JPH05232040A - External appearance inspecting floodlight device - Google Patents

External appearance inspecting floodlight device

Info

Publication number
JPH05232040A
JPH05232040A JP3192292A JP3192292A JPH05232040A JP H05232040 A JPH05232040 A JP H05232040A JP 3192292 A JP3192292 A JP 3192292A JP 3192292 A JP3192292 A JP 3192292A JP H05232040 A JPH05232040 A JP H05232040A
Authority
JP
Japan
Prior art keywords
light
substrate
light flux
fresnel lens
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3192292A
Other languages
Japanese (ja)
Other versions
JP3095855B2 (en
Inventor
Ikuzo Nakamura
郁三 中村
Mitsuo Harada
満雄 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP04031922A priority Critical patent/JP3095855B2/en
Publication of JPH05232040A publication Critical patent/JPH05232040A/en
Application granted granted Critical
Publication of JP3095855B2 publication Critical patent/JP3095855B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To provide an external appearance inspecting floodlight device in a simple low cost constitution, by which the whole of a large substrate can be illuminated uniformly and which has an excellent foreign material detecting capacity capable of detecting a foreign material on the substrate and by which an external appearance inspection on the substrate can be carried out efficiently. CONSTITUTION:A floodlight device is provided with a light collecting fresnel lens 18 to regulate illumination light emitted from a light source 28 into a parallel light flux, a floodlighting fresnel lens 20 constituted to be connected to/disconnected from the parallel light flux introduced through this light collecting fresnel lens 18 so as to regulate the introduced parallel light flux into a convergent light flux and a transmission type liquid crystal plate 24 constituted to be connected to/disconnected from the convergent light flux introduced through this floodlighting fresnel lens 20 so as to illuminate the surface of a large substrate 22 by giving optical characteristics to the introduced convergent light flux. The transmission type liquid crystal plate 24 is opaque usually, and has a function of being transformed into a transparent shape by voltage impression.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば、ウェハ又は液
晶ガラス基板等の基板上の外観を検査するための投光装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light projecting device for inspecting the appearance on a substrate such as a wafer or a liquid crystal glass substrate.

【0002】[0002]

【従来の技術】従来、基板上の外観を検査するために、
例えば、図4ないし図8に示すような投光装置が用いら
れている。
2. Description of the Related Art Conventionally, in order to inspect the appearance on a board,
For example, a light projecting device as shown in FIGS. 4 to 8 is used.

【0003】図4に示された投光装置は、光源2から発
光された拡散光を基板、例えばウェハ4上に照明し、ウ
ェハ4表面上のごみや傷等の異物6からの散乱光とウェ
ハ4の表面からの直接反射光との強度差によって、ウェ
ハ4の表面の外観検査が行われている。
The light projecting device shown in FIG. 4 illuminates diffused light emitted from a light source 2 onto a substrate, for example, a wafer 4, and scatters light from foreign matter 6 such as dust or scratches on the surface of the wafer 4. The appearance of the surface of the wafer 4 is inspected by the difference in the intensity of the light directly reflected from the surface of the wafer 4.

【0004】しかし、このような投光装置では、観察者
の目8に散乱光と直接反射光とが同時に入射してまぶし
いために、ウェハ表面上のごみや傷等の異物6の判断が
困難になるという問題がある。そこで、図5に示す装置
では、反射光が直接観察者の目8に入射しないように、
遮光板10が配置されている。
However, in such a light projecting device, the scattered light and the direct reflected light are simultaneously incident on the eyes 8 of the observer and are dazzling, so that it is difficult to judge the foreign matter 6 such as dust or scratches on the wafer surface. There is a problem that becomes. Therefore, in the apparatus shown in FIG. 5, the reflected light is prevented from directly entering the observer's eyes 8.
A light shielding plate 10 is arranged.

【0005】また、図6に示された投光装置は、レンズ
12を介して収束光束をウェハ4の表面に照明して外観
検査を行うように構成されている。また、図7に示され
た投光装置は、レンズ14を介して平行光束をウェハ4
の表面に照明して外観検査を行うように構成されてい
る。
Further, the light projecting device shown in FIG. 6 is configured to illuminate the surface of the wafer 4 with a converged light flux through the lens 12 to perform a visual inspection. Further, the light projecting device shown in FIG.
It is configured to illuminate the surface of and to perform a visual inspection.

【0006】図6及び図7の投光装置を介してウェハ表
面に照明される光束の照射範囲は、比較的狭いものの、
強い光で照射でき且つ観察者の目8も観察光軸に接近さ
せることができるため、ごみや傷等の異物6からの散乱
光の観察が容易となる。また、図8に示すように、複数
のオプチカルファイバ16を用いてウェハ表面全体を照
明する方法も知られている。
Although the irradiation range of the light flux illuminated on the wafer surface through the light projecting device of FIGS. 6 and 7 is relatively narrow,
Since strong light can be applied and the eyes 8 of the observer can be brought close to the observation optical axis, it becomes easy to observe scattered light from the foreign matter 6 such as dust and scratches. Further, as shown in FIG. 8, a method of illuminating the entire wafer surface using a plurality of optical fibers 16 is also known.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、図5に
示す装置では、遮光板10によって、観察視野も遮られ
てしまい、ウェハ4の全体を観察するためには、遮光板
10を移動させたりウェハ4と光源2との成す角を変え
たりしなければならず、繁雑な作業が必要となるという
問題がある。
However, in the apparatus shown in FIG. 5, the light-shielding plate 10 also blocks the observation field of view, and in order to observe the entire wafer 4, the light-shielding plate 10 must be moved or the wafer must be moved. There is a problem in that the angle between the light source 2 and the light source 2 has to be changed, and complicated work is required.

【0008】また、図6及び図7に示す装置では、ウェ
ハ全体を斑なく照明することができないため、大型のウ
ェハの外観を検査する場合には、この種の装置を複数個
必要となり、コスト的にも不利になるという問題があ
る。また、図8に示す装置では、散乱光の集合となるた
め、ウェハ表面上のごみや傷等の異物6の判断が困難に
なるという問題がある。
Further, since the apparatus shown in FIGS. 6 and 7 cannot illuminate the entire wafer without unevenness, when inspecting the appearance of a large wafer, a plurality of apparatuses of this type are required, which results in cost reduction. There is a problem that it is disadvantageous. Further, the apparatus shown in FIG. 8 has a problem that it becomes difficult to determine the foreign matter 6 such as dust and scratches on the wafer surface because the scattered light is aggregated.

【0009】本発明は、このような問題点を解決するた
めになされ、その目的は、簡単且つ低価格な構成で、大
型基板全体を斑なく照明できると共に、基板上の異物検
出能力に富み、且つ、基板の外観検査を効率よく行なえ
る外観検査用投光装置を提供することにある。
The present invention has been made in order to solve such a problem, and its purpose is to illuminate a large-sized substrate as a whole with a simple and low-priced structure and to detect foreign substances on the substrate. Another object of the present invention is to provide a visual inspection light projecting device capable of efficiently performing visual inspection of a substrate.

【0010】[0010]

【課題を解決するための手段】このような目的を達成す
るために、本発明は、基板表面を照明して、前記基板の
外観検査を行う投光装置であって、照明光路中を導光さ
れた光を平行光束に規制する第1の光学手段と、
In order to achieve such an object, the present invention is a light projecting device for illuminating a surface of a substrate to inspect the appearance of the substrate, which guides light in an illumination optical path. First optical means for regulating the converted light into a parallel light flux,

【0011】この第1の光学手段を介して導光される前
記平行光束に対して挿脱可能に構成され、前記平行光束
に所定の光学的特性を与えて前記基板表面全体を照明可
能に構成された第2の光学手段と、を備えている。
It is constructed so that it can be inserted into and removed from the parallel luminous flux guided through the first optical means, and it can illuminate the entire surface of the substrate by giving predetermined optical characteristics to the parallel luminous flux. Second optical means.

【0012】[0012]

【作用】本発明の投光装置において、第2の光学手段を
照明光路中から脱出させ、第1の光学手段のみを照明光
路中に配置させることによって、平行光束が基板表面全
体に照明されて外観検査が行われる。また、第1及び第
2の光学手段を照明光路に挿入させることによって、所
定の光学的特性を有した照明光が基板表面全体に照明さ
れて所定の外観検査が行われる。
In the projector of the present invention, the second optical means is allowed to escape from the illumination optical path and only the first optical means is disposed in the illumination optical path, so that the parallel light flux is illuminated on the entire surface of the substrate. Visual inspection is performed. Further, by inserting the first and second optical means into the illumination optical path, the illumination light having predetermined optical characteristics is illuminated on the entire surface of the substrate and a predetermined visual inspection is performed.

【0013】[0013]

【実施例】以下、本発明の一実施例に係る外観検査用投
光装置について、図1ないし図3を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A visual inspection light projecting apparatus according to an embodiment of the present invention will be described below with reference to FIGS.

【0014】図1に示すように、本実施例の外観検査用
投光装置は、照明光路中に配され、入射光を平行光束に
規制する集光用フレネルレンズ18(厚さ5mm)と、
この集光用フレネルレンズ18を介して導光された平行
光束に対して挿脱可能に構成され、導光された平行光束
を収束光束に規制する投光用フレネルレンズ20(厚さ
5mm)と、この投光用フレネルレンズ20を介して導
光された収束光束に対して挿脱可能に構成され、導光さ
れた収束光束に光学的特性を与えて観察試料、例えば、
対角500mm以上の大型基板22上を照明する散乱板
24と、を備えている。
As shown in FIG. 1, the appearance inspection light projecting apparatus of this embodiment is provided with a Fresnel lens for condensing 18 (thickness: 5 mm) which is arranged in the illumination optical path and regulates incident light into a parallel light flux.
A light projecting Fresnel lens 20 (thickness: 5 mm) configured to be insertable into and removable from a parallel light beam guided through the light collecting Fresnel lens 18, and restricting the guided light beam to a convergent light beam. An observation sample, such as an observation sample, which is configured to be attachable / detachable to / from the convergent light flux guided through the Fresnel lens 20 for projecting light and gives optical characteristics to the convergent light flux guided
And a scattering plate 24 that illuminates a large substrate 22 having a diagonal of 500 mm or more.

【0015】集光用フレネルレンズ18、投光用フレネ
ルレンズ20及び散乱板24は、供に、大型基板22よ
りも大きな径(500〜600mm程度)を有してい
る。このため、大型基板22は、その全体亘って斑なく
照明される。
The light collecting Fresnel lens 18, the light projecting Fresnel lens 20, and the scattering plate 24 have a larger diameter (about 500 to 600 mm) than the large-sized substrate 22. Therefore, the large-sized substrate 22 is uniformly illuminated over the entire area.

【0016】また、本実施例の装置に用いられる散乱板
24には、透明電極(図示しない)を介して電源26に
接続され、電圧が印加可能な透過型液晶板(以下、この
液晶板を参照符号24で示す)が用いられている。この
透過型液晶板24に適用された調光液晶シート(図示し
ない)は、通常は液滴中で液晶(図示しない)がランダ
ムになているため、入射された光が界面又は内部で散乱
されて不透明な状態になっているが、電圧を印加するこ
とによって、液晶が電界の方向に整列して、入射した光
を散乱しなくなり、透明に変化する機能を有する。
Further, the scattering plate 24 used in the apparatus of this embodiment is connected to a power source 26 through a transparent electrode (not shown) and is capable of applying a voltage to a transmission type liquid crystal plate (hereinafter, this liquid crystal plate will be referred to as a liquid crystal plate). Reference numeral 24) is used. In the dimming liquid crystal sheet (not shown) applied to the transmissive liquid crystal plate 24, since the liquid crystal (not shown) is usually random in the liquid droplets, the incident light is scattered at the interface or inside. Although it is in an opaque state, the liquid crystal is aligned in the direction of the electric field by applying a voltage so that incident light is not scattered and has a function of changing to transparent.

【0017】また、図1ないし図3に示すように、本実
施例の投光装置に用いられた光源28には、例えば、メ
タルハライドランプ(150〜250W)が適用されて
いる。このような光源28は、その発光点が楕円回転面
ミラー30の第1焦点に位置付けられ、且つ、楕円回転
ミラー30の第2焦点が、散乱板が設けられたゲート3
2となるように構成されている。また、ゲート32と集
光用フレネルレンズ18との間の距離は、この集光用フ
レネルレンズ18の焦点距離(f)と一致している。
Further, as shown in FIGS. 1 to 3, for example, a metal halide lamp (150 to 250 W) is applied to the light source 28 used in the light projecting device of this embodiment. In such a light source 28, the light emitting point is positioned at the first focal point of the elliptical rotary surface mirror 30, and the second focal point of the elliptical rotary mirror 30 is provided with the scattering plate.
It is configured to be 2. Further, the distance between the gate 32 and the converging Fresnel lens 18 matches the focal length (f) of the converging Fresnel lens 18.

【0018】なお、光源28とゲート32との間には、
熱線吸収フィルタ34が設けられている。また、ゲート
32に配される散乱板は、20〜30mmの大きさを有
しており、ゲート32から均一照明光を出射させる機能
を有する。以下、このような構成を有する本実施例の外
観検査用投光装置の動作について図1ないし図3を参照
して説明する。
Between the light source 28 and the gate 32,
A heat ray absorption filter 34 is provided. The scattering plate arranged in the gate 32 has a size of 20 to 30 mm and has a function of emitting uniform illumination light from the gate 32. Hereinafter, the operation of the appearance inspection light projecting apparatus of the present embodiment having such a configuration will be described with reference to FIGS.

【0019】光源28から発光された照明光は、楕円回
転ミラー30、熱線吸収フィルタ34及びゲート32を
介してフィルタ(グリーン、イエロー、偏光板等)36
を透過し、ミラー38に照射される。ミラー38に照射
された照明光は、このミラー38で反射されて、集光用
フレネルレンズ18に照射され、平行光束に規制され
る。
Illumination light emitted from the light source 28 passes through an elliptical rotation mirror 30, a heat ray absorption filter 34, and a gate 32, and a filter (green, yellow, polarizing plate, etc.) 36.
And is irradiated onto the mirror 38. The illumination light applied to the mirror 38 is reflected by the mirror 38, applied to the converging Fresnel lens 18, and regulated into a parallel light flux.

【0020】図1に示す装置では、収束光束を照明光と
して用いるため、照明光路中には、投光用フレネルレン
ズ20、及び、電圧が印加されて透明になっている透過
型液晶板24が挿入されている。このため、投光用フレ
ネルレンズ20からの収束光束は、そのまま透過型液晶
板24を透過して、大型基板22の全面に斑なく照明さ
れる。
In the apparatus shown in FIG. 1, since the convergent light flux is used as the illumination light, the projection Fresnel lens 20 and the transmissive liquid crystal plate 24 which is transparent when a voltage is applied are provided in the illumination light path. Has been inserted. Therefore, the convergent light flux from the light-projecting Fresnel lens 20 passes through the transmissive liquid crystal plate 24 as it is and illuminates the entire surface of the large-sized substrate 22 without spots.

【0021】大型基板22から反射した反射照明光は、
観察者の目40の近傍位置Sに結像される。このとき、
大型基板22の表面にごみや傷等の異物42が存在して
いる場合、この異物42から散乱光が発生して、近傍位
置Sでは結像しなくなる。この結果、観察者は、光軸外
から微小散乱光を目視観察することで、大型基板22の
表面の異物42の存在を確認できる。なお、近傍位置S
に、例えば遮光板(図示しない)を配置させて、基板表
面から直接反射した反射光が目40に入射しないように
構成することも好ましい。
The reflected illumination light reflected from the large substrate 22 is
An image is formed at a position S near the eyes 40 of the observer. At this time,
When a foreign matter 42 such as dust or scratches is present on the surface of the large-sized substrate 22, scattered light is generated from the foreign matter 42 and no image is formed at the near position S. As a result, the observer can confirm the presence of the foreign matter 42 on the surface of the large substrate 22 by visually observing the minute scattered light from outside the optical axis. The vicinity position S
It is also preferable to dispose a light shielding plate (not shown), for example, so that the reflected light directly reflected from the substrate surface does not enter the eye 40.

【0022】このような収束光束は、特に、基板に印刷
されたパターンの乱れや斑あるいは基板表面のごみや傷
等の検査に適しており、その大型基板22の面上での照
度が極めて明るいため、異物42の確認が容易となるば
かりでなく、光源像が目40に入射されないため、まぶ
しくならず、観察に支障を来すこともない。
Such a convergent light flux is particularly suitable for inspection of irregularities and spots of a pattern printed on the substrate, dust and scratches on the substrate surface, and the illuminance on the surface of the large substrate 22 is extremely bright. Therefore, not only is it easy to confirm the foreign matter 42, but since the light source image is not incident on the eye 40, it does not become dazzling and does not hinder observation.

【0023】次に、照明光として面光源を選択する場
合、図2に示すように、電源26からの印加電圧を遮断
して、透過型液晶板24を不透明にすることによって、
投光用フレネルレンズ20を透過して形成された収束光
束は、透過型液晶板24によってシャーカステン照明光
となり、大型基板22の全面に斑なく照明される。
Next, when a surface light source is selected as the illumination light, as shown in FIG. 2, the voltage applied from the power source 26 is cut off to make the transmissive liquid crystal plate 24 opaque.
The convergent light flux formed by passing through the light-projecting Fresnel lens 20 becomes a Sharkusten illumination light by the transmissive liquid crystal plate 24, and is uniformly illuminated on the entire surface of the large-sized substrate 22.

【0024】このような面光源は、特に、基板上のレジ
スト等の膜厚の斑あるいは透明導電膜(ITO)上のピ
ンホールや膜下のごみ等の検査に適しており、その大型
基板22の全面に亘って均一な照度となると共に、基板
表面に存在する異物42によって形成される干渉パター
ンが良く見える。
Such a surface light source is particularly suitable for inspecting unevenness of the film thickness of the resist or the like on the substrate, pinholes on the transparent conductive film (ITO), dust under the film, and the like. The illuminance is uniform over the entire surface and the interference pattern formed by the foreign matter 42 existing on the substrate surface is clearly visible.

【0025】本実施例の投光装置では、散乱板として透
過型液晶板24を適用し、この透過型液晶板24に電圧
を印加又は遮断させるだけで、収束光束又は面光源を適
宜選択できるため、照明光路中に対する散乱板の挿脱の
必要がなくなり、観察作業効率を向上させることができ
る。
In the light projecting device of the present embodiment, the transmissive liquid crystal plate 24 is applied as the scattering plate, and the converged light flux or the surface light source can be appropriately selected only by applying or blocking the voltage to the transmissive liquid crystal plate 24. It is not necessary to insert and remove the scattering plate in the illumination optical path, and the observation work efficiency can be improved.

【0026】また、照明光として平行光束を選択する場
合、図3に示すように、投光用フレネルレンズ20及び
透過型液晶板24を照明光路外に回避させることによっ
て、集光用フレネルレンズ18を透過して形成された平
行光束は、大型基板22に斑なく照明される。
Further, when the parallel light flux is selected as the illumination light, as shown in FIG. 3, the light-collecting Fresnel lens 20 and the transmissive liquid crystal plate 24 are avoided outside the illumination optical path to thereby condense the Fresnel lens 18. The parallel light flux formed by transmitting the light is uniformly illuminated on the large-sized substrate 22.

【0027】このような平行光束は、特に、大型基板の
一括検査や基板表面のごみや傷の検査に適しており、そ
の大型基板22の全面に亘って一括照明することができ
るため、基板外観検査効率を向上させることができる。
Such a parallel light flux is particularly suitable for a batch inspection of a large-sized substrate and an inspection for dust and scratches on the surface of the substrate, and since it is possible to collectively illuminate the entire surface of the large-sized substrate 22, the substrate appearance. The inspection efficiency can be improved.

【0028】上述したように、本実施例の外観検査用投
光装置は、散乱板として透過型液晶板24を適用してお
り、照明光路中に透過型液晶板24を配置させたまま
で、電圧の印加・遮断によって、簡単に、所望の収束光
束又は面光源を選択することができる。この結果、基板
の外観検査作業の効率を向上させることができる。更
に、本実施例の投光装置は、大型基板全面を斑なく照明
するように構成されているため、基板表面全体に亘る異
物検出能力に優れ、且つ、基板の外観検査を効率よく行
なうことができる。
As described above, in the appearance inspection light projecting apparatus of this embodiment, the transmissive liquid crystal plate 24 is applied as the scattering plate, and the voltage is applied while the transmissive liquid crystal plate 24 is placed in the illumination optical path. It is possible to easily select a desired convergent light flux or surface light source by applying / blocking. As a result, the efficiency of the work of inspecting the appearance of the substrate can be improved. Further, since the floodlighting device of the present embodiment is configured to illuminate the entire surface of a large-sized substrate without unevenness, it has excellent foreign matter detection ability over the entire surface of the substrate and can efficiently perform visual inspection of the substrate. it can.

【0029】なお、本発明は上述した実施例の構成に限
定されることはなく、例えば、投光用フレネルレンズ2
0と透過型液晶板24とを互いに照明光路に挿脱させ
て、所望の収束光束又は面光源を適宜選択可能に構成で
き得ることは言うまでもない。
The present invention is not limited to the configuration of the above-mentioned embodiment, and for example, the Fresnel lens 2 for projecting light is used.
It is needless to say that the desired convergent light flux or surface light source can be appropriately selected by inserting and removing the 0 and the transmissive liquid crystal plate 24 in the illumination optical path.

【0030】また、偏光板が挿入されたフィルタ36か
ら導光された照明光を受光可能な位置に、アナライザと
してフィルム状偏光膜が形成されたガラス板を配置させ
ることによって、大型基板22の偏光観察を行うことも
可能である。なお、係る偏光観察は、観察者が偏光板が
設けられた眼鏡等を掛けて、光源像位置に目40を置く
ことによっても行うことができる。また、上述した実施
例では、観察者による目視検査について説明したが、画
像処理装置を介して基板外観検査を行うように構成して
もよい。
Further, by arranging a glass plate on which a film-shaped polarizing film is formed as an analyzer at a position where the illumination light guided from the filter 36 in which the polarizing plate is inserted can be received, the polarization of the large substrate 22 is polarized. It is also possible to make an observation. The polarized light observation can also be performed by an observer wearing glasses or the like provided with a polarizing plate and placing the eyes 40 at the light source image position. Further, in the above-described embodiment, the visual inspection by the observer has been described, but the visual inspection of the substrate may be performed via the image processing apparatus.

【0031】[0031]

【発明の効果】本発明の外観検査用投光装置は、散乱板
として透過型液晶板を適用しており、照明光路中に透過
型液晶板を配置させたままで、電圧の印加・遮断によっ
て、簡単に、所望の収束光束又は面光源を選択すること
ができる。この結果、基板の外観検査作業の効率を向上
させることができる。更に、本発明の投光装置は、大型
基板全面を斑なく照明するように構成されているため、
基板表面全体に亘る異物検出能力に優れ、且つ、基板の
外観検査を効率よく行なうことができる。
EFFECTS OF THE INVENTION The floodlighting device for appearance inspection according to the present invention uses a transmissive liquid crystal plate as a scattering plate, and the transmissive liquid crystal plate is placed in the illumination optical path while the voltage is applied or cut off. A desired convergent light flux or surface light source can be easily selected. As a result, the efficiency of the work of inspecting the appearance of the substrate can be improved. Furthermore, since the floodlighting device of the present invention is configured to illuminate the entire surface of a large substrate without spots,
The foreign matter detection ability over the entire surface of the substrate is excellent, and the appearance inspection of the substrate can be efficiently performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る外観検査用投光装置の
構成を概略的に示す図であって、収束光束を用いて基板
表面全体の観察を行っている状態を示す図。
FIG. 1 is a diagram schematically showing a configuration of an appearance inspection light projecting apparatus according to an embodiment of the present invention, showing a state in which an entire surface of a substrate is observed using a converged light flux.

【図2】図1に示す装置を用いて、面光源によって基板
表面全体の観察が行われている状態を示す図。
FIG. 2 is a diagram showing a state in which the entire surface of the substrate is observed by a surface light source using the apparatus shown in FIG.

【図3】図1に示す装置を用いて、平行光束によって基
板表面全体の観察が行われている状態を示す図。
FIG. 3 is a diagram showing a state in which the entire surface of the substrate is observed by a parallel light flux using the apparatus shown in FIG.

【図4】従来の投光装置の概略図であって、拡散光によ
って基板表面の観察が行われている状態を示す図。
FIG. 4 is a schematic view of a conventional light projecting device, showing a state where the substrate surface is observed by diffused light.

【図5】図4に示す装置に遮光板を設けて、基板表面の
観察が行われている状態を示す図。
5 is a diagram showing a state in which a light shielding plate is provided in the apparatus shown in FIG. 4 and the surface of the substrate is being observed.

【図6】従来の投光装置の概略図であって、収束光束に
よって基板表面の観察が行われている状態を示す図。
FIG. 6 is a schematic view of a conventional light projecting device, showing a state where the substrate surface is observed by a convergent light beam.

【図7】従来の投光装置の概略図であって、平行光束に
よって基板表面の観察が行われている状態を示す図。
FIG. 7 is a schematic view of a conventional light projecting device, showing a state in which a substrate surface is observed by a parallel light beam.

【図8】従来の投光装置の概略図であって、複数のオプ
チカルファイバを用いて基板表面の観察が行われている
状態を示す図。
FIG. 8 is a schematic view of a conventional light projecting device, showing a state in which the substrate surface is observed using a plurality of optical fibers.

【符号の説明】[Explanation of symbols]

18…集光用フレネルレンズ、20…投光用フレネルレ
ンズ、22…大型基板、24…透過型液晶板、28…光
源。
Reference numeral 18 ... Condensing Fresnel lens, 20 ... Projecting Fresnel lens, 22 ... Large substrate, 24 ... Transmissive liquid crystal plate, 28 ... Light source.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基板表面を照明して、前記基板の外観検
査を行う投光装置であって、 照明光路中を導光された光を平行光束に規制する第1の
光学手段と、 この第1の光学手段を介して導光される前記平行光束に
対して挿脱可能に構成され、前記平行光束に所定の光学
的特性を与えて前記基板表面全体を照明可能に構成され
た第2の光学手段と、を備えていることを特徴とする外
観検査用投光装置。
1. A light projecting device for illuminating a surface of a substrate to inspect the appearance of the substrate, comprising: first optical means for regulating light guided in an illumination optical path into a parallel light flux; The second light beam is configured to be insertable into and removable from the parallel light flux guided through the first optical means, and to impart predetermined optical characteristics to the parallel light flux to illuminate the entire surface of the substrate. An optical projection device for visual inspection, comprising: an optical unit.
【請求項2】 前記第1の光学手段は、第1のフレネル
レンズであることを特徴とする請求項1に記載の外観検
査用投光装置。
2. The light projecting apparatus for appearance inspection according to claim 1, wherein the first optical means is a first Fresnel lens.
【請求項3】 前記第2の光学手段は、前記第1の光学
手段を介して導光された前記平行光束に対して挿脱可能
に構成され、前記平行光束を収束光束に規制するた第2
のフレネルレンズと、前記第2のフレネルレンズを介し
て導光された前記収束光束に対して挿脱可能に構成さ
れ、前記収束光束に所定の光学的特性を与えて前記基板
表面全体を照明する散乱板と、を備えていることを特徴
とする請求項1又は2に記載の外観検査用投光装置。
3. The second optical means is configured to be insertable into and removable from the parallel light flux guided through the first optical means, and regulates the parallel light flux into a convergent light flux. Two
Of the Fresnel lens and the converging light beam guided through the second Fresnel lens, and is configured to be removable from the converging light beam to give a predetermined optical characteristic to the entire surface of the substrate. The light projection device for appearance inspection according to claim 1 or 2, further comprising: a scattering plate.
【請求項4】 前記散乱板は、電圧が印加可能な不透明
な調光液晶シートであって、電圧を印加することによっ
て透明に変化することを特徴とする請求項3に記載の外
観検査用投光装置。
4. The appearance inspection projection device according to claim 3, wherein the scattering plate is an opaque light control liquid crystal sheet to which a voltage can be applied, and the transparent plate changes to be transparent when a voltage is applied. Light equipment.
JP04031922A 1992-02-19 1992-02-19 Light inspection device for visual inspection Expired - Lifetime JP3095855B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04031922A JP3095855B2 (en) 1992-02-19 1992-02-19 Light inspection device for visual inspection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04031922A JP3095855B2 (en) 1992-02-19 1992-02-19 Light inspection device for visual inspection

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP36147499A Division JP3253942B2 (en) 1992-02-19 1999-12-20 Light inspection device for visual inspection

Publications (2)

Publication Number Publication Date
JPH05232040A true JPH05232040A (en) 1993-09-07
JP3095855B2 JP3095855B2 (en) 2000-10-10

Family

ID=12344470

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3095855B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000097864A (en) * 1998-09-21 2000-04-07 Olympus Optical Co Ltd Floodlight device for visual inspection
US6563577B2 (en) 2000-04-21 2003-05-13 Nikon Corporation Defect testing apparatus and defect testing method
KR100400455B1 (en) * 2001-04-26 2003-10-01 엘지전자 주식회사 lighting apparatus for inspected board
WO2003102562A1 (en) * 2002-05-31 2003-12-11 Olympus Corporation Macro illumination device
JP2007225591A (en) 2006-01-30 2007-09-06 Aitec System:Kk Lighting system
CN103939846A (en) * 2013-01-22 2014-07-23 牧德科技股份有限公司 Optical assembly for multi-angle illumination of line scanning and light source system using the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000097864A (en) * 1998-09-21 2000-04-07 Olympus Optical Co Ltd Floodlight device for visual inspection
JP4576006B2 (en) * 1998-09-21 2010-11-04 オリンパス株式会社 Projection device for visual inspection
US6563577B2 (en) 2000-04-21 2003-05-13 Nikon Corporation Defect testing apparatus and defect testing method
KR100400455B1 (en) * 2001-04-26 2003-10-01 엘지전자 주식회사 lighting apparatus for inspected board
WO2003102562A1 (en) * 2002-05-31 2003-12-11 Olympus Corporation Macro illumination device
KR100738741B1 (en) * 2002-05-31 2007-07-12 올림푸스 가부시키가이샤 Macro illumination apparatus
JP2007225591A (en) 2006-01-30 2007-09-06 Aitec System:Kk Lighting system
CN103939846A (en) * 2013-01-22 2014-07-23 牧德科技股份有限公司 Optical assembly for multi-angle illumination of line scanning and light source system using the same
KR101476530B1 (en) * 2013-01-22 2014-12-24 마하비전 아이엔씨. Optical assembly of multi-angle illumination for line scan and light source system using the same

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