing data recording medium in which drawing data is recorded. The recording medium is divided into rectangles in the vertical and horizontal directions, or at predetermined intervals. Each of the divided image cell pattern drawing data obtained by dividing is sequentially extracted as reticle pattern drawing data, and based on the extracted reticle pattern drawing data, a photomask substrate is sequentially formed by electron beam exposure means. The reticle pattern is exposed on the surface and after the reticle pattern is exposed, the photomask substrate is moved by a distance corresponding to a division interval of the reticle pattern in the vertical or horizontal direction, and the reticle pattern is sequentially formed on the photomask substrate surface. Create a color filter image cell pattern by exposing separately In the method for producing an image cell pattern of a color filter, units that are arranged to face each other so that vertical and horizontal dividing lines for dividing the data for drawing the reticle pattern do not overlap each unit cell portion of the image cell pattern of the color filter. An image cell pattern of a color filter is produced by setting the cell at approximately the center of the cell and extracting it as reticle pattern drawing data, and sequentially exposing the reticle pattern on the photomask substrate surface in divided fashion based on the reticle pattern drawing data. And a method for producing an image cell pattern of a color filter.

A second aspect of the present invention is directed to a vertical direction from a drawing data recording medium on which image cell pattern drawing data of a color filter in which a plurality of unit cell patterns are regularly arranged in a row direction and a column direction is recorded. And 1 unit division data obtained by equally dividing into a rectangular shape in the horizontal direction as reticle pattern drawing data, and the photomask substrate surface based on the extracted reticle pattern drawing data by the electron beam exposure means. Then, the reticle pattern is exposed by drawing, and after the reticle pattern drawing exposure, the photomask substrate is moved by a distance corresponding to the division interval of the reticle pattern in the vertical or horizontal direction, and the reticle pattern is sequentially divided on the photomask substrate surface. A color fill that creates an image cell pattern of a color filter by drawing exposure In the image cell pattern manufacturing method of No. 2, the vertical and horizontal dividing lines for equally dividing the data for drawing the reticle pattern are arranged so as to face each other so as not to hang on each unit cell portion of the image cell pattern of the color filter. Image cell patterns of color filters are created by extracting data as reticle pattern drawing data by setting between the unit cell patterns to be formed, and sequentially exposing the reticle pattern on the substrate surface for the photomask in accordance with the reticle pattern drawing data. And a method for producing an image cell pattern of a color filter.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The first invention of the present invention will be described in detail below with reference to embodiments. FIG. 1 shows an image cell pattern 1 of a color filter to be drawn and exposed using an electron beam exposure apparatus.
FIG. 4 is a plan view showing a partial region of FIG. 1, in which a large number of one unit cell patterns 1a are regularly arranged in a vertical direction (vertical direction in the drawing) and a horizontal direction (horizontal direction in the drawing). The image cell pattern 1 is designed in advance as a figure and is designed by CAD (Computer Aided Desi).
The graphic pattern is digitized by the gn) system to be digitized, and the predetermined recording medium (magnetic tape,
It is recorded on a floppy disk, hard disk, etc.).

The shape of each one unit cell pattern 1a constituting the image cell pattern 1 is usually rectangular or circular, and its arrangement is as shown in FIG. 2 which is an enlarged view of FIG. Blue, Green
Data for drawing such that each 1-unit cell pattern 1a is regularly arranged in the area corresponding to the position where the filters for the three primary colors of light of en) and red (Red) are repeatedly arranged in order as cells. Are recorded on the recording medium by the CAD system.

1 and 2 from the image cell pattern drawing data of the color filter recorded on the recording medium by this CAD system (drawing data for drawing the image cell pattern 1 of FIG. 1). As described above, the vertical division line V and the horizontal division line H are used to obtain a rectangular shape at equal intervals or at predetermined unequal intervals (vertical division interval v, horizontal division interval h). The image cell pattern data of each divided area is extracted as reticle pattern drawing data (data for drawing the reticle pattern 2 of the rectangular area surrounded by the dividing line), and the extracted reticle pattern drawing data Based on CAM (ComputerAided M
NCM (Nu in the anufacturing) process
That is, a reticle pattern is exposed on the surface of the photomask substrate by controlling the electron beam exposure apparatus and the photomask substrate moving base, and the reticle pattern is exposed on the photomask substrate after the reticle pattern is exposed. The image cell pattern of the color filter is produced by moving the reticle pattern on the surface of the photomask substrate one by one by dividing and exposing it while moving it by a distance corresponding to the length in the vertical or horizontal direction.

The CAD system is for digitizing an image cell pattern, a pad pattern, a wiring pattern, etc. of a color filter in which a large number of unit cells are regularly arranged in the row direction and the column direction to form numerical data. A digitizer, a pattern data output means such as a CRT display, a recording medium for recording the numerical data of the pattern as image cell pattern drawing data for drawing and exposing the photomask substrate surface, and a recording medium for recording the recording medium. Reticle pattern drawing for extracting 1-unit divided data obtained by equally dividing the existing photomask drawing data into a rectangular shape in the row direction / column direction and setting the 1-unit divided data as reticle pattern drawing data It is provided with data setting means and the like.

Further, as the NCM in the CAM process,
Electron beam exposure means for drawing and exposing the reticle pattern on the photomask substrate surface based on the reticle pattern drawing data set by the reticle pattern drawing data setting means, and the reticle pattern for exposing the photomask substrate after the reticle pattern drawing exposure And a photomask intermittent moving table that can be intermittently moved by a distance corresponding to the lengths in the row and column directions of the electron beam based on the reticle pattern drawing data set by the reticle pattern drawing data setting means. The reticle pattern is exposed on the photomask substrate surface by the exposure means, and after the reticle pattern drawing exposure, the photomask is moved by a distance corresponding to the length of the reticle pattern in the row direction or the column direction, and the photomask substrate surface is exposed. That exposes the reticle pattern separately A.

According to the method of the present invention, when the above-mentioned image cell pattern is produced, the image is recorded on a recording medium as shown in FIG.
The vertical dividing line V and the horizontal dividing line H for equally dividing the image cell pattern 1 of the color filter into the reticle pattern drawing data as shown in FIG. The reticle pattern drawing data is set by extracting the reticle pattern drawing data between the unit cell patterns 1a, 1a arranged opposite to each other (for example, in the middle or almost in the middle) so as not to cover the area of the unit cell pattern 1a. The photomask substrate moving base is operated by operating the electron beam exposure apparatus based on the reticle pattern drawing data and interlocking with the beam exposure scanning start and end operations of the electron beam exposure apparatus. By intermittently moving the reticle pattern on the surface of the photomask substrate. It is characterized in that to produce the image cell pattern of the color filter by.

In the method of the present invention, the photomask substrate is, for example, one side of a transparent glass substrate.
An opaque chrome thin film and a photosensitive photoresist film (positive type or negative type) are laminated in this order, but the laminated constitution is not particularly limited to this, and a material for film formation is also used. , Composition, etc. can be appropriately set.

FIG. 3 shows a reticle pattern 2 for producing a blue image cell pattern to be drawn by reticle pattern drawing data for explaining an embodiment of the method of the present invention.
3 is a plan view of the reticle pattern of the blue, green, and red unit cell patterns 1a in the region of the reticle pattern 2 surrounded by the dividing lines V and H shown in FIG. This is for setting drawing data.

FIG. 4A is a plan view showing a reticle pattern 2 for each divided area for producing a set blue image cell pattern. The reticle pattern for each divided area for the blue image cell pattern is shown in FIG. The electron beam exposure scanning of the electron beam exposure apparatus is controlled based on the drawing data, and the reticle pattern 2 of one unit divided area is exposed every time the exposure is completed. The reticle pattern 2 is moved relative to the beam source by a vertical length v and a horizontal length h to move the reticle pattern 2 on the photomask substrate surface fixed on the photomask substrate moving table. , The reticle pattern 2 for each division unit is sequentially divided and exposed. The photomask substrate thus divided and exposed for exposure is developed by developing the photoresist (positive type or negative type) on the outermost surface, and the opaque chrome film in the photomask substrate region where the photoresist is removed by the development is removed. Etching is performed.

As a result, as shown in FIG. 4B, the reticle pattern 2 of all the divided areas is attached to the surface of the photomask substrate 10 by, for example, 15 times by the divided drawing exposure, and the blue image cell pattern of the color filter is formed. A photomask 11 for forming a blue image cell pattern of a color filter having a (positive pattern or negative pattern) formed by photoetching is obtained.

In the same manner, the green and red image cell patterns (positive pattern or negative pattern) will be described below on the basis of the green reticle pattern drawing data and the red reticle pattern drawing data on the surface of the photomask substrate 10, respectively. A photomask 11 for forming the image cell patterns of green and red of the color filters by photoetching is obtained by dividing and exposing by the electron beam of the electron beam exposure apparatus.

When the electron beam exposure device sequentially performs the divided writing exposure on the photomask substrate surface based on the reticle pattern writing data for each divided area, the center of the scanning region of the electron beam (electron beam light source) is used. The reticle pattern drawing data for each division unit is set so that the exposure target point (which is directly opposed to) is aligned with the center of the reticle pattern 2 for each division unit, and the division drawing exposure is performed.

FIG. 5 shows an on-chip color filter panel according to another embodiment of the method of the present invention (the image cell pattern 1 of the color filter is integrally formed on an operation circuit element such as a logic circuit for CCD operation on a silicon wafer surface and a wiring pattern. FIG. 3 is a plan view showing a panel pattern formed on a panel formed by stacking the image cell pattern 1a and an image cell pattern 1 of a color filter formed by a regular arrangement of unit cell patterns 1a, and an end portion of the image cell pattern 1 region. 2 shows a pad pattern 20 and a wiring pattern 21 for operating the color filter, which are formed in FIG.

The panel pattern is designed as a figure in advance and is designed by CAD (Computer Aide).
d Design) the figure is digitized and digitized by a system, and is recorded on a predetermined recording medium (magnetic tape, floppy disk, hard disk, etc.) as predetermined drawing data as in the conventional example. is there.

From the panel pattern drawing data (drawing data for drawing the panel pattern of FIG. 5) of the on-chip color filter panel recorded and constructed on the recording medium by this CAD system, the vertical dividing line V
And reticle pattern drawing data (the reticle pattern 2 in the rectangular area surrounded by the dividing line, the divided image cell pattern data for each dividing unit obtained by equally dividing into rectangular shapes by the dividing line H in the horizontal direction. Data for drawing the reticle pattern), and based on the extracted data for drawing the reticle pattern, CAM (Co
mputorAided Manufacturin
g) NCM (Numerical Con) in the process
That is, the electron beam exposure device and the photomask substrate moving base are controlled to sequentially draw and expose a reticle pattern on the photomask substrate surface, and after the reticle pattern drawing exposure, the photomask substrate is exposed to the reticle pattern. Of the reticle pattern for each division unit is sequentially drawn and exposed (divided exposure) on the surface of the photomask substrate to form an image cell pattern of the color filter. It is a thing.

In the other embodiment, even if the reticle pattern drawing data is set so that the dividing lines V and H shown in FIG. 7 pass above the pad pattern 20 and the wiring pattern 21, for example. Since there is no optical obstacle to the area of the image cell pattern 1 of the color filter, the pad pattern 20 and the wiring pattern 2
There is no problem in setting the reticle pattern drawing data so that the dividing lines V and H pass over 1.

Next, the second invention of the present invention will be described. As shown in FIG. 1, an image cell pattern 1 of a color filter in which a large number of unit cell patterns 1a are regularly arranged in the row and column directions is provided. From the drawing data recording medium in which the image cell pattern drawing data obtained by converting the data into numerical data is recorded, the vertical dividing lines V and the horizontal dividing lines H form rectangular intervals in the vertical and horizontal directions (in the vertical direction). 1 unit division data obtained by dividing into division intervals v and horizontal division intervals h) is extracted as reticle pattern drawing data, and a photo based on the extracted reticle pattern drawing data by the electron beam exposure means. A reticle pattern is drawn and exposed on the mask substrate surface, and after the reticle pattern drawing and exposure, the reticle pattern is hung on the photomask substrate. Or horizontal row direction of the split interval (v,
The image cell pattern of the color filter is produced by moving the reticle pattern on the surface of the photomask substrate one by one by dividing and exposing it by moving a distance corresponding to (h).

The vertical dividing lines V and the horizontal dividing lines H for equally dividing the reticle pattern drawing data are not applied to the respective unit cell patterns 1a constituting the image cell pattern 1 of the color filter. Is set between the unit cell patterns 1a, 1a arranged opposite to each other (for example, in the middle or almost in the middle) and extracted as reticle pattern drawing data, and based on the reticle pattern drawing data, the photomask substrate surface is formed. An image cell pattern of a color filter is produced by sequentially exposing a reticle pattern in a divided pattern.

[0031]

According to the method of the present invention, the dividing line V in the vertical direction and the dividing line H in the horizontal direction for dividing the image cell pattern 1 of the color filter into the reticle pattern drawing data are set in the image cell pattern 1 of the color filter. The image cell pattern is divided by setting it approximately at the middle of the unit cell patterns 1a arranged so as to face each other so as not to cover the area of each unit cell pattern 1a, and the image cell pattern for each division unit is set as reticle pattern drawing data. Since the divided drawing exposure is performed after that, the joint portion of the divided exposure is located outside the area of each unit cell pattern 1a, and the trace of the exposure joint is not generated in the produced image cell pattern.

Further, based on the reticle pattern drawing data for each divided area, when the electron beam exposure device sequentially performs the divided drawing exposure on the surface of the photomask substrate, the center of the scanning area of the electron beam (electron beam light source) is used. (Exposure point directly facing to) is aligned with the center of the reticle pattern of each division unit and the divided writing exposure is performed. Therefore, the deflection swing angle of the electron beam (the displacement angle with respect to the straight undeflected beam direction) is minimized, and Generation of distortion can be suppressed.

[0033]

According to the method of the present invention, the trace of the joint which is likely to occur due to the overlap scanning of the electron beam in the joint portion of the exposure in the divided drawing exposure scanning of the photomask, the movement error in the precision of the movable table body, and the like, It does not occur in each unit cell pattern area of the image cell pattern,
This is a remarkable effect in producing an image cell pattern of a color filter that does not cause optical troubles due to exposure continuity.

[Brief description of drawings]

FIG. 1 is an overall plan view of an image cell pattern in the method of the present invention.

FIG. 2 is an enlarged plan view of a division unit reticle pattern obtained by dividing an image cell pattern in the method of the present invention.

FIG. 3 is an enlarged plan view of a blue reticle pattern obtained by dividing an image cell pattern in the method of the present invention.

FIG. 4A is a plan view of a blue reticle pattern in the method of the present invention. (B) An overall plan view of a blue image cell pattern produced on a photomask substrate in the method of the present invention.

FIG. 5 is a partial plan view of an on-chip color filter panel pattern for explaining the first aspect of the invention.

FIG. 6 is a flowchart illustrating an image cell pattern production process of a general color filter.

FIG. 7 is a partially enlarged view of an image cell pattern for explaining a conventional method for producing an image cell pattern of a color filter.

[Explanation of symbols]

1 ... Image cell pattern 1a ... Unit cell pattern 2 ...
Division unit reticle pattern 10 ... Photomask substrate 11 ... Photomask 20 ... Pad pattern 21 ...
Wiring pattern H ... Horizontal division line V ... Vertical division line h ... Horizontal division interval v ... Vertical division interval

 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Takatoshi Fujino 1-5-1 Taito, Taito-ku, Tokyo Toppan Printing Co., Ltd.

Claims (2)

[Claims] 1. An equal division into a rectangular shape in the vertical and horizontal directions from a drawing data recording medium in which image cell pattern drawing data of a color filter in which a number of unit cells are regularly arranged in a row direction and a column direction is recorded, Or, it is sequentially extracted as reticle pattern drawing data for each divided image cell pattern drawing data obtained by dividing at a predetermined interval, and based on the extracted reticle pattern drawing data, sequentially by the electron beam exposure means. , A reticle pattern is exposed on the surface of the photomask substrate, and after the exposure of the reticle pattern is moved, the photomask substrate is moved by a distance corresponding to a division interval of the reticle pattern in the vertical or horizontal direction, The image cell pattern of the color filter is obtained by sequentially exposing the reticle pattern on the In the method for producing the image cell pattern of the color filter, the vertical and horizontal dividing lines for dividing the reticle pattern drawing data are opposed to each other so as not to hang on each unit cell portion of the image cell pattern of the color filter. An image cell pattern of a color filter is set by setting it approximately in the middle of the unit cells to be arranged and extracted as reticle pattern drawing data, and by sequentially drawing and exposing the reticle pattern on the photomask substrate surface based on the reticle pattern drawing data. A method for producing an image cell pattern of a color filter, which comprises: 2. A drawing data recording medium in which image cell pattern drawing data of a color filter in which a number of unit cell patterns are regularly arranged in a row direction and a column direction is recorded is equally divided vertically and horizontally in a rectangular shape. The 1-unit divided data obtained by the above is extracted as reticle pattern drawing data, and the reticle pattern is drawn and exposed on the photomask substrate surface by the electron beam exposure means on the basis of the extracted reticle pattern drawing data and the reticle. After the pattern drawing exposure, the photomask substrate is moved by a distance corresponding to the division interval of the reticle pattern in the vertical or horizontal direction, and the reticle pattern is sequentially drawn and exposed on the photomask substrate surface to form a color filter image. Image of color filter for making cell pattern Making cell pattern In the method, vertical and horizontal dividing lines for equally dividing the reticle pattern drawing data into the unit cell patterns of the image cells of the color filter are arranged between the unit cell patterns arranged so as to face each other so as not to hang on each unit cell portion. The image cell pattern of the color filter is produced by setting and extracting as reticle pattern drawing data, and sequentially exposing the reticle pattern on the substrate surface for the photomask in a divided manner based on the reticle pattern drawing data. Method for producing image cell pattern of color filter.