JPH0522229B2 - - Google Patents
Info
- Publication number
- JPH0522229B2 JPH0522229B2 JP18886786A JP18886786A JPH0522229B2 JP H0522229 B2 JPH0522229 B2 JP H0522229B2 JP 18886786 A JP18886786 A JP 18886786A JP 18886786 A JP18886786 A JP 18886786A JP H0522229 B2 JPH0522229 B2 JP H0522229B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- atom
- double bond
- lower alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 37
- 239000000203 mixture Substances 0.000 claims description 28
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 239000003999 initiator Substances 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 8
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 125000003282 alkyl amino group Chemical group 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 6
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 claims description 5
- 125000005520 diaryliodonium group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000004423 acyloxy group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- -1 argon ion Chemical class 0.000 description 36
- 150000001735 carboxylic acids Chemical class 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 9
- 206010034972 Photosensitivity reaction Diseases 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 230000036211 photosensitivity Effects 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- LQJPFRZLZSLIIO-UHFFFAOYSA-N 2,11-dimethyldodeca-2,10-dienediamide Chemical compound NC(=O)C(C)=CCCCCCCC=C(C)C(N)=O LQJPFRZLZSLIIO-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- PQJUJGAVDBINPI-UHFFFAOYSA-N 9H-thioxanthene Chemical compound C1=CC=C2CC3=CC=CC=C3SC2=C1 PQJUJGAVDBINPI-UHFFFAOYSA-N 0.000 description 2
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ARKDCHXUGNPHJU-UHFFFAOYSA-N 2,7-dimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CCCC=C(C)C(N)=O ARKDCHXUGNPHJU-UHFFFAOYSA-N 0.000 description 1
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 1
- QAGHEHQMRFEQMB-UHFFFAOYSA-N 2-ethylidenepropanedioic acid Chemical compound CC=C(C(O)=O)C(O)=O QAGHEHQMRFEQMB-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- VRBUPQGTJAXZAE-UHFFFAOYSA-N 2-propylidenebutanedioic acid Chemical compound CCC=C(C(O)=O)CC(O)=O VRBUPQGTJAXZAE-UHFFFAOYSA-N 0.000 description 1
- FJWCTQCMDWCKEC-UHFFFAOYSA-N 2-propylidenepropanedioic acid Chemical compound CCC=C(C(O)=O)C(O)=O FJWCTQCMDWCKEC-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- WZHHYIOUKQNLQM-UHFFFAOYSA-N 3,4,5,6-tetrachlorophthalic acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C(O)=O WZHHYIOUKQNLQM-UHFFFAOYSA-N 0.000 description 1
- KTFJPMPXSYUEIP-UHFFFAOYSA-N 3-benzoylphthalic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1C(O)=O KTFJPMPXSYUEIP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- XTJFFFGAUHQWII-UHFFFAOYSA-N Dibutyl adipate Chemical compound CCCCOC(=O)CCCCC(=O)OCCCC XTJFFFGAUHQWII-UHFFFAOYSA-N 0.000 description 1
- PYGXAGIECVVIOZ-UHFFFAOYSA-N Dibutyl decanedioate Chemical compound CCCCOC(=O)CCCCCCCCC(=O)OCCCC PYGXAGIECVVIOZ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- MWPUSWNISCYUNR-UHFFFAOYSA-N bis(3-nitrophenyl)iodanium Chemical compound [O-][N+](=O)C1=CC=CC([I+]C=2C=C(C=CC=2)[N+]([O-])=O)=C1 MWPUSWNISCYUNR-UHFFFAOYSA-N 0.000 description 1
- QRMFGEKERJAYSQ-UHFFFAOYSA-N bis(4-chlorophenyl)iodanium Chemical compound C1=CC(Cl)=CC=C1[I+]C1=CC=C(Cl)C=C1 QRMFGEKERJAYSQ-UHFFFAOYSA-N 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- AOESAXAWXYJFNC-UHFFFAOYSA-N bis(prop-2-enyl) propanedioate Chemical compound C=CCOC(=O)CC(=O)OCC=C AOESAXAWXYJFNC-UHFFFAOYSA-N 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 229940100539 dibutyl adipate Drugs 0.000 description 1
- PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000006232 ethoxy propyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AJKLKFPOECCSOO-UHFFFAOYSA-N hydrochloride;hydroiodide Chemical class Cl.I AJKLKFPOECCSOO-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- HSZCJVZRHXPCIA-UHFFFAOYSA-N n-benzyl-n-ethylaniline Chemical compound C=1C=CC=CC=1N(CC)CC1=CC=CC=C1 HSZCJVZRHXPCIA-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- NAYYNDKKHOIIOD-UHFFFAOYSA-N phthalamide Chemical class NC(=O)C1=CC=CC=C1C(N)=O NAYYNDKKHOIIOD-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000006233 propoxy propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006225 propoxyethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
Description
[産業上の利用分野]
本発明は紫外線、可視光線を含む広範な波長範
囲に属する光に対して高い感度を示す光重合性組
成物に関する。特にアルゴンイオンレーザー光の
ような可視レーザー光に対して優れた感光性を示
す光重合性組成物に関する。
[従来の技術]
写真的技法によつて画像を再現するにあたつて
は、ジアゾニウム塩類、アジド類、キノンジアジ
ド類などの感光性をもつ化合物を含む組成物、ま
たは紫外線で作用する光重合開始剤を含む光重合
性組成物が使用されている。上述の化合物または
組成物はいずれも紫外線には感光性を示すものの
可視光線には殆んど感光性を示さないという問題
があつた。紫外線の代りに可視光線(波長400〜
700nm)に対して感光性をもつ光重合性組成物と
しては、例えば特開昭57−114139号公報、特開昭
59−142205号公報などに示されている色素と感光
促進剤を含む組成物が知られている。
近年、レーザー光源による走査露光技術の進
歩、特に可視レーザー光による走査露光装置の実
用化に伴い、アルゴンイオンレーザー光のような
可視レーザー光に高い感光性をもつ感光材料の開
発が望まれていた。ところが、従来の感光材料に
あつては、紫外線に対して感光性をもつものは勿
論のこと、可視光線に対して感光性をもつもので
あつても、可視レーザー光に対しては感度が必ず
しも十分ではなく、レーザー光走査露光による記
録は可能であるにしてもかなりの高出力を要し、
経済的ではなかつた。
[発明の目的]
本発明の目的は、紫外線、可視光線を含む広範
な波長範囲に属する光に対して高い感度を示す光
重合性組成物を提供することにある。特に、アル
ゴンイオンレーザー光のような可視レーザー光に
対して優れた感光性を示す光重合性組成物を提供
することにある。
[発明の構成]
本発明者らの研究によれば、エチレン性不飽和
二重結合を有する付加重合可能な化合物と光重合
開始剤を含む光重合性組成物の系において、光重
合開始剤として、ある種のキサンテンまたはチオ
キサンテン系色素、ジアリールヨードニウム塩、
およびN−フエニルグリシンのような窒素原子の
α位にメチレン基を有する化合物の三者を組合わ
せて使用することにより、所期の目的を達成でき
る事実を見出した。
即ち、本発明によれば、エチレン性不飽和二重
結合を有する付加重合可能な化合物と光重合開始
剤を含む光重合性組成物において、該光重合開始
剤が、
(a) 下記一般式[]
[式中、Aは酸素原子または硫黄原子、Xは水
素原子またはハロゲン原子、Yは炭素原子または
窒素原子(ただし、Yが炭素原子である場合には
隣接する炭素原子との間(点線で示した箇所)は
二重結合であり、Yが窒素原子である場合には隣
接する上記炭素原子との間は一重結合である。)、
Zは酸素原子(この場合隣接する炭素原子との間
は二重結合である。)、低級アルコキシ基または低
級アルカノイルオキシ基、R1は低級アルキル基、
ヒドロキシ低級アルキル基、低級アルコキシ低級
アルキル基、ジ低級アルキルアミノ低級アルキル
基またはアリール基、R2は水素原子、低級アル
コキシ基またはジ低級アルキルアミノ基である。
なお、ZとR1は両者合して−Z−R1−として、
を表わすこともある。]
で示される化合物、
(b) ジアリールヨードニウム塩、および
(c) 窒素原子のα位にメチレン基を有する化合物
の組合わせからなることを特徴とする光重合性組
成物が提供される。
上記一般式[]で示される化合物(以下、成
分(a)と称することもある。)において、Xで表さ
れるハロゲン原子の具体例としては、塩素、臭素
などがある。また、Zで表される低級アルコキシ
基としてはメトキシ、エトキシ、プロポキシなど
が、低級アルカノイルオキシ基としてはアセチル
オキシ、プロピオニルオキシ、ブチリルオキシな
どが例示される。なおまた、R1で表される低級
アルキル基の具体例としてはメチル、エチル、プ
ロピル、ブチル、ペンチル、ヘキシル、ヘプチ
ル、オクチル、ノニル、デシルなどが、ヒドロキ
シ低級アルキル基の具体例としてはヒドロキシメ
チル、ヒドロキシエチル、ヒドロキシプロピル、
ヒドロキシブチルなどが、低級アルコキシ低級ア
ルキル基の具体例としてはメトキシメチル、メト
キシエチル、メトキシプロピル、エトキシエチ
ル、エトキシプロピル、エトキシブチル、プロポ
キシエチル、プロポキシプロピルなどが、ジ低級
アルキルアミノ低級アルキル基の具体例としては
ジメチルアミノメチル、ジメチルアミノエチル、
ジメチルアミノピロピル、ジエチルアミノエチ
ル、ジエチルアミノプロピル、ジエチルアミノブ
チルなどが、アリール基の具体例としてはフエニ
ル、キシリル、トリル、ナフチルなどがあり、
R2で表される低級アルコキシ基の具体例として
はメトキシ、エトキシ、プロポキシなどが、ジ低
級アルキルアミノ基の具体例としてはジメチルア
ミノ、ジエチルアミノなどが挙げられる。なお、
一般式[]で示される化合物は、キサンテンま
たはチオキサンテン系色素として一般に文献既知
の物質である。
上記ジアリールヨードニウム塩(以下、成分(b)
と称することもある。)は、下記一般式[]で
示される化合物である。
[式中、R3〜R6は同一または異なつて、水素
原子、ハロゲン原子(例えば塩素、臭素)、低級
アルキル基(例えばメチル、エチル、プロピル、
t−ブチル)、低級アルコキシ基(例えばメトキ
シ、エトキシ、プロポキシ)またはニトロ基を表
わし、X-はハロゲンイオン(例えばCl-,Br-,
I-)、BF4 -,PF6 -,AsF6 -またはSbF6 -を表わ
す。]
一般式[]で示される化合物は、例えば「ジ
ヤーナル・オブ・ポリマー・サイエンス・ポリマ
ー・シンポジア」(J.Polym.Sci.Polym.Symp.)
56巻383〜395頁(1976年)に記載の方法に従つて
合成することができ、例えばジフエニルヨードニ
ウム、ビス(p−クロロフエニル)ヨードニウ
ム、ジトリルヨージドニウム、ビス(p−t−ブ
チルフエニル)ヨードニウム、ビス(m−ニトロ
フエニル)ヨードニウムなどのヨードニウムのク
ロリド、ブロミド、ホウフツ化塩、ヘキサフルオ
ロホスフエート塩、ヘキサフルオロアルセネート
塩、ヘキサフルオロアンチモネート塩を挙げるこ
とができる。
上記窒素原子のα位にメチレン基を有する化合
物(以下、成分(c)と称することもある。)として
は、例えばトリエチルアミン、N−メチルジエタ
ノールアミン、トリエタノールアミン、N−エチ
ル−N−ベンジルアニリン、N,N−ジエチル−
p−フエニレンジアミン、N−フエニルグリシン
などを挙げることができ、特にN−フエニルグリ
シンが好ましい。
上記エチレン性不飽和二重結合を有する付加重
合可能な化合物(以下、二重結合含有化合物と称
することもある。)は、光重合開始剤の作用によ
り付加重合して硬化し、実質的に不溶化をもたら
すようなエチレン性不飽和二重結合を有する単量
体または重合体であればよい。その具体例として
は、不飽和カルボン酸、不飽和カルボン酸と脂肪
族ポリヒドロキシ化合物とのエステル、不飽和カ
ルボン酸と芳香族ポリヒドロキシ化合物とのエス
テル、不飽和カルボン酸とエポキシドとの付加反
応物、不飽和カルボン酸および多価カルボン酸と
脂肪族ポリヒドロキシ化合物、芳香族ポリヒドロ
キシ化合物などの多価ヒドロキシ化合物とのエス
テル化反応により得られるエステルなどが挙げら
れる。
不飽和カルボン酸の具体例としてはアクリル
酸、メタクリル酸、イタコン酸、クロトン酸、マ
レイン酸などがある。脂肪族ポリヒドロキシ化合
物としてはエチレングリコール、ジエチレングリ
コール、トリエチレングリコール、テトラエチレ
ングリコール、ネオペンチルグリコール、プロピ
レングリコール、1,2−ブタンジオールなどの
二価アルコール類、トリメチロールエタン、トリ
メチロールプロパン、グリセロールなどの三価ア
ルコール類、ペンタエリスリトール、トリペンタ
エリスリトールなどの四価あるいはそれ以上の多
価アルコール類、多価ヒドロキシカルボン酸類な
どが例示される。芳香族ポリヒドロキシ化合物と
してはハイドロキノン、レゾルシン、カテコー
ル、ピロガロールなどがある。エポキシドとして
はトリメチロールプロパンポリグリシジルエーテ
ル、ペンタエリスリトールポリグリシジルエーテ
ル、プロピレングリコールジグリシジルエーテ
ル、フタル酸のジグリシジルエステル、エピクロ
ルヒドリンと2,2−ビス(4−ヒドロキシフエ
ニル)−プロパンとの反応物などがある。多価カ
ルボン酸としてはフタル酸、イソフタル酸、テレ
フタル酸、テトラクロルフタル酸、トリメリツト
酸、ピロメリツト酸、ベンゾフエノンジカルボン
酸、マレイン酸、フマル酸、マロン酸、グルター
ル酸、アジピン酸、セバシン酸、テトラヒドロフ
タル酸などがある。
不飽和カルボン酸と脂肪族ポリヒドロキシ化合
物とのエステル、または不飽和カルボン酸と芳香
族ポリヒドロキシ化合物とのエステルの代表的な
例としては、上記脂肪族ポリヒドロキシ化合物ま
たは芳香族ポリヒドロキシ化合物のアクリル酸ま
たはメタクリル酸のエステルが挙げられる。不飽
和カルボン酸および多価カルボン酸と多価ヒドロ
キシ化合物とのエステル化反応により得られるエ
ステルの代表的な例としては、以下に示すものが
挙げられる。(ただし、Z′はアクリロイル基また
はメタクリロイル基である。):
Z′−(OC2H4)−2OOC−(CH2)−4COO−(C2H4O)−2
Z′
Z′−(OC2H4)−3OOC−CH=CH−COO−(C2H4O
)−3Z′
その他本発明に用いることができる二重結合含
有化合物の例としては、アクリルアミド、エチレ
ンビスアクリルアミド、ヘキサメチレンビスアク
リルアミドなどのアクリルアミド類、エチレンビ
スメタクリルアミド、ヘキサメチレンビスメタク
リルアミドなどのメタクリルアミド類、フタル酸
ジアリル、マロン酸ジアリル、フマル酸ジアリ
ル、トリアリルイソシアヌレートなどのアリルエ
ステル類などの二重結合含有化合物が挙げられ
る。
重合体としての二重結合含有化合物にあつて、
主鎖に二重結合を有するものの例としては、不飽
和二価カルボン酸(例えばマレイン酸、フマル
酸)とジヒドロキシ化合物(例えば上記二価アル
コール類)との重縮合反応により得られるポリエ
ステル、上記不飽和二価カルボン酸とジアミン
(例えばエチレンジアミン、ヘキサメチレンジア
ミン)との重縮合反応により得られるポリアミド
などが挙げられる。側鎖に二重結合を有するもの
の例としては、側鎖に二重結合をもつ二価カルボ
ン酸(例えばイタコン酸、α−メチルイタコン
酸、γ−メチルイタコン酸、プロピリデンコハク
酸、α−エチリデングルタル酸、エチリデンマロ
ン酸、プロピリデンマロン酸)と上記ジビドロキ
シ化合物との重縮合反応により得られるポリエス
テル、あるいは上記ジアミンとの重縮合反応によ
り得られるポリアミドが挙げられる。また、側鎖
にヒドロキシ基やハロゲン化メチル基の如き官能
基をもつ重合体とアクリル酸、メタクリル酸、ク
ロトン酸のような不飽和カルボン酸との高分子反
応により得られる重合体も使用できる。なお、側
鎖に官能基をもつ重合体としては、ポリビニルア
ルコール、ポリ酢酸ビニルの部分ケン化物、アク
リロニトリルとスチレン、塩化ビニル、塩化ビニ
リデンなどとの共重合体、アクリロニトリルと酢
酸ビニルとの共重合体の完全ケン化物、2−ヒド
ロキシエチルメタクリレートとアクリロニトリ
ル、メチルメタクリレート、ブチルメタクリレー
ト、スチレン、塩化ビニリデン、酢酸ビニルなど
との共重合体、ポリ(4−ヒドロキシスチレン)、
ポリ(N−メチロールアクリルアミド)などが挙
げられる。
以上の二重結合含有化合物にあつて、アクリル
酸エステル類またはメタクリル酸エステル類の単
量体の使用が特に好ましい。
本発明組成物にあつては、二重結合含有化合物
1重量部に対して、成分(a)を0.01〜0.2重量部、
好ましくは0.02〜0.1重量部、成分(b)および(c)の
各々を0.005〜0.2重量部、好ましくは0.01〜0.08
重量部の割合で使用する。これらの3成分のいず
れかの使用割合がそれぞれの下限より少ないと、
感光性が低下し当該組成物の不溶化に長い時間を
要することになる。また、上限よりも多くなる
と、当該組成物から形成される皮膜の強度や耐溶
媒溶解性などの低下をもたらし、実用的用途に適
さなくなる。
本発明組成物は、上述の二重結合含有化合物と
成分(a)(b)(c)の組合わせからなる光重合開始剤を必
須成分とするが、必要に応じて高分子結合剤、熱
重合防止剤、可塑剤、着色剤などを併用してよ
い。高分子結合剤は相溶性、皮膜形成性、現像
性、接着性など種々の改善目的を有するものであ
り、その目的に応じて適宜の種類のものを選択す
ればよい。例えば水系溶媒による現像性改善に
は、アクリル酸(またはメタクリル酸)とアクリ
ル酸(またはメタクリル酸)アルキルエステル
(例えばメチルエステル、エチルエステル、ブチ
ルエステル)との共重合体、イタコン酸共重合
体、部分エステル化マレイン酸共重合体、側鎖に
カルボキシル基を有する酸性セルロース変性物、
ポリエチレンオキシド、ポリビニルピロリドンな
どが有用であり、皮膜強度、接着性の改善には、
エピクロロヒドリンと2,2−ビス(4−ヒドロ
キシフエニル)プロパンとのポリエーテル、ポリ
アミドなどが有用である。熱重合防止剤として
は、例えばハイドロキノン、p−メトキシフエノ
ール、ピロガロール、カテコール、2,6−ジ−
t−ブチル−p−クレゾール、β−ナフトールな
どが有用である。可塑剤としては、例えばジオク
チルフタレート、ジドデシルフタレート、ジブチ
ルフタレートなどのフタル酸ジエステル、ジオク
チルアジペート、ジブチルアジベート、ジブチル
セバケートなどの脂肪族二塩基酸エステルなどが
有用である。着色剤としては、例えばフタロシア
ニン系顔料、アゾ系顔料、カーボンブラツク、酸
化チタンなどの顔料、トリフエニルメタン系染
料、アゾ系染料、アントラキノン系染料などが有
用である。
本発明組成物は通常の方法で調製されてよい。
例えば上述の必須成分および任意成分をそのまま
もしくは必要に応じて溶媒(例えばメチルエチル
ケトン、アセトン、シクロヘキサノンなどのケト
ン系溶媒、酢酸エチル、酢酸ブチルなどのエステ
ル系溶媒、トルエン、キシレンなどの芳香族系溶
媒、メチルセロソルブ、エチルセロソルブ、ブチ
ルセロソルブなどのセロソルブ系溶媒、メタノー
ル、エタノール、プロパノールなどのアルコール
系溶媒、テトラヒドロフラン、ジオキサンなどの
エーテル溶媒)を配合し、冷暗所にて例えばニー
ダーあるいはミキサーを使用して混合することに
より調製できる。
[発明の効果]
本発明組成物による感光層は、当該組成物を通
常の方法に従い例えばバーコーターあるいはスピ
ンナーにより支持体上に塗布し、乾燥することに
より形成することができる。なお、形成された感
光層には、その表面保護と酸素による感度低下な
どの悪影響を防止するための公知技術が適用され
てもよい。例えば感光層上に剥離可能な透明カバ
ーシートを設けたり、酸素透過性の小さいロウ状
物質、水溶性またはアルカリ可溶性ポリマーなど
による被覆層を設けることもできる。
上記感光層は、アルゴンイオンレーザー、ヘリ
ウムカドミウムレーザー、クリプトンレーザーな
どのレーザーの他、高圧水銀灯、低圧水銀灯、メ
タルハライドランプ、キセノンランプ、タングス
テンランプなどの紫外線または可視光線を発生す
る汎用の光源を使用して不溶化することができ
る。なお、光照射後の現像は、感光層の組成内容
に応じ、未露光の感光層を溶解させ得る適宜の現
像液を使用して行なえばよい。
このように本発明組成物は、紫外線〜可視光
線、更に詳しくは紫外線〜600nm付近を含む広範
な波長範囲における光に対して高い感度を示すの
で、当該組成物の用途性をより一層拡張すること
ができる。しかも、アルゴンイオンレーザー光の
ような上記波長範囲の可視レーザー光に対して優
れた感光性を示すので、従来のネガフイルムなど
を使用することなく、走査露光装置を用いて画線
の信号を直接的に本発明組成物を設けた被画線
体、例えば平版印刷版、プリント配線基板作製用
レジスト、ホログラムの母型作製用原版などに書
き込むことができ、その実用的効果は非常に大で
ある。
[実施例]
以下、本発明を実施例および比較例により具体
的に説明するが、本発明はこれら実施例に限定さ
れるものではない。
実施例1〜8および比較例1〜8
光重合性組成物の調製
メチルメタクリレート/メタクリル酸共重合体
(三菱レーヨン社製「BR−77」、重量平均分子量
約70000)100部(重量部、以下同様)をメチルエ
チルケトン1000部に溶解させた後、これにペンタ
エリスリトールトリアクリレート100部を溶解さ
せて第1液を得た。
次に、第1表に示す割合で光重合開始剤(成分
(a)〜(c))をメチルセロソルブ300部に溶解させて
第2液とし、その各々の全量を第1液に加え、よ
く攪拌して光重合性組成物の溶液(感光液)を得
た。
感光層(試験板)の作成
アルミニウム支持体上にバーコーターを用いて
塗布量が乾燥時に2g/m2になるように上記感光
液を塗布し、60℃の乾燥器中で3分間乾燥した。
厚さ2.0μmの感光層が得られた。この感光層上
に、バーコーターを用いて、5%ポリビニルアル
コール(ケン化度88%、重合度500)水溶液を厚
さ2.0μmになるように塗布してオーバーコート層
とした。
感度の測定
コダツク社製のステツプタブレツトNo.2(21ス
テツプ)と上記試験板を重ね合わせ、キセノンラ
ンプ(ウシオ電機社製、150W)の光から東芝KL
−49フイルターを通して取り出した490nm前後の
波長の光(光強度4.0mW/cm2)をその上から10
秒間照射した。現像液(無水炭酸ナトリウム10重
量部、ブチルセロソルブ50部およびアニオン系活
性剤3部を水1000部に溶かしたもの)により現像
して、光硬化した段数に基づいて硬化に必要な露
光エネルギーを算出し、その値を「感度」とし
た。結果を第1表に示す。
アルゴンイオンレーザー光による画像形成
出力0.2Wのアルゴンイオンレーザー光源から
光学系を通してビーム径20μに集光したレーザー
光(488nm)を変調器で変調しながら試験板上を
円筒走査(1000rpm、600本/インチ)した。次
にこれを前記の現像液で現像して「アルゴンイオ
ンレーザー光による画像」を得た。その結果を第
1表に示す。
[Industrial Application Field] The present invention relates to a photopolymerizable composition that exhibits high sensitivity to light in a wide wavelength range including ultraviolet rays and visible light. In particular, the present invention relates to a photopolymerizable composition that exhibits excellent photosensitivity to visible laser light such as argon ion laser light. [Prior Art] When reproducing images using photographic techniques, compositions containing photosensitive compounds such as diazonium salts, azides, and quinone diazides, or photopolymerization initiators that act with ultraviolet light are used. A photopolymerizable composition containing the following is used. All of the above-mentioned compounds or compositions have a problem in that they exhibit photosensitivity to ultraviolet light but almost no photosensitivity to visible light. Visible light (wavelength 400~) instead of ultraviolet rays
Examples of photopolymerizable compositions having photosensitivity to 700 nm) include JP-A-57-114139 and JP-A-Sho 57-114139;
Compositions containing a dye and a photosensitizer are known, such as those disclosed in Japanese Patent No. 59-142205. In recent years, with advances in scanning exposure technology using laser light sources, and in particular the practical application of scanning exposure equipment that uses visible laser light, there has been a desire to develop photosensitive materials that are highly sensitive to visible laser light such as argon ion laser light. . However, with conventional photosensitive materials, not only those that are sensitive to ultraviolet rays but also those that are sensitive to visible light do not necessarily have sensitivity to visible laser light. This is not sufficient, and even if recording by laser beam scanning exposure is possible, it requires considerably high output power.
It wasn't economical. [Object of the Invention] An object of the present invention is to provide a photopolymerizable composition that exhibits high sensitivity to light in a wide wavelength range including ultraviolet rays and visible light. In particular, it is an object of the present invention to provide a photopolymerizable composition that exhibits excellent photosensitivity to visible laser light such as argon ion laser light. [Structure of the Invention] According to research conducted by the present inventors, in a system of a photopolymerizable composition containing an addition polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator, , certain xanthene or thioxanthene dyes, diaryliodonium salts,
We have discovered that the desired objective can be achieved by using a combination of compounds having a methylene group at the alpha position of the nitrogen atom, such as N-phenylglycine and N-phenylglycine. That is, according to the present invention, in a photopolymerizable composition containing an addition polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator, the photopolymerization initiator (a) has the following general formula [ ] [In the formula, A is an oxygen atom or a sulfur atom, ) is a double bond, and if Y is a nitrogen atom, the bond with the adjacent carbon atom is a single bond.)
Z is an oxygen atom (in this case, there is a double bond between adjacent carbon atoms), a lower alkoxy group or a lower alkanoyloxy group, R 1 is a lower alkyl group,
In the hydroxy lower alkyl group, lower alkoxy lower alkyl group, di-lower alkylamino lower alkyl group or aryl group, R 2 is a hydrogen atom, a lower alkoxy group or a di-lower alkylamino group.
In addition, Z and R 1 are both combined as -Z-R 1 -, It may also represent ] There is provided a photopolymerizable composition comprising a combination of a compound represented by (b) a diaryliodonium salt, and (c) a compound having a methylene group at the α-position of a nitrogen atom. In the compound represented by the above general formula [] (hereinafter sometimes referred to as component (a)), specific examples of the halogen atom represented by X include chlorine and bromine. Further, examples of the lower alkoxy group represented by Z include methoxy, ethoxy, propoxy, etc., and examples of the lower alkanoyloxy group include acetyloxy, propionyloxy, butyryloxy, etc. Further, specific examples of the lower alkyl group represented by R 1 include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, etc., and specific examples of the hydroxy lower alkyl group include hydroxymethyl. , hydroxyethyl, hydroxypropyl,
Specific examples of lower alkoxy lower alkyl groups include methoxymethyl, methoxyethyl, methoxypropyl, ethoxyethyl, ethoxypropyl, ethoxybutyl, propoxyethyl, propoxypropyl, etc. Specific examples of di-lower alkylamino lower alkyl groups Examples include dimethylaminomethyl, dimethylaminoethyl,
Dimethylaminopropyl, diethylaminoethyl, diethylaminopropyl, diethylaminobutyl, etc., and specific examples of aryl groups include phenyl, xylyl, tolyl, naphthyl, etc.
Specific examples of the lower alkoxy group represented by R 2 include methoxy, ethoxy, propoxy, etc., and specific examples of the di-lower alkylamino group include dimethylamino, diethylamino, etc. In addition,
The compound represented by the general formula [] is a substance generally known in the literature as a xanthene or thioxanthene dye. The above diaryliodonium salt (hereinafter referred to as component (b))
It is also sometimes called. ) is a compound represented by the following general formula []. [In the formula, R 3 to R 6 are the same or different and represent a hydrogen atom, a halogen atom (e.g. chlorine, bromine), a lower alkyl group (e.g. methyl, ethyl, propyl,
t-butyl), a lower alkoxy group (e.g. methoxy, ethoxy, propoxy) or a nitro group, and X - represents a halogen ion (e.g. Cl - , Br - ,
I - ), BF 4 - , PF 6 - , AsF 6 - or SbF 6 - . ] The compound represented by the general formula [] is described in, for example, "Journal of Polymer Science Polymer Symposia" (J.Polym.Sci.Polym.Symp.)
56, pp. 383-395 (1976), for example, diphenyliodonium, bis(p-chlorophenyl)iodonium, ditolyliodinium, bis(p-t-butylphenyl). Examples include iodonium chlorides, bromides, borofluoride salts, hexafluorophosphate salts, hexafluoroarsenate salts, and hexafluoroantimonate salts of iodonium such as iodonium and bis(m-nitrophenyl)iodonium. Examples of the compound having a methylene group at the alpha position of the nitrogen atom (hereinafter sometimes referred to as component (c)) include triethylamine, N-methyldiethanolamine, triethanolamine, N-ethyl-N-benzylaniline, N,N-diethyl-
Examples include p-phenylenediamine and N-phenylglycine, with N-phenylglycine being particularly preferred. The addition-polymerizable compound having an ethylenically unsaturated double bond (hereinafter sometimes referred to as a double-bond-containing compound) is addition-polymerized and cured by the action of a photopolymerization initiator, becoming substantially insolubilized. Any monomer or polymer having an ethylenically unsaturated double bond that provides the following may be used. Specific examples include unsaturated carboxylic acids, esters of unsaturated carboxylic acids and aliphatic polyhydroxy compounds, esters of unsaturated carboxylic acids and aromatic polyhydroxy compounds, and addition reaction products of unsaturated carboxylic acids and epoxides. , esters obtained by esterification reactions of unsaturated carboxylic acids and polyhydric carboxylic acids with polyhydric hydroxy compounds such as aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, and maleic acid. Aliphatic polyhydroxy compounds include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, neopentyl glycol, propylene glycol, dihydric alcohols such as 1,2-butanediol, trimethylolethane, trimethylolpropane, glycerol, etc. Examples include trihydric alcohols, tetrahydric or higher polyhydric alcohols such as pentaerythritol and tripentaerythritol, and polyhydric hydroxycarboxylic acids. Examples of aromatic polyhydroxy compounds include hydroquinone, resorcinol, catechol, and pyrogallol. Epoxides include trimethylolpropane polyglycidyl ether, pentaerythritol polyglycidyl ether, propylene glycol diglycidyl ether, diglycidyl ester of phthalic acid, and a reaction product of epichlorohydrin and 2,2-bis(4-hydroxyphenyl)-propane. There is. Examples of polyvalent carboxylic acids include phthalic acid, isophthalic acid, terephthalic acid, tetrachlorophthalic acid, trimellitic acid, pyromellitic acid, benzophenonedicarboxylic acid, maleic acid, fumaric acid, malonic acid, glutaric acid, adipic acid, sebacic acid, Examples include tetrahydrophthalic acid. Typical examples of esters of unsaturated carboxylic acids and aliphatic polyhydroxy compounds or esters of unsaturated carboxylic acids and aromatic polyhydroxy compounds include acrylics of the above aliphatic polyhydroxy compounds or aromatic polyhydroxy compounds. Acids or esters of methacrylic acid may be mentioned. Typical examples of esters obtained by the esterification reaction of unsaturated carboxylic acids and polyhydric carboxylic acids with polyhydric hydroxy compounds include those shown below. (However, Z' is an acryloyl group or a methacryloyl group.): Z′−(OC 2 H 4 )− 2 OOC−(CH 2 )− 4 COO−(C 2 H 4 O)− 2
Z′ Z′−(OC 2 H 4 )− 3 OOC−CH=CH−COO−(C 2 H 4 O
) − 3 Z′ Other examples of double bond-containing compounds that can be used in the present invention include acrylamide, acrylamides such as ethylenebisacrylamide and hexamethylenebismethacrylamide, methacrylamides such as ethylenebismethacrylamide and hexamethylenebismethacrylamide, and phthalamides. Examples include double bond-containing compounds such as allyl esters such as diallyl acid, diallyl malonate, diallyl fumarate, and triallyl isocyanurate. Regarding double bond-containing compounds as polymers,
Examples of substances having a double bond in the main chain include polyesters obtained by the polycondensation reaction of unsaturated dicarboxylic acids (e.g., maleic acid, fumaric acid) and dihydroxy compounds (e.g., the above-mentioned dihydric alcohols); Examples include polyamides obtained by a polycondensation reaction between a saturated dihydric carboxylic acid and a diamine (eg, ethylenediamine, hexamethylenediamine). Examples of compounds with a double bond in the side chain include dicarboxylic acids with a double bond in the side chain (e.g. itaconic acid, α-methylitaconic acid, γ-methylitaconic acid, propylidenesuccinic acid, α-ethylidene Examples include polyesters obtained by a polycondensation reaction between glutaric acid, ethylidenemalonic acid, propylidenemalonic acid) and the above-mentioned dividroxy compounds, and polyamides obtained by a polycondensation reaction between the above-mentioned diamines. Also usable are polymers obtained by a polymer reaction between a polymer having a functional group such as a hydroxyl group or a halogenated methyl group in a side chain and an unsaturated carboxylic acid such as acrylic acid, methacrylic acid, or crotonic acid. Polymers with functional groups in side chains include polyvinyl alcohol, partially saponified polyvinyl acetate, copolymers of acrylonitrile with styrene, vinyl chloride, vinylidene chloride, etc., and copolymers of acrylonitrile with vinyl acetate. completely saponified products of 2-hydroxyethyl methacrylate and acrylonitrile, methyl methacrylate, butyl methacrylate, styrene, vinylidene chloride, vinyl acetate, etc., poly(4-hydroxystyrene),
Examples include poly(N-methylolacrylamide). Among the above double bond-containing compounds, it is particularly preferable to use monomers of acrylic esters or methacrylic esters. In the composition of the present invention, component (a) is added in an amount of 0.01 to 0.2 parts by weight per 1 part by weight of the double bond-containing compound.
Preferably 0.02 to 0.1 parts by weight, each of components (b) and (c) 0.005 to 0.2 parts by weight, preferably 0.01 to 0.08 parts by weight.
Use parts by weight. If the usage ratio of any of these three components is less than the respective lower limit,
The photosensitivity decreases and it takes a long time to insolubilize the composition. Moreover, if the amount exceeds the upper limit, the strength and solvent solubility resistance of the film formed from the composition will decrease, making it unsuitable for practical use. The composition of the present invention has a photopolymerization initiator consisting of a combination of the above-mentioned double bond-containing compound and components (a), (b), and (c) as an essential component. Polymerization inhibitors, plasticizers, colorants, etc. may be used in combination. The polymeric binder has various purposes for improving compatibility, film-forming properties, developability, adhesion, etc., and an appropriate type may be selected depending on the purpose. For example, to improve developability with an aqueous solvent, copolymers of acrylic acid (or methacrylic acid) and acrylic acid (or methacrylic acid) alkyl esters (such as methyl ester, ethyl ester, butyl ester), itaconic acid copolymers, Partially esterified maleic acid copolymer, acidic cellulose modified product having a carboxyl group in the side chain,
Polyethylene oxide, polyvinylpyrrolidone, etc. are useful for improving film strength and adhesion.
Polyethers and polyamides of epichlorohydrin and 2,2-bis(4-hydroxyphenyl)propane are useful. Examples of thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, pyrogallol, catechol, and 2,6-di-
Useful examples include t-butyl-p-cresol and β-naphthol. Examples of useful plasticizers include phthalic acid diesters such as dioctyl phthalate, didodecyl phthalate, and dibutyl phthalate, and aliphatic dibasic acid esters such as dioctyl adipate, dibutyl adipate, and dibutyl sebacate. Useful colorants include, for example, phthalocyanine pigments, azo pigments, carbon black, titanium oxide pigments, triphenylmethane dyes, azo dyes, anthraquinone dyes, and the like. The composition of the invention may be prepared in a conventional manner.
For example, the above-mentioned essential components and optional components may be used as they are or as needed in a solvent (for example, a ketone solvent such as methyl ethyl ketone, acetone, or cyclohexanone, an ester solvent such as ethyl acetate or butyl acetate, an aromatic solvent such as toluene or xylene, Cellosolve solvents such as methyl cellosolve, ethyl cellosolve, and butyl cellosolve, alcohol solvents such as methanol, ethanol, and propanol, and ether solvents such as tetrahydrofuran and dioxane) are mixed in a cool, dark place using, for example, a kneader or mixer. It can be prepared by [Effects of the Invention] A photosensitive layer based on the composition of the present invention can be formed by applying the composition onto a support according to a conventional method, for example, using a bar coater or a spinner, and drying it. Note that known techniques may be applied to the formed photosensitive layer to protect its surface and prevent adverse effects such as a decrease in sensitivity due to oxygen. For example, a removable transparent cover sheet may be provided on the photosensitive layer, or a coating layer made of a waxy material with low oxygen permeability, a water-soluble or alkali-soluble polymer, etc. may be provided. The photosensitive layer uses general-purpose light sources that generate ultraviolet or visible light such as lasers such as argon ion lasers, helium cadmium lasers, and krypton lasers, as well as high-pressure mercury lamps, low-pressure mercury lamps, metal halide lamps, xenon lamps, and tungsten lamps. It can be made insolubilized by Incidentally, development after light irradiation may be carried out using an appropriate developer capable of dissolving the unexposed photosensitive layer depending on the composition of the photosensitive layer. As described above, the composition of the present invention exhibits high sensitivity to light in a wide range of wavelengths, including ultraviolet rays to visible light, and more specifically, from ultraviolet rays to around 600 nm, so that the applicability of the composition can be further expanded. I can do it. Moreover, it exhibits excellent photosensitivity to visible laser light in the above wavelength range, such as argon ion laser light, so it can directly capture image signals using a scanning exposure device without using conventional negative film. It is possible to write on objects coated with the composition of the present invention, such as lithographic printing plates, resists for producing printed wiring boards, original plates for producing hologram matrices, etc., and the practical effects thereof are very large. . [Examples] Hereinafter, the present invention will be specifically explained using Examples and Comparative Examples, but the present invention is not limited to these Examples. Examples 1 to 8 and Comparative Examples 1 to 8 Preparation of photopolymerizable composition Methyl methacrylate/methacrylic acid copolymer (“BR-77” manufactured by Mitsubishi Rayon Co., Ltd., weight average molecular weight approximately 70,000) 100 parts (parts by weight, hereinafter) (Similar) was dissolved in 1000 parts of methyl ethyl ketone, and then 100 parts of pentaerythritol triacrylate was dissolved therein to obtain a first liquid. Next, a photopolymerization initiator (component
Dissolve (a) to (c)) in 300 parts of methyl cellosolve to prepare a second liquid, add the entire amount of each to the first liquid, and stir well to obtain a solution of the photopolymerizable composition (photosensitive liquid). Ta. Preparation of photosensitive layer (test plate) The above photosensitive solution was coated on an aluminum support using a bar coater so that the coating amount was 2 g/m 2 when dry, and dried for 3 minutes in a dryer at 60°C.
A photosensitive layer with a thickness of 2.0 μm was obtained. On this photosensitive layer, a 5% aqueous solution of polyvinyl alcohol (saponification degree 88%, polymerization degree 500) was applied to a thickness of 2.0 μm using a bar coater to form an overcoat layer. Sensitivity measurement Lay the above test plate on Kodatsu step tablet No. 2 (21 steps) and use the Toshiba KL light from a xenon lamp (manufactured by Ushio Inc., 150W)
Light with a wavelength of around 490 nm (light intensity 4.0 mW/cm 2 ) extracted through a −49 filter is
Irradiated for seconds. Developed with a developer (10 parts by weight of anhydrous sodium carbonate, 50 parts of butyl cellosolve, and 3 parts of anionic activator dissolved in 1000 parts of water), and calculated the exposure energy required for curing based on the number of photocured stages. , and that value was defined as "sensitivity." The results are shown in Table 1. Image formation using argon ion laser light Laser light (488 nm) is focused from an argon ion laser light source with an output of 0.2 W through an optical system to a beam diameter of 20 μm, and is cylindrical scanned (1000 rpm, 600 lines/ inch). Next, this was developed with the developer described above to obtain an "image created by argon ion laser light." The results are shown in Table 1.
【表】
第1表の結果から明らかな如く、光重合開始剤
として成分(a)〜(c)の三者を組合わせて使用する
と、その内の二者の組合わせを採用する場合に比
較して、3〜5倍程度の高感度を示して、その実
用性が高いことを示し、また可視レーザー光に対
して高い感光性を示すことが認められる。
実施例 9
実施例1におけるペンタエリスリトールトリア
クリレート100部の代わりにプロピレングリコー
ルジグリシジルエーテル1モルにアクリル酸2モ
ルを付加した化合物100部を用いる以外は、すべ
て実施例1と同様にして試験板の作成、感度の測
定およびアルゴンイオンレーザー光による画像形
成を行つた。その結果、感度は0.6mJ/cm2であ
り、アルゴンイオンレーザーによる画像は実施例
1で得られたものと同様に鮮明なものであつた。[Table] As is clear from the results in Table 1, when the three components (a) to (c) are used in combination as a photopolymerization initiator, the comparison is made when a combination of two of them is used. It is recognized that the sensitivity is about 3 to 5 times higher, indicating its high practicality, and that it exhibits high photosensitivity to visible laser light. Example 9 A test plate was prepared in the same manner as in Example 1 except that 100 parts of a compound obtained by adding 2 moles of acrylic acid to 1 mole of propylene glycol diglycidyl ether was used instead of 100 parts of pentaerythritol triacrylate in Example 1. We created it, measured its sensitivity, and formed an image using argon ion laser light. As a result, the sensitivity was 0.6 mJ/cm 2 , and the image obtained by the argon ion laser was as clear as that obtained in Example 1.
Claims (1)
可能な化合物と光重合開始剤を含む光重合性組成
物において、該光重合開始剤が、 (a) 下記一般式[] [式中、Aは酸素原子または硫黄原子、Xは水
素原子またはハロゲン原子、Yは炭素原子または
窒素原子(ただし、Yが炭素原子である場合には
隣接する炭素原子との間(点線で示した箇所)は
二重結合であり、Yが窒素原子である場合には隣
接する上記炭素原子との間は一重結合である。)、
Zは酸素原子(この場合隣接する炭素原子との間
は二重結合である。)、低級アルコキシ基または低
級アルカノイルオキシ基、R1は低級アルキル基、
ヒドロキシ低級アルキル基、低級アルコキシ低級
アルキル基、ジ低級アルキルアミノ低級アルキル
基またはアリール基、R2は水素原子、低級アル
コキシ基またはジ低級アルキルアミノ基である。
なお、ZとR1は両者合して−Z−R1−として、 を表わすこともある。] で示される化合物、 (b) ジアリールヨードニウム塩、および (c) 窒素原子のα位にメチレン基を有する化合物 の組合わせからなることを特徴とする光重合性組
成物。 2 成分(c)がN−フエニルグリシン、トリエチル
アミンおよびトリエタノールアミンからなる群か
ら選ばれる上記第1項の組成物。[Scope of Claims] 1. A photopolymerizable composition comprising an addition polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator, wherein the photopolymerization initiator (a) has the following general formula [] [In the formula, A is an oxygen atom or a sulfur atom, ) is a double bond, and if Y is a nitrogen atom, the bond with the adjacent carbon atom is a single bond.)
Z is an oxygen atom (in this case, there is a double bond between adjacent carbon atoms), a lower alkoxy group or a lower alkanoyloxy group, R 1 is a lower alkyl group,
In the hydroxy lower alkyl group, lower alkoxy lower alkyl group, di-lower alkylamino lower alkyl group or aryl group, R 2 is a hydrogen atom, a lower alkoxy group or a di-lower alkylamino group.
In addition, Z and R 1 are both combined as -Z-R 1 -, It may also represent ] A photopolymerizable composition comprising a combination of a compound represented by (b) a diaryliodonium salt, and (c) a compound having a methylene group at the α-position of a nitrogen atom. 2. The composition of item 1 above, wherein component (c) is selected from the group consisting of N-phenylglycine, triethylamine and triethanolamine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18886786A JPS6343133A (en) | 1986-08-11 | 1986-08-11 | High-sensitivity photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18886786A JPS6343133A (en) | 1986-08-11 | 1986-08-11 | High-sensitivity photopolymerizable composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6343133A JPS6343133A (en) | 1988-02-24 |
JPH0522229B2 true JPH0522229B2 (en) | 1993-03-26 |
Family
ID=16231256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18886786A Granted JPS6343133A (en) | 1986-08-11 | 1986-08-11 | High-sensitivity photopolymerizable composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6343133A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01126302A (en) * | 1987-11-10 | 1989-05-18 | Nippon Paint Co Ltd | Photopolymerizable composition |
JPH01238656A (en) * | 1988-03-18 | 1989-09-22 | Nippon Paint Co Ltd | High sensitive photopolymerizable composition |
JPH02238002A (en) * | 1989-03-10 | 1990-09-20 | Nippon Paint Co Ltd | Photosensitive composition |
-
1986
- 1986-08-11 JP JP18886786A patent/JPS6343133A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6343133A (en) | 1988-02-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0211615B1 (en) | Photopolymerisable composition | |
JP3365434B2 (en) | Photopolymerizable composition and photosensitive material | |
EP0276016B1 (en) | Photopolymerizable composition | |
JPH0469381B2 (en) | ||
JPS5829803A (en) | Photopolymerizable composition | |
US5738974A (en) | Photopolymerizable composition and photosensitive lithographic printing plate | |
JPS62143043A (en) | Photopolymerizable composition | |
JPS6231844A (en) | Lithographic plate material | |
JPH0522228B2 (en) | ||
JPH0255446B2 (en) | ||
JPH07225474A (en) | Photopolymerizable composition | |
JP2539810B2 (en) | High-sensitivity photopolymerizable composition | |
JP2758737B2 (en) | Photopolymerizable composition and photosensitive lithographic printing plate | |
JPH0522229B2 (en) | ||
JP3010880B2 (en) | Photopolymerizable composition | |
JPS63278909A (en) | Photopolymerizable composition | |
JP3324266B2 (en) | Photopolymerizable composition and photosensitive material | |
JPH06301208A (en) | Photopolymerizable composition | |
JPH08297367A (en) | Photopolymerizable composition | |
JP3508434B2 (en) | Photopolymerizable composition and photosensitive lithographic printing plate using the same | |
JPH08179504A (en) | Photopolymerizable composition | |
JPH10195118A (en) | Photopolymerizable composition | |
JPH0876377A (en) | Photopolymeerizable composition | |
JP3552437B2 (en) | Photopolymerizable composition | |
JP3424368B2 (en) | Photopolymerizable composition |