JPH05140765A - Treatment for surface of copper foil for printed circuit - Google Patents
Treatment for surface of copper foil for printed circuitInfo
- Publication number
- JPH05140765A JPH05140765A JP32667491A JP32667491A JPH05140765A JP H05140765 A JPH05140765 A JP H05140765A JP 32667491 A JP32667491 A JP 32667491A JP 32667491 A JP32667491 A JP 32667491A JP H05140765 A JPH05140765 A JP H05140765A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- copper foil
- zinc
- printed circuit
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Treatment Of Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、印刷回路用銅箔の表面
処理方法に関するものであり、特には耐熱酸化性(プリ
ント基板等の製造時に適用される熱履歴に対して変色を
起こさないこと)を改善するために、Cr系防錆層形成
前にZn−Ni合金層を形成することを特徴とする印刷
回路用銅箔の光沢面の処理方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method for a printed circuit copper foil, and more particularly to a thermal oxidation resistance (not discoloration due to thermal history applied when manufacturing a printed circuit board or the like). The present invention relates to a method for treating a glossy surface of a copper foil for a printed circuit, which comprises forming a Zn—Ni alloy layer before forming a Cr-based rust preventive layer in order to improve
【0002】[0002]
【従来の技術】印刷回路用銅箔は一般に、合成樹脂等の
基材に高温高圧下で積層接着され、その後目的とする回
路を形成するべく必要な回路を印刷した後、不要部を除
去するエッチング処理が施される。最終的に、所要の素
子が半田付けされて、エレクトロニクスデバイス用の種
々の印刷回路板を形成する。印刷配線板用銅箔に対する
品質要求は、樹脂基材と接着される面(粗化面)と、非
接着面(光沢面)とで異なる。2. Description of the Related Art Generally, a printed circuit copper foil is laminated and adhered to a base material such as a synthetic resin under high temperature and high pressure, and after printing a necessary circuit to form a target circuit, an unnecessary portion is removed. An etching process is performed. Finally, the required components are soldered together to form various printed circuit boards for electronic devices. Quality requirements for copper foil for printed wiring boards differ between the surface (roughened surface) bonded to the resin substrate and the non-bonded surface (glossy surface).
【0003】粗化面に対する要求としては、主として、 保存時における酸化変色のないこと、 基材との引き剥し強さが高温加熱、湿式処理、半田付
け、薬品処理等の後でも充分なこと、 基材との積層、エッチング後に生じる所謂積層汚点の
ないこと 等が挙げられる。The requirements for the roughened surface are mainly that there is no oxidative discoloration during storage, and that the peeling strength from the substrate is sufficient even after high temperature heating, wet treatment, soldering, chemical treatment, etc. For example, there is no so-called laminated stain that occurs after lamination with a substrate or etching.
【0004】他方、光沢面に対しては、 外観が良好なこと及び保存時における酸化変色のない
こと、 半田濡れ性が良好なこと、 高温加熱時に酸化変色がないこと レジストとの密着性が良好なこと 等が要求される。On the other hand, the glossy surface has a good appearance, no oxidative discoloration during storage, good solder wettability, no oxidative discoloration when heated at high temperature, and good adhesion to the resist. Something is required.
【0005】こうした要求に応えるべく、粗化面及び光
沢面について印刷配線板用銅箔に対して様々の目的で多
くの処理方法が提唱されてきた。特に銅箔の防錆処理に
注目すると、有用な基本的防錆方法の一つとして、本件
出願人は、特公昭61−33908号において銅箔の光
沢面に亜鉛の皮膜を形成し、続いてクロム酸化物の皮膜
によるクロム防錆層を形成する方法を提唱した。また、
クロム防錆層自体に関しても、電解亜鉛・クロム処理に
よるクロム酸化物と亜鉛及び(又は)亜鉛酸化物との混
合皮膜処理を提唱し(特公昭58−7077号)、多く
の成果を挙げてきた。更に、特開平2−294490号
には、長期間高温多湿条件下での黒点発生を防止するこ
とを目的として、浸漬クロメート処理によりクロム酸化
物皮膜を形成し、続いて電解亜鉛・クロム処理によりク
ロム酸化物と亜鉛及び(又は)亜鉛酸化物との混合皮膜
を形成することが開示される。In order to meet such demands, many treatment methods have been proposed for various purposes with respect to the roughened surface and the glossy surface of the copper foil for printed wiring board. In particular, paying attention to the anticorrosion treatment of the copper foil, the applicant of the present invention, as one of the useful basic antirust methods, formed a zinc film on the glossy surface of the copper foil in Japanese Patent Publication No. 61-33908, and subsequently, A method of forming a chromium anticorrosive layer by a chromium oxide film was proposed. Also,
Regarding the chrome rust preventive layer itself, a mixed film treatment of chromium oxide and zinc and / or zinc oxide by electrolytic zinc / chromium treatment has been proposed (Japanese Patent Publication No. 58-7077) and many results have been achieved. .. Further, in JP-A-2-294490, for the purpose of preventing the generation of black spots under a high temperature and high humidity condition for a long period of time, a chromium oxide film is formed by immersion chromate treatment, and then chromium is treated by electrolytic zinc / chromium treatment. It is disclosed to form a mixed film of oxide and zinc and / or zinc oxide.
【0006】[0006]
【発明が解決しようとする課題】ところで、銅箔の光沢
面の耐熱酸化性に関しては、年々要求が厳しくなってい
る。一つには、従来なかった新しい製作方式(2層フレ
キ:ポリイミドワニスを直接銅箔上へ塗布し、フレキシ
ブル基板とする方法で、ポリイミド層と銅箔層の2層構
造となっているため、2層フレキと呼ばれている。)及
び高耐熱性の新規樹脂の出現に伴い、銅箔が今までより
も高い温度に曝露されるようになったためである。ま
た、従来の積層方法においても、加熱処理を行う積層及
びキュアー工程のコスト削減のために今までの窒素雰囲
気から大気中で行なう傾向も見られ、この点からも銅箔
光沢面の耐熱酸化性の改善が要求されるようになった。
現在の亜鉛めっき+クロメート処理の方法では、例えば
200℃×30分程度しか耐熱酸化性が保持されず、今
後必要とされる240℃×30分或いは270℃×10
分の高温条件では変色してしまう。従って、今後の印刷
回路用銅箔ヘの要求に対応するためには、240℃×3
0分或いは270℃×10分といったもっと高温の条件
でも変色しない一層高度の耐熱酸化性を確保することが
必要である。しかも、半田濡れ性、レジスト密着性とい
った光沢面に要求される他の特性を損なうものであって
はならないことはもちろんである。By the way, with respect to the thermal oxidation resistance of the glossy surface of the copper foil, demands are becoming stricter year by year. One is a new manufacturing method that has never existed before (two-layer flex: a polyimide varnish is directly applied on a copper foil to form a flexible substrate, which has a two-layer structure of a polyimide layer and a copper foil layer. This is because the copper foil is exposed to higher temperatures than before with the advent of new resins with high heat resistance. In addition, even in the conventional laminating method, there is a tendency to perform the heat treatment in the atmosphere from the nitrogen atmosphere to reduce the cost of the laminating and curing steps. From this point as well, the thermal oxidation resistance of the glossy surface of the copper foil is seen. Improvement has come to be required.
With the current method of zinc plating + chromate treatment, the thermal oxidation resistance is maintained only for, for example, about 200 ° C. × 30 minutes, and 240 ° C. × 30 minutes or 270 ° C. × 10 which will be required in the future.
It discolors under high temperature conditions for a minute. Therefore, in order to meet the future demand for copper foil for printed circuits, 240 ° C x 3
It is necessary to ensure a higher level of thermal oxidation resistance that does not discolor even under higher temperature conditions such as 0 minutes or 270 ° C. × 10 minutes. In addition, it should not impair other properties required for the glossy surface, such as solder wettability and resist adhesion.
【0007】本発明の課題は、従来からの亜鉛めっき+
クロメート処理方法において、今後のプリント基板製造
時に予想される熱履歴に対しても変色を起こさないよう
銅箔光沢面の耐熱酸化性を高め、しかも半田濡れ性、レ
ジスト密着性といった他の特性を損なうことのない処理
方法を開発することである。The object of the present invention is to provide conventional zinc plating +
In the chromate treatment method, the thermal oxidation resistance of the glossy surface of the copper foil is increased so as not to cause discoloration with respect to the thermal history expected in future printed circuit board manufacturing, and other properties such as solder wettability and resist adhesion are impaired. It is to develop a unique processing method.
【0008】[0008]
【課題を解決するための手段】本発明者等は、従来の亜
鉛単独めっきに替えてごく薄いZn−Ni合金皮膜を形
成することにより上記課題を解決しうることを見出し
た。Zn−Ni合金めっき自体は例えば自動車エンジン
ルームやボディ鋼板における耐熱性及び耐食性を改善す
るために使用されているが、こうした一般構造材でのめ
っきと印刷回路銅箔とでは使用環境条件が全く異なり、
全く別異の技術であるといってよい。Zn−Ni合金め
っきの銅箔への応用として、銅箔の光沢面ではなく粗化
面に対して剥離強度の上昇、マイグレーションの防止、
耐塩酸性、耐熱性を向上する目的でZn−Ni合金めっ
き行なう試みは存在するが(例えば、特開昭61−11
0794号、特開昭63−89698号、特公平2−5
1272号等)、光沢面と粗化面とでは前述したように
要求される要件が全く異なり、特に上記の公知の方法で
は、めっき厚みがあまりにも厚く、プリント基板用銅箔
としては外観上問題があり、とても使用できるレベルで
はない。そこで上記の方法で約3μm程度のめっきのも
のをプリント基板用として、数十から数百Å厚さの領域
へ応用できるよう鋭意研究を行った。その結果、非常に
薄いZn−Ni合金被膜を光沢面に施すことにより、意
外にも光沢面の耐熱酸化性が改善されることを初めて見
いだしたものである。The present inventors have found that the above problems can be solved by forming a very thin Zn-Ni alloy film in place of the conventional zinc single plating. Zn-Ni alloy plating itself is used, for example, to improve heat resistance and corrosion resistance in automobile engine rooms and body steel sheets, but the environmental conditions of use are completely different between plating with such a general structural material and printed circuit copper foil. ,
It can be said that this is a completely different technology. As an application of Zn-Ni alloy plating to copper foil, increase in peel strength, prevention of migration, to the roughened surface of the copper foil, not to the glossy surface,
There is an attempt to perform Zn-Ni alloy plating for the purpose of improving hydrochloric acid resistance and heat resistance (see, for example, JP-A-61-111).
0794, JP-A-63-89698, JP-B-2-5
No. 1272), the requirements required as described above are completely different between the glossy surface and the roughened surface. Particularly, in the above-mentioned known method, the plating thickness is too thick, and there is a problem in appearance as a copper foil for a printed circuit board. However, it is not at a level that can be used. Therefore, the above-mentioned method was carried out, and a diligent study was carried out so that a plating film having a thickness of about 3 μm could be applied to a region of several tens to several hundreds of Å as a printed circuit board. As a result, it was discovered for the first time that the thermal oxidation resistance of the glossy surface is improved by applying a very thin Zn-Ni alloy coating to the glossy surface.
【0009】この知見に基づいて、本発明は、印刷回路
用銅箔の光沢面に50〜97重量%Znと3〜50重量
%Niとから成るZn−Ni合金層を100〜500μ
g/dm2 の付着量で形成し、その後該Zn−Ni合金
層上にCr系防錆層を形成することを特徴とする印刷回
路用銅箔の表面処理方法を提供するものである。この場
合、前記銅箔の粗化面(非光沢面)にはCu、Cr、N
i、Fe、Co及びZnから選択される1種乃至2種以
上の単一金属層又は合金層を形成するトリート処理を行
なうことが好ましい。耐候性を一層良好にするには、C
r系防錆層を浸漬クロメート乃至電解クロメート処理に
よるクロム酸化物皮膜及び(或いは)電解亜鉛・クロム
処理によるクロム酸化物と亜鉛及び(又は)亜鉛酸化物
との混合皮膜から形成するのがよい。Based on this finding, the present invention provides a Zn-Ni alloy layer comprising 50 to 97% by weight Zn and 3 to 50% by weight Ni on the shiny side of a printed circuit copper foil in an amount of 100 to 500 μm.
The present invention provides a surface treatment method for a copper foil for a printed circuit, which is characterized in that it is formed with an adhesion amount of g / dm 2 and then a Cr-based rust preventive layer is formed on the Zn—Ni alloy layer. In this case, on the roughened surface (non-glossy surface) of the copper foil, Cu, Cr, N
It is preferable to perform a treat treatment for forming a single metal layer or an alloy layer of one or more selected from i, Fe, Co and Zn. To further improve weather resistance, C
It is preferable that the r-type rust preventive layer is formed of a chromium oxide film by immersion chromate treatment or electrolytic chromate treatment and / or a mixed film of chromium oxide and zinc and / or zinc oxide by electrolytic zinc / chromium treatment.
【0010】[0010]
【作用】印刷回路用銅箔の光沢面にZn−Ni合金皮膜
を形成する。Zn−Ni合金処理は、好ましくはZn−
Ni電解めっき浴を使用して、50〜97重量%Zn及
び3〜50重量%Niの組成のZn−Ni合金層を10
0〜500μg/dm2の付着量でごく薄く形成するよ
うに実施される。Ni量が3重量%未満では耐熱酸化性
の所要の向上が得られない。他方Ni量が50重量%を
超えると、半田濡れ性が悪化すると共に、耐熱酸化性も
また悪化する。Zn−Ni合金層の付着量が100μg
/dm2 未満では、耐熱酸化性の向上が得られない。他
方500μg/dm2 を超えると、Zn等の拡散により
導電性が悪化する。Zn−Ni合金層は銅箔光沢面の耐
熱酸化性を高め、しかも半田濡れ性、レジスト密着性と
いった他の特性を損なうことはない。Function: A Zn-Ni alloy film is formed on the glossy surface of the printed circuit copper foil. The Zn-Ni alloy treatment is preferably Zn-
Using a Ni electrolytic plating bath, a Zn-Ni alloy layer having a composition of 50 to 97 wt% Zn and 3 to 50 wt% Ni was used.
It is carried out so as to form a very thin film with an adhesion amount of 0 to 500 μg / dm 2 . If the amount of Ni is less than 3% by weight, the required improvement in thermal oxidation resistance cannot be obtained. On the other hand, when the amount of Ni exceeds 50% by weight, the solder wettability deteriorates and the thermal oxidation resistance also deteriorates. The amount of Zn-Ni alloy layer deposited is 100 μg
If it is less than / dm 2 , the improvement in thermal oxidation resistance cannot be obtained. On the other hand, when it exceeds 500 μg / dm 2 , conductivity is deteriorated due to diffusion of Zn and the like. The Zn-Ni alloy layer enhances the thermal oxidation resistance of the glossy surface of the copper foil and does not impair other properties such as solder wettability and resist adhesion.
【0011】[0011]
【実施例】本発明において使用する銅箔は、電解銅箔或
いは圧延銅箔いずれでもよい。本発明自体は銅箔の光沢
面と関与するが、参考までに銅箔粗化面についても述べ
ておく。通常、銅箔の、樹脂基材と接着する面即ち粗化
面には積層後の銅箔の引き剥し強さを向上させることを
目的として、脱脂後の銅箔の表面に例えば銅のふしこぶ
状の電着を行なう銅粗化処理が施される。こうした銅の
ふしこぶ状の電着はいわゆるヤケ電着により容易にもた
らされる。粗化前の前処理として通常の銅めっき等がそ
して粗化後の仕上げ処理として通常の銅めっき等が行な
われることもある。EXAMPLES The copper foil used in the present invention may be either electrolytic copper foil or rolled copper foil. Although the present invention is concerned with the glossy surface of the copper foil, the roughened surface of the copper foil will be described for reference. Usually, on the surface of the copper foil that is bonded to the resin substrate, that is, the roughened surface, for the purpose of improving the peeling strength of the copper foil after lamination, the surface of the copper foil after degreasing, for example, is made of copper Roughening treatment is carried out for performing electrodeposition of the shape. Such copper hump-like electrodeposition is easily brought about by so-called burn electrodeposition. Normal copper plating or the like may be performed as a pretreatment before roughening, and normal copper plating or the like may be performed as a finishing treatment after roughening.
【0012】銅粗化処理の例としては、例えば次の条件
が採用され得る。 銅粗化処理 Cu : 10〜25g/l H2SO4 : 20〜100g/l 温度 : 20〜40℃ Dk : 30〜70A/dm2 時間 : 1〜5秒The following conditions can be adopted as an example of the copper roughening treatment. Copper roughening treatment Cu: 10 to 25 g / l H 2 SO 4 : 20 to 100 g / l Temperature: 20 to 40 ° C. D k : 30 to 70 A / dm 2 hours: 1 to 5 seconds
【0013】粗化処理後に、該粗化面にCu、Cr、N
i、Fe、Co及びZnから選択される1種乃至2種以
上の単一金属層又は合金層を形成するトリート処理を行
なうことが好ましい。合金めっきの例としては、Cu−
Ni、Cu−Co、Cu−Ni−Co、Cu−Znその
他を挙げることが出来る(詳細は、特公昭56−902
8号、特開昭54−13971号、特開平2−2928
95号、特開平2−292894号、特公昭51−35
711号、特公昭54−6701号等を参照のこと)。
こうしたトリート処理は、銅箔の最終性状を決定するも
のとしてまた障壁としての役割を果たす。After the roughening treatment, Cu, Cr, N is formed on the roughened surface.
It is preferable to perform a treat treatment for forming a single metal layer or an alloy layer of one or more selected from i, Fe, Co and Zn. As an example of alloy plating, Cu-
Ni, Cu-Co, Cu-Ni-Co, Cu-Zn and the like can be mentioned (for details, see Japanese Patent Publication No. 56-902).
No. 8, JP-A-54-13971, JP-A-2-2928.
95, JP-A-2-292894, JP-B-51-35.
711, Japanese Examined Patent Publication No. 54-6701, etc.).
Such treat treatments serve as a determinant and barrier to the final properties of the copper foil.
【0014】本発明に従えば、銅箔の粗化面にトリート
処理を伴って或いは伴わずして、光沢面にZn−Ni合
金処理が実施される。Zn−Ni合金処理は、好ましく
はZn−Ni電解めっき浴を使用して50〜97重量%
Zn及び3〜50重量%Niを含むZn−Ni合金層を
100〜500μg/dm2 の付着量でごく薄く形成す
るように実施される。Ni量が3重量%未満では耐熱酸
化性の所要の向上が得られない。他方Ni量が50重量
%を超えると、半田濡れ性が悪化すると共に、耐熱酸化
性も悪化する。Zn−Ni合金層の付着量が100μg
/dm2 未満では、耐熱酸化性の向上が得られない。他
方500μg/dm2 を超えると、Zn等の拡散により
導電性が悪化する。また、フラックスを使用しない工程
では、半田濡れ性を悪化することも予想される。付着量
は外観が銅色とあまり変わらないようにするためにも上
記のような薄いものとされる。According to the present invention, the roughened surface of the copper foil is subjected to the Zn-Ni alloy treatment on the shiny side with or without the treatment. Zn-Ni alloy treatment is preferably 50-97 wt% using a Zn-Ni electroplating bath
A Zn-Ni alloy layer containing Zn and 3 to 50% by weight of Ni is formed to a very thin thickness with a deposition amount of 100 to 500 μg / dm 2 . If the amount of Ni is less than 3% by weight, the required improvement in thermal oxidation resistance cannot be obtained. On the other hand, when the amount of Ni exceeds 50% by weight, the solder wettability deteriorates and the thermal oxidation resistance also deteriorates. The amount of Zn-Ni alloy layer deposited is 100 μg
If it is less than / dm 2 , the improvement in thermal oxidation resistance cannot be obtained. On the other hand, when it exceeds 500 μg / dm 2 , conductivity is deteriorated due to diffusion of Zn and the like. Further, it is expected that the solder wettability will be deteriorated in the process in which no flux is used. The adhered amount is made thin as described above so that the appearance is not so different from the copper color.
【0015】Zn−Niめっき浴の組成及び条件例は次
の通りである: Zn:5〜50g/l Ni:5〜50g/l pH:2.5〜4 温度:30〜60℃ 電流密度:0.5〜5A/dm2 めっき時間:1〜10秒The composition and conditions of the Zn-Ni plating bath are as follows: Zn: 5 to 50 g / l Ni: 5 to 50 g / l pH: 2.5 to 4 Temperature: 30 to 60 ° C. Current density: 0.5-5 A / dm 2 Plating time: 1-10 seconds
【0016】Zn−Ni合金以外にも、Zn−Co合金
についても同等の効果が得られる。In addition to the Zn-Ni alloy, the same effect can be obtained with the Zn-Co alloy.
【0017】水洗後、Zn−Ni合金層上にCr系防錆
層を形成するための防錆処理が実施される。Cr系防錆
層とは、クロム酸化物の単独皮膜処理或いはクロム酸化
物と亜鉛及び(又は)亜鉛酸化物との混合皮膜処理の単
独或いは組合せにより形成されたクロム酸化物を主体と
する防錆層を云う。クロム酸化物の単独皮膜処理に関し
ては、浸漬クロメート或いは電解クロメートいずれでも
良い。耐候性が要求されるときには、電解クロメートが
好ましい。浸漬クロメート或いは電解クロメートの条件
は斯界で確立されている条件に従う。例えば、浸漬クロ
メート及び電解クロメート処理の条件例は次の通りであ
る: (A)浸漬クロメート処理 K2Cr2O7 :0.5〜1.5g/l pH:1.4〜2.4 温度:20〜60℃ 時間:3〜10秒 (B)電解クロメート処理 K2Cr2O7 (Na2Cr2O7或いはCrO3):2〜10g/l NaOH或いはKOH :10〜50g/l pH :7〜13 浴温 :20〜80℃ 電流密度 :0.05〜5 A/dm2 時間 :5〜30秒 アノード :Pt-Ti 板、ステンレス鋼板等After washing with water, a rust preventive treatment for forming a Cr rust preventive layer on the Zn-Ni alloy layer is carried out. The Cr-based rust preventive layer is a rust preventive layer mainly composed of chromium oxide formed by a single film treatment of chromium oxide or a mixed film treatment of chromium oxide with zinc and / or zinc oxide. Say a layer. For the single film treatment of chromium oxide, either immersion chromate or electrolytic chromate may be used. When weather resistance is required, electrolytic chromate is preferable. The conditions of immersion chromate or electrolytic chromate follow the conditions established in the art. For example, examples of conditions for immersion chromate treatment and electrolytic chromate treatment are as follows: (A) Immersion chromate treatment K 2 Cr 2 O 7 : 0.5 to 1.5 g / l pH: 1.4 to 2.4 Temperature : 20 to 60 ° C Time: 3 to 10 seconds (B) Electrolytic chromate treatment K 2 Cr 2 O 7 (Na 2 Cr 2 O 7 or CrO 3 ): 2 to 10 g / l NaOH or KOH: 10 to 50 g / l pH : 7 to 13 Bath temperature: 20 to 80 ° C Current density: 0.05 to 5 A / dm 2 hours: 5 to 30 seconds Anode: Pt-Ti plate, stainless steel plate, etc.
【0018】クロム酸化物と亜鉛/亜鉛酸化物との混合
物皮膜処理とは、亜鉛塩または酸化亜鉛とクロム酸塩と
を含むめっき浴を用いて電気めっきにより亜鉛または酸
化亜鉛とクロム酸化物とより成る亜鉛−クロム基混合物
の防錆層を被覆する処理であり、電解亜鉛・クロム処理
と呼ばれる。めっき浴としては代表的には、K2Cr2O7、N
a2Cr2O7等の重クロム酸塩やCrO3等の少なくとも一種
と、水溶性亜鉛塩、例えばZnO 、ZnSO4 ・7H2O等少なく
とも一種と、水酸化アルカリとの混合水溶液が用いられ
る。代表的なめっき浴組成と電解条件例は次の通りであ
る: (C)電解亜鉛・クロム処理 K2Cr2O7 (Na2Cr2O7或いはCrO3):2〜10g/l NaOH或いはKOH :10〜50g/l ZnO 或いはZnSO4 ・7H2O:0.05〜10g/l pH :7〜13 浴温 :20〜80℃ 電流密度 :0.05〜5 A/dm2 時間 :5〜30秒 アノード :Pt-Ti 板、ステンレス鋼板等 クロム酸化物はクロム量として15μg/dm2 以上そして
亜鉛は30μg/dm2 以上の被覆量が要求される。粗面側
と光沢面側とで厚さを異ならしめても良い。こうした防
錆方法は、特公昭58−7077、61−33908、
62−14040等に記載されている。クロム酸化物単
独の皮膜処理及びクロム酸化物と亜鉛/亜鉛酸化物との
混合物皮膜処理の組合せも有効である。The treatment of a mixture of chromium oxide and zinc / zinc oxide is carried out by electroplating zinc or zinc oxide and chromium oxide using a plating bath containing zinc salt or zinc oxide and chromate. This is a treatment for coating the rust preventive layer of the zinc-chromium group mixture, which is called electrolytic zinc-chromium treatment. The plating bath is typically K 2 Cr 2 O 7 , N
A mixed aqueous solution of at least one dichromate such as a 2 Cr 2 O 7 or CrO 3 and at least one water-soluble zinc salt such as ZnO or ZnSO 4 .7H 2 O and an alkali hydroxide is used. .. Typical plating bath compositions and examples of electrolysis conditions are as follows: (C) Electrolytic zinc / chromium treatment K 2 Cr 2 O 7 (Na 2 Cr 2 O 7 or CrO 3 ): 2 to 10 g / l NaOH or KOH: 10 to 50 g / l ZnO or ZnSO 4 · 7H 2 O: 0.05~10g / l pH: 7~13 bath temperature: 20 to 80 ° C. current density: 0.05 to 5 A / dm 2 Time: 5 ~ 30 seconds Anode: Pt-Ti plate, stainless steel plate, etc. Chromium oxide requires a chromium amount of 15 µg / dm 2 or more and zinc has a coating amount of 30 µg / dm 2 or more. The rough surface side and the glossy surface side may have different thicknesses. Such rust prevention methods are disclosed in Japanese Patent Publications Sho 58-7077, 61-33908,
62-14040 and the like. A combination of chromium oxide alone and a mixture of chromium oxide and zinc / zinc oxide is also effective.
【0019】水洗及び乾燥後得られた銅箔は、従来の亜
鉛めっき+クロメート処理の方法では、例えば200℃
×30分程度しか耐熱酸化性がなかったのに対して、2
40℃×30分或いは270℃×10分の高温条件でも
変色しない耐熱酸化性を具備する。しかも、半田濡れ
性、レジスト密着性といった他の特性を損なうものでは
ない。The copper foil obtained after washing and drying with water is, for example, 200 ° C. by the conventional method of zinc plating + chromate treatment.
It had a heat-resistant oxidation resistance of only about × 30 minutes, while 2
It has thermal oxidation resistance that does not discolor even under high temperature conditions of 40 ° C x 30 minutes or 270 ° C x 10 minutes. Moreover, it does not impair other properties such as solder wettability and resist adhesion.
【0020】最後に、必要に応じ、銅箔と樹脂基板との
接着力の改善を主目的として、防錆層上の少なくとも粗
化面にシランカップリング剤を塗布するシラン処理が施
される。塗布方法は、シランカップリング剤溶液のスプ
レーによる吹付け、コーターでの塗布、浸漬、流しかけ
等いずれでもよい。例えば、特公昭60−15654号
は、銅箔の粗面側にクロメート処理を施した後シランカ
ップリング剤処理を行なうことによって銅箔と樹脂基板
との接着力を改善することを記載している。詳細はこれ
を参照されたい。Finally, if necessary, a silane treatment for applying a silane coupling agent to at least the roughened surface of the rust preventive layer is performed for the main purpose of improving the adhesive force between the copper foil and the resin substrate. The coating method may be spraying of a silane coupling agent solution, coating with a coater, dipping, pouring, or the like. For example, Japanese Examined Patent Publication No. 60-15654 discloses that the adhesion between the copper foil and the resin substrate is improved by subjecting the rough surface side of the copper foil to a chromate treatment and then a silane coupling agent treatment. .. For details, refer to this.
【0021】この後、必要に応じて、銅箔の延性を改善
する目的で焼鈍処理を施すこともある。Thereafter, if necessary, an annealing treatment may be performed for the purpose of improving the ductility of the copper foil.
【0022】(実施例及び比較例)圧延銅箔に、(1)
Zn−Ni合金或いはZn単独めっき→水洗→(2)C
r浸漬めっき→水洗→乾燥に手順で表面処理を施した
(光沢面)。一方、粗化面は銅粗化後、Cu−Ni処理
を施し、その後Cr浸漬めっきを行った。(1)Zn−
Ni合金めっき及び(2)Cr浸漬めっき並びに(3)
Cu−Ni合金めっきの条件は次の通りとした: (1)Zn−Ni(又はZn単独)合金めっき Zn:20g/l Ni:零又は10g/l pH:3 温度:40℃ 電流密度:2A/dm2 めっき時間:1.5秒 (2)Cr浸漬めっき K2Cr2O7 :1g/l pH:2.0 温度:40℃ 時間:5秒 (3)Cu−Ni合金めっき Cu:5〜10g/l Ni:10〜20g/l pH:1〜4 温度:20〜40℃ 電流密度:10〜30A/dm2 めっき時間:2〜5秒(Examples and Comparative Examples) A rolled copper foil was provided with (1)
Zn-Ni alloy or Zn single plating → washing → (2) C
r Surface treatment was applied in the order of immersion plating → washing with water → drying (glossy surface). On the other hand, the roughened surface was subjected to Cu-Ni treatment after copper roughening, and then Cr immersion plating. (1) Zn-
Ni alloy plating and (2) Cr immersion plating and (3)
The conditions of Cu-Ni alloy plating were as follows: (1) Zn-Ni (or Zn alone) alloy plating Zn: 20 g / l Ni: zero or 10 g / l pH: 3 Temperature: 40 ° C Current density: 2A / dm 2 plating time: 1.5 seconds (2) Cr dipping plating K 2 Cr 2 O 7 : 1 g / l pH: 2.0 Temperature: 40 ° C. Time: 5 seconds (3) Cu-Ni alloy plating Cu: 5 -10g / l Ni: 10-20g / l pH: 1-4 Temperature: 20-40 ° C Current density: 10-30A / dm 2 Plating time: 2-5 seconds
【0023】得られた製品の光沢面について、表面付着
量、ベーキングテスト及び半田濡れ性について試験を行
なった。尚、表面分析は、粗化面をFR−4等の基板材
料でプレスしてマスキングし、酸に浸漬して光沢面のみ
のZn及びNiを溶解させ、原子吸光法により分析し
た。ベーキングテストは、銅箔600mm巾×100m
m長さの試片を所定のオーブン中に投入し、取り出した
後、光沢面の変色の有無を確認した(判断基準0=変色
なし。×=変色あり)。半田濡れ性については、フラッ
クスとして田村化研社製JS64を使用して半田槽にプ
レスした基板を垂直に浸漬し、基板表面に沿って吸い上
げられた半田の濡れ角度を求めた。角度が小さい程半田
濡れ性が良い。The glossy surface of the obtained product was tested for surface adhesion, baking test and solder wettability. In the surface analysis, the roughened surface was pressed with a substrate material such as FR-4 for masking, immersed in an acid to dissolve Zn and Ni only on the glossy surface, and analyzed by an atomic absorption method. Baking test is copper foil 600mm width x 100m
After the m-length test piece was put into a predetermined oven and taken out, the presence or absence of discoloration on the glossy surface was confirmed (judgment criterion 0 = no discoloration. × = discoloration). Regarding solder wettability, the pressed board was vertically dipped in a solder bath using JS64 manufactured by Tamura Kaken Co., Ltd. as a flux, and the wetting angle of the solder sucked along the board surface was obtained. The smaller the angle, the better the solder wettability.
【0024】試験結果は次の通りである: No. Zn Ni 付着量( μg/dm2 ) ベーキングテスト 半田濡れ性 (g/l) (g/l) Zn Ni Cr 240oC/30min 270oC/30min 濡れ角 濡れ性 1 20 0 230 -- 26 × × 39.5 100% 2 20 10 230 28 26 ○ ○ 42.7 100%The test results are as follows: No. Zn Ni adhesion amount (μg / dm 2 ) Baking test Solder wettability (g / l) (g / l) Zn Ni Cr 240 o C / 30min 270 o C / 30min Wetting angle Wetting 1 20 0 230 --26 × × 39.5 100% 2 20 10 230 28 26 ○ ○ 42.7 100%
【0025】以上の試験結果から、次の事項が確認され
る。 Znめっき製品に対してZn−Niめっき製品は皮膜
中にNiが約11%入った。 光沢面耐熱酸化性は、Znめっき品では変色したのに
対し、Zn−Niめっき品では変色せず、非常に良好で
ある。 半田濡れについては、いずれも差がほとんどなく、濡
れも100%であることから問題がない。From the above test results, the following matters are confirmed. About 11% of Ni was contained in the coating of the Zn-Ni plated product with respect to the Zn plated product. The glossy surface thermal oxidation resistance is very good, while the Zn-plated product discolored, whereas the Zn-Ni plated product did not discolor. There is almost no difference in solder wetting and there is no problem because the wetting is 100%.
【0026】[0026]
【発明の効果】従来の亜鉛めっき+クロメート処理方法
製品よりも耐熱酸化性を改善した本発明品は、今後のプ
リント基板製造時の熱履歴に対しても銅箔光沢面の変色
を防止し、しかも半田濡れ性、レジスト密着性といった
他の特性を損なうことがなく、今後のプリント基板用銅
箔の要求に対処しうる。EFFECTS OF THE INVENTION The product of the present invention, which has improved thermal oxidation resistance as compared with the conventional zinc plating + chromate treatment method product, prevents discoloration of the copper foil glossy surface against future heat history at the time of printed circuit board manufacturing, Moreover, other characteristics such as solder wettability and resist adhesiveness are not impaired, and future demands for copper foils for printed circuit boards can be met.
Claims (3)
量%Znと3〜50重量%Niとから成るZn−Ni合
金層を100〜500μg/dm2 の付着量で形成し、
その後該Zn−Ni合金層上にCr系防錆層を形成する
ことを特徴とする印刷回路用銅箔の表面処理方法。1. A Zn-Ni alloy layer comprising 50 to 97% by weight Zn and 3 to 50% by weight Ni is formed on the shiny side of a copper foil for a printed circuit at an adhesion amount of 100 to 500 μg / dm 2 .
Thereafter, a Cr-based rust preventive layer is formed on the Zn-Ni alloy layer, which is a surface treatment method for a copper foil for a printed circuit.
Fe、Co及びZnから選択される1種乃至2種以上の
単一金属層又は合金層を形成するトリート処理を行なう
ことを特徴とする請求項1の印刷回路用銅箔の表面処理
方法。2. Cu, Cr, Ni, on the roughened surface of the copper foil,
The surface treatment method for a copper foil for a printed circuit according to claim 1, wherein a treat treatment for forming a single metal layer or an alloy layer of one or more selected from Fe, Co and Zn is performed.
クロメート処理によるクロム酸化物皮膜及び(或いは)
電解亜鉛・クロム処理によるクロム酸化物と亜鉛及び
(又は)亜鉛酸化物との混合皮膜から形成することを特
徴とする請求項1乃至2の印刷回路用銅箔の表面処理方
法。3. A chromium oxide film and / or a chromium-based rust preventive layer formed by immersion chromate treatment or electrolytic chromate treatment.
The method for surface treatment of a copper foil for a printed circuit according to claim 1 or 2, which is formed from a mixed film of chromium oxide and zinc and / or zinc oxide by electrolytic zinc / chromium treatment.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3326674A JP2517503B2 (en) | 1991-11-15 | 1991-11-15 | Surface treatment method for copper foil for printed circuits |
TW081107613A TW230290B (en) | 1991-11-15 | 1992-09-25 | |
MYPI92001742A MY109952A (en) | 1991-11-15 | 1992-09-29 | Surface treatment method of a copper foil for printed circuits. |
EP92117930A EP0541997B1 (en) | 1991-11-15 | 1992-10-20 | Surface treatment method of a copper foil for printed circuits |
DE69208324T DE69208324T2 (en) | 1991-11-15 | 1992-10-20 | Process for the surface treatment of a copper foil for printed circuits |
US08/327,138 US5456817A (en) | 1991-11-15 | 1994-10-21 | Surface treatment method of a copper foil for printed circuits |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3326674A JP2517503B2 (en) | 1991-11-15 | 1991-11-15 | Surface treatment method for copper foil for printed circuits |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05140765A true JPH05140765A (en) | 1993-06-08 |
JP2517503B2 JP2517503B2 (en) | 1996-07-24 |
Family
ID=18190397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3326674A Expired - Lifetime JP2517503B2 (en) | 1991-11-15 | 1991-11-15 | Surface treatment method for copper foil for printed circuits |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2517503B2 (en) |
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US6524723B2 (en) | 2000-04-28 | 2003-02-25 | Fukuda Metal Foil & Powder Co., Ltd. | Copper foil for printed circuit boards and its surface treatment method |
DE19512196B4 (en) * | 1994-04-15 | 2004-07-15 | Fukuda Metal Foil & Powder Co., Ltd. | Copper foils for base material of printed circuits and methods for surface treatment of the copper foils |
WO2005120139A1 (en) * | 2004-06-03 | 2005-12-15 | Mitsui Mining & Smelting Co., Ltd. | Surface-treated copper foil and flexible copper-clad laminate plate and film carrier tape manufactured by use of the surface-treated copper foil |
JP2006173549A (en) * | 2004-11-18 | 2006-06-29 | Nikko Metal Manufacturing Co Ltd | Metallic material for printed-circuit board |
JP2006339304A (en) * | 2005-05-31 | 2006-12-14 | Nikko Kinzoku Kk | Metal material for printed circuit board |
JP2008041972A (en) * | 2006-08-08 | 2008-02-21 | Nikko Kinzoku Kk | Metal material for printed-wiring board |
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1991
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DE19512196B4 (en) * | 1994-04-15 | 2004-07-15 | Fukuda Metal Foil & Powder Co., Ltd. | Copper foils for base material of printed circuits and methods for surface treatment of the copper foils |
US6524723B2 (en) | 2000-04-28 | 2003-02-25 | Fukuda Metal Foil & Powder Co., Ltd. | Copper foil for printed circuit boards and its surface treatment method |
WO2005120139A1 (en) * | 2004-06-03 | 2005-12-15 | Mitsui Mining & Smelting Co., Ltd. | Surface-treated copper foil and flexible copper-clad laminate plate and film carrier tape manufactured by use of the surface-treated copper foil |
JP2006173549A (en) * | 2004-11-18 | 2006-06-29 | Nikko Metal Manufacturing Co Ltd | Metallic material for printed-circuit board |
JP4538375B2 (en) * | 2005-05-31 | 2010-09-08 | 日鉱金属株式会社 | Metal materials for printed wiring boards |
JP2006339304A (en) * | 2005-05-31 | 2006-12-14 | Nikko Kinzoku Kk | Metal material for printed circuit board |
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US8142905B2 (en) * | 2008-06-17 | 2012-03-27 | Jx Nippon Mining & Metals Corporation | Copper foil for printed circuit board and copper clad laminate for printed circuit board |
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