JPH0518865B2 - - Google Patents
Info
- Publication number
- JPH0518865B2 JPH0518865B2 JP23453382A JP23453382A JPH0518865B2 JP H0518865 B2 JPH0518865 B2 JP H0518865B2 JP 23453382 A JP23453382 A JP 23453382A JP 23453382 A JP23453382 A JP 23453382A JP H0518865 B2 JPH0518865 B2 JP H0518865B2
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- formula
- film
- solution
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920001721 polyimide Polymers 0.000 claims description 46
- 239000004642 Polyimide Substances 0.000 claims description 29
- 229920000642 polymer Polymers 0.000 claims description 27
- 229920002492 poly(sulfone) Polymers 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 10
- 239000009719 polyimide resin Substances 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000006157 aromatic diamine group Chemical group 0.000 claims 1
- 229920001169 thermoplastic Polymers 0.000 claims 1
- 239000004416 thermosoftening plastic Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 22
- 239000000243 solution Substances 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 17
- 239000002243 precursor Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- -1 diamine compound Chemical class 0.000 description 3
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 3
- 150000003949 imides Chemical group 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- FILVIKOEJGORQS-UHFFFAOYSA-N 1,5-dimethylpyrrolidin-2-one Chemical class CC1CCC(=O)N1C FILVIKOEJGORQS-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 1
- LFASIQLVFCSCCU-UHFFFAOYSA-N 4-(4-chlorophenyl)sulfonylphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 LFASIQLVFCSCCU-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000004984 aromatic diamines Chemical group 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002896 organic halogen compounds Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- XIPFMBOWZXULIA-UHFFFAOYSA-N pivalamide Chemical compound CC(C)(C)C(N)=O XIPFMBOWZXULIA-UHFFFAOYSA-N 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical group OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Description
本発明はポリイミド樹脂からなるフイルムに関
し、詳しくは、ポリイミド重合体に特定量のポリ
スルホン系重合体を含有せしめたポリイミド樹脂
組成物からなるフイルムに関する。
ポリイミド樹脂は低温から高温まで広い温度範
囲にわたつて優れた機械的、物理的、化学的、電
気的性質を有しており、従つてその用途も多岐に
わたつている。
例えば電線、ケーブル等の被覆、マグネツトワ
イヤーの被覆、モーターのスロツトランナー、ト
ランスの層間絶縁膜、フレキシブルプリント回路
基板、コンデンサー膜、磁気記録用ベースフイル
ム、耐熱性粘着テープ等の成形体として広く用い
られている。
ポリイミドフイルムの製造は一般にポリイミド
の有機溶媒溶液又はポリイミドの前駆体であるポ
リアミド酸の溶液を加熱ドラム(ベルト)上に流
延し、熱風で溶媒を乾燥除去した後、加熱ドラム
(ベルト)からフイルムを剥離して熱処理を施す
ことによつてポリイミドフイルムとする。しかし
この方法で得られるフイルムは表面が極めて平滑
であるため、滑り性に著しく劣り、巻取り、巻出
しにフイルム製造上及びその後加工上大きな問題
があつた。
滑り性を改良する方法として加熱ドラム(ベル
ト)の表面を粗らすとか、無機粒子を添加する方
法が考えられるが、これらの方法では滑り性は改
良されようが、表面が著しく粗れたりして均一な
凹凸をつけることが困難であり、商品価値の著し
く劣つたフイルムしか得られなかつた。即ち、従
来技術では表面が平滑で且つ滑り性の良好なフイ
ルムを得る事は困難であつた。
本発明者らは上記諸問題を解決するため、鋭意
研究の結果、予想外にも、特定量のポリスルホン
系重合体をポリイミド樹脂に含有せしめることに
より、従来法の流延フイルム化技術によつても、
表面平滑で且つ滑り性の良好なポリイミドフイル
ムが得られることを発見し、本発明を完成するに
至つた。
即ち、本発明の要旨は、一般式
(式中、R1は
The present invention relates to a film made of a polyimide resin, and more particularly to a film made of a polyimide resin composition in which a polyimide polymer contains a specific amount of a polysulfone polymer. Polyimide resins have excellent mechanical, physical, chemical, and electrical properties over a wide temperature range from low to high temperatures, and therefore have a wide variety of uses. Widely used as molded products, such as coatings for electric wires and cables, coatings for magnet wires, slot runners for motors, interlayer insulation films for transformers, flexible printed circuit boards, capacitor films, base films for magnetic recording, heat-resistant adhesive tapes, etc. It is used. Generally, polyimide film is produced by casting a solution of polyimide in an organic solvent or a solution of polyamic acid, which is a precursor of polyimide, onto a heated drum (belt), drying and removing the solvent with hot air, and then removing the film from the heated drum (belt). A polyimide film is obtained by peeling off the film and subjecting it to heat treatment. However, since the film obtained by this method has an extremely smooth surface, it has extremely poor slip properties, and there are major problems in winding and unwinding the film and in its subsequent processing. Possible ways to improve slipperiness include roughening the surface of the heating drum (belt) or adding inorganic particles, but these methods may improve slipperiness, but they also result in the surface becoming extremely rough. However, it was difficult to form uniform irregularities, and the resulting film was of significantly inferior commercial value. That is, with the prior art, it has been difficult to obtain a film with a smooth surface and good sliding properties. In order to solve the above-mentioned problems, the present inventors conducted extensive research and unexpectedly found that by incorporating a specific amount of polysulfone-based polymer into polyimide resin, it was possible to create a film using conventional casting film technology. too,
The inventors have discovered that a polyimide film with a smooth surface and good slip properties can be obtained, leading to the completion of the present invention. That is, the gist of the present invention is that the general formula (In the formula, R 1 is
【式】または[expression] or
【式】(Xは単結合、−O −、[Formula] (X is a single bond, -O -,
【式】−CH2−、−C(CF3)2、または−
C(CF3)2−)であり、R2は芳香族ジアミン残基
で、nは正の整数を表わす。)で示される繰り返
し単位を有し、かつ対数粘度が0.5〜10dl/gの
熱可塑性芳香族ポリイミド100重量部に対し、有
機溶媒に可溶で繰り返し単位中に少なくとも1個
のスルホン基−SO2−を有する芳香族ポリスルホ
ン系重合体を0.01〜5重量部含有してなるポリイ
ミド樹脂組成物からなることを特徴とするポリイ
ミドフイルムに存する。
本発明でいうポリイミド重合体は例えばジアミ
ン化合物とテトラカルボン酸二無水物との公知の
反応によつて得られる。
即ち、4,4′−ジアミノジフエニルエーテル、
4,4′−ジアミノジフエニルメタン、p−フエニ
レンジアミン、3,3′−ジメチルベンジジン等の
ジアミン化合物と、ピロメリツト酸二無水物、ベ
ンゾフエノンテトラカルボン酸二無水物、3,
3′,4,4′−ビフエニルテトラカルボン酸二無水
物等のテトラカルボン酸二無水物とを実質的に等
モルで仕込み、N,N′−ジメチルホルムアミド、
N,N−ジメチルアセトアミド、N−メチル−ピ
ロリドン、フエノール、p−クロロフエノール等
の有機溶媒中で比較的低温、例えば50℃以下で反
応させ、ポリイミド前駆体溶液を作り、これを熱
的あるいは化学的にイミド閉環させる公知の方法
等によつて製造される。又、例えば3,3′,4,
4′−ベンゾフエノンテトラカルボン酸二無水物と
トリエンジイソシアネート及びメチレンビス(フ
エニルイソシアネート)の混合物を同時にあるい
は順次に反応させる方法によつても製造される。
なお、ジアミン化合物として複数種類を用いる
こともできるし、少量のトリアミン化合物を併用
してもよい。又、必要に応じて複数種類のテトラ
カルボン酸二無水物を用いることもできる。
前示一般式〔〕のポリイミド重合体の繰返し
単位中のR1の例としては下記の構造式の基を挙
げることが出来る。[Formula] -CH2- , -C( CF3 ) 2 , or -C( CF3 ) 2- ), R2 is an aromatic diamine residue, and n represents a positive integer. ) is soluble in an organic solvent and has at least one sulfone group in the repeating unit -SO2 A polyimide film comprising a polyimide resin composition containing 0.01 to 5 parts by weight of an aromatic polysulfone polymer having -. The polyimide polymer referred to in the present invention can be obtained, for example, by a known reaction between a diamine compound and a tetracarboxylic dianhydride. That is, 4,4'-diaminodiphenyl ether,
Diamine compounds such as 4,4'-diaminodiphenylmethane, p-phenylenediamine, 3,3'-dimethylbenzidine, pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, 3,
A tetracarboxylic dianhydride such as 3',4,4'-biphenyltetracarboxylic dianhydride is charged in substantially equimolar amounts, and N,N'-dimethylformamide,
A polyimide precursor solution is prepared by reacting in an organic solvent such as N,N-dimethylacetamide, N-methyl-pyrrolidone, phenol, p-chlorophenol, etc. at a relatively low temperature, e.g., 50°C or less. It is produced by a known method such as imide ring closure. Also, for example, 3, 3', 4,
It can also be produced by reacting a mixture of 4'-benzophenonetetracarboxylic dianhydride, triene diisocyanate and methylene bis(phenylisocyanate) simultaneously or sequentially. Note that a plurality of types of diamine compounds may be used, or a small amount of a triamine compound may be used in combination. Moreover, multiple types of tetracarboxylic dianhydrides can be used as necessary. Examples of R 1 in the repeating unit of the polyimide polymer of the general formula [] include groups of the following structural formula.
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】
また、前記ポリイミド重合体の繰返し単位中の
R2の例としては下記の構造式の基を挙げること
が出来る。[Formula] Also, in the repeating unit of the polyimide polymer,
Examples of R 2 include groups of the following structural formula.
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
更に、前記ポリイミド重合体の繰返し単位のn
としてはポリイミド重合体の耐熱性、機械的強度
等から10以上であつて1000以下が好ましい。又、
N,N−ジメチルホルムアミド又は97%濃硫酸中
0.5g/dlの濃度かつ30℃の温度で測定した対数
粘度(ηinh)が0.5dl/g〜10dl/gの範囲のも
のが好ましい。
本発明でいう芳香族ポリスルホン系重合体はビ
スフエノールAのナトリウム塩と4,4′−ジクロ
ロジフエニルスルホンとの重縮合4−(4−クロ
ロフエニルスルホニル)フエノールのカリウム塩
の重縮合等により製造されるポリスルホンに代表
される、後記の有機溶媒に可溶で繰返し単位中に
少なくとも1個のスルホン基−SO2−を有する芳
香族ポリスルホン系重合体であり、具体的には、
等の繰返し単位を有する公知のポリスルホン系重
合体が挙げられる。ここでnは正の整数であり、
5以上1000以下のものが耐熱性及び機械強度ある
いは有機溶媒への溶解性の点で好ましい。
ポリスルホン系重合体の有機溶媒としては特に
限定されないが、例えばN,N−ジメチルホルム
アミド、N,N−ジメチルアセトアミド、N,N
−ジメチルプロピオンアミド等のアミド類、N−
メチル−2−ピロリドン、1,5−ジメチル−2
−ピロリドン等のピロリドン類、フエノール、p
−クロロフエノール、o−クロロフエノール等の
フエノール類、トリクロロエタン、トリクロロメ
タン、テトラクロロエタン等の有機ハロゲン化合
物、ジメチルスルホキサイド等が挙げられる。
ポリスルホン系重合体の添加量はポリイミド樹
脂100重量部に対し、0.01〜5重量部、好ましく
は0.5〜5重量部である。0.01重量部より少ない
と滑り性が十分改良されず、又5重量部より多く
なると滑り性は十分改良されるが表面が粗れて商
品価値の著しく劣つたものしか得られなくなるか
らである。
次に本発明のポリイミド樹脂組成物の製造法に
ついて説明する。
ポリイミド前駆体溶液又はポリイミド溶液に前
記ポリスルホン系重合体あるいはその有機溶媒溶
液を添加混合した後、有機溶媒を乾燥除去する。
必要に応じ加熱乾燥する。ポリイミド前駆体の場
合は加熱乾燥と同時にイミド閉環するか乾燥後加
熱してイミド閉環して本発明の組成物を得る。な
お、ポリスルホン系重合体を溶液状でなく固体の
まゝ加える場合には、ポリイミド又はその前駆体
溶液の溶媒としてはポリスルホン系重合体を溶解
する溶媒を用いることが好ましい。
また、ポリイミド前駆体又はポリイミドの製造
時、即ち、重合時に単量体と一緒に又は重合中に
ポリスルホン系重合体あるいはその有機溶媒溶液
を仕込んで重合し、ポリスルホン系重合体含有ポ
リイミド前駆体又はポリイミド溶液を得た後、上
記のようにして本発明の組成物を得てもよい。
本発明のポリイミド樹脂組成物は耐熱性の極め
て高いフイルム、塗膜等として有用であり、特に
表面の凹凸が小さいにもかかわらず動摩擦係数が
小さいという特徴を有する滑り性の改良されたも
のである。
電子、電気絶縁材料等に広く応用することが出
来る。
本発明のポリイミド樹脂組成物からなるフイル
ムあるいはシートは前述の如くベルト(ドラム)
上に流延する方法によつて一般に製造されるが、
実施例に示される様にガラス板等の上に流延する
ことによつても製造される。又、アルミニウム、
鉄、鋼、銅、セラミツクス等の基板の上にコーテ
イングして溶媒を乾燥除去することにより積層体
とすることも出来る。
本発明の組成物はそれ自体公知の方法に従い周
知の配合剤、例えば酸化防止剤、熱安定剤、紫外
線吸収剤、着色剤等を配合してもよい。
以下実施例によつて、本発明を詳細に説明する
が、本発明はその要旨を越えぬ限り、下記実施例
によつて限定されるものではない。
なお、動摩擦係数はASTM−D−1844に基き
測定したフイルムとフイルム間の動摩擦係数で、
フイルムの滑り性を表わし、動摩擦係数が小さい
程、滑り性が優れていることを示す。又、表面粗
度(Ra)は小坂研究所製ET−10型薄膜段差測定
器を用い、JIS−B0601に定義された方法に準じ
て平均突起高さを求めた。
実施例1〜6、比較例1〜4
25の重合釜に4,4′−ジアミノジフエニルエ
ーテル(以下ODAと略記する)0.94KgとN,N
−ジメチルホルムアミド(以下DMFと略記する)
17.73Kgを仕込み1時間撹拌してODAを完全に溶
解した。次いでピロメリツト酸ジ無水物(以下
PMDAと略記する)1.03Kgを少量ずつ添加した
後、反応液温度を20℃に保ちつつ撹拌下に5時間
重合し、粘稠なポリイミド前駆体(ポリアミド
酸)溶液を得た。この溶液の一部をとり、DMF
で希釈して0.5g/dl溶液を調製して対数粘度を
測定したところ2.5dl/gであつた。
次にこのポリイミド前駆体溶液の一部を200g
づつ撹拌装置付フラスコに分割し、ポリイミド前
駆体を閉環して得られるポリイミド重合体100重
量部に対しポリスルホン系重合体のN−メチルピ
ロリドン(以下NMPと略記する)20重量%溶液
をポリスルホン系重合体として表1の割合になる
ように加え、室温で5時間撹拌し、よく混合し
た。この混合液をドクターナイフにてガラス板上
にキヤストし120℃で10分間熱風乾機中で乾燥し
た。次いでこの半乾燥フイルムを金属枠に固定
し、更に120℃より250℃まで15分間で加熱昇温
し、最後に350℃4分間熱処理を行い、25μmの
本発明の樹脂組成物のフイルムを得た。このポリ
イミドフイルムの表面粗度及び動摩擦係数を測定
した結果を表1に示す。 Furthermore, n of the repeating unit of the polyimide polymer
It is preferably 10 or more and 1000 or less in view of the heat resistance, mechanical strength, etc. of the polyimide polymer. or,
In N,N-dimethylformamide or 97% concentrated sulfuric acid
Preferably, the concentration is 0.5 g/dl and the logarithmic viscosity (ηinh) measured at a temperature of 30° C. is in the range of 0.5 dl/g to 10 dl/g. The aromatic polysulfone polymer referred to in the present invention is produced by polycondensation of sodium salt of bisphenol A and 4,4'-dichlorodiphenylsulfone, polycondensation of potassium salt of 4-(4-chlorophenylsulfonyl)phenol, etc. It is an aromatic polysulfone-based polymer that is soluble in the organic solvent described below and has at least one sulfone group -SO2- in the repeating unit, as represented by the polysulfone described below. Examples include known polysulfone polymers having repeating units such as. Here n is a positive integer,
Those having a molecular weight of 5 or more and 1000 or less are preferable in terms of heat resistance, mechanical strength, or solubility in organic solvents. Organic solvents for polysulfone polymers are not particularly limited, but include, for example, N,N-dimethylformamide, N,N-dimethylacetamide, and N,N-dimethylformamide.
-Amides such as dimethylpropionamide, N-
Methyl-2-pyrrolidone, 1,5-dimethyl-2
- Pyrrolidones such as pyrrolidone, phenol, p
Examples include phenols such as -chlorophenol and o-chlorophenol, organic halogen compounds such as trichloroethane, trichloromethane, and tetrachloroethane, and dimethyl sulfoxide. The amount of the polysulfone polymer added is 0.01 to 5 parts by weight, preferably 0.5 to 5 parts by weight, per 100 parts by weight of the polyimide resin. If the amount is less than 0.01 part by weight, the slipperiness will not be sufficiently improved, and if it is more than 5 parts by weight, the slipperiness will be sufficiently improved, but the surface will become rough and only products with significantly inferior commercial value will be obtained. Next, a method for producing the polyimide resin composition of the present invention will be explained. After adding and mixing the polysulfone polymer or its organic solvent solution to the polyimide precursor solution or polyimide solution, the organic solvent is removed by drying.
Heat and dry as necessary. In the case of a polyimide precursor, the composition of the present invention is obtained by carrying out imide ring closure simultaneously with heating and drying, or by heating and closing imide rings after drying. Note that when the polysulfone polymer is added in solid form rather than in solution form, it is preferable to use a solvent that dissolves the polysulfone polymer as the solvent for the polyimide or its precursor solution. In addition, during the production of a polyimide precursor or polyimide, that is, during polymerization, a polysulfone polymer or its organic solvent solution may be added together with the monomer or during polymerization to produce a polyimide precursor or polyimide containing a polysulfone polymer. After obtaining the solution, the composition of the invention may be obtained as described above. The polyimide resin composition of the present invention is useful as extremely heat-resistant films, coatings, etc., and in particular has improved slipperiness, characterized by a small coefficient of dynamic friction despite having small surface irregularities. . It can be widely applied to electronic and electrical insulating materials. The film or sheet made of the polyimide resin composition of the present invention can be used as a belt (drum) as described above.
It is generally produced by a method of casting on
It can also be produced by casting on a glass plate or the like as shown in the Examples. Also, aluminum,
A laminate can also be produced by coating a substrate of iron, steel, copper, ceramics, etc. and drying and removing the solvent. The composition of the present invention may be blended with known compounding agents such as antioxidants, heat stabilizers, ultraviolet absorbers, colorants, etc. according to methods known per se. The present invention will be explained in detail below with reference to Examples, but the present invention is not limited to the following Examples unless the gist thereof is exceeded. The coefficient of dynamic friction is the coefficient of dynamic friction between films measured based on ASTM-D-1844.
It represents the slipperiness of the film, and the smaller the coefficient of dynamic friction, the better the slipperiness. In addition, the surface roughness (Ra) was determined by using an ET-10 type thin film step measuring instrument manufactured by Kosaka Laboratory, and the average protrusion height was determined according to the method defined in JIS-B0601. Examples 1 to 6, Comparative Examples 1 to 4 0.94 kg of 4,4'-diaminodiphenyl ether (hereinafter abbreviated as ODA) and N,N were placed in a 25 polymerization pot.
-Dimethylformamide (hereinafter abbreviated as DMF)
17.73 kg was charged and stirred for 1 hour to completely dissolve ODA. Next, pyromellitic dianhydride (hereinafter
After adding 1.03 kg (abbreviated as PMDA) little by little, the reaction solution was polymerized for 5 hours with stirring while maintaining the temperature at 20°C to obtain a viscous polyimide precursor (polyamic acid) solution. Take a portion of this solution and DMF
A 0.5 g/dl solution was prepared by diluting the solution, and the logarithmic viscosity was measured and found to be 2.5 dl/g. Next, add 200g of this polyimide precursor solution.
A 20% by weight solution of N-methylpyrrolidone (hereinafter abbreviated as NMP) of a polysulfone polymer was added to 100 parts by weight of the polyimide polymer obtained by ring-closing the polyimide precursor. The mixture was added in the proportions shown in Table 1 and stirred at room temperature for 5 hours to mix well. This mixed solution was cast onto a glass plate using a doctor knife and dried in a hot air dryer at 120°C for 10 minutes. Next, this semi-dry film was fixed on a metal frame, and further heated from 120°C to 250°C for 15 minutes, and finally heat treated at 350°C for 4 minutes to obtain a 25 μm film of the resin composition of the present invention. . Table 1 shows the results of measuring the surface roughness and dynamic friction coefficient of this polyimide film.
【表】
実施例 7〜11
3,3′−ジメチルベンチジン(以下OTDと略
記する)0.5Kg、ODA0.47Kg及びPMDA1.03Kgを
使用する以外は実施例1と同様にして対数粘度
2.7dl/gのポリイミド前駆体溶液を得、ポリス
ルホン系重合体を混合して、そのキヤストフイル
ムを作つた。その動摩擦係数及び表面粗度を測定
した結果を表2に示す。[Table] Examples 7 to 11 Logarithmic viscosity was measured in the same manner as in Example 1 except that 0.5 kg of 3,3'-dimethylbenzidine (hereinafter abbreviated as OTD), 0.47 kg of ODA, and 1.03 kg of PMDA were used.
A 2.7 dl/g polyimide precursor solution was obtained, and a polysulfone polymer was mixed therein to produce a cast film. Table 2 shows the results of measuring the coefficient of dynamic friction and surface roughness.
【表】【table】
【表】
実施例 12
撹拌装置のついた300mlフラスコにDMF177.3
gと
の構造のポリスルホン系重合体をポリイミド100
重量部に対し3重量部になるように仕込み撹拌下
に溶解した。次にODA9.4gを仕込み、溶解した
後PMDA10.3gを加え室温で5時間反応した。
対数粘度は2.6dl/gであつた。これを実施例1
と同様にキヤストしてフイルムを作つたところ、
動摩擦係数は0.8、Raは0.06μmであつた。
実施例 13〜15
3,3′,4,4′−ベンゾフエノンテトラカルボ
ン酸二無水物とトルエンジイソシアネート及びメ
チレンビス(フエニルイソシアネート)(モル比
80/20)を公知の方法によりDMF中で反応させ
てDMF可溶型ポリイミドを得た。対数粘度は0.7
dl/gであつた。実施例1〜6と同様にしてポリ
スルホン系重合体を加え、そのキヤストフイルム
を作つた。その動摩擦係数、表面粗度の結果を表
3に示す。[Table] Example 12 DMF177.3 in a 300ml flask equipped with a stirring device
g and Polyimide 100 is a polysulfone polymer with the structure of
The ingredients were added in an amount of 3 parts by weight and dissolved under stirring. Next, 9.4 g of ODA was charged and dissolved, and then 10.3 g of PMDA was added and reacted at room temperature for 5 hours.
Logarithmic viscosity was 2.6 dl/g. Example 1
When I made a film by casting in the same way,
The coefficient of dynamic friction was 0.8 and Ra was 0.06 μm. Examples 13-15 3,3',4,4'-benzophenonetetracarboxylic dianhydride, toluene diisocyanate and methylene bis(phenyl isocyanate) (mole ratio
80/20) in DMF by a known method to obtain a DMF-soluble polyimide. Logarithmic viscosity is 0.7
It was dl/g. A polysulfone polymer was added in the same manner as in Examples 1 to 6, and a cast film thereof was produced. Table 3 shows the results of the dynamic friction coefficient and surface roughness.
【表】
実施例 16
実施例7で使用したポリスルホン系重合体含有
ポリイミド前駆体溶液にポリイミド前駆体のピロ
メリツト酸単位1モルに対し触媒としてイソキノ
リン4モル及び脱水剤として無水酢酸4モルを加
えよく混合した後、実施例1と同様にしてポリイ
ミドフイルムを作つた。その動摩擦係数は0.7で
あり、Raは0.06μmであつた。
実施例 17
実施例13〜15で用いたポリスルホン系重合体含
有ポリイミド溶液を鏡面仕上げの2mm厚アルミ板
の上にコーテイングし120℃で10分、120℃から
250℃まで15分間で加熱昇温し、最後300℃4分間
熱処理を行い、ポリイミド塗布アルミ板を得た。
いずれも表面粗度は実施例13〜15と同じであつ
た。[Table] Example 16 To the polyimide precursor solution containing the polysulfone polymer used in Example 7, 4 moles of isoquinoline as a catalyst and 4 moles of acetic anhydride as a dehydrating agent were added to 1 mole of pyromellitic acid units of the polyimide precursor and mixed well. After that, a polyimide film was produced in the same manner as in Example 1. Its dynamic friction coefficient was 0.7 and Ra was 0.06 μm. Example 17 The polyimide solution containing the polysulfone polymer used in Examples 13 to 15 was coated on a mirror-finished 2 mm thick aluminum plate and heated at 120°C for 10 minutes.
The temperature was raised to 250°C for 15 minutes, and finally heat treated at 300°C for 4 minutes to obtain a polyimide coated aluminum plate.
In all cases, the surface roughness was the same as in Examples 13-15.
Claims (1)
基で、nは正の整数を表わす。)で示される繰り
返し単位を有し、かつ対数粘度が0.5〜10dl/g
の熱可塑性芳香族ポリイミド100重量部に対し、
有機溶媒に可溶で繰り返し単位中に少なくとも1
個のスルホン基−SO2−を有する芳香族ポリスル
ホン系重合体を0.01〜5重量部含有してなるポリ
イミド樹脂組成物からなることを特徴とするポリ
イミドフイルム。[Claims] 1. General formula (In the formula, R 1 is [Formula] or [Formula] (X is a single bond, -O -, [Formula] -CH 2 -, -C(CH 3 ) 2 -, or -C(CF 3 ) 2 - ), R 2 is an aromatic diamine residue, n represents a positive integer), and has a logarithmic viscosity of 0.5 to 10 dl/g.
For 100 parts by weight of thermoplastic aromatic polyimide,
Soluble in organic solvents and containing at least 1 repeating unit
1. A polyimide film comprising a polyimide resin composition containing 0.01 to 5 parts by weight of an aromatic polysulfone polymer having -SO2- sulfone groups.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57234533A JPS59122547A (en) | 1982-12-28 | 1982-12-28 | Polyimide resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57234533A JPS59122547A (en) | 1982-12-28 | 1982-12-28 | Polyimide resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59122547A JPS59122547A (en) | 1984-07-16 |
JPH0518865B2 true JPH0518865B2 (en) | 1993-03-15 |
Family
ID=16972515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57234533A Granted JPS59122547A (en) | 1982-12-28 | 1982-12-28 | Polyimide resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59122547A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5286812A (en) * | 1988-02-19 | 1994-02-15 | University Of Massachusetts | High performance blends of aromatic polyimides with aromatic polyethersulfones |
US5037902A (en) * | 1988-12-30 | 1991-08-06 | Amoco Corporation | Miscible blends of imide containing polymers with poly(aryl sulfones) |
JP2631899B2 (en) * | 1990-03-13 | 1997-07-16 | 財団法人 石油産業活性化センター | Resin composition and method for producing the same |
US5206311A (en) * | 1991-09-30 | 1993-04-27 | Amoco Corporation | Blends of polyether sulfones and copolymides |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55102651A (en) * | 1979-02-01 | 1980-08-06 | Toray Ind Inc | Polyamideimide resin composition |
JPS55102650A (en) * | 1979-02-01 | 1980-08-06 | Toray Ind Inc | Resin composition |
JPS5698257A (en) * | 1979-12-26 | 1981-08-07 | Union Carbide Corp | Mixture of poly*allyl ether* resin and polyether imide |
JPS56123605A (en) * | 1980-03-01 | 1981-09-28 | Toshiba Chem Prod | Selffadhesive insulated wire |
JPS57167347A (en) * | 1981-04-09 | 1982-10-15 | Mitsubishi Gas Chem Co Inc | Highly heat-resistant resin composition |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59500724A (en) * | 1983-03-29 | 1984-04-26 | ゼネラル エレクトリツク カンパニイ | Polyetherimide-polysulfone blend |
-
1982
- 1982-12-28 JP JP57234533A patent/JPS59122547A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55102651A (en) * | 1979-02-01 | 1980-08-06 | Toray Ind Inc | Polyamideimide resin composition |
JPS55102650A (en) * | 1979-02-01 | 1980-08-06 | Toray Ind Inc | Resin composition |
JPS5698257A (en) * | 1979-12-26 | 1981-08-07 | Union Carbide Corp | Mixture of poly*allyl ether* resin and polyether imide |
JPS56123605A (en) * | 1980-03-01 | 1981-09-28 | Toshiba Chem Prod | Selffadhesive insulated wire |
JPS57167347A (en) * | 1981-04-09 | 1982-10-15 | Mitsubishi Gas Chem Co Inc | Highly heat-resistant resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS59122547A (en) | 1984-07-16 |
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