JPH0513936A - Recoverying method for water from thin drain of cleaning water for printed substrate - Google Patents

Recoverying method for water from thin drain of cleaning water for printed substrate

Info

Publication number
JPH0513936A
JPH0513936A JP3015943A JP1594391A JPH0513936A JP H0513936 A JPH0513936 A JP H0513936A JP 3015943 A JP3015943 A JP 3015943A JP 1594391 A JP1594391 A JP 1594391A JP H0513936 A JPH0513936 A JP H0513936A
Authority
JP
Japan
Prior art keywords
water
wastewater
cleaning
printed circuit
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3015943A
Other languages
Japanese (ja)
Other versions
JP2754925B2 (en
Inventor
Akio Urata
昭雄 浦田
Mari Kokubu
真理 国分
Setsuko Iso
節子 礒
Akiyo Yoshiyagawa
陽代 吉谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Organo Corp
Original Assignee
Organo Corp
Japan Organo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organo Corp, Japan Organo Co Ltd filed Critical Organo Corp
Priority to JP3015943A priority Critical patent/JP2754925B2/en
Publication of JPH0513936A publication Critical patent/JPH0513936A/en
Application granted granted Critical
Publication of JP2754925B2 publication Critical patent/JP2754925B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Water Treatment By Sorption (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Physical Water Treatments (AREA)

Abstract

PURPOSE:To reproduce the processed water in a sterilized state at a reusable level for rinse shower in the title water recovery method from thin drain produced by the cleaning step of soldered printed substrate. CONSTITUTION:Within the title water recovery method from the thin drain containing respective removal steps such as the fine particle removing step using microfilms 2 and/or 9; the organic matter removing step using an active carbon adsorption tower 3; and the metallic ion content and organic acid content removing step using an ion-exchange resin towers 4 and 5 or a mixed bed tower 10, the other step ultraviolet sterilizing the processed water by said organic matter removing step and metallic ion content, organic acid content removing step using UV sterilizer 7 is further added to the title water recovery method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント基板洗浄希薄
排水からの水の回収方法に関し、より具体的には、フラ
ックスを使用した半田付け工程を経たプリント基板の水
洗浄により生成する希薄排水から水を回収する方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for recovering water from diluted waste water for cleaning printed circuit boards, and more specifically, to a method for recovering water from diluted waste water produced by cleaning the printed circuit board with water using a soldering process using flux. It relates to a method of collecting water.

【0002】[0002]

【従来の技術】従来、電子工業におけるプリント基板の
半田付け工程に使用するフラックスの残渣を洗い落とす
洗浄剤としてフロン系溶剤(特に、フロン113)が広
く使用されてきた。しかし、フロン系溶剤のオゾン層破
壊が世界的な環境問題として大きく取り上げられるよう
になり、フロン系溶剤の使用が規制されることが確実と
なった(日本については、「特定物質の規制等によるオ
ゾン層の保護に関する法律」参照)。この環境問題に関
しては、種々の対応策の模索検討がなされているが、経
済性や、実用化まで長期を要する等の諸問題を抱えてお
り、当面の早期対応策の一つとして、水溶性フラックス
の開発と水によるプリント基板の洗浄(主に、米国)、
フロン系溶剤の代替洗浄剤としてのアルカリ鹸化剤等が
検討実施化されつつある。
2. Description of the Related Art Conventionally, a chlorofluorocarbon solvent (in particular, chlorofluorocarbon 113) has been widely used as a cleaning agent for washing off flux residue used in a soldering process of a printed circuit board in the electronic industry. However, the depletion of the ozone layer of CFC-based solvents has become a major environmental issue worldwide, and it has become certain that the use of CFC-based solvents will be regulated. Law concerning the protection of the ozone layer "). Regarding this environmental problem, various countermeasures are being investigated and examined, but there are various problems such as economic efficiency and long-term practical application. Development of flux and cleaning of printed circuit boards with water (mainly in the US),
Alkali saponification agents and the like as alternative cleaning agents for CFC-based solvents are being studied and implemented.

【0003】ここで、フラックスの内容について簡単に
説明しておく。周知のように、フラックスの作用は、
(1)半田及び母材金属の表面に存在するか半田付け中
に生成する酸化物等と反応して、かかる酸化物等を塩化
物、臭化物、有機酸塩、アミン錯塩等のような可溶性化
合物に転化させることと、(2)半田付け作業温度にお
いて、液体状態で半田付け部分の表面を覆い非酸化性環
境を造って、半田の流動や接合を阻害する酸化を防ぐこ
とである。
Here, the contents of the flux will be briefly described. As is well known, the action of flux is
(1) Soluble compound such as chloride, bromide, organic acid salt, amine complex salt, etc., which reacts with an oxide or the like existing on the surface of the solder or the base metal or generated during soldering And (2) at the soldering working temperature, to cover the surface of the soldered portion in a liquid state to create a non-oxidizing environment and prevent oxidation that hinders the flow and bonding of the solder.

【0004】各種の従来フラックスの内、非腐食性の樹
脂フラックスとしてロジンフラックスが有る。これに
は、ディップ式半田用フラックス(成分:ロジン、有機
酸、有機アミン、有機溶剤等)、フラックスと粉末半田
を練ったクリーム半田(成分:半田約90%、ロジン主
成分のフラックス約10%;チップを乗せるプリント基
板部分にクリーム半田を印刷し、遠赤外線炉で半田付け
を行う方式で使用する)が有る。この場合、半田付けさ
れたプリント基板からフラックス残渣を洗い落とすのに
アルカリ鹸化剤を使用するのである。なお、ロジンが上
記作用(2)を主に担う。
Among various conventional fluxes, rosin flux is a non-corrosive resin flux. This includes dip-type solder flux (component: rosin, organic acid, organic amine, organic solvent, etc.), cream solder prepared by mixing flux and powdered solder (component: solder approximately 90%, rosin-based flux approximately 10%). A method of printing cream solder on the printed circuit board part on which the chip is placed and soldering it in a far infrared furnace). In this case, an alkali saponifying agent is used to wash off the flux residue from the soldered printed circuit board. In addition, rosin mainly plays the above-mentioned function (2).

【0005】最近開発された水溶性フラックスには、有
機酸フラックスや水溶性ロジンフラックスが有る。
Recently developed water-soluble fluxes include organic acid fluxes and water-soluble rosin fluxes.

【0006】上記ロジンフラックスで半田付け工程を行
った場合、プリント基板をアルカリ鹸化剤で洗浄してフ
ラックス残渣を落とす際に、ロジンは容易に落ちない成
分である。このため、アルカリ鹸化剤の組成は、有機ア
ミンの他に、有機溶剤としての多量のアルコール類、界
面活性剤等を含み、約5ないし25重量%の濃度で洗浄
に使用される。
When the soldering process is performed with the rosin flux, the rosin is a component that does not easily drop when the printed board is washed with an alkali saponifying agent to remove the flux residue. Therefore, the composition of the alkali saponifying agent contains, in addition to the organic amine, a large amount of alcohol as an organic solvent, a surfactant and the like, and is used for washing at a concentration of about 5 to 25% by weight.

【0007】上記の場合、プリント基板の洗浄は、まず
アルカリ鹸化剤を使用した洗浄剤シャワーでフラックス
残渣を落とし、次ぎにすすぎシャワーで粗洗いを行う。
続いて、リンスシャワーで仕上げ洗いを行うが、この仕
上げ洗いの排水を処理して、例えば、再びリンスシャワ
ーに使用できる水とすることが試みられている。
In the above case, the printed circuit board is cleaned by first removing the flux residue with a cleaning agent shower using an alkali saponifying agent, and then roughly washing with a rinsing shower.
Subsequently, finish washing is performed with a rinse shower, and it has been attempted to treat the wastewater of this finish washing to make water that can be used again for the rinse shower.

【0008】また、水溶性フラックスの場合は、上記洗
浄剤シャワーでの洗浄工程が不要となるだけで他は同様
であり、この場合も、仕上げ洗いの排水を処理してリン
スシャワーに再使用することが試みられている。
Further, in the case of water-soluble flux, the same as the above except that the cleaning step in the above-mentioned cleaning agent shower is not necessary, and in this case also, the waste water of finish cleaning is treated and reused in the rinse shower. Is being attempted.

【0009】かかる排水処理に用いられる排水処理再生
システムの基本的な構成は、微粒子除去工程、有機物除
去工程、及びイオン性物質除去工程(金属イオン分除去
工程とハロゲン物質・有機酸除去工程に分離されている
場合も有れば、両成分除去を一工程で行う場合も有る)
からなる。
The basic constitution of the wastewater treatment / regeneration system used for such wastewater treatment is a fine particle removing process, an organic substance removing process, and an ionic substance removing process (separating into a metal ion content removing process and a halogen substance / organic acid removing process). In some cases, both components may be removed in one step.)
Consists of.

【0010】しかし、プリント基板洗浄は、約40℃な
いし約70℃の比較的高温で行われるところから、上記
各工程を経て得られる処理水(実質的純水)でも菌が繁
殖し易くスライムが生ずることが多い。かかる処理水を
再びリンスシャワーに使用すると、シャワーノズルが詰
まったり、プリント基板を汚染しその合格率の低下を招
く等のトラブルを生ずる。
However, since the printed circuit board is washed at a relatively high temperature of about 40 ° C. to about 70 ° C., the treated water (substantially pure water) obtained through the above-mentioned steps is prone to bacterial growth and slime. It often happens. When such treated water is used again in the rinse shower, problems such as clogging of the shower nozzle and contamination of the printed circuit board and a reduction in the pass rate thereof occur.

【0011】[0011]

【発明が解決しようとする問題点】このような従来技術
の欠点に鑑み、本発明は、リンスシャワーに再使用でき
るレベルの殺菌状態の処理水を与えるプリント基板洗浄
希薄排水からの水の回収方法を提供することを目的とす
る。
SUMMARY OF THE INVENTION In view of the above-mentioned drawbacks of the prior art, the present invention provides a method for recovering water from diluted wastewater for cleaning a printed circuit board, which provides sterilized treated water at a level that can be reused in a rinse shower. The purpose is to provide.

【0012】[0012]

【問題点を解決するための手段】上記の目的を達成する
ために、本発明は、プリント基板の洗浄により生成する
希薄排水から水を回収する方法において、排水から有機
物を除去する工程、有機物除去工程を経た処理水から金
属イオン分及び有機酸分を除去する工程、及び金属イオ
ン分・有機酸分除去工程を経た処理水を紫外線殺菌する
工程、更に、排水又はいづれかの処理水から微粒子を除
去する工程を包含するプリント基板洗浄希薄排水からの
水の回収方法を提供するものである。
In order to achieve the above object, the present invention provides a method for recovering water from dilute wastewater produced by cleaning a printed circuit board, the step of removing organic matter from the wastewater, and the removal of organic matter. A step of removing metal ions and organic acids from the treated water that has gone through the steps, and a step of sterilizing the treated water after the steps of removing metal ions and organic acids with ultraviolet rays, and further removing fine particles from the wastewater or any of the treated water. The present invention provides a method of recovering water from diluted wastewater for cleaning a printed circuit board, which includes the step of:

【0013】[0013]

【作用】排水ないし処理水の殺菌に、通常の酸化系殺菌
剤(例えば、オゾン、過酸化水素、遊離塩素、次亜塩素
酸イオン)を使用すると、得られる純水をプリント基板
の洗浄に再使用する際に、プリント基板の金属部分が腐
食する問題を避けることができない。これに対し、本発
明に従い紫外線殺菌を行うと上記の腐食の問題を避ける
ことができる。なお、ここで「殺菌」と言っても、有機
物除去工程を経た処理水中に残る有機物を紫外線で酸化
し、殺菌とともにCOD(化学的酸素消費量)を充分に
低減させる意味も含む。
[Function] When normal oxidizing bactericidal agents (for example, ozone, hydrogen peroxide, free chlorine, hypochlorite ion) are used for sterilizing waste water or treated water, the pure water obtained is reused for cleaning the printed circuit board. In use, the problem of corroding the metal parts of the printed circuit board is unavoidable. On the other hand, when the ultraviolet sterilization is performed according to the present invention, the above problem of corrosion can be avoided. It should be noted that the term "sterilization" used herein also includes the meaning that the organic matter remaining in the treated water that has undergone the organic matter removal step is oxidized by ultraviolet rays to sterilize and reduce COD (chemical oxygen consumption) sufficiently.

【0014】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0015】ロジンフラックスを使用した場合のプリン
ト基板の洗浄に使用するアルカリ鹸化剤は、排水処理設
備を考えた場合、濃度が大変高いものであり、原液の一
例を挙げれば、TOC(全有機性炭素)約480000mg/l
前後、BOD(生物学的酸素要求量)約130000mg/l 前
後、COD約67000 mg/l 前後で、pHが10ないし1
1.7であり、水で約4倍に希釈して実際の洗浄に使用
する。
The alkali saponifying agent used for cleaning the printed circuit board when rosin flux is used has a very high concentration in consideration of waste water treatment equipment. To give an example of the undiluted solution, TOC (total organic Carbon) About 480,000 mg / l
Before and after, BOD (biological oxygen demand) around 130000 mg / l, COD around 67,000 mg / l, pH 10 to 1
1.7, which is diluted with water about 4 times and used for actual cleaning.

【0016】かかる希釈アルカリ鹸化剤を洗浄剤シャワ
ーとして半田付けプリント基板上に供給し、フラックス
残渣を落とし、プリント基板をすすぎシャワーですすい
だ後、更に、リンスシャワーで仕上げ洗いを行って生ず
るこの仕上げ洗いの排水が本発明の方法により処理され
る排水の一つである。従って、かかる排水には、フラッ
クスに由来する汚染物、プリント基板に由来する汚染
物、アルカリ鹸化剤に由来する汚染物等が含まれ、その
水質は、TOC約15ml/l前後、懸濁物質約1mg/l 前
後、導電率約40μs/cm前後、金属類約5mg/l 前後、
pH約9前後である。
This diluted alkaline saponification agent is supplied as a cleaning agent shower onto the soldered printed circuit board to remove flux residue, rinse the printed circuit board with a rinse shower, and then carry out a final wash with a rinse shower to produce this finish. Wash effluent is one of the effluents treated by the method of the present invention. Therefore, such wastewater contains contaminants derived from flux, contaminants derived from printed circuit boards, contaminants derived from alkali saponification agents, etc., and its water quality is about 15 ml / l of TOC, About 1 mg / l, conductivity about 40 μs / cm, metal about 5 mg / l,
The pH is around 9.

【0017】水溶性フラックスを使用した場合は、前述
したように洗浄剤シャワーでのプリント基板の洗浄が無
く、従って、この場合の排水にはフラックスに由来する
汚染物、プリント基板に由来する汚染物等を含み、洗浄
剤に由来する汚染物は含まない。
When the water-soluble flux is used, the printed circuit board is not washed with the cleaning agent shower as described above. Therefore, in this case, the drainage is a contaminant derived from the flux and a contaminant derived from the printed circuit board. Etc., but does not include contaminants derived from the cleaning agent.

【0018】かかる排水から、まず、例えば、10μm
前後の孔径を有するマイクロフィルターで微粒子(塵、
ロジン、半田ボール等)の除去を行う。この工程は必須
のものでは無く、例えば、水溶性フラックスを使用した
場合のように、比較的大きな微粒子が排水に含まれ無い
時は省略して後に述べる比較的小さな微粒子の除去工程
のみとすることができる場合も有る。
From such drainage, first, for example, 10 μm
A micro filter with front and rear pore size
Rosin, solder balls, etc.) are removed. This step is not essential. For example, when relatively large particles are not included in the waste water, such as when using a water-soluble flux, omit it and only perform the relatively small particle removal step described later. There are cases where you can do it.

【0019】次ぎに、上記の微粒子除去工程を経たか又
は経ない排水を、例えば、活性炭を充填した活性炭吸着
塔に通液し、有機物(主に、有機溶剤等の非イオン性有
機物)を除去する(TOCの低減)。
Next, the wastewater that has or has not passed through the fine particle removal step is passed through, for example, an activated carbon adsorption tower filled with activated carbon to remove organic substances (mainly nonionic organic substances such as organic solvents). Yes (TOC reduction).

【0020】次ぎに、有機物を除去した処理水から金属
イオン分と有機酸分の除去を行う。金属イオン分はプリ
ント基板に設けられた金属部分の溶解したもので、鉛、
銅、亜鉛、錫、アルミニウム等のイオンを含む。一方、
有機酸分はフラックスに由来する。
Next, metal ions and organic acids are removed from the treated water from which organic substances have been removed. The metal ion component is the dissolved metal part of the printed circuit board.
Contains ions such as copper, zinc, tin, and aluminum. on the other hand,
Organic acid is derived from flux.

【0021】この金属イオン分・有機酸分の除去は、例
えば、カチオン交換樹脂とアニオン交換樹脂とからなる
混合樹脂を充填した混床を有するイオン交換樹脂塔に有
機物除去処理水を通液し、両者を同時に除去してもよ
く、カチオン交換樹脂床を有するイオン交換樹脂塔とア
ニオン交換樹脂床を有するイオン交換樹脂塔に通液し、
各々除去していってもよい。後者の場合、両樹脂床の順
序は任意であり、どちらの樹脂床に先に通液してもよ
い。なお、有機酸分は、通常アニオン交換樹脂に吸着さ
れるが、有機酸分除去処理中に、ハロゲン酸等の無機酸
類が含まれる場合は、アニオン交換樹脂により、同時に
除去される。
The removal of the metal ion component / organic acid component is carried out by, for example, passing the organic substance-removing treated water through an ion exchange resin tower having a mixed bed filled with a mixed resin composed of a cation exchange resin and an anion exchange resin, Both may be removed at the same time, passing through an ion exchange resin column having a cation exchange resin bed and an ion exchange resin column having an anion exchange resin bed,
Each may be removed. In the latter case, the order of both resin beds is arbitrary, and either resin bed may be passed through first. The organic acid component is usually adsorbed on the anion exchange resin, but if inorganic acid such as halogen acid is contained in the organic acid component removal treatment, it is simultaneously removed by the anion exchange resin.

【0022】金属イオン分・有機酸分を除去した処理水
に対して、次ぎに紫外線殺菌を行う。前述したように、
プリント基板の洗浄と排水処理再生の一貫システムは、
約40℃ないし約70℃の水温度で一日当り8ないし1
6時間運転するのが通常であり、折角の処理水中で菌の
繁殖が多く、前述のようなトラブルを生じ易いので、滅
菌の必要が生ずる。
The treated water from which the metal ions and organic acids have been removed is then subjected to ultraviolet sterilization. As previously mentioned,
An integrated system for cleaning printed circuit boards and recycling wastewater
8 to 1 per day at a water temperature of about 40 ° C to about 70 ° C
It is usually operated for 6 hours, and bacteria are often proliferated in the treated water, and the above-mentioned troubles are likely to occur. Therefore, sterilization is necessary.

【0023】以上の様な処理を終えた処理水は、リンス
シャワーノズルに送る前に、例えば、孔径3μm 前後の
マイクロフィルターを通し、残存する微粒子を除去する
のが好ましく、前述した微粒子除去工程を経ていない場
合は、この段階での微粒子除去が必要である。
The treated water after the above treatment is preferably passed through, for example, a microfilter having a pore size of about 3 μm to remove the remaining fine particles before being sent to the rinse shower nozzle. If not, it is necessary to remove fine particles at this stage.

【0024】上記のような排水処理システムに、熱交換
器を組み込んでもよい。例えば、少なくとも金属イオン
分・有機酸分除去工程を経た処理水の少なくとも一部を
少なくとも有機物除去工程の前に設けられた熱交換器に
戻し、排水と熱交換する。例えば、温度が約60℃の排
水と幾つかの工程を経て熱放散により約45℃程度に温
度低下した処理水とを熱交換し、排水の温度を約50℃
前後に低下させて次の工程へ送る。これは、(1)有機
物除去工程で用いる活性炭は、温度が低い方が吸着効率
が高いので、排水温度を少しでも低下させておく方が良
いこと、(2)有機酸除去に用いるアニオン交換樹脂は
温度の低い液を通した方が、経時的交換容量の低減傾向
を抑えることができること、(3)リンスシャワーに再
利用する処理水(純水)の温度上昇を部分的に上記熱交
換で行うことになるので、省エネルギー化を図ることが
できること等の理由による。
A heat exchanger may be incorporated in the waste water treatment system as described above. For example, at least a part of the treated water that has undergone at least the metal ion / organic acid removal step is returned to the heat exchanger provided at least before the organic matter removal step, and exchanges heat with waste water. For example, the waste water having a temperature of about 60 ° C. and the treated water whose temperature has been lowered to about 45 ° C. due to heat dissipation through several steps are heat-exchanged to reduce the temperature of the waste water to about 50 ° C.
Lower it back and forth and send it to the next step. This is because (1) the activated carbon used in the organic matter removal step has a higher adsorption efficiency at lower temperatures, so it is better to lower the drainage temperature as much as possible. (2) Anion exchange resin used for organic acid removal It is possible to suppress the tendency for the exchange capacity to decrease over time by passing a liquid with a low temperature, and (3) increase the temperature of the treated water (pure water) reused for the rinse shower partially by the heat exchange. This is for the reason that energy saving can be achieved.

【0025】次ぎに、処理水の水質分析管理について述
べる。
Next, the water quality analysis management of the treated water will be described.

【0026】有機物総量を知る上で、COD測定では過
マンガン酸カリウム等の酸化剤で分解できないものは測
定できないのに対し、TOC測定は有機物を構成する炭
素量を測定するので有機物総量を知る上で都合がよく、
本発明の方法の場合、TOCを処理水の清浄度の一尺度
とする方がよい。TOCの測定は、通常の水質分析に使
用される燃焼式TOC分析装置を使用してもよいが、本
発明の方法においては、安価で、維持費が安く、管理も
容易なUV計測器を用いた紫外線分析法によっても行う
ことができる。通常TOCの測定・管理に紫外線分析法
を用いることは無いが、本発明の方法において、紫外線
分析法がTOCの測定・管理に使用できるのは、排水中
の有機溶剤量が多くTOCと紫外線吸光度の因果関係が
高いことによると思われる。
In order to know the total amount of organic substances, COD measurement cannot measure those that cannot be decomposed by an oxidizing agent such as potassium permanganate, while TOC measurement measures the amount of carbon constituting the organic substances. Convenient for
In the case of the method of the present invention, TOC should be a measure of the cleanliness of the treated water. The TOC measurement may be performed using a combustion type TOC analyzer used for ordinary water quality analysis, but in the method of the present invention, a UV measuring device that is inexpensive, inexpensive to maintain, and easy to manage is used. It can also be carried out by the conventional UV analysis method. Normally, the UV analysis method is not used for measuring and managing TOC, but in the method of the present invention, the UV analysis method can be used for measuring and managing TOC because the amount of organic solvent in the waste water is large and the TOC and UV absorbance are large. It seems that the causal relationship of is high.

【0027】UV計測器等のTOC分析計は、有機物除
去工程の後であれば、どの位置に置いてもよいが、好ま
しくは紫外線殺菌工程の後に位置させる。処理水中のT
OCが目標値上限を越えるようになったら、活性炭の取
り替え等の処置を採る。
The TOC analyzer such as a UV measuring device may be placed at any position after the organic substance removing step, but it is preferably placed after the ultraviolet sterilization step. T in treated water
If the OC exceeds the upper limit of the target value, take measures such as replacing the activated carbon.

【0028】処理水中の金属イオン分や有機酸分等のイ
オン性物質の管理は、電気伝導度測定を利用して行えば
よい。安価な電気伝導度計でイオン性物質の管理を行え
るが、この場合、約25℃で測定するので、処理水の冷
却機構を要する。処理水中のこれらのイオン性物質の量
が目標値上限を越えるようになったら、交換樹脂の取り
替え等の処置を採る。
Management of ionic substances such as metal ions and organic acids in the treated water may be carried out by utilizing electric conductivity measurement. Although an ionic substance can be controlled with an inexpensive electric conductivity meter, in this case, since the measurement is performed at about 25 ° C, a cooling mechanism for the treated water is required. When the amount of these ionic substances in the treated water exceeds the upper limit of the target value, measures such as replacement of exchange resin are taken.

【0029】[0029]

【実施例】以下、図面を参照しつつ、実施例により本発
明を具体的に説明するが、本発明は実施例に限定される
ものでは無い。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings, but the present invention is not limited to the embodiments.

【0030】実施例1 図1は、本発明の方法の好ましい実施態様の一例をフロ
ーチャートに表した図である。
Example 1 FIG. 1 is a flow chart showing an example of a preferred embodiment of the method of the present invention.

【0031】プリント基板洗浄システム1から排出され
る約60℃の排水L1は、排水受槽R1に貯水され、ポ
ンプP1によりバルブV1を経由して、約10μmの孔
径を有するマイクロフィルター2に通され、排水L1か
らの微粒子の除去が行われる。
Waste water L1 of about 60 ° C. discharged from the printed board cleaning system 1 is stored in a waste water receiving tank R1 and is passed by a pump P1 through a valve V1 to a micro filter 2 having a pore diameter of about 10 μm. Fine particles are removed from the wastewater L1.

【0032】次ぎに、微粒子が除去された排水は活性炭
吸着塔3に通され、有機物除去が行われる(後述する熱
交換により排水温度の低下を行った後、行われる)。
Next, the waste water from which the fine particles have been removed is passed through the activated carbon adsorption tower 3 to remove organic substances (this is performed after the waste water temperature has been lowered by heat exchange described later).

【0033】次ぎに、活性炭吸着塔3を出た処理水は、
カチオン交換樹脂塔4に通され、金属イオン分が除かれ
る。更に、処理水はアニオン交換樹脂塔5に通され、有
機酸分が除かれる。これら二つの交換樹脂塔を設ける代
わりに、カチオン交換樹脂とアニオン交換樹脂を混ぜて
充填した混床塔10(破線で示されている)を一つ設け
てもよい。この場合は、二工程の処理が一工程の処理で
済む。
Next, the treated water leaving the activated carbon adsorption tower 3 is
It is passed through the cation exchange resin tower 4 to remove the metal ion content. Further, the treated water is passed through the anion exchange resin tower 5 to remove the organic acid content. Instead of providing these two exchange resin columns, one mixed bed column 10 (shown by a broken line) in which a cation exchange resin and an anion exchange resin are mixed and packed may be provided. In this case, the two-step process need be one-step process.

【0034】金属イオン分と有機酸分を除去された処理
水は、処理水受槽R2に貯水される。この処理水は、約
45℃前後に冷えているので、これをポンプP2により
熱交換器6に戻し、マイクロフィルター2を通過した排
水と熱交換を行う。従って、上述の説明における活性炭
吸着塔3に入る排水は、約50℃前後に冷却されてい
る。
The treated water from which the metal ions and organic acids have been removed is stored in the treated water receiving tank R2. Since this treated water is cooled to about 45 ° C., it is returned to the heat exchanger 6 by the pump P2, and heat exchange is performed with the wastewater that has passed through the microfilter 2. Therefore, the wastewater entering the activated carbon adsorption tower 3 in the above description is cooled to about 50 ° C.

【0035】熱交換器6を出た処理水はUV殺菌器7に
送られ、滅菌される。UV殺菌器としては、UV−B及
びUV−Cの範囲内に相当する波長の紫外線を発生する
ものが良く、特に、約250〜260nm前後の主波長を
有する紫外線を発生するものが好ましい。また、連続的
殺菌処理が行える点で、流水型UV殺菌器が好ましく、
外照式流水型でも内照式流水型でもよいが、エネルギー
効率から大容量処理に適した内照式流水型が好ましい。
The treated water discharged from the heat exchanger 6 is sent to the UV sterilizer 7 and sterilized. As the UV sterilizer, a UV sterilizer that emits UV light having a wavelength corresponding to the range of UV-B and UV-C is preferable, and a UV sterilizer that emits UV light having a main wavelength of about 250 to 260 nm is particularly preferable. A running water type UV sterilizer is preferable in that continuous sterilization can be performed.
The externally illuminated running water type or the internally illuminated running water type may be used, but the internally illuminated running water type suitable for large-capacity treatment is preferable in terms of energy efficiency.

【0036】次ぎに、UV自動計測器8により、得られ
た実質的純水のTOCの分析が行われ、流量計Fを経由
して、孔径約3μmのマイクロフィルター9に送られ
る。
Next, the TOC of the substantially pure water obtained is analyzed by the UV automatic measuring device 8 and is sent to the microfilter 9 having a pore diameter of about 3 μm via the flowmeter F.

【0037】マイクロフィルター9で上記実質的純水か
ら残存する微粒子を除去し、得られる純水L2は、プリ
ント基板洗浄システムのリンスシャワーノズルへと送ら
れ、プリント基板の仕上げ洗いに再び使われる。
The microfilter 9 removes the remaining fine particles from the substantially pure water, and the pure water L2 obtained is sent to the rinse shower nozzle of the printed circuit board cleaning system and used again for the final cleaning of the printed circuit board.

【0038】上記したUV自動計測器8により、本発明
方法の場合、TOC分析が充分行えることを実証してい
るのが第2図である。
FIG. 2 demonstrates that the TOC analysis can be sufficiently carried out in the case of the method of the present invention by the above-mentioned UV automatic measuring device 8.

【0039】即ち、図2(a),(b),(c)及び
(d)は、同一条件(セル長:50mm)で求めたUV吸
光度曲線を表す図であり、図2(a)はTOC2.5 mg/
l の水を測定した場合、図2(b)はTOC5.0 mg/l
の水を測定した場合、図2(c)はTOC7.5 mg/l の
水を測定した場合、図2(d)はTOC15.0mg/lの水
を測定した場合である(これらの水の汚染成分は、本発
明方法で処理された水中の汚染成分とほぼ同じであ
る)。紫外線波長254nmのピーク高さとTOCの相関
関係が高く、本発明の方法におけるTOC管理の目的に
充分であることが分かるであろう。
That is, FIGS. 2 (a), 2 (b), 2 (c) and 2 (d) are UV absorption curves obtained under the same conditions (cell length: 50 mm), and FIG. TOC 2.5 mg /
Fig. 2 (b) shows TOC 5.0 mg / l when measuring 1 l of water.
2 (c) shows the case of measuring TOC 7.5 mg / l water, and FIG. 2 (d) shows the case of measuring TOC 15.0 mg / l water (these waters). The pollutants are almost the same as the pollutants in the water treated by the method of the present invention). It can be seen that there is a high correlation between the peak height of the ultraviolet wavelength of 254 nm and TOC, which is sufficient for the purpose of TOC control in the method of the present invention.

【0040】図1には図示されていないが、電導度計を
金属イオン・有機酸分除去工程の後の何処かの位置に設
け、イオン性物質の管理を行ってもよい。例えば、5μ
s/cmを目標値上限とした場合、電気伝導度がこの値
を越えた時、イオン交換樹脂の薬液による再生、或いは
イオン交換樹脂塔がカートリッジ方式の場合は、イオン
交換樹脂の交換の処置を採る。
Although not shown in FIG. 1, a conductivity meter may be provided at some position after the metal ion / organic acid content removing step to control the ionic substance. For example, 5μ
When s / cm is set as the upper limit of the target value, when the electric conductivity exceeds this value, the ion exchange resin must be regenerated with a chemical solution, or if the ion exchange resin tower is a cartridge type, the ion exchange resin must be replaced. take.

【0041】排水処理システム中の流量は、流量計Fの
計測値等に基づき、制御回路を用いて、バルブV1、V
2、V3、V4、その他図示されていないバルブ等を制
御して、調節する。
The flow rate in the waste water treatment system is based on the measured value of the flow meter F and the like, and the valves V1, V
2, V3, V4 and other valves not shown are controlled and adjusted.

【0042】[0042]

【発明の効果】本発明の方法によるプリント基板洗浄希
薄排水の回収システムの中に、紫外線殺菌工程を組み込
んだので、処理後の純水をプリント基板洗浄システム中
のリンスシャワーとして再利用してもシャワーノズルが
詰まったり、洗浄されたプリント基板が再汚染されてそ
の合格率低下を招く等のトラブルを無くすことができ
る。また、通常の酸化系殺菌剤を使用した場合と異なっ
て、紫外線を使用しているので、プリント基板の金属部
分が腐食する問題を避けることができる。
The ultraviolet sterilization process is incorporated in the system for diluting the printed circuit board cleaning diluted wastewater by the method of the present invention, so that the treated pure water can be reused as a rinse shower in the printed circuit board cleaning system. Problems such as clogging of the shower nozzle and recontamination of the cleaned printed circuit board and a decrease in the acceptance rate can be eliminated. Further, unlike the case of using a normal oxidant type germicide, since ultraviolet rays are used, it is possible to avoid the problem that the metal portion of the printed circuit board is corroded.

【0043】更に、本発明の方法の場合は、処理水中の
TOCの検出測定を安価で、維持費が安く、管理も容易
なUV計測器を用いた紫外線分析法によって行うことが
できるので、処理水の水質管理が低コストで行えるとい
う利点を有する。
Further, in the case of the method of the present invention, the detection and measurement of TOC in the treated water can be carried out by an ultraviolet analysis method using a UV measuring instrument which is inexpensive, low in maintenance cost and easy to manage. It has an advantage that the water quality can be controlled at low cost.

【0044】本発明の方法によるプリント基板洗浄希薄
排水の回収システムの中に熱交換器を組み込んだ場合、
有機物除去工程に活性炭を使用して、その吸着効率を高
いレベルで使用でき、有機酸除去工程でアニオン交換樹
脂を使用して、その交換容量の経時低減傾向を抑えるこ
とができ、また、得られる純水をリンスシャワーに使用
するに際して、省エネルギー化を図ることができる。
When a heat exchanger is incorporated in the system for diluting the printed circuit board cleaning diluted wastewater by the method of the present invention,
Activated carbon can be used in the organic substance removal step to use its adsorption efficiency at a high level, and anion exchange resin can be used in the organic acid removal step to suppress the tendency of the exchange capacity to decrease over time. Energy can be saved when pure water is used for the rinse shower.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の方法の好ましい実施態様の一例をフロ
ーチャートに表した図である。
FIG. 1 is a flow chart showing an example of a preferred embodiment of the method of the present invention.

【図2】図2(a),(b),(c)及び(d)は、プ
リント基板洗浄希薄排水から得られる異なったTOCの
処理水の各UV吸光度曲線(同一条件下に求めた)を表
す図である。
FIGS. 2 (a), (b), (c) and (d) are UV absorption curves of treated water of different TOCs obtained from diluted waste water for cleaning printed circuit boards (determined under the same conditions). It is a figure showing.

【符号の説明】[Explanation of symbols]

1 プリント基板洗浄システム 2 マイクロフィルター 3 活性炭吸着塔 4 カチオン交換樹脂塔 5 アニオン交換樹脂塔 6 熱交換器 7 UV殺菌器 8 UV自動計測器 9 マイクロフィルター 10 混床塔 L1 排水 L2 純水 1 Printed circuit board cleaning system 2 micro filters 3 Activated carbon adsorption tower 4 Cation exchange resin tower 5 Anion exchange resin tower 6 heat exchanger 7 UV sterilizer 8 UV automatic measuring instrument 9 Micro filter 10 mixed bed tower L1 drainage L2 pure water

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C02F 1/42 G 7158−4D 9/00 Z 6647−4D // B01D 61/14 500 C02F 1/44 K 8014−4D (72)発明者 吉谷川 陽代 埼玉県戸田市川岸1丁目4番9号 オルガ ノ株式会社総合研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical indication C02F 1/42 G 7158-4D 9/00 Z 6647-4D // B01D 61/14 500 C02F 1 / 44 K 8014-4D (72) Inventor, Yoyo Yoshitani, 1-4-9 Kawagishi, Toda City, Saitama Prefecture Organo Research Institute

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 プリント基板の洗浄により生成する希薄
排水から水を回収する方法において、排水から有機物を
除去する工程、有機物除去工程を経た処理水から金属イ
オン分及び有機酸分を除去する工程、及び金属イオン分
・有機酸分除去工程を経た処理水を紫外線殺菌する工
程、更に、排水又はいづれかの処理水から微粒子を除去
する工程を包含することを特徴とするプリント基板洗浄
希薄排水からの水の回収方法。
1. A method of recovering water from dilute wastewater generated by cleaning a printed circuit board, a step of removing organic matter from the wastewater, a step of removing metal ions and organic acids from the treated water that has undergone the organic matter removing step, And water from diluted wastewater for cleaning printed circuit boards, characterized by including a step of sterilizing the treated water after the metal ion / organic acid removal step with ultraviolet rays, and a step of removing fine particles from the wastewater or any of the treated water. Recovery method.
【請求項2】 前記金属イオン分・有機酸分除去工程
を、カチオン交換樹脂及びアニオン交換樹脂の混合樹脂
からなる混床に通液することにより行うことを特徴とす
る請求項1に記載のプリント基板洗浄希薄排水からの水
の回収方法。
2. The print according to claim 1, wherein the step of removing the metal ion / organic acid content is performed by passing the solution through a mixed bed composed of a mixed resin of a cation exchange resin and an anion exchange resin. Substrate cleaning Method for recovering water from dilute wastewater.
【請求項3】 前記金属イオン分・有機酸分除去工程
を、カチオン交換樹脂床及びアニオン交換樹脂床に通液
することにより行うことを特徴とする請求項1に記載の
プリント基板洗浄希薄排水からの水の回収方法。
3. The diluted wastewater from printed circuit board cleaning according to claim 1, wherein the step of removing the metal ion / organic acid content is performed by passing the solution through a cation exchange resin bed and an anion exchange resin bed. Water recovery method.
【請求項4】 少なくとも前記有機物除去工程を経た処
理水に対して、有機物総含有量の検出測定を紫外線分析
法により行うことにより回収水の水質管理を行うことを
特徴とする請求項1ないし3のいずれかに記載のプリン
ト基板洗浄希薄排水からの水の回収方法。
4. The water quality control of the recovered water is carried out by detecting and measuring the total organic matter content of the treated water that has undergone at least the organic matter removing step by an ultraviolet analysis method. 5. A method for recovering water from diluted wastewater for cleaning printed circuit boards according to any one of 1.
【請求項5】 少なくとも前記金属イオン分・有機酸分
除去工程を経た処理水を少なくとも前記有機物除去工程
の前に設けられた熱交換器に戻し、排水と熱交換を行う
ことにより有機物除去工程に入る排水の温度を下げるこ
とを特徴とする請求項1ないし3のいずれかに記載のプ
リント基板洗浄希薄排水からの水の回収方法。
5. The organic water removing step is performed by returning the treated water that has undergone at least the metal ion / organic acid removing step to at least a heat exchanger provided before the organic material removing step and performing heat exchange with waste water. The method for recovering water from diluted wastewater for cleaning printed circuit boards according to claim 1, wherein the temperature of the wastewater entering is lowered.
JP3015943A 1991-01-14 1991-01-14 Water recovery method from diluted wastewater for printed circuit board cleaning Expired - Fee Related JP2754925B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3015943A JP2754925B2 (en) 1991-01-14 1991-01-14 Water recovery method from diluted wastewater for printed circuit board cleaning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3015943A JP2754925B2 (en) 1991-01-14 1991-01-14 Water recovery method from diluted wastewater for printed circuit board cleaning

Publications (2)

Publication Number Publication Date
JPH0513936A true JPH0513936A (en) 1993-01-22
JP2754925B2 JP2754925B2 (en) 1998-05-20

Family

ID=11902848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3015943A Expired - Fee Related JP2754925B2 (en) 1991-01-14 1991-01-14 Water recovery method from diluted wastewater for printed circuit board cleaning

Country Status (1)

Country Link
JP (1) JP2754925B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1330592C (en) * 2003-03-14 2007-08-08 栗田工业株式会社 Hyperpure water manufacturing systems
JP2016172947A (en) * 2010-11-25 2016-09-29 栗田工業株式会社 Method for manufacturing paper
JP2021137804A (en) * 2020-03-04 2021-09-16 エーティーアンドエス オーストリア テクノロジー アンド システムテクニック アクツィエンゲゼルシャフト Method for treating metal salt-containing medium from partial stream of circuit board and/or substrate production

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1330592C (en) * 2003-03-14 2007-08-08 栗田工业株式会社 Hyperpure water manufacturing systems
JP2016172947A (en) * 2010-11-25 2016-09-29 栗田工業株式会社 Method for manufacturing paper
JP2021137804A (en) * 2020-03-04 2021-09-16 エーティーアンドエス オーストリア テクノロジー アンド システムテクニック アクツィエンゲゼルシャフト Method for treating metal salt-containing medium from partial stream of circuit board and/or substrate production

Also Published As

Publication number Publication date
JP2754925B2 (en) 1998-05-20

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