JPH0519139B2 - - Google Patents

Info

Publication number
JPH0519139B2
JPH0519139B2 JP62265554A JP26555487A JPH0519139B2 JP H0519139 B2 JPH0519139 B2 JP H0519139B2 JP 62265554 A JP62265554 A JP 62265554A JP 26555487 A JP26555487 A JP 26555487A JP H0519139 B2 JPH0519139 B2 JP H0519139B2
Authority
JP
Japan
Prior art keywords
resist composition
alkyl
substituted
acid
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62265554A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63139343A (ja
Inventor
Rosu Buransuborudo Uiriamu
Iiru Konrei Uiraado
Marei Kuroketsuto Deiru
Eren Iwamoto Nanshii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS63139343A publication Critical patent/JPS63139343A/ja
Publication of JPH0519139B2 publication Critical patent/JPH0519139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62265554A 1986-10-23 1987-10-22 レジスト組成物 Granted JPS63139343A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92265786A 1986-10-23 1986-10-23
US922657 1986-10-23

Publications (2)

Publication Number Publication Date
JPS63139343A JPS63139343A (ja) 1988-06-11
JPH0519139B2 true JPH0519139B2 (enExample) 1993-03-15

Family

ID=25447393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62265554A Granted JPS63139343A (ja) 1986-10-23 1987-10-22 レジスト組成物

Country Status (3)

Country Link
EP (1) EP0264908B1 (enExample)
JP (1) JPS63139343A (enExample)
DE (1) DE3751745T2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68926019T2 (de) * 1988-10-28 1996-10-02 Ibm Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
EP0378156A3 (en) * 1989-01-09 1992-02-26 Nitto Denko Corporation Positively photosensitive polyimide composition
US5212047A (en) * 1990-04-10 1993-05-18 E. I. Du Pont De Nemours And Company Resist material and process for use
US5262281A (en) * 1990-04-10 1993-11-16 E. I. Du Pont De Nemours And Company Resist material for use in thick film resists
US5206317A (en) * 1990-04-10 1993-04-27 E. I. Du Pont De Nemours And Company Resist material and process for use
US5093221A (en) * 1990-04-10 1992-03-03 E. I. Du Pont De Nemours And Company Process of making colored images using aqueous processable photosensitive elements
US5071731A (en) * 1990-04-10 1991-12-10 E. I. Du Pont De Nemours And Company Aqueous processable photosensitive element with an elastomeric layer
US5252427A (en) * 1990-04-10 1993-10-12 E. I. Du Pont De Nemours And Company Positive photoresist compositions
US5145764A (en) * 1990-04-10 1992-09-08 E. I. Du Pont De Nemours And Company Positive working resist compositions process of exposing, stripping developing
US5219711A (en) * 1990-04-10 1993-06-15 E. I. Du Pont De Nemours And Company Positive image formation utilizing resist material with carbazole diazonium salt acid generator
US5120633A (en) * 1990-04-10 1992-06-09 E. I. Du Pont De Nemours And Company Resist material for use in thick film resists
US4985332A (en) * 1990-04-10 1991-01-15 E. I. Du Pont De Nemours And Company Resist material with carbazole diazonium salt acid generator and process for use
JPH04149445A (ja) * 1990-10-12 1992-05-22 Mitsubishi Electric Corp ポジ型感光性組成物
EP0659781A3 (de) * 1993-12-21 1995-09-27 Ciba Geigy Ag Maleinimidcopolymere, insbesonder für Photoresists.
DE4414896A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Positiv arbeitendes strahlungempfindliches Gemisch
US6010826A (en) * 1994-10-13 2000-01-04 Nippon Zeon Co., Ltd. Resist composition
US6309795B1 (en) 1996-01-26 2001-10-30 Nippon Zeon Co., Ltd. Resist composition
JP6213135B2 (ja) * 2013-10-17 2017-10-18 東ソー株式会社 ｔｒａｎｓ−スチルベン−Ｎ−置換マレイミド共重合体及びそれを用いた位相差フィルム
EP3769156B1 (en) 2018-03-23 2024-03-20 Merck Patent GmbH Negative-working ultra thick film photoresist

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4469774A (en) * 1983-03-28 1984-09-04 E. I. Du Pont De Nemours And Company Positive-working photosensitive benzoin esters
JPS6336240A (ja) * 1986-07-28 1988-02-16 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン レジスト構造の作成方法

Also Published As

Publication number Publication date
DE3751745T2 (de) 1996-09-26
EP0264908A3 (en) 1990-07-11
EP0264908B1 (en) 1996-03-20
JPS63139343A (ja) 1988-06-11
EP0264908A2 (en) 1988-04-27
DE3751745D1 (de) 1996-04-25

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