JPH0515800B2 - - Google Patents
Info
- Publication number
- JPH0515800B2 JPH0515800B2 JP58199208A JP19920883A JPH0515800B2 JP H0515800 B2 JPH0515800 B2 JP H0515800B2 JP 58199208 A JP58199208 A JP 58199208A JP 19920883 A JP19920883 A JP 19920883A JP H0515800 B2 JPH0515800 B2 JP H0515800B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- electrolytic polishing
- water
- polishing
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 claims description 41
- 239000007788 liquid Substances 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 22
- 229910052758 niobium Inorganic materials 0.000 claims description 18
- 239000010955 niobium Substances 0.000 claims description 18
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 16
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 9
- 230000007423 decrease Effects 0.000 claims description 6
- 230000001172 regenerating effect Effects 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 12
- 150000008064 anhydrides Chemical class 0.000 description 5
- 230000008929 regeneration Effects 0.000 description 5
- 238000011069 regeneration method Methods 0.000 description 5
- 238000009835 boiling Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
- C25F7/02—Regeneration of process liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
- B23H3/10—Supply or regeneration of working media
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58199208A JPS6090628A (ja) | 1983-10-26 | 1983-10-26 | ニオブ材用電解研磨液組成物の再生方法 |
DE19843438433 DE3438433A1 (de) | 1983-10-26 | 1984-10-19 | Verfahren zur reproduktion der zusammensetzung einer elektrolytischen poliermittelloesung fuer niobmaterial |
US06/816,379 US4676833A (en) | 1983-10-26 | 1986-01-06 | Method for reproducing composition of electrolytic polishing solution for niobium material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58199208A JPS6090628A (ja) | 1983-10-26 | 1983-10-26 | ニオブ材用電解研磨液組成物の再生方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6090628A JPS6090628A (ja) | 1985-05-21 |
JPH0515800B2 true JPH0515800B2 (US20030204162A1-20031030-M00001.png) | 1993-03-02 |
Family
ID=16403929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58199208A Granted JPS6090628A (ja) | 1983-10-26 | 1983-10-26 | ニオブ材用電解研磨液組成物の再生方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US4676833A (US20030204162A1-20031030-M00001.png) |
JP (1) | JPS6090628A (US20030204162A1-20031030-M00001.png) |
DE (1) | DE3438433A1 (US20030204162A1-20031030-M00001.png) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0124484B1 (ko) * | 1993-03-23 | 1997-12-10 | 모리시다 요이치 | 반도체 장치의 세정방법 및 그 장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2466095A (en) * | 1944-03-15 | 1949-04-05 | Pennsylvania Salt Mfg Co | Electrochemical process for polishing tantalum |
DE1185780B (de) * | 1962-11-10 | 1965-01-21 | Erich Saelzle Dipl Chem Dr | Verfahren zum Polieren von Gegenstaenden aus Kristall- oder Bleikristallglas |
DE2609549C3 (de) * | 1976-03-08 | 1979-04-12 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum anodischen Polieren von Oberflächen aus intermetallischen Niobverbindungen und Nioblegierungen |
-
1983
- 1983-10-26 JP JP58199208A patent/JPS6090628A/ja active Granted
-
1984
- 1984-10-19 DE DE19843438433 patent/DE3438433A1/de active Granted
-
1986
- 1986-01-06 US US06/816,379 patent/US4676833A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4676833A (en) | 1987-06-30 |
JPS6090628A (ja) | 1985-05-21 |
DE3438433C2 (US20030204162A1-20031030-M00001.png) | 1987-04-30 |
DE3438433A1 (de) | 1985-05-15 |
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