JPH0516399B2 - - Google Patents

Info

Publication number
JPH0516399B2
JPH0516399B2 JP7779888A JP7779888A JPH0516399B2 JP H0516399 B2 JPH0516399 B2 JP H0516399B2 JP 7779888 A JP7779888 A JP 7779888A JP 7779888 A JP7779888 A JP 7779888A JP H0516399 B2 JPH0516399 B2 JP H0516399B2
Authority
JP
Japan
Prior art keywords
group
evaporation
evaporation source
growth chamber
substrate holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7779888A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01249692A (ja
Inventor
Haruo Tanaka
Masahito Mushigami
Juji Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP63077798A priority Critical patent/JPH01249692A/ja
Priority to DE68926577T priority patent/DE68926577T2/de
Priority to EP89105248A priority patent/EP0335267B1/en
Priority to EP92117113A priority patent/EP0529687B1/en
Priority to DE68916457T priority patent/DE68916457T2/de
Priority to TW080105276A priority patent/TW202485B/zh
Priority to US07/329,313 priority patent/US4944246A/en
Priority to CA000594977A priority patent/CA1333038C/en
Priority to KR1019890004152A priority patent/KR930010750B1/ko
Publication of JPH01249692A publication Critical patent/JPH01249692A/ja
Publication of JPH0516399B2 publication Critical patent/JPH0516399B2/ja
Priority to CA000616594A priority patent/CA1333039C/en
Priority to KR1019930013044A priority patent/KR930010751B1/ko
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP63077798A 1988-03-30 1988-03-30 分子線エピタキシー装置 Granted JPH01249692A (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP63077798A JPH01249692A (ja) 1988-03-30 1988-03-30 分子線エピタキシー装置
DE68926577T DE68926577T2 (de) 1988-03-30 1989-03-23 Einrichtung zur Molekularstrahlepitaxie
EP89105248A EP0335267B1 (en) 1988-03-30 1989-03-23 Molecular beam epitaxy apparatus
EP92117113A EP0529687B1 (en) 1988-03-30 1989-03-23 Molecular beam epitaxy apparatus
DE68916457T DE68916457T2 (de) 1988-03-30 1989-03-23 Einrichtung zur Molekularstrahlepitaxie.
TW080105276A TW202485B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-03-30 1989-03-24
US07/329,313 US4944246A (en) 1988-03-30 1989-03-27 Molecular beam epitaxy apparatus
CA000594977A CA1333038C (en) 1988-03-30 1989-03-29 Molecular beam epitaxy apparatus
KR1019890004152A KR930010750B1 (ko) 1988-03-30 1989-03-30 분자선 에피택시 장치
CA000616594A CA1333039C (en) 1988-03-30 1993-03-30 Molecular beam epitaxy apparatus
KR1019930013044A KR930010751B1 (ko) 1988-03-30 1993-07-09 분자선 에피택시 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63077798A JPH01249692A (ja) 1988-03-30 1988-03-30 分子線エピタキシー装置

Publications (2)

Publication Number Publication Date
JPH01249692A JPH01249692A (ja) 1989-10-04
JPH0516399B2 true JPH0516399B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-04

Family

ID=13644020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63077798A Granted JPH01249692A (ja) 1988-03-30 1988-03-30 分子線エピタキシー装置

Country Status (1)

Country Link
JP (1) JPH01249692A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111304623A (zh) * 2020-02-24 2020-06-19 西安交通大学 一种超高真空进样与样品处理两用系统及处理方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2323209A (en) * 1997-03-13 1998-09-16 Sharp Kk Molecular beam epitaxy apparatus and method
US12080571B2 (en) * 2020-07-08 2024-09-03 Applied Materials, Inc. Substrate processing module and method of moving a workpiece

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111304623A (zh) * 2020-02-24 2020-06-19 西安交通大学 一种超高真空进样与样品处理两用系统及处理方法

Also Published As

Publication number Publication date
JPH01249692A (ja) 1989-10-04

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees