JPH0515255B2 - - Google Patents

Info

Publication number
JPH0515255B2
JPH0515255B2 JP61141066A JP14106686A JPH0515255B2 JP H0515255 B2 JPH0515255 B2 JP H0515255B2 JP 61141066 A JP61141066 A JP 61141066A JP 14106686 A JP14106686 A JP 14106686A JP H0515255 B2 JPH0515255 B2 JP H0515255B2
Authority
JP
Japan
Prior art keywords
printing
plate
thickness
photosensitive resin
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61141066A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62296142A (ja
Inventor
Motoaki Takahashi
Takashi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP14106686A priority Critical patent/JPS62296142A/ja
Publication of JPS62296142A publication Critical patent/JPS62296142A/ja
Publication of JPH0515255B2 publication Critical patent/JPH0515255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14106686A 1986-06-17 1986-06-17 バ−コ−ドシンボル印刷用多層化感光性樹脂版 Granted JPS62296142A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14106686A JPS62296142A (ja) 1986-06-17 1986-06-17 バ−コ−ドシンボル印刷用多層化感光性樹脂版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14106686A JPS62296142A (ja) 1986-06-17 1986-06-17 バ−コ−ドシンボル印刷用多層化感光性樹脂版

Publications (2)

Publication Number Publication Date
JPS62296142A JPS62296142A (ja) 1987-12-23
JPH0515255B2 true JPH0515255B2 (enrdf_load_stackoverflow) 1993-03-01

Family

ID=15283449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14106686A Granted JPS62296142A (ja) 1986-06-17 1986-06-17 バ−コ−ドシンボル印刷用多層化感光性樹脂版

Country Status (1)

Country Link
JP (1) JPS62296142A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2878300B2 (ja) * 1988-03-31 1999-04-05 旭化成工業株式会社 新規な凸版用印刷版
IT1401671B1 (it) * 2010-06-17 2013-08-02 Ciemmezeta S R L Lastra per produzione di cliche' e metodo di realizzazione di detta lastra per produzione di cliche'

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
JPH06699B2 (ja) * 1984-08-11 1994-01-05 カネボウ食品株式会社 精神安定チユ−インガム

Also Published As

Publication number Publication date
JPS62296142A (ja) 1987-12-23

Similar Documents

Publication Publication Date Title
US3891443A (en) Mat finish photosensitive relief plates
EP0427950B1 (en) A photosensitive resin composition for use in forming a relief structure
JP2653458B2 (ja) 凸版印刷版用感光性樹脂組成物
US5252428A (en) Photoresin relief printing plate
JPS6156506B2 (enrdf_load_stackoverflow)
JPS5818635A (ja) 摩擦およびひつかきに強いグラビア印刷版を作る感光記録材料およびこれら記録材料によりグラビア印刷版を作る方法
US4269680A (en) Curable polymeric composition comprising natural or synthetic rubbers
JP2012173368A (ja) 感光性樹脂印刷原版およびそれを用いた印刷版
JPH0515255B2 (enrdf_load_stackoverflow)
EP0483378B1 (en) Photo-set resin letterpress
EP0335399B1 (en) A novel photoresin relief printing plate
JP4425700B2 (ja) 多層フレキソ印刷版とその製造方法
JP2019171730A (ja) フレキソ印刷用積層体、及びフレキソ印刷方法
JP3158369B2 (ja) 光硬化樹脂凸版およびその製造方法
JP2581314B2 (ja) 感光性樹脂版材
JP2009271277A (ja) 感光性樹脂組成物およびそれを用いた印刷版材
JPS6319866B2 (enrdf_load_stackoverflow)
JP3000687B2 (ja) 水なし平版印刷用原版
JP4467048B2 (ja) フレキソ印刷版の製造方法
JPH0434147B2 (enrdf_load_stackoverflow)
JPH0743532B2 (ja) 部分多層化印刷版及びその製造方法
WO2013062082A1 (ja) 凸版印刷版用感光性樹脂積層体
JP2023139417A (ja) 感光性フレキソ印刷版原版
JPH0367262B2 (enrdf_load_stackoverflow)
JP2878300B2 (ja) 新規な凸版用印刷版

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term