JPH05315302A - Light exciting reactor - Google Patents

Abstract

PURPOSE:To provide a surface treatment device capable of providing the maximum light exciting reaction on a substrate surface in a surface treatment for a substrate in which light exciting reaction is utilized. CONSTITUTION:A window 5 of a quartz plate capable of transmitting ultra-violet ray for isolating a light source 10 and a substrate 11 is provided in a reaction chamber 1 and the pressure of two chambers are adjusted to the same degree, thereby making thin the window material and an inert gas which does not absorb ultra-violet ray is introduced into the chamber of the light source side. Thereby, the strong ultra-violet intensity is obtained on the substrate surface and the light exciting reaction is efficiently obtained on the substrate.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoexcitation reaction apparatus for a semiconductor manufacturing process utilizing a photoexcitation reaction.

[0002]

2. Description of the Related Art There is a method of dry etching or cleaning the surface of a silicon substrate using halogen gas and ultraviolet rays. Since this method activates the reaction gas by ultraviolet rays, it has an advantage that damage to the substrate can be reduced as compared with the method using plasma.

However, if the light source is placed in the reaction chamber together with the substrate, the photoexcited reaction is likely to occur near the light source, and it is difficult to obtain a sufficient reaction on the surface of the substrate, which may damage the light source. Further, when a window is provided in the reaction chamber and light is irradiated from the outside, there is a problem that the wall thickness of the window material becomes large, ultraviolet rays are attenuated, sufficient ultraviolet ray intensity cannot be obtained, and processing time becomes long.

[0004]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a photoexcitation reaction apparatus capable of obtaining a sufficient photoexcitation reaction on a substrate.

[0005]

A reaction chamber is divided into a light source side and a substrate side by a quartz plate or the like, and the two chambers are individually evacuated so that the pressures in the two chambers become the same. ..
This makes it possible to reduce the wall thickness of the window material. In addition, in the room on the light source side, an inert gas such as nitrogen or argon, which absorbs less ultraviolet rays, is passed in the same amount as the reaction gas such as halogen gas, which flows into the room on the substrate side. It becomes possible to obtain a sufficient photoexcitation reaction.

[0006]

The photoexcitation reaction apparatus according to the present invention is to obtain the photoexcitation reaction on the substrate by increasing the illuminance of ultraviolet rays on the substrate by the above method.

[0007]

Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view of an optical cleaning device according to the present invention. The reaction chamber 1 is divided into a light source side and a substrate side by a partition window 5. A low-pressure mercury lamp is set as a light source in a room on the light source side (hereinafter referred to as a lamp house 2), and an inert gas such as nitrogen is introduced from an inert gas introducing tube 6 so that a flow rate can be controlled by a valve 16. Is becoming A reaction gas is introduced through a reaction gas introduction tube 7 into a chamber on the substrate side (hereinafter referred to as a processing chamber 3), and a flow rate is controlled by a valve 17. Further, both the lamp house 2 and the processing chamber 3 are evacuated by the vacuum pump 13 and the pressures in the two chambers are adjusted to be the same by the valves 18 and 19 and the gas introduction valves 16 and 17, respectively. The substrate 11, which is the object to be processed, is set on the stage 12 capable of controlling the temperature in the processing chamber 3, and is subjected to a predetermined process.

Next, the substrate processing of the present invention using this apparatus will be described. In the lamp house 2 and the processing chamber 3, the pressure of the vacuum pump 13 is controlled to 20 to 0.02 Torr by the exhaust valves 18 and 19 and the gas introduction valves 16 and 17.
A low-pressure mercury lamp is set as a light source in the lamp house 2, nitrogen as an inert gas is flown therein, and a reaction gas is flown in the processing chamber 3. At this time, it is possible to keep the purity of the reaction gas high by making the pressure on the processing chamber side slightly higher than the pressure on the lamp house side. It is also possible to control the photoexcitation reaction by controlling the intensity of ultraviolet rays on the substrate surface by mixing ozone or the like that absorbs ultraviolet rays into the lamp house. Substrate 11 is load lock chamber 1
4 is passed through the gate valve 15 and placed on the temperature-controlled heater 12 to be surface-treated. The processed substrate passes through the gate valve 15 and is sent to the next step such as film formation.

[0009]

According to the present invention, the photoexcitation reaction on the substrate surface can be efficiently performed.

[Brief description of drawings]

FIG. 1 is a block diagram of an optical cleaning device according to the present invention.

[Explanation of symbols]

1 ... Reaction chamber, 2 ... Lamp house, 3 ... Processing chamber, 5 ... Partition window, 6 ... Gas introduction tube, 7 ... Gas introduction tube,
8 ... Exhaust tube, 9 ... Exhaust tube, 10 ... Low-pressure mercury lamp, 11 ... Substrate, 12 ... Heater, 13 ... Vacuum pump, 14 ... Load lock chamber, 15 ... Gate valve, 16
… Gas flow rate control valve, 17… Gas flow rate control valve, 1
8 ... Exhaust speed control valve, 19 ... Exhaust speed control valve.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tsuyoshi Kimura 888 Fujibashi, Ome-shi, Tokyo Hitachi Ltd. Ome factory

Claims (3)

[Claims] 1. A substrate processing apparatus utilizing a photoexcited reaction in which a substrate is placed in a reaction chamber, a predetermined reaction gas is introduced, and ultraviolet rays are irradiated to treat the surface of the substrate.
A photoexcited reaction apparatus characterized in that a quartz plate window that transmits ultraviolet rays is provided in the reaction chamber to separate the substrate and the light source, the reaction chamber is divided into two, and the two reaction chambers are individually evacuated by a vacuum pump. .. 2. The photoexcited reaction device according to claim 1, wherein a gas can be individually supplied to the two reaction chambers. 3. The photoexcitation reaction device according to claim 1, wherein the pressures of the two reaction chambers can be individually controlled.