JPH0521863Y2 - - Google Patents

Info

Publication number
JPH0521863Y2
JPH0521863Y2 JP1521587U JP1521587U JPH0521863Y2 JP H0521863 Y2 JPH0521863 Y2 JP H0521863Y2 JP 1521587 U JP1521587 U JP 1521587U JP 1521587 U JP1521587 U JP 1521587U JP H0521863 Y2 JPH0521863 Y2 JP H0521863Y2
Authority
JP
Japan
Prior art keywords
coating
center
semiconductor wafer
detectors
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1521587U
Other languages
English (en)
Japanese (ja)
Other versions
JPS63124737U (h
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1521587U priority Critical patent/JPH0521863Y2/ja
Publication of JPS63124737U publication Critical patent/JPS63124737U/ja
Application granted granted Critical
Publication of JPH0521863Y2 publication Critical patent/JPH0521863Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
JP1521587U 1987-02-04 1987-02-04 Expired - Lifetime JPH0521863Y2 (h)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1521587U JPH0521863Y2 (h) 1987-02-04 1987-02-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1521587U JPH0521863Y2 (h) 1987-02-04 1987-02-04

Publications (2)

Publication Number Publication Date
JPS63124737U JPS63124737U (h) 1988-08-15
JPH0521863Y2 true JPH0521863Y2 (h) 1993-06-04

Family

ID=30805941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1521587U Expired - Lifetime JPH0521863Y2 (h) 1987-02-04 1987-02-04

Country Status (1)

Country Link
JP (1) JPH0521863Y2 (h)

Also Published As

Publication number Publication date
JPS63124737U (h) 1988-08-15

Similar Documents

Publication Publication Date Title
KR100260588B1 (ko) 레지스트 처리장치 및 기판처리장치 및 피처리체의 반송방법
JPH06103687B2 (ja) 回転式表面処理方法および回転式表面処理における処理終点検出方法、ならびに回転式表面処理装置
JPH0355550B2 (h)
JPH0610775B2 (ja) 円形基板の位置決め装置
US5168304A (en) Exposure apparatus
JPH0521863Y2 (h)
US4865491A (en) Apparatus for positioning a semiconductor wafer
JP3200326B2 (ja) 円板状被処理物の移載方法及び移載装置
US5159202A (en) Wafer shape detecting method
KR20010030429A (ko) 레지스트 도포 현상 장치 및 하층 반사 방지막의 엣지컷트 방법
US5820677A (en) Coater
JP3763619B2 (ja) 基板回転保持装置および回転式基板処理装置
JPH0625013Y2 (ja) ウエハ位置決め装置
CN112558418A (zh) 光刻胶涂布装置
JPH06124885A (ja) 回転処理装置
JP3009243B2 (ja) Ｖノッチウエハの位置決め機構
JP2004140057A (ja) ウエハ位置決め装置
JPH09167750A (ja) 基板端縁部の洗浄装置及び洗浄方法
JPH05259050A (ja) 半導体基板のスピンコーティング方法および装置
JPS6130282Y2 (h)
JPH02219213A (ja) レジスト塗布装置
JPH0441285Y2 (h)
KR20000000515U (ko) 이물질 감지 기능이 구비된 액정표시소자용 코팅장치
JPH051067Y2 (h)
JPH0936205A (ja) 基板の切欠き検出装置および基板処理装置