JPH05241013A - Production of color filter - Google Patents

Abstract

PURPOSE:To solve the disconnection accident generated in transparent electrodes and to improve the yield and reliability of this kind of color filters by applying a light shielding film resist covering a transparent protective layer on a transparent substrate and forming a light shielding film by self-alignment exposing from the rear surface of the substrate. CONSTITUTION:Three primary color films 3 of red R, green G and blue B are formed by, for example a printing method, etc., on the transparent substrate 2 so as to have spacings between the respective colors and thereafter the transparent protective layer 4 is so formed as to cover the color films 3. Level differences 4a are generated on the transparent protective layer 4 in correspondence to the spacings between the color films 3 at this time. The light shielding film resist 5 is then applied thereon and is self-alignment exposing from the transparent electrode 2 side. The exposure of the self-alignment exposing is adjusted at this time and the resist is exposed at approximately the same thickness as the depth of the level differences 4a generated in the transparent protective layer 4, by which the light shielding film 6 is formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color liquid crystal display device used as a display portion of a color TV, and more particularly to a method for manufacturing a color filter used in the color liquid crystal display device. is there.

[0002]

2. Description of the Related Art FIGS. 6 to 8 show a conventional method of manufacturing a color filter 90 of this type. First, as shown in FIG. 6, red R, green G and blue are formed on a transparent substrate 91 made of glass or the like. The B color films 92 of the three primary colors are formed by, for example, a printing method so as to have a gap between the respective colors, and then a light shielding film resist 93 is applied so as to cover the color films 92, and then back exposure, that is, , The light-shielding film resist 93 by self-alignment exposure from the transparent substrate 91 side.
The light-shielding film resist 93 in the gap is exposed to form a light-shielding film 94 as shown in FIG. 7, and thereafter, as shown in FIG. 8, transparent protection is performed so as to cover the color film 92 and the light-shielding film 94. The layer 95 is formed, and a transparent electrode 96 for driving liquid crystal is usually formed on the surface of the transparent protective layer 95.

[0003]

However, in the color filter 90 according to the above-described conventional manufacturing method, since the light shielding film resist 93 originally has a low transmittance, the light shielding film thinner than the color film 92 is used. Inevitably, the color film 92 becomes 94 (see FIG. 7).
And a step between the light shielding film 94 and the transparent protective layer 9
Even after forming No. 5, the problem is not solved (see FIG. 8), and there is a problem that the transparent electrode 96 formed on the transparent protective layer 95 causes a disconnection accident at the edge portion, and the color filter 90 is used. When a liquid crystal cell is formed, there is a partial gap difference in the liquid crystal that is sealed inside, which causes problems such as deterioration of viewing angle characteristics that also impair the characteristics of the liquid crystal cell. It was supposed to be done.

[0004]

As a concrete means for solving the above-mentioned conventional problems, the present invention is one in which a color film of three primary colors is formed on a transparent substrate with a gap between each color, In a method of manufacturing a color filter in which a light-shielding film is formed corresponding to a gap, a transparent protective layer that covers the color film is formed in advance on the color film, and then a light-shielding film resist that covers the transparent protective layer. And a light-shielding film is formed by self-alignment exposure from the back surface of the transparent substrate to provide a method for manufacturing a color filter, which does not cause a step on the color filter surface. To solve the problem of.

[0005]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail based on an embodiment shown in the drawings. 1 to 3 show a method of manufacturing the color filter 1 according to the present invention in the order of steps. As a first step, as shown in FIG. 1, red R, green G and blue B are formed on the transparent substrate 2. The color films 3 of the three primary colors are formed by a printing method or the like so that there is a gap between the respective colors,
After that, the transparent protective layer 4 is formed so as to cover the color film 3.

At this time, the transparent protective layer 4 has a step 4a corresponding to the gap between the color films 3 as described in the conventional example, but the light shielding film 5 to be described later according to the present invention. Since the transparent protective layer 4 is formed in a state where it is not formed in the gap unlike the conventional example, the depth of the step 4a is about 0.5 μm, which is deeper than 0.2 μm of the conventional example. Will be the one.

Next, in the manufacturing method of the present invention, FIG.
The light-shielding film resist 5 is applied as shown in FIG.
It is assumed that self-alignment exposure is performed from the side, but in this embodiment, the exposure amount of the self-alignment exposure is adjusted, and a step generated in the transparent protective layer 4 with respect to the light-shielding film resist 5. The thickness of the light-shielding film 6 is approximately the same as the depth of 4a, that is, about 0.5 μm.

FIG. 3 shows a completed state of the color filter 1 obtained by the above steps. After forming the transparent protective layer 4 according to the present invention, a light-shielding film resist 5 is applied and exposed to light, thereby forming the transparent protective layer. By using the manufacturing method in which the light shielding film 6 having substantially the same thickness as that of the step 4a formed in the step 4 is formed, the step 4a is buried by the light shielding film 6, and thus the liquid crystal side of the color filter 1 obtained. The smoothness of the surface to be formed is remarkably improved, and the transparent electrode 7 laid on the surface is not broken or the like.

In actual practice, after the light shielding film 6 is formed, the transparent protective layer 4 is formed by the same member as the member on which the transparent protective layer 4 is formed as shown in FIG.
By forming the auxiliary protective layer 8 covering the light-shielding film 6 and the light-shielding film 6, a smoother surface can be obtained, and a better result can be obtained.

FIG. 5 shows a further embodiment of the present invention. In the previous embodiment, the transparent electrode 7 is surely provided with a smooth surface and no disconnection. However, since the transparent electrode 7 is laid on a smooth surface, the thickness of the transparent electrode 7 is different between the liquid crystal (not shown) and the position where the transparent electrode 7 is laid and the position where the transparent electrode 7 is not laid. A gap difference of (0.1 to 0.3 μm) is generated, which causes the deterioration of the viewing angle characteristics described in the conventional example.

This embodiment is also intended to solve the above-mentioned factors, and the steps of applying the light-shielding film resist 5 and performing exposure are exactly the same as those in the previous embodiment, but only the exposure amount is laid after that. Thickness of the transparent electrode 7 (0.1 to 0.3 μm)
The light-shielding film 6 formed only for m) is the step 4a of the transparent protective layer 4.
Adjusted to protrude from.

After that, the transparent electrode 7 is laid, but since the transparent electrode 7 is originally laid only at a position facing the color film 3, the color film 3 is provided as described above.
It is not laid on the upper surface of the light-shielding film 6 protruding in between, and therefore, the surface of the color filter 1 on the liquid crystal side becomes completely smooth including the transparent electrode 7, which causes deterioration of viewing angle characteristics. The difference in the liquid crystal gap does not occur.

[0013]

As described above, according to the present invention, a transparent protective layer that covers the color film is formed on the color film in advance, and then a light-shielding film resist that covers the transparent protective layer is applied to form the transparent protective layer. The method of manufacturing a color filter in which a light-shielding film is formed by self-alignment exposure from the back surface of a transparent substrate is used. The present invention has an excellent effect in solving the disconnection accident that occurs and improving the yield and reliability of this type of color filter.

Further, since the above-mentioned smoothing is performed,
Even if there is no gap difference with respect to the liquid crystal, or if there is no gap difference, and the deterioration of the viewing angle characteristics due to this gap difference does not occur, it is possible to improve the quality of color liquid crystal cells formed by using this color filter It has an excellent effect.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a transparent protective layer forming step of a method for manufacturing a color filter according to the present invention.

FIG. 2 is a cross-sectional view showing a step of forming a light shielding film of the same embodiment.

FIG. 3 is a cross-sectional view showing a completed state of a color filter of the same example.

FIG. 4 is a sectional view showing another embodiment of the method for manufacturing a color filter according to the present invention.

FIG. 5 is a sectional view showing still another embodiment of the method for manufacturing a color filter according to the present invention.

FIG. 6 is a cross-sectional view showing a conventional light-shielding film forming process.

FIG. 7 is a cross-sectional view showing a formation state of a light shielding film of the same conventional example.

FIG. 8 is a cross-sectional view showing a completed state of the same conventional color filter.

[Explanation of symbols]

 1 ... Color filter 2 ... Transparent substrate 3 ... Color film 4 ... Transparent protective layer 4a ... Step 5 ... Light-shielding film resist 6 ... Light-shielding film 7 ... Transparent electrode 8 ... Auxiliary protective layer

Claims (1)

[Claims] 1. A method for manufacturing a color filter, wherein a color film of three primary colors is formed on a transparent substrate with a gap between respective colors, and a light-shielding film is formed corresponding to the gap. A transparent protective layer that covers the color film is formed in advance, a light-shielding film resist that covers the transparent protective layer is then applied, and the light-shielding film is formed by self-alignment exposure from the back surface of the transparent substrate. And a method for manufacturing a color filter.