JPH0515781B2 - - Google Patents

Info

Publication number
JPH0515781B2
JPH0515781B2 JP60047400A JP4740085A JPH0515781B2 JP H0515781 B2 JPH0515781 B2 JP H0515781B2 JP 60047400 A JP60047400 A JP 60047400A JP 4740085 A JP4740085 A JP 4740085A JP H0515781 B2 JPH0515781 B2 JP H0515781B2
Authority
JP
Japan
Prior art keywords
alloy
thermal
sprayed
base material
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60047400A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61207566A (ja
Inventor
Isamu Asakawa
Yoshio Machida
Katsuyuki Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP60047400A priority Critical patent/JPS61207566A/ja
Publication of JPS61207566A publication Critical patent/JPS61207566A/ja
Priority to US07/408,951 priority patent/US5204189A/en
Publication of JPH0515781B2 publication Critical patent/JPH0515781B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating By Spraying Or Casting (AREA)
JP60047400A 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法 Granted JPS61207566A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60047400A JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法
US07/408,951 US5204189A (en) 1985-03-12 1989-09-18 Heat-sensitive transferring recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60047400A JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法

Publications (2)

Publication Number Publication Date
JPS61207566A JPS61207566A (ja) 1986-09-13
JPH0515781B2 true JPH0515781B2 (enEXAMPLES) 1993-03-02

Family

ID=12774059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60047400A Granted JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法

Country Status (1)

Country Link
JP (1) JPS61207566A (enEXAMPLES)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118058A (ja) * 1986-11-05 1988-05-23 Toyota Motor Corp セラミツク溶射部材およびその製造方法
JPS63274751A (ja) * 1987-05-01 1988-11-11 Toyota Motor Corp セラミック溶射部材
US5204302A (en) * 1991-09-05 1993-04-20 Technalum Research, Inc. Catalyst composition and a method for its preparation
US5520516A (en) * 1994-09-16 1996-05-28 Praxair S.T. Technology, Inc. Zirconia-based tipped blades having macrocracked structure
FR2763259A1 (fr) * 1997-05-16 1998-11-20 Ecia Equip Composants Ind Auto Catalyseur en materiau composite, convertisseur muni d'un tel catalyseur et procede pour sa fabrication
JP3510993B2 (ja) 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7780786B2 (en) 2002-11-28 2010-08-24 Tokyo Electron Limited Internal member of a plasma processing vessel
KR101016913B1 (ko) 2003-03-31 2011-02-22 도쿄엘렉트론가부시키가이샤 처리요소용 배리어층 및 그의 형성방법
JP4597972B2 (ja) 2003-03-31 2010-12-15 東京エレクトロン株式会社 処理部材上に隣接するコーティングを接合する方法。
JP4607530B2 (ja) 2004-09-28 2011-01-05 株式会社日立製作所 遮熱被覆を有する耐熱部材およびガスタービン
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
JP4889271B2 (ja) * 2005-09-26 2012-03-07 国立大学法人東北大学 金属ガラス複合材料およびそれを使用した電子電気機器用部材
JP6246666B2 (ja) 2014-06-11 2017-12-13 日本発條株式会社 積層体の製造方法
JP6599950B2 (ja) * 2017-09-20 2019-10-30 日本発條株式会社 積層体及び積層体の製造方法

Also Published As

Publication number Publication date
JPS61207566A (ja) 1986-09-13

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