JPH0522229B2 - - Google Patents

Info

Publication number
JPH0522229B2
JPH0522229B2 JP18886786A JP18886786A JPH0522229B2 JP H0522229 B2 JPH0522229 B2 JP H0522229B2 JP 18886786 A JP18886786 A JP 18886786A JP 18886786 A JP18886786 A JP 18886786A JP H0522229 B2 JPH0522229 B2 JP H0522229B2
Authority
JP
Japan
Prior art keywords
group
acid
atom
double bond
lower alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18886786A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6343133A (ja
Inventor
Masami Kawabata
Masahiko Harada
Yasuyuki Takimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP18886786A priority Critical patent/JPS6343133A/ja
Publication of JPS6343133A publication Critical patent/JPS6343133A/ja
Publication of JPH0522229B2 publication Critical patent/JPH0522229B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
JP18886786A 1986-08-11 1986-08-11 高感度光重合性組成物 Granted JPS6343133A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18886786A JPS6343133A (ja) 1986-08-11 1986-08-11 高感度光重合性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18886786A JPS6343133A (ja) 1986-08-11 1986-08-11 高感度光重合性組成物

Publications (2)

Publication Number Publication Date
JPS6343133A JPS6343133A (ja) 1988-02-24
JPH0522229B2 true JPH0522229B2 (cg-RX-API-DMAC10.html) 1993-03-26

Family

ID=16231256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18886786A Granted JPS6343133A (ja) 1986-08-11 1986-08-11 高感度光重合性組成物

Country Status (1)

Country Link
JP (1) JPS6343133A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01238656A (ja) * 1988-03-18 1989-09-22 Nippon Paint Co Ltd 高感度光重合性組成物
JPH02238002A (ja) * 1989-03-10 1990-09-20 Nippon Paint Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPS6343133A (ja) 1988-02-24

Similar Documents

Publication Publication Date Title
EP0211615B1 (en) Photopolymerisable composition
JP3365434B2 (ja) 光重合性組成物及び感光材料
EP0276016B1 (en) Photopolymerizable composition
JPH0469381B2 (cg-RX-API-DMAC10.html)
JPS5829803A (ja) 光重合性組成物
US5738974A (en) Photopolymerizable composition and photosensitive lithographic printing plate
JPS62143043A (ja) 光重合性組成物
JPS6231844A (ja) 平版用版材
JPH0522228B2 (cg-RX-API-DMAC10.html)
JPH0255446B2 (cg-RX-API-DMAC10.html)
JPH086245A (ja) 光重合性組成物
JPH07225474A (ja) 光重合性組成物
JP2539810B2 (ja) 高感度光重合性組成物
JP2758737B2 (ja) 光重合性組成物及び感光性平版印刷版
JP3010880B2 (ja) 光重合性組成物
JPH0522229B2 (cg-RX-API-DMAC10.html)
JPS63278909A (ja) 光重合性組成物
JP3324266B2 (ja) 光重合性組成物及び感光材料
JPH08297367A (ja) 光重合性組成物
JPH06301208A (ja) 光重合性組成物
JP3508434B2 (ja) 光重合性組成物及びこれを用いた感光性平版印刷版
JPH08179504A (ja) 光重合性組成物
JPH10195118A (ja) 光重合性組成物
JPH0876377A (ja) 光重合性組成物
JP3552437B2 (ja) 光重合性組成物