JPH0523042B2 - - Google Patents
Info
- Publication number
- JPH0523042B2 JPH0523042B2 JP59216321A JP21632184A JPH0523042B2 JP H0523042 B2 JPH0523042 B2 JP H0523042B2 JP 59216321 A JP59216321 A JP 59216321A JP 21632184 A JP21632184 A JP 21632184A JP H0523042 B2 JPH0523042 B2 JP H0523042B2
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- resistance value
- resistance
- film
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 230000036961 partial effect Effects 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052788 barium Inorganic materials 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 2
- 229910052716 thallium Inorganic materials 0.000 claims description 2
- 239000010408 film Substances 0.000 description 18
- 239000010410 layer Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- 238000000137 annealing Methods 0.000 description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910016062 BaRuO Inorganic materials 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 230000008685 targeting Effects 0.000 description 2
- 229910019819 Cr—Si Inorganic materials 0.000 description 1
- 102000005717 Myeloma Proteins Human genes 0.000 description 1
- 108010045503 Myeloma Proteins Proteins 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Landscapes
- Electronic Switches (AREA)
- Resistance Heating (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59216321A JPS6196704A (ja) | 1984-10-17 | 1984-10-17 | 抵抗体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59216321A JPS6196704A (ja) | 1984-10-17 | 1984-10-17 | 抵抗体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6196704A JPS6196704A (ja) | 1986-05-15 |
| JPH0523042B2 true JPH0523042B2 (enrdf_load_stackoverflow) | 1993-03-31 |
Family
ID=16686694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59216321A Granted JPS6196704A (ja) | 1984-10-17 | 1984-10-17 | 抵抗体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6196704A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103038148A (zh) * | 2010-06-24 | 2013-04-10 | 电气化学工业株式会社 | 浇包输送用锚链引导机构 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2679148B2 (ja) * | 1988-09-09 | 1997-11-19 | 松下電器産業株式会社 | 酸化ルテニウム系薄膜のエッチング方法 |
-
1984
- 1984-10-17 JP JP59216321A patent/JPS6196704A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103038148A (zh) * | 2010-06-24 | 2013-04-10 | 电气化学工业株式会社 | 浇包输送用锚链引导机构 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6196704A (ja) | 1986-05-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |