JPH05221012A - Manufacture of ion flow electrostatic recording head - Google Patents

Abstract

PURPOSE:To enhance image quality by obtaining uniform discharge characteristics by a method wherein the manufacturing process is shortened and the scattering of the ion generation is prevented from occurring. CONSTITUTION:Dielectric paste consisting of high dielectric constant ceramic powder as filler and silicone varnish as binder is applied on an insulating substrate 2 and first electrodes 3. After the dielectric paste is semi-cured, second electrode 6 is joined on the tacky fixing surface 5 or semi-cured dielectric paste surface. Finally, by fully curing the dielectric paste, the second electrode 6 is fixed onto the dielectric layer 4.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an ion flow electrostatic recording head used in an electrostatic recording apparatus for performing electrostatic printing or copying.

[0002]

2. Description of the Related Art Generally, in electrostatic printing or the like, for example, a high current density ion is generated and selectively extracted and applied to a member to be charged, and the member to be charged is imagewise charged. Electronic recording devices are known.

An ion flow electrostatic recording head used in this electrostatic recording apparatus has a dielectric layer and a plurality of first electrodes fixed to one side of the dielectric layer and extending in a first direction, and the dielectric layer. A plurality of second electrodes fixed to the other side of the first electrode and extending in a direction intersecting the extension direction of the first electrode, and the plurality of first electrodes and the plurality of second electrodes form a matrix.

By alternately applying a high voltage between the first electrode and the second electrode corresponding to the selected portion of this matrix, positive and negative ions are generated in the vicinity of the second electrode facing the portion. Occurs. The generated ions can be selectively extracted to charge the member to be charged. Therefore, electrostatic recording by dots can be performed by selectively driving the electrodes having a matrix structure.

The material forming the dielectric layer and the insulating layer of the ion flow electrostatic recording head used here is required not to have a dielectric breakdown even at a high voltage applied for ion extraction during operation. .. In addition, the dielectric layer needs to have a high dielectric constant because it needs to have a thickness that efficiently generates ions and can withstand dielectric breakdown.

Therefore, as a material for this kind of dielectric layer, for example, Japanese Patent Publication No. 57-501348 discloses a sheet-shaped mica. Further, in JP-A-2-153760, a paste in which titanium oxide powder is dispersed in a silicone-modified polyester alkyd resin is provided, and the paste is screen-printed on the insulating substrate and the first electrode of the ion flow electrostatic recording head. It is disclosed that after the application, the solvent in the applied paste is evaporated and cured.

The conditions for the adhesive to bond the dielectric layer and the second electrode are heat resistance and dielectric that can withstand the heat generated by high voltage application during operation of the ion flow electrostatic recording head. Assembling an ion flow electrostatic recording head, as well as flexibility required to withstand the stress generated by the difference in the coefficient of thermal expansion between the layer and the second electrode, and corona discharge resistance that is strong against discharge due to ion generation. It is required to have a high adhesive strength capable of withstanding the tensile shearing force applied during the work.

And, as an adhesive of this kind, a special table of Sho 5
7-501348 discloses a silicone pressure sensitive adhesive, and JP-B-61-29274 discloses an epoxy adhesive.

[0009]

[Problems to be Solved by the Invention] Tokuhyo Sho 57-5013
When an organic polysiloxane-based or acrylic-based pressure-sensitive adhesive is used as a means for fixing the second electrode to the dielectric layer as in Japanese Patent Laid-Open No. 48-48, only the adhesive force is used and the surface of the dielectric layer and the second electrode are It is designed to be fixed to the surface.

However, since the adhesion area of the surface of the dielectric layer and each second electrode is a very small area of about several square millimeters, the surface of the dielectric layer and the second surface of the second layer during the assembly work of the ion flow electrostatic recording head. When a tensile shearing force acts on the adhesive surface between the surface of the electrode or when heat is generated during the use of the ion flow electrostatic recording head, the surface of the dielectric layer and the second
Adhesive strength may be insufficient to fix the adhesion surface of a small area between the surface of the electrode and the position of the adhesive so that it will not be displaced only by the adhesive force of the adhesive, and the durability of the entire ion flow electrostatic recording head may be insufficient. There is.

Therefore, as disclosed in, for example, Japanese Examined Patent Publication No. 61-29274, an epoxy adhesive having a large adhesive force and a strong heat resistance, or an anaerobic acrylic adhesive or a silicone adhesive is used. Is considered.

However, since each of the above adhesives has a low dielectric constant with respect to the dielectric layer, even if any of the above adhesives is used, the generation of ions is prevented during the operation of the ion flow electrostatic recording head. Or, there is a possibility that variations in the generation of ions will occur due to variations in the electrical characteristics.

Therefore, in order to prevent the generation of ions during the operation of such an ion flow electrostatic recording head and to prevent the variation of the ion generation due to the variation of the electrical characteristics, the ion flow electrostatic recording head is disposed in the opening of the second electrode in an exposed state. It is necessary to mechanically remove the pressure-sensitive adhesive or adhesive that is present, or to completely remove it by dissolving it with alcohol, ether, or a silicone dissolving agent.

However, since it is difficult to remove the adhesive or the adhesive from a large number of minute openings formed in the second electrode, there is a possibility that uneven removal or removal residue may occur in each opening of the second electrode. There is. Further, it takes a long time to completely remove the adhesive in each opening of the second electrode,
There is also a problem that its work efficiency is poor.

The present invention has been made in view of the above circumstances, and an object thereof is to enable the second electrode to be fixed to the dielectric layer without using an adhesive, and to bond the second electrode in each opening. A method for manufacturing a high-quality ion flow electrostatic recording head that can shorten the manufacturing process by omitting the work of removing the agent layer, and can prevent the dispersion of ion generation and obtain uniform discharge characteristics. To provide.

[0016]

According to the present invention, a plurality of first electrodes extending in a substantially straight line in the same direction on an insulating substrate and arranged side by side substantially in parallel, and a direction intersecting these first electrodes. A plurality of second electrodes extending in the same direction and forming a matrix together with the first electrode, and having openings formed at portions corresponding to the matrix, and a side opposite to the first electrode with respect to the second electrode. A third electrode having an opening formed in a portion corresponding to the matrix, a dielectric layer provided between the first electrode and the second electrode, the second electrode and the third electrode.
An ion flow electrostatic recording head manufacturing method for manufacturing a main body of an ion flow electrostatic recording head provided with an electrode and an insulating layer having an opening formed in a portion corresponding to the matrix, A dielectric paste laminating step of filling high dielectric constant ceramic powder and applying a dielectric paste using a silicone varnish as a binder on the insulating substrate and on the first electrode laminated on the insulating substrate; A second electrode bonding step of bonding the second electrode onto the sticky adhesive surface of the surface of the semi-cured dielectric paste after semi-curing the body paste, and after the bonding of the second electrode, the dielectric And a second electrode fixing step of fixing the second electrode on the dielectric layer by completely curing the paste.

[0017]

[Operation] It has excellent heat resistance, corona discharge resistance, electrical insulation, chemical resistance, etc. during the manufacturing of the ion flow electrostatic recording head body, and in the semi-cured state it has stronger adhesion than the silicone pressure sensitive adhesive. Using a silicone varnish as a binder, a dielectric paste filled with high-dielectric-constant ceramic powder is applied on the insulating substrate and the first electrode, and the second electrode is fixed when the dielectric paste is in a semi-cured state. By completely curing the dielectric paste, the adhesive layer that prevents the generation of ions is eliminated between the dielectric layer and the second electrode, and the step of removing the adhesive in the opening of the second electrode becomes unnecessary. Therefore, it is possible to prevent uneven removal and residual removal in the opening of the second electrode, shorten the manufacturing time, easily generate ions, and uniform the discharge to improve the image quality. Further, the dielectric layer formed by completely curing the dielectric paste provides excellent corrosion resistance against heat generated when ions are generated, corona discharge, or an etching solution used in a later step.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS. 1A and 1B show an ion flow electrostatic recording head 1 used in an electrostatic recording device.
2 shows a schematic configuration of a main part of the above, and 2 is an insulating substrate of the ion flow electrostatic recording head 1.

A plurality of first electrodes 3 for ion generation are provided on the insulating substrate 2. First of these multiple
The electrodes 3 ... Are arranged substantially parallel to each other in one direction. Further, a dielectric layer 4 is provided on the insulating substrate 1 on the side where the first electrodes 3 are arranged side by side in a state of embedding these first electrodes 3.

A plurality of second electrodes 6 are fixed to the fixing surface 5 on the surface of the dielectric layer 4. In this case, the plurality of second electrodes 6 are arranged side by side on the surface of the dielectric layer 4 opposite to the insulating substrate 2 in a direction intersecting with the first electrodes 3 ,. A matrix is composed of the electrodes 6 ... Then, the second electrodes 6 ... Are respectively formed with openings 6a ..

On the side of the dielectric layer 4 where the second electrodes 6 are arranged in parallel, an insulating layer 7 is provided in a state of embedding these second electrodes 6. The insulating layer 7 has a second electrode 6 ...
The openings 7a ... Are formed at portions corresponding to the openings 6a.

Further, the surface of the insulating layer 7 has a strip-shaped third layer.
An electrode 8 is provided. Openings 8a are formed in the third electrode 8 at positions corresponding to the matrix of the first electrodes 3 ... And the second electrodes 6. The openings 8a of the third electrode 8 are the openings 7a of the insulator layer 7 and the second electrode 6.
The ion flow passage opening 9 of the ion flow electrostatic recording head 1 is formed in communication with the openings 6a of.

During operation of the ion flow electrostatic recording head 1, the matrix between the first electrodes 3 ... And the second electrodes 6 ... Is appropriately selected based on the print signal, and the matrix corresponding to the selected matrix portion is selected. An alternating voltage is applied between the first electrode 3 and the second electrode 6. As a result, positive and negative ions are generated in the vicinity of the openings 6a of the second electrodes 6 corresponding to the selected matrix portion. At this time, a bias voltage is applied between the second electrode 6 ...
The ions are extracted from the ions generated in the vicinity of the openings 6a of the electrodes 6 ... Then, the extracted ions pass through the openings 7a of the insulator layer 7 and the openings 8a of the third electrode 8 to locally charge a dielectric drum (not shown). Therefore, a dot latent image can be formed on the dielectric drum by selectively driving the first electrode 3 ... And the second electrode 6 ...

Next, a method of manufacturing the ion flow electrostatic recording head 1 shown in FIGS. 1A and 1B will be described in detail.
First, the first electrodes 3 ... Are formed on the insulating substrate 2. In this case, the insulating substrate 2 is, for example, a synthetic resin material having a thickness of about 100 μm, for example, a flexible substrate (FP such as polyimide).
C) is used. Then, a thickness 9 is formed on the insulating substrate 2.
After the copper foil having a thickness of μm is adhered, patterning is performed by etching to form the first electrodes 3 ...

Further, after forming the first electrodes 3 on the insulating substrate 2, the dielectric layer 4 is formed between the patterns of the first electrodes 3 on the insulating substrate 2 and on the first electrodes 3. When forming the dielectric layer 4, a silicone varnish as a binder is previously used, for example, ES-1001N (trade name of Shin-Etsu Chemical Co., Ltd.).
Then, a high-dielectric-constant ceramic powder, for example, titanium oxide powder, is gradually added to the varnish with a diluting solvent, carbitol acetate, and kneaded with a kneader such as an electric stirrer or a ball mill to form a paste. Create the dielectric paste. Then, this dielectric paste is applied to the insulating substrate 2 between the patterns of the first electrodes 3 and the first electrodes 3 so as to have a film thickness of 30 μm by a screen printing method (dielectric paste laminating step).

Further, after applying the dielectric paste, 100
As shown in FIG. 2 (A), by heating for 5 minutes at ℃, the solvent contained in the dielectric paste is volatilized and removed, and the silicone resin is semi-cured to make the dielectric layer 4 having adhesiveness on the surface. To form.

Subsequently, the fixed surface 5 on the surface of the dielectric layer 4
The second electrodes 6 are fixed on the top. The second electrodes 6 are formed by previously etching a stainless steel foil having a thickness of 30 μm by photo-etching or the like to form a plurality of second electrodes 6 ...
The electrode patterns of ... Are formed by patterned electrode plates. The electrode plate of the second electrodes 6 ... Is in a semi-cured state in a state where the openings 6a of the second electrodes 6 are aligned with the plurality of first electrodes 3 as shown in FIG. 2B. It is put on the fixed surface 5 of the dielectric layer 4 and bonded by pressure bonding (second electrode bonding step).

Further, after the dielectric layer 4 and the second electrode 6 are joined, the dielectric layer 4 is heated at 150 ° C. for 5 hours, whereby the dielectric paste is completely hardened, and as shown in FIG. As shown, the second electrodes 6 ... Are fixed on the dielectric layer 4 (second electrode fixing step).

Next, an insulating layer 7 is formed on the dielectric layer 4 inside the second electrodes 6 ... And the openings 6a of the second electrodes 6 ... For example, a photosensitive insulating layer having a thickness of about 100 μm. The film (solder resist) is vacuum laminated. Further, the photosensitive insulating film is subjected to photoetching treatment such as exposure and development, and the openings 6 of the plurality of second electrodes 6 ...
An opening 7a corresponding to a ... Is formed.

Further, on the insulator layer 7 thus formed, for example, a stainless foil having a thickness of about 30 μm is provided with openings 8a ... Corresponding to the openings 6a ... of the second electrodes 6 ... The electrode 8 is joined. In this case, the third electrode 8 is heat-cured by applying an adhesive to the portion of the third electrode 8 on the side of the joint surface with the insulating layer 7 except the openings 8a. The opening 8a of the third electrode 8 is formed in the opening 6 of the second electrode 6.
The ion flow electrostatic recording head 1 is manufactured by positioning and superposing in a state corresponding to a.

Although the adhesive was used as a means for laminating the third electrode 8 on the insulator layer 7, a double-sided tape may be used. Further, the third electrode 8 simply stacked may be attached to the insulator layer 7 with a single-sided tape.

Therefore, in the above structure, the silicone varnish contained as a binder in the dielectric paste forming the dielectric layer 4 of the ion flow electrostatic recording head 1 is a tackifier (adhesiveness) of a silicone adhesive. Since it has stronger adhesiveness than the silicone-based pressure-sensitive adhesive in the semi-cured state as used as a (giving) component,
When the dielectric layer 4 is in a semi-cured state, the second electrodes 6 ...
After that, by completely curing the dielectric paste of the dielectric layer 4, the second electrodes 6 can be firmly fixed onto the fixing surface 5 of the dielectric layer 4.

Therefore, when the second electrodes 6 ... Are fixed to the dielectric layer 4, the adhesive layer that hinders the generation of ions, which has been conventionally required, is omitted, and the openings 6a. Since the step of removing the adhesive of can be eliminated,
The manufacturing time of the ion flow electrostatic recording head 1 can be shortened.

Further, since there is no risk of uneven removal or residual removal of the adhesive in the openings 6a of the second electrodes 6 ..., Ions are generated during the operation of the ion flow electrostatic recording head 1. It is possible to obtain a uniform discharge and improve the image quality of an image.

The silicone varnish contained as a binder in the dielectric paste forming the dielectric layer 4 of the ion flow electrostatic recording head 1 generally has heat resistance, corona discharge resistance, electrical insulation and resistance. Since it has excellent chemical properties, the dielectric layer 4 formed by completely curing the dielectric paste provides excellent durability against heat generation and corona discharge when ions are generated during operation of the ion flow electrostatic recording head 1. In addition to being able to obtain, it is possible to obtain excellent corrosion resistance with respect to the etching liquid used in the subsequent process at the time of manufacturing the ion flow electrostatic recording head 1.

Next, a second embodiment of the present invention will be described. This is a modification of the dielectric paste forming the dielectric layer 4 of the ion flow electrostatic recording head 1.
That is, in this example, SR2406 (trade name of Toray Dow Corning Co., Ltd.) was used as the silicone varnish of the binder, toluene was used as the diluting solvent, and titanium oxide powder was added as the high dielectric constant ceramic powder in an amount of 70 wt% with respect to the binder and kneaded. Then, a paste-like dielectric paste is prepared.

Then, this dielectric paste is applied to the first electrode 3
After being applied to the insulating substrate 2 and the first electrode 3 between the patterns by a screen printing method so as to have a film thickness of 30 μm, it is heated at 100 ° C. for 1 hour to volatilize the solvent contained in the dielectric paste. , And the silicone resin is semi-cured to form the adhesive sticking surface 5 on the surface of the dielectric paste.

Next, as shown in FIG. 3 (A), SRX67 is formed on the bonding surface of the second electrodes 6 ...
(Toray Dow Corning's trade name) 0.5 with toluene
The hardening accelerator 11 diluted to wt% is applied.

Further, after the applied curing accelerator 11 is dried at room temperature, the curing accelerator 11 for the second electrodes 6 ...
The coated surface is covered with the dielectric layer 4 and pressure-bonded, and the second electrodes 6 ... Are bonded to the fixed surface 5 of the dielectric layer 4 as shown in FIG. In this state, the semi-hardened dielectric paste is heated at 150 ° C. for 2 hours to be completely hardened, whereby the second electrodes 6 are fixed on the dielectric layer 4. The other steps are the same as those in the first embodiment.

Therefore, in the case of the above-mentioned structure, the fixing surface 5 of the dielectric layer 4 can be cured in a short time by contact with the curing accelerator 11 applied to the second electrodes 6. , The second electrode 6 ... Is joined to the fixed surface 5 of the dielectric layer 4 and, until the semi-cured dielectric layer 4 is completely cured, an external force is applied to the second electrode 6 ... Is less likely to move and shift from the proper fixing position.

Further, as in the first embodiment, the adhesive layer for preventing the generation of ions is not required between the dielectric layer 4 and the second electrodes 6 ... At the same time, the step of removing the adhesive is not required. Therefore, the manufacturing time of the ion flow electrostatic recording head 1 can be shortened, ions can be easily generated during the operation of the ion flow electrostatic recording head 1, and uniform discharge can be obtained, so that a high image quality can be obtained. Quality can be improved.

The present invention is not limited to the above embodiment. For example, the dielectric paste is a paste-like paste in which inorganic fine powder having a large dielectric constant is dispersed in a silicone varnish containing a solvent, and as the dielectric powder, besides titanium oxide, barium titanate, lead zirconate, etc. Can be used.

Further, as the organic solvent for dissolving the silicone varnish of the organic polymer material, carbitol acetate,
Other than toluene, an organic solvent such as xylene can be used. Further, it goes without saying that various modifications can be made without departing from the scope of the present invention.

[0044]

According to the present invention, a high dielectric constant ceramic powder is filled and a dielectric paste containing silicone varnish as a binder is applied on an insulating substrate and a first electrode laminated on the insulating substrate. Body paste lamination process,
After the dielectric paste is semi-cured, the second electrode bonding step of bonding the second electrode on the sticky fixing surface of the semi-cured dielectric paste surface, and after the bonding of the second electrode, the dielectric paste is Since the second electrode fixing step of completely curing and fixing the second electrode on the dielectric layer is provided, the second electrode can be fixed to the dielectric layer without using an adhesive. The manufacturing process can be shortened by omitting the work of removing the adhesive layer in each opening, and the uniform discharge characteristics can be obtained by preventing the dispersion of the ion generation, which improves the image quality of the image. Can be planned.

[Brief description of drawings]

FIG. 1 shows a first embodiment of the present invention,
FIG. 1A is a vertical cross-sectional view of a main part showing a schematic configuration of an ion flow electrostatic recording head, and FIG. 1B is a cross-sectional perspective view of the ion flow electrostatic recording head.

2A and 2B are views for explaining a manufacturing operation of an ion flow electrostatic recording head, in which FIG. 2A is a longitudinal sectional view of a main part showing a state where a dielectric paste is laminated on a first electrode and an insulating substrate;
(B) is a longitudinal cross-sectional view of a main part showing a bonding step of the second electrode for bonding the second electrode on the dielectric layer, and (C) is a main part showing a state in which the second electrode is fixed to the dielectric layer. FIG.

FIG. 3 shows a second embodiment of the present invention,
(A) is a longitudinal cross-sectional view of a main part showing a bonding step of the second electrode for bonding the second electrode on the dielectric layer, and (B) is a main part showing a state in which the second electrode is fixed to the dielectric layer. FIG.

[Explanation of symbols]

2 ... Insulating substrate, 3 ... 1st electrode, 4 ... Dielectric layer, 5 ... Fixed surface, 6 ... 2nd electrode, 6a, 7a, 8a ... Opening part, 7 ... Insulator layer, 8 ... 3rd electrode.

Claims (1)

[Claims] 1. A plurality of first electrodes that extend in a substantially straight line in the same direction on an insulating substrate and are arranged in parallel in a substantially parallel manner, and a plurality of first electrodes that extend in a direction intersecting the first electrodes. A matrix is formed with one electrode, and a plurality of second electrodes each having an opening formed at a portion corresponding to the matrix, and a plurality of second electrodes.
A third electrode, which is disposed on the opposite side of the first electrode with respect to the electrode and has an opening formed in a portion corresponding to the matrix.
An electrode, a dielectric layer provided between the first electrode and the second electrode, and a dielectric layer provided between the second electrode and the third electrode,
An ion flow electrostatic recording head manufacturing method for manufacturing a body of an ion flow electrostatic recording head comprising an insulator layer having an opening formed in a portion corresponding to the matrix, in which a high dielectric constant ceramic powder is filled. A dielectric paste laminating step of applying a dielectric paste using a silicone varnish as a binder on the insulating substrate and on the first electrode laminated on the insulating substrate, and after semi-curing the dielectric paste. A second electrode bonding step of bonding the second electrode on the tacky sticking surface of the semi-cured dielectric paste surface, and after the bonding of the second electrode, the dielectric paste is completely hardened. The second layer on the dielectric layer
A method of manufacturing an ion flow electrostatic recording head, comprising a second electrode fixing step of fixing an electrode.