JPH05226262A - Surface treatment device - Google Patents

Surface treatment device

Info

Publication number
JPH05226262A
JPH05226262A JP2821092A JP2821092A JPH05226262A JP H05226262 A JPH05226262 A JP H05226262A JP 2821092 A JP2821092 A JP 2821092A JP 2821092 A JP2821092 A JP 2821092A JP H05226262 A JPH05226262 A JP H05226262A
Authority
JP
Japan
Prior art keywords
surface treatment
light
lamp
fluid
ultraviolet rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2821092A
Other languages
Japanese (ja)
Inventor
Mitsuo Tokuda
光雄 徳田
Kenichi Kawasumi
建一 川澄
Toshiaki Fujito
利昭 藤戸
Motohiro Hashizaki
元裕 橋崎
Masao Kako
雅郎 加来
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2821092A priority Critical patent/JPH05226262A/en
Publication of JPH05226262A publication Critical patent/JPH05226262A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To embody instantaneous modification control of the intensity of ultraviolet rays without affecting adversely the reaction induced by the generation of dust or out gas only in every wavelength area but also in a selective wavelength area in a surface processing which uses a photochemical reaction. CONSTITUTION:Two boards 6a and 6b, which transmit ultraviolet rays, are laid out substantially in parallel with each other in the middle of an ultraviolet lamp 4 and a workpiece 3 with a clearance. A mixed fluid of a substance unable to absorb the ultraviolet rays and a substance capable of absorbing the ultraviolet rays is arranged to flow into the clearance under the control of the velocity and flow rate. This construction makes it possible to change the transmittance of the ultraviolet rays in short time and without generating dust under control. In addition, it is very simple to form the part which controls the amount of the transmitted ultraviolet rays and embody the reduction in the cost of this device, thereby providing an effective means for practical application.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、表面処理装置、更に詳
しくいえば、光のエネルギを用いる光化学反応により、
固体表面の薄膜形成、エッチング、洗浄、改質等の表面
処理を行う表面処理方法及び装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus, and more specifically, to a photochemical reaction using light energy.
The present invention relates to a surface treatment method and apparatus for performing surface treatment such as thin film formation on a solid surface, etching, cleaning and modification.

【0002】[0002]

【従来の技術】光化学反応を利用した表面処理は、プラ
ズマ処理方式などに比較して低損傷であり装置も簡単な
ため利用範囲が広がっている。光化学反応を利用した表
面処理の光としては紫外線が多く用いられている。光化
学反応は、紫外線強度及び光量に左右されるので、紫外
線強度の制御は必要不可欠である。紫外線の全波長領域
での強度制御方法としては、次の方法が考えられる。 (1)紫外線ランプの出力の変更、(2)紫外線ランプ
の最冷点温度の変更、である。
2. Description of the Related Art Surface treatment using a photochemical reaction has a wide range of applications because it is less damaged than a plasma treatment method and the apparatus is simple. Ultraviolet rays are often used as light for surface treatment using photochemical reactions. Since the photochemical reaction depends on the ultraviolet intensity and the amount of light, control of the ultraviolet intensity is essential. The following method is conceivable as a method for controlling the intensity of ultraviolet rays in all wavelength regions. (1) Change of output of ultraviolet lamp, (2) Change of coldest point temperature of ultraviolet lamp.

【0003】(1)の紫外線ランプの出力変更は、ラン
プの設計時点で決める値であり、ランプが完成されてか
らの変更、即ち表面処理に使用中の変更は、ランプの性
能や寿命を悪化させるなどの問題がある。(2)の紫外
線ランプの冷点温度の変更は、紫外線強度変更に数分以
上の時間を要するため、反応の開始や中断等の場合の瞬
間的な反応の制御が困難である。そのため、瞬時的な制
御には、減光もしくは遮光手段として、可動式の遮光板
を利用するものも提案されている(特開平3−3294
1号)。一方、光の波長を選択的に制御する方法として
は、恒常的な波長制御には、光学的フィルタ等が利用さ
れている。しかし処理条件を反応の途中で速やかに変更
するような、瞬時可変的な波長選択制御は実現されてい
ない。
The change of the output of the ultraviolet lamp of (1) is a value determined at the time of designing the lamp, and the change after the lamp is completed, that is, the change during the surface treatment, deteriorates the performance and life of the lamp. There is a problem such as letting. Changing the cold spot temperature of the ultraviolet lamp of (2) requires several minutes or more to change the ultraviolet intensity, and thus it is difficult to control the instantaneous reaction when the reaction is started or interrupted. Therefore, for instantaneous control, there has been proposed one that uses a movable light-shielding plate as a dimming or light-shielding means (Japanese Patent Laid-Open No. 3-3294).
No. 1). On the other hand, as a method of selectively controlling the wavelength of light, an optical filter or the like is used for constant wavelength control. However, instantaneously variable wavelength selection control has not been realized, in which processing conditions are changed promptly during the reaction.

【0004】[0004]

【発明が解決しようとする課題】光化学反応を利用した
表面処理装置としては、光強度、光量の瞬時的制御がで
きると同時に、表面処理部の反応に悪影響を生じないこ
と、装置の寿命が長いこと、装置のコストが経済的であ
ることが重要となる。上記可動式の遮光板あるいは光学
的フィルタを利用する装置は、動作時の発塵やアウトガ
ス等による化学反応への悪影響が問題になる場合には、
採用できない。本発明者等は、ランプ従って表面処理装
置の寿命を伸ばすと共に光強度、光量の瞬時的制御可能
とするため、細長い紫外線ランプを鞘に挿入し、鞘と紫
外線ランプとの間の間隙に紫外線の通過特性を制御する
流体を流す方法及び装置を発明した(特願平2−155
152号「表面処理方法および装置」)。しかし上記発
明では、鞘の構成、装着、被表面処理物体と紫外線ラン
プとの間の流体の量の均一性の保持に困難性が生じ、経
済的に実現することが困難であることが分かった。
As a surface treatment apparatus utilizing a photochemical reaction, it is possible to instantaneously control the light intensity and the amount of light, at the same time, the reaction of the surface treatment section is not adversely affected, and the life of the apparatus is long. It is important that the cost of the device is economical. The device utilizing the movable light-shielding plate or the optical filter, when the adverse effect on the chemical reaction due to dust or outgas during operation becomes a problem,
Cannot be adopted. The present inventors insert a long and narrow ultraviolet lamp into the sheath and extend the life of the lamp and therefore the surface treatment device and make it possible to instantaneously control the light intensity and the amount of light. A method and a device for flowing a fluid for controlling the passage characteristic have been invented (Japanese Patent Application No. 2-155).
No. 152, "Surface Treatment Method and Apparatus"). However, in the above invention, it has been found that it is difficult to realize economically because of difficulty in the configuration of the sheath, mounting, and maintaining the uniformity of the amount of fluid between the surface-treated object and the ultraviolet lamp. .

【0005】本発明の主な目的は、光、特に紫外線強度
又は量の瞬時的な変更制御を、全波長域のみならず、選
択的波長域においても、発塵やアウトガス等による反応
への悪影響を与えることなし行う表面処理装置を構成が
簡単で経済的に実現することにある。
The main object of the present invention is to control the instantaneous change of the intensity or quantity of light, especially ultraviolet light, not only over the entire wavelength range but also over a selective wavelength range, which adversely affects the reaction due to dust generation or outgas. The object is to realize a surface treatment apparatus which is performed without giving a simple and economical structure.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明の表面処理装置は、被処理物である固体表面
に照射する光の強度あるいは光量を制御する手段とし
て、光源と上記固体表面の間に配置され、上記光を透過
する略平行な複数枚の板もしくは膜をもつ空間に容器
と、上記容器に入れる流体の流体の組成、流体の流量の
少なくとも1つを制御する制御手段とを有して構成され
る。
In order to achieve the above object, the surface treatment apparatus of the present invention comprises a light source and the above solid state as a means for controlling the intensity or the light amount of the light irradiating the surface of the solid to be treated. A container disposed between the surfaces and having a space having a plurality of substantially parallel plates or films that transmit the light, and a control means for controlling at least one of the fluid composition of the fluid to be contained in the container and the flow rate of the fluid. And is configured.

【0007】上記制御手段は被処理物の表面へ到達する
光が、上記流体層により吸収される光の強度減衰率、波
長の少なくとも一方を、選択的もしくは統括的に制御す
るものである。また、好ましくは、装置を小型化するた
め、上記容器は被処理物を載置する処理室を形成する壁
の一部を構成する。更に、流体の厚さを粗調整するた
め、容器は複数個用意して、必要に応じて代えられるよ
うに、着脱可能に処理室に装着する構造とする。また、
本発明の表面処理装置の好ましい実施形態は、光源とし
た紫外線を発生するランプを使用し、容器に入れる流体
が窒素、酸素を主体とし、これにオゾンを含む気体でオ
ゾン量を制御するものである。
The control means selectively or collectively controls at least one of the intensity attenuation rate and the wavelength of the light that reaches the surface of the object to be processed, which is absorbed by the fluid layer. Further, preferably, in order to downsize the apparatus, the container constitutes a part of a wall forming a processing chamber in which an object to be processed is placed. Furthermore, in order to roughly adjust the thickness of the fluid, a plurality of containers are prepared and detachably mounted in the processing chamber so that they can be replaced as needed. Also,
A preferred embodiment of the surface treatment apparatus of the present invention uses a lamp that emits ultraviolet rays as a light source, the fluid contained in the container is mainly nitrogen and oxygen, and the amount of ozone is controlled by a gas containing ozone. is there.

【0008】[0008]

【作用】上記の構成によれば、複数の光透過平板もしく
は膜の間に、光が透過する流体を流せば光(紫外線)は
透過し、光を吸収もしくは反射する流体を流せば紫外線
は遮光もしくは減光される。また、透過する流体と吸収
もしくは反射する流体を適宜混合することにより、混合
率に応じて光の透過率及び波長を制御できる。流体を注
入する空間に流す流体は、短時間で組成を変えることが
できるので、瞬時に遮光するシャッタ機能が実現できる
のみならず、特定の波長を選択的に吸収遮光することが
できる。また、流体層が複数の平板と上記複数の平板を
所定の間隔で保持し、流体を入れる容器を構成する壁部
材の簡単な構造で構成されるため、設計製造が容易とな
り装置を経済的に実現できる。更に、流体を入れる容器
を被処理物を載置する処理室の壁の一部とすることによ
り、装置の構成が小型、簡易となり、従って、経済的な
装置を得ることができるる。
According to the above construction, light (ultraviolet rays) is transmitted between a plurality of light transmitting flat plates or films by passing a fluid through which light passes, and ultraviolet rays are blocked by flowing a fluid through which light is absorbed or reflected. Or it is dimmed. Further, by appropriately mixing the fluid that transmits and the fluid that absorbs or reflects, the transmittance and wavelength of light can be controlled according to the mixing ratio. Since the composition of the fluid flowing into the space for injecting the fluid can be changed in a short time, not only a shutter function of instantaneously blocking light can be realized, but also a specific wavelength can be selectively absorbed and blocked. Further, since the fluid layer is composed of a plurality of flat plates and the above-mentioned plurality of flat plates at a predetermined interval and has a simple structure of a wall member that constitutes a container for containing a fluid, designing and manufacturing are facilitated, and the device is economically manufactured. realizable. Further, by making the container for containing the fluid a part of the wall of the processing chamber in which the object to be processed is placed, the structure of the device can be made small and simple, so that an economical device can be obtained.

【0009】[0009]

【実施例】以下、本発明の実施例を図面を用いて説明す
る。図1は、本発明による表面処理装置の一実施例の断
面図である。処理室1内のステージ2には、被処理物3
を載置する。処理室1の上部には、光源である紫外線ラ
ンプ4を収納したランプ室5が搭載されている。処理室
1とランプ室5は、窓6a及び6bにより仕切られてい
る。窓6aと6bは、共に合成石英製の平板であり、複
数の平板6aと6bを所定の間隔で保持する壁部材18
と共に流体を入れる容器を構成している。壁部材18と
して異なった高さのもの多数を用意することによって任
意の間隔、即ち流体の厚さを設定することができる。窓
6aと6bで挟まれた空間7は、周囲と気密が保たれて
おり、この空間には、外部配管としてガスA、ガスB及
びガスCが、流量調整手段8a、8b、8cを介して導
入管9で接続されている。また、これに対向して排気管
10が接続されている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of an embodiment of the surface treatment apparatus according to the present invention. An object to be processed 3 is placed on the stage 2 in the processing chamber 1.
To place. A lamp chamber 5 accommodating an ultraviolet lamp 4 serving as a light source is mounted above the processing chamber 1. The processing chamber 1 and the lamp chamber 5 are partitioned by windows 6a and 6b. Both the windows 6a and 6b are flat plates made of synthetic quartz, and a wall member 18 for holding the flat plates 6a and 6b at predetermined intervals.
Together with this, it constitutes a container for containing a fluid. By preparing many wall members 18 having different heights, it is possible to set an arbitrary interval, that is, the thickness of the fluid. The space 7 sandwiched between the windows 6a and 6b is kept airtight with the surroundings. In this space, gas A, gas B and gas C are used as external pipes via the flow rate adjusting means 8a, 8b, 8c. They are connected by an introduction pipe 9. Further, an exhaust pipe 10 is connected to face this.

【0010】なお、本実施例では、ガスAは窒素、ガス
Bは酸素、ガスCはオゾンである。処理室1の内部へ
は、処理ガスPが流量調整手段11を経てノズル12か
ら導入され。処理に使われたガスPは、排気管13に接
続された圧力制御弁14および排気ポンプ15で外部へ
排出される。ステージ2は温度調節手段15により、適
切な温度に制御する。ランプ室5には窒素ガス吸入管1
6a及び排気管16bが取り付けられている。図面は、
側断面図のみ示されているが、壁部材18は、矩形、円
形又は楕円形上であり、上導入管9、排気管10は流体
が速く均一になるように配置されている。
In this embodiment, the gas A is nitrogen, the gas B is oxygen, and the gas C is ozone. The processing gas P is introduced from the nozzle 12 into the processing chamber 1 through the flow rate adjusting means 11. The gas P used for processing is discharged to the outside by the pressure control valve 14 and the exhaust pump 15 connected to the exhaust pipe 13. The stage 2 is controlled to an appropriate temperature by the temperature adjusting means 15. The lamp chamber 5 has a nitrogen gas suction pipe 1
6a and the exhaust pipe 16b are attached. The drawings are
Although only a side sectional view is shown, the wall member 18 has a rectangular, circular, or elliptical shape, and the upper introduction pipe 9 and the exhaust pipe 10 are arranged so that the fluid can be quickly and uniformly distributed.

【00011】以上の図1の構成において、各部の作用
を説明する。処理室1内のステージ2に被処理物3を載
置し、被処理物3すなわちステージ2を温度調節手段1
7により、適切な温度に設定制御する。表面処理ガスP
が流量調整手段11を経てノズル12から導入され、圧
力制御弁14の開度を調整して処理室1の内圧を設定制
御する。予め紫外線ランプ4を点灯しておく。ランプ室
5のガス吸入管16aから一定流量の窒素をランプ室5
内へ供給し、排気管16bから排出する。これによりラ
ンプ室5内部を常時完全に窒素雰囲気とし、雰囲気によ
る紫外線の吸収を防止するのみならず、ランプの過熱を
も防止する。
The operation of each part in the configuration shown in FIG. 1 will be described. The object 3 to be processed is placed on the stage 2 in the processing chamber 1, and the object 3 to be processed, that is, the stage 2 is set to the temperature control means 1.
7, the temperature is controlled to a proper temperature. Surface treatment gas P
Is introduced from the nozzle 12 through the flow rate adjusting means 11, and the opening degree of the pressure control valve 14 is adjusted to set and control the internal pressure of the processing chamber 1. The ultraviolet lamp 4 is turned on in advance. A constant flow rate of nitrogen is supplied from the gas suction pipe 16a of the lamp chamber 5 to the lamp chamber 5.
It is supplied inside and discharged from the exhaust pipe 16b. As a result, the inside of the lamp chamber 5 is always completely filled with a nitrogen atmosphere, so that not only the absorption of ultraviolet rays by the atmosphere is prevented but also the lamp is not overheated.

【0012】空間7にガスBすなわち酸素とガスCすな
わちオゾンを混合して導入すると、紫外線ランプ4から
放射された紫外線は、紫外線に対して良好な透過特性を
持つ合成石英の窓6aを透過するが、空間7のオゾンや
酸素に吸収されるため、その下へ透過する紫外線の強度
は大幅に減衰し、被処理物3の表面での光化学反応を起
こさせることが困難となる。つまり、空間7は、紫外線
の遮蔽体として機能する。なお、空間7の紫外線吸収率
は、空間7の高さ即ち壁部材18の厚み、ガス組成等に
より制御される。
When the gas B, that is, oxygen and the gas C, that is, ozone are mixed and introduced into the space 7, the ultraviolet rays emitted from the ultraviolet lamp 4 pass through the synthetic quartz window 6a having a good transmission characteristic with respect to the ultraviolet rays. However, since it is absorbed by ozone and oxygen in the space 7, the intensity of the ultraviolet rays that pass therethrough is greatly attenuated, and it becomes difficult to cause a photochemical reaction on the surface of the object 3 to be processed. That is, the space 7 functions as a shield for ultraviolet rays. The ultraviolet absorption rate of the space 7 is controlled by the height of the space 7, that is, the thickness of the wall member 18, the gas composition, and the like.

【0013】次に、空間7へ導入するガスとして、前記
酸素とオゾンの代わりに、ガスAつまり窒素を導入する
と、窒素は紫外線を吸収しないので、紫外線は空間7を
透過し、窓6bをも透過して処理室1の被処理物3へ照
射される。これにより、被処理物3の表面では光化学反
応が進行し、目的とする表面処理が行われる。表面処理
を停止させる場合には、再度空間7へ供給するガスをガ
スB及びガスCに切替えることにより紫外線が空間7で
遮蔽されるため、光化学反応が抑止される。このよう
に、処理室1内には異物の発生源となる可動物や雰囲気
の純度を悪化させる物体がない、非常にクリーンな環境
下で表面処理ができるので、被処理物3の仕上り特性が
改善され、また歩留りや信頼性の向上も実現できる。
Next, when gas A, that is, nitrogen, is introduced as the gas to be introduced into the space 7 instead of the oxygen and ozone, the nitrogen does not absorb the ultraviolet rays, so that the ultraviolet rays pass through the space 7 and also through the window 6b. It penetrates and is irradiated to the to-be-processed object 3 in the processing chamber 1. As a result, the photochemical reaction proceeds on the surface of the object 3 to be processed, and the desired surface treatment is performed. When the surface treatment is stopped, the gas supplied to the space 7 is switched to the gas B and the gas C again to block the ultraviolet rays in the space 7, so that the photochemical reaction is suppressed. As described above, since the surface treatment can be performed in a very clean environment in which there are no movable objects that are sources of foreign matters or objects that deteriorate the purity of the atmosphere in the processing chamber 1, the finish characteristics of the object to be processed 3 are It is also possible to improve the yield and reliability.

【0014】更には、本実施例でガスAつまり窒素とガ
スBつまり酸素、ガスCつまりオゾンを適宜混合するこ
とにより、被処理物3へ照射する紫外線の強度を自由に
制御できる。被処理物3に照射される紫外線の強度は光
化学反応の反応速度や反応過程を制御できるので、表面
処理速度の適正化、薄膜形成における膜質の制御、表面
処理の長期的プロセス安定化等が実現できる効果も有す
る。
Further, in the present embodiment, the intensity of the ultraviolet rays applied to the object to be treated 3 can be freely controlled by appropriately mixing the gas A, that is, nitrogen, the gas B, that is, oxygen, and the gas C, that is, ozone. Since the intensity of the ultraviolet rays applied to the object to be treated 3 can control the reaction rate and reaction process of the photochemical reaction, it is possible to optimize the surface treatment rate, control the film quality in thin film formation, and stabilize the surface treatment for a long period of time. It also has the effect.

【0015】図2は、本発明による表面処理装置の他の
実施例の断面図である。なお、図1の実施例と同じ機
能、作用の構成部分には同一番号を付し、詳細な説明を
省略する。本実施例は、被処理物3を大気圧雰囲気中で
処理する場合の装置構成を示している。排気管13は、
図示を省略した排気ダクトへ接続されている。処理室1
の気密性は、実施例1ほどは必要としない。また、窓6
bの両側の差圧はほとんど無いので、窓6bの厚みは実
施例1の場合に比べて数分の一程度まで薄くできる。こ
れにより、窓6bを透過する紫外線の透過率が増すた
め、表面処理効率が増大するのみならず、装置構造が簡
単にできるため信頼性向上や低コスト化が実現できる効
果を有する。
FIG. 2 is a sectional view of another embodiment of the surface treatment apparatus according to the present invention. It should be noted that components having the same functions and functions as those of the embodiment of FIG. 1 are designated by the same reference numerals, and detailed description thereof will be omitted. The present embodiment shows an apparatus configuration in the case where the object 3 to be processed is processed in an atmospheric pressure atmosphere. The exhaust pipe 13 is
It is connected to an exhaust duct (not shown). Processing room 1
The air tightness of is not required as much as in the first embodiment. Window 6
Since there is almost no pressure difference between the two sides of b, the thickness of the window 6b can be reduced to a fraction of that of the first embodiment. As a result, the transmittance of ultraviolet rays that pass through the window 6b is increased, so that not only the surface treatment efficiency is increased, but also the device structure can be simplified, so that the reliability can be improved and the cost can be reduced.

【0016】図3は、本発明による表面処理装置の更に
他の実施例の断面図である。本実施例は、前記実施例の
ランプ室5に入れるガスと空間7のガスを区別する必要
が無い場合の、最も簡易な構成の表面処理装置である。
なお、図1の実施例と同じ機能、作用の構成部分には同
一番号を付し、詳細な説明を省略する。流体層を構成す
る容器7とランプ室5が一体となって新しいランプ室
5’を構成し、ランプ室5’と処理室1が1枚の光を透
過する平板6bで仕切られた構成となっている。一体化
された室内5’には、酸素ガスAと窒素ガスBのそれぞ
れが流量調整手段8a及び8bで割合が制御されながら
導入管9によって室5’に吸入される。酸素ガスの割合
によって紫外線の透過率が制御される。室5’に入れる
ガスの容量が増大するため、切り替え速度は若干前記実
施例に劣るが装置はガス源、ガス導入管、透明平板6a
等が省け、極めて簡単な構造となる。
FIG. 3 is a sectional view of still another embodiment of the surface treatment apparatus according to the present invention. The present embodiment is the surface treatment apparatus having the simplest structure in the case where it is not necessary to distinguish between the gas to be put into the lamp chamber 5 and the gas in the space 7 of the above embodiment.
It should be noted that components having the same functions and functions as those of the embodiment of FIG. 1 are designated by the same reference numerals, and detailed description thereof will be omitted. The container 7 forming the fluid layer and the lamp chamber 5 are integrated to form a new lamp chamber 5 ', and the lamp chamber 5'and the processing chamber 1 are partitioned by a flat plate 6b that transmits light. ing. The oxygen gas A and the nitrogen gas B are sucked into the integrated chamber 5'through the introduction pipe 9 into the chamber 5 ', while the ratios of the oxygen gas A and the nitrogen gas B are controlled by the flow rate adjusting means 8a and 8b. The transmittance of ultraviolet rays is controlled by the proportion of oxygen gas. The switching speed is slightly inferior to that of the above-mentioned embodiment because the volume of gas to be put into the chamber 5'is increased, but the apparatus is equipped with a gas source, a gas introduction pipe, and a transparent flat plate 6a
Etc. are omitted and the structure is extremely simple.

【0017】以上、本発明の実施例について説明した
が、本発明は上記実施例に限定されるものではない。実
施例では光源を紫外線源としたが、他の光源を使用でき
ることは明らかであり、それに応じて、容器に入れるガ
スの種類も異なってくる。
Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments. In the embodiment, the light source is the ultraviolet ray source, but it is obvious that other light source can be used, and accordingly, the kind of gas to be put in the container is also different.

【0018】[0018]

【発明の効果】本発明によれば、処理室内には異物の発
生源となる可動物や雰囲気の純度を悪化させる物体がな
い、非常にクリーンな環境下で表面処理ができるので、
被処理物の仕上り特性が改善され、また歩留りや信頼性
の向上も実現できる。また、紫外線の透過率を瞬間的短
時間で変更制御できるので、反応プロセスを精度良く制
御できる効果を有する。小型で信頼性の高いシャッタ機
能も実現できる。特に、光の透過量を制御する流体層の
構成が、平板状で、ランプ室と処理室の壁の1部を構成
し、しかも着脱可能に装着されるので、装置が極めて簡
素な構造となり、装置の低コストかを実現できる。
According to the present invention, the surface treatment can be carried out in a very clean environment in which there are no movable objects as sources of foreign matters or objects deteriorating the purity of the atmosphere in the processing chamber.
The finishing characteristics of the object to be processed can be improved, and the yield and reliability can be improved. In addition, since the transmittance of ultraviolet rays can be changed and controlled in an instantaneously short time, there is an effect that the reaction process can be accurately controlled. A compact and highly reliable shutter function can also be realized. In particular, the configuration of the fluid layer that controls the amount of light transmission is flat, constitutes a part of the wall of the lamp chamber and the processing chamber, and is detachably mounted, so that the device has an extremely simple structure, The cost of the device can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による表面処理装置の一実施例の断面図
である。
FIG. 1 is a sectional view of an embodiment of a surface treatment apparatus according to the present invention.

【図2】本発明による表面処理装置の他の実施例の断面
図である。
FIG. 2 is a sectional view of another embodiment of the surface treatment apparatus according to the present invention.

【図3】本発明による表面処理装置の更に他の実施例の
断面図である。
FIG. 3 is a sectional view of still another embodiment of the surface treatment apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

11…流量調整手段 1…処理室、 12…ノズル 3…被処理物、 13…排気管 4…紫外線ランプ、 14…圧力制御
弁 5、5’…ランプ室 15…排気ポン
プ 6a,6b…窓(平板)、 16…管 7…空間、 17…温度調節
手段 8a,8b,8c…流量調整手段、 18…壁 9…導入管、 10…排気管。
11 ... Flow rate adjusting means 1 ... Processing chamber, 12 ... Nozzle 3 ... Processing object, 13 ... Exhaust pipe 4, UV lamp, 14 ... Pressure control valve 5, 5 '... Lamp chamber 15 ... Exhaust pump 6a, 6b ... Window ( Flat plate), 16 ... Tube 7 ... Space, 17 ... Temperature adjusting means 8a, 8b, 8c ... Flow rate adjusting means, 18 ... Wall 9 ... Introducing tube, 10 ... Exhaust tube.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 // H01L 21/31 B 8518−4M (72)発明者 橋崎 元裕 東京都青梅市藤橋888番地 株式会社日立 製作所青梅工場内 (72)発明者 加来 雅郎 東京都青梅市藤橋888番地 株式会社日立 製作所青梅工場内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Internal reference number FI technical display location // H01L 21/31 B 8518-4M (72) Inventor Motohiro Hashizaki 888 Fujihashi, Ome City, Tokyo Hitachi Co., Ltd. Ome Plant (72) Inventor Masao Karai 888 Fujibashi, Ome City, Tokyo Hitachi Co., Ltd. Ome Plant

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 被処理物である固体の表面に光源から光
を照射して表面処理を行う装置であって、上記光源と上
記固体とのに配置され、上記光を透過する略平行な複数
枚の板もしくは膜と上記板もしくは膜を一定間隔に保持
する壁とからなる容器と、上記容器に入れる流体の流体
の組成、流体の流量の少なくとも1つを制御する制御手
段とを有して構成されたとを特徴とする表面処理装置。
1. An apparatus for performing surface treatment by irradiating a surface of a solid, which is an object to be processed, with light from a light source, wherein the plurality of substantially parallel light-transmitting elements are disposed between the light source and the solid and transmit the light. And a control means for controlling at least one of a fluid composition and a fluid flow rate of a fluid to be placed in the container. A surface treatment device characterized by being configured.
【請求項2】 被処理物である固体を内部に配置する処
理室と、光源としてのランプを収納したランプ室と、上
記処理室と上記ランプ室に挾まれ上記ランプからの光を
透過する略平行な複数枚の板もしくは膜と上記板もしく
は膜を一定間隔に保持する壁とからなる容器と、上記容
器に入れる流体の組成、流体の流量の少なくとも1つを
制御する制御手段とを有して構成されたとを特徴とする
表面処理装置。
2. A processing chamber in which a solid, which is an object to be processed, is disposed, a lamp chamber in which a lamp as a light source is housed, a processing chamber and the lamp chamber which are sandwiched between the processing chamber and the light from the lamp are transmitted therethrough. A container having a plurality of parallel plates or membranes and walls for holding the plates or membranes at regular intervals, and a control means for controlling at least one of the composition of the fluid to be placed in the container and the flow rate of the fluid. A surface treatment device characterized by being configured as follows.
【請求項3】 請求項1又は2記載の表面処理装置にお
いて、上記複数枚の板は、合成石英であることを特徴と
する表面処理装置。
3. The surface treatment apparatus according to claim 1 or 2, wherein the plurality of plates are synthetic quartz.
【請求項4】 請求項1又は2記載の表面処理装置にお
いて、上記光源が紫外線を発生するランプであり、上記
容器に入れられる流体が窒素、酸素を主体とし、これに
オゾンを含む気体であることを特徴とする表面処理装
置。
4. The surface treatment apparatus according to claim 1 or 2, wherein the light source is a lamp that emits ultraviolet rays, and the fluid contained in the container is a gas mainly containing nitrogen and oxygen and containing ozone. A surface treatment device characterized by the above.
【請求項5】 請求項2記載の表面処理装置において、
上記容器の板は上記処理室の壁の一部を構成することを
特徴とする表面処理装置。
5. The surface treatment apparatus according to claim 2, wherein
The surface treatment apparatus, wherein the plate of the container constitutes a part of the wall of the processing chamber.
【請求項6】 請求項2記載の表面処理装置において、
上記容器は上記処理室及び、ランプ室と着脱可能に装着
されたことを特徴とする表面処理装置。
6. The surface treatment apparatus according to claim 2, wherein
The surface treatment apparatus, wherein the container is detachably attached to the treatment chamber and the lamp chamber.
【請求項7】 被処理物である固体の表面に光源から光
を照射して表面処理を行う装置であって、上記光源とな
るランプを内部に持つランプ室と、上記固体を内部に載
置する処理室と、上記ランプ室と処理室の境界壁の1部
を構成し、上記光を透過する1枚の平板と、上記ランプ
室に入れる流体の組成、流体の流量の少なくとも1つを
制御する制御手段とを有して構成されたとを特徴とする
表面処理装置。
7. An apparatus for performing surface treatment by irradiating a surface of a solid, which is an object to be processed, with light from a light source, wherein a lamp chamber having a lamp serving as the light source therein, and the solid placed inside the lamp chamber. A processing chamber, a part of a boundary wall between the lamp chamber and the processing chamber, and a flat plate that transmits the light, and at least one of the composition of the fluid to be put into the lamp chamber and the flow rate of the fluid is controlled. And a control means for controlling the surface treatment apparatus.
【請求項8】 請求項7記載の表面処理装置において、
上記光が紫外線であり、上記流体が窒素ガスと酸素ガス
の混合体であることを特徴とする表面処理装置。
8. The surface treatment apparatus according to claim 7,
The surface treatment apparatus, wherein the light is ultraviolet light and the fluid is a mixture of nitrogen gas and oxygen gas.
JP2821092A 1992-02-14 1992-02-14 Surface treatment device Pending JPH05226262A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2821092A JPH05226262A (en) 1992-02-14 1992-02-14 Surface treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2821092A JPH05226262A (en) 1992-02-14 1992-02-14 Surface treatment device

Publications (1)

Publication Number Publication Date
JPH05226262A true JPH05226262A (en) 1993-09-03

Family

ID=12242294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2821092A Pending JPH05226262A (en) 1992-02-14 1992-02-14 Surface treatment device

Country Status (1)

Country Link
JP (1) JPH05226262A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001118837A (en) * 1992-09-07 2001-04-27 Mitsubishi Electric Corp Semiconductor manufacturing device
JP2002100627A (en) * 2000-07-21 2002-04-05 Tokyo Electron Ltd Method for manufacturing semiconductor device, apparatus and system for processing substrate
JP2008235678A (en) * 2007-03-22 2008-10-02 Ushio Inc Ultraviolet irradiator, ultraviolet irradiation device and film reforming method
WO2010032852A1 (en) * 2008-09-18 2010-03-25 株式会社ジーエス・ユアサコーポレーション Ultraviolet light irradiation device
JP2013535097A (en) * 2010-06-08 2013-09-09 アプライド マテリアルズ インコーポレイテッド Window assembly for use in a substrate processing system
JP2015119127A (en) * 2013-12-20 2015-06-25 ウシオ電機株式会社 Light irradiation device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001118837A (en) * 1992-09-07 2001-04-27 Mitsubishi Electric Corp Semiconductor manufacturing device
JP2002100627A (en) * 2000-07-21 2002-04-05 Tokyo Electron Ltd Method for manufacturing semiconductor device, apparatus and system for processing substrate
JP2008235678A (en) * 2007-03-22 2008-10-02 Ushio Inc Ultraviolet irradiator, ultraviolet irradiation device and film reforming method
WO2010032852A1 (en) * 2008-09-18 2010-03-25 株式会社ジーエス・ユアサコーポレーション Ultraviolet light irradiation device
KR20110063712A (en) * 2008-09-18 2011-06-14 가부시키가이샤 지에스 유아사 Ultraviolet light irradiation device
JPWO2010032852A1 (en) * 2008-09-18 2012-02-16 株式会社Gsユアサ UV irradiation equipment
JP5534344B2 (en) * 2008-09-18 2014-06-25 株式会社Gsユアサ UV irradiation equipment
TWI466735B (en) * 2008-09-18 2015-01-01 Gs Yuasa Int Ltd Ultraviolet irradiation apparatus
JP2013535097A (en) * 2010-06-08 2013-09-09 アプライド マテリアルズ インコーポレイテッド Window assembly for use in a substrate processing system
JP2015119127A (en) * 2013-12-20 2015-06-25 ウシオ電機株式会社 Light irradiation device

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