JPH05134398A - Photomask cleaner, production for photomask and for semiconductor device - Google Patents
Photomask cleaner, production for photomask and for semiconductor deviceInfo
- Publication number
- JPH05134398A JPH05134398A JP30043591A JP30043591A JPH05134398A JP H05134398 A JPH05134398 A JP H05134398A JP 30043591 A JP30043591 A JP 30043591A JP 30043591 A JP30043591 A JP 30043591A JP H05134398 A JPH05134398 A JP H05134398A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- brush
- cleaning
- manufacturing
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000004065 semiconductor Substances 0.000 title claims description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 55
- 239000002245 particle Substances 0.000 claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 description 22
- 239000003599 detergent Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000005201 scrubbing Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0288—Ultra or megasonic jets
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体装置等の製造の
フォト工程に用いるフォトマスクの、洗浄装置及び製造
方法、及び半導体装置の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photomask cleaning apparatus and a method for manufacturing a photomask used in a photo process for manufacturing a semiconductor device, and a method for manufacturing a semiconductor device.
【０００２】[0002]
【従来の技術】従来技術のフォトマスク洗浄装置を図２
に示す。2. Description of the Related Art A conventional photomask cleaning apparatus is shown in FIG.
Shown in.
【０００３】図２は、従来技術のフォトマスクの両面ス
クラブ洗浄装置の断面図であり、以下図に従って従来技
術の説明をする。FIG. 2 is a cross-sectional view of a conventional photomask double-sided scrub cleaning apparatus. The prior art will be described below with reference to the drawings.
【０００４】スクラブ洗浄槽１４の中に、ポリビニール
アルコール等を原料とする多孔質体（以下ベルクリンと
呼ぶ）を円盤状に成形したブラシ３が、向き合わせて数
個ずつ配置されている。その向かい合わせに配置された
ブラシの間隔はフォトマスクの厚さより若干小さく設定
され、洗浄効果を上げるためにブラシは縦方向に２段配
置されている。なおブラシ３には純水配管１１よりブラ
シ駆動軸５を通して純水を供給しベルクリンを柔らかい
スポンジ状にすることも重要である。In the scrubbing washing tank 14, a plurality of brushes 3 each formed by molding a porous body (hereinafter referred to as "Berculin") made of polyvinyl alcohol or the like into a disc shape are arranged facing each other. The interval between the brushes arranged facing each other is set to be slightly smaller than the thickness of the photomask, and the brushes are arranged in two stages in the vertical direction to enhance the cleaning effect. It is also important to supply pure water from the pure water pipe 11 to the brush 3 through the brush drive shaft 5 so that the bellkulin is made into a soft sponge.
【０００５】またブラシ３はホルダー４に接着されてお
りモーター６の駆動力により回転する。The brush 3 is adhered to the holder 4 and is rotated by the driving force of the motor 6.
【０００６】その回転しているブラシの間を、アーム２
により保持されたフォトマスク１がゆっくりと上下方向
に移動する事により、フォトマスク１の表面を同時に両
面スクラブ洗浄する。The arm 2 is inserted between the rotating brushes.
By slowly moving the photomask 1 held by the above in the vertical direction, the surface of the photomask 1 is simultaneously subjected to double-side scrub cleaning.
【０００７】つまりこの洗浄装置は、ブラシでこすると
いう物理的な作用により、フォトマスク１の表面に付着
しているパーティクルを除去しようとする方法をとって
おり、さらにシャワーノズル１２から純水１３をフォト
マスク１の表面に向けて吐出することにより、ブラシ３
でこすることによって付着力を弱められたパーティクル
を洗い流す効果をねらっている。That is, this cleaning apparatus employs a method of removing particles adhering to the surface of the photomask 1 by a physical action of rubbing with a brush, and further, from the shower nozzle 12 to pure water 13. Of the brush 3 toward the surface of the photomask 1
The effect is to wash away particles whose adhesion has been weakened by rubbing.
【０００８】また、付着力が強固で純水を流しながらブ
ラシでこするだけでは不充分なパーティクルに対して
は、アームに保持されたフォトマスクがスクラブ洗浄槽
１４の下部まで移動しスクラブ洗浄槽１４の下部に設け
た洗剤ノズル１６より洗剤１７をフォトマスクに吹き付
けた後、ブラシでのスクラブ洗浄を行なうという方法を
取っていた。Further, for particles which have a strong adhesive force and are insufficient for rubbing with a brush while flowing pure water, the photomask held by the arm is moved to a lower portion of the scrub cleaning tank 14 and the scrub cleaning tank is moved. After the detergent 17 is sprayed onto the photomask from the detergent nozzle 16 provided in the lower portion of 14, the scrubbing with a brush is performed.
【０００９】[0009]
【発明が解決しようとする課題】しかし、従来技術のフ
ォトマスクの洗浄装置では、フォトマスクの洗浄を繰り
返す間にブラシにフォトマスクのパーティクルが付着
し、ブラシに付着したパーティクルが再びフォトマスク
の表面に付着するという課題を有していた。However, in the photomask cleaning apparatus of the prior art, the particles of the photomask adhere to the brush while the cleaning of the photomask is repeated, and the particles adhered to the brush reappear on the surface of the photomask. Had the problem of adhering to.
【００１０】そこで本発明はこのような課題を解決する
もので、その目的とするところはブラシに付着したパー
ティクルを自動的に除去しながらフォトマスクの両面ス
クラブ洗浄装置を提供するところにある。Therefore, the present invention solves such a problem, and an object thereof is to provide a double-side scrub cleaning device for a photomask while automatically removing particles adhering to the brush.
【００１１】また、従来技術のフォトマスクの製造方法
では、その洗浄工程を従来技術の洗浄方法で処理してい
たため、パーティクルの品質規格を満足するまでに何回
も洗浄を繰り返さなければならず、フォトマスクの製造
納期が安定しないという課題を有していた。Further, in the conventional photomask manufacturing method, since the cleaning process is performed by the conventional cleaning method, the cleaning must be repeated many times until the particle quality standard is satisfied. The problem was that the photomask manufacturing delivery date was not stable.
【００１２】そこで本発明はこのような課題を解決する
もので、その目的とするところは短納期で安定した製造
ができるフォトマスクの製造方法を提供するところにあ
る。また、従来技術の半導体装置の製造方法では、その
フォト工程において従来技術の洗浄方法で洗浄したフォ
トマスクを使用しているため、パーティクルの品質レベ
ルが低く半導体装置のパターンにパーティクルが転写し
て欠陥となる危険性が高いという課題を有していた。Therefore, the present invention solves such a problem, and an object of the present invention is to provide a method of manufacturing a photomask which can be stably manufactured with a short delivery time. Further, in the conventional semiconductor device manufacturing method, since the photomask cleaned by the conventional cleaning method is used in the photo process, the quality level of the particles is low and the particles are transferred to the pattern of the semiconductor device to cause a defect. There was a problem that the risk of becoming
【００１３】そこで本発明はこのような課題を解決する
もので、その目的とするところは欠陥の少ないフォト工
程処理ができる半導体装置の製造方法を提供するところ
にある。Therefore, the present invention solves such a problem, and an object of the present invention is to provide a method of manufacturing a semiconductor device capable of performing a photo process with few defects.
【００１４】[0014]
【課題を解決するための手段】上記課題を解決するた
め、本発明のフォトマスク洗浄装置は、フォトマスクの
表面に付着したパーティクルを除去するために前記フォ
トマスクの表面をブラシでこするフォトマスクの洗浄装
置において、超音波発振器と振動板を有し、超音波振動
を与えた水流を前記ブラシに流すことを特徴とする。In order to solve the above problems, a photomask cleaning apparatus of the present invention is a photomask in which the surface of the photomask is rubbed with a brush to remove particles adhering to the surface of the photomask. In the cleaning device, the ultrasonic wave oscillator and the vibration plate are provided, and the water flow to which the ultrasonic vibration is applied is caused to flow through the brush.
【００１５】また本発明のフォトマスクの製造方法は、
フォトマスク製造の洗浄工程において、請求項１記載の
フォトマスクの洗浄方法を用いることを特徴とする。The photomask manufacturing method of the present invention is
The method of cleaning a photomask according to claim 1 is used in the cleaning step of manufacturing a photomask.
【００１６】また本発明の半導体装置の製造方法は、半
導体装置製造のフォト工程において、請求項１記載のフ
ォトマスクの洗浄方法で洗浄したフォトマスクを用いて
パターン転写することを特徴とする。Further, the semiconductor device manufacturing method of the present invention is characterized in that, in the photo step of manufacturing the semiconductor device, pattern transfer is performed using the photomask cleaned by the photomask cleaning method according to claim 1.
【００１７】[0017]
【実施例】以下に本発明の実施例を図面にもとづいて説
明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１８】図１は、本発明の実施例によるフォトマス
クの両面スクラブ洗浄装置の断面図である。FIG. 1 is a cross-sectional view of a photomask double-side scrub cleaning apparatus according to an embodiment of the present invention.
【００１９】スクラブ洗浄槽１４の上部に、振動板８を
貼付けたノズル９が設けてある。超音波発振器７によ
り、振動板８がノズル９内の純水に振動を与えることに
より、ノズル９から超音波振動を与えられた純水１０が
ブラシ３に吐出される。A nozzle 9 having a vibrating plate 8 attached thereto is provided above the scrub cleaning tank 14. The vibrating plate 8 vibrates the pure water in the nozzle 9 by the ultrasonic oscillator 7, so that the pure water 10 to which the ultrasonic vibration is applied is ejected from the nozzle 9 to the brush 3.
【００２０】超音波振動を与えられた純水１０がノズル
３の表面を流れることにより、フォトマスク１から脱落
してノズル３に付着したパーティクルは、純水に叩き出
される要領で容易に除去され、洗い流される。As the pure water 10 to which ultrasonic vibration is applied flows on the surface of the nozzle 3, the particles that have fallen off the photomask 1 and adhered to the nozzle 3 are easily removed as if they were hit out with pure water. , Washed away.
【００２１】この方式により、この実施例のようにブラ
シの取り外しが困難な構造を持った両面スクラブ洗浄装
置においても、フォトマスクの洗浄を１枚処理するごと
に、１回ブラシ洗浄を実施することが可能となる。According to this method, even in the double-sided scrubbing apparatus having a structure in which the brush is difficult to remove as in this embodiment, the brush cleaning should be performed once for each cleaning of the photomask. Is possible.
【００２２】ここで、本発明の実施例のスクラブ洗浄装
置の構成を説明する。The structure of the scrubbing cleaning apparatus according to the embodiment of the present invention will be described.
【００２３】スクラブ洗浄槽１４の中に、ベルクリンを
円盤状に成形したブラシ３が、向き合わせて数個ずつ配
置されている。その向かい合わせに配置されたブラシの
間隔はフォトマスクの厚さより若干小さく設定され、洗
浄効果を上げるためにブラシは縦方向に２段配置されて
いる。In the scrubbing cleaning tank 14, a plurality of brushes 3 each of which is formed of bellkulin in a disk shape are arranged facing each other. The interval between the brushes arranged opposite to each other is set to be slightly smaller than the thickness of the photomask, and the brushes are arranged in two stages in the vertical direction in order to enhance the cleaning effect.
【００２４】またブラシ３はホルダー４に接着されてお
り、さらに純水配管１１よりブラシ駆動軸５を通して純
水が供給され、モーター６の駆動力により回転してい
る。The brush 3 is adhered to the holder 4, pure water is supplied from the pure water pipe 11 through the brush drive shaft 5, and is rotated by the driving force of the motor 6.
【００２５】その回転しているブラシの間を、アーム２
により保持されたフォトマスク１がゆっくりと上下方向
に移動する事により、フォトマスク１の表面を同時に両
面スクラブ洗浄する。The arm 2 is placed between the rotating brushes.
By slowly moving the photomask 1 held by the above in the vertical direction, the surface of the photomask 1 is simultaneously subjected to double-side scrub cleaning.
【００２６】さらにシャワーノズル１２から純水１３を
フォトマスク１の表面に向けて吐出することにより、ブ
ラシ３でこすることによって付着力を弱められたパーテ
ィクルを洗い流している。Further, pure water 13 is discharged from the shower nozzle 12 toward the surface of the photomask 1 to wash away particles whose adhesion is weakened by rubbing with the brush 3.
【００２７】また、付着力が強固で純水を流しながらブ
ラシでこするだけでは不充分なパーティクルに対して
は、アームに保持されたフォトマスクがスクラブ洗浄槽
１４の下部まで移動しスクラブ洗浄槽１４の下部に設け
た洗剤ノズル１６より洗剤１７をフォトマスクに吹き付
けた後、ブラシでのスクラブ洗浄を行なう。Further, for particles that have a strong adhesive force and are insufficient for rubbing with a brush while flowing pure water, the photomask held by the arm moves to the lower portion of the scrub cleaning tank 14 and is moved to the scrub cleaning tank. After the detergent 17 is sprayed onto the photomask from the detergent nozzle 16 provided in the lower part of 14, the scrubbing is performed with a brush.
【００２８】また、ブラシの材質についてもナイロン製
の毛ブラシ等を用いても本発明の洗浄方法は有効であ
る。また、実施例においてはフォトマスクを垂直方向に
動かしたが、水平方向に動かす方式の洗浄装置や、フォ
トマスクを水平に保持して静止または回転させながらス
クラブ洗浄する方式にも、本発明は適用できる。As for the material of the brush, the cleaning method of the present invention is effective even if a nylon bristle brush or the like is used. Although the photomask is moved in the vertical direction in the embodiments, the present invention is also applicable to a cleaning device in which the photomask is moved in the horizontal direction and a scrub cleaning method in which the photomask is held horizontally and is stationary or rotated. it can.
【００２９】さらに、本発明のスクラブ洗浄方法はパー
ティクルの除去が確実にできるため、フォトマスクの製
造における洗浄工程に本発明の洗浄方法を用いると、短
納期で安定したフォトマスクの製造が可能となる。Further, since the scrub cleaning method of the present invention can surely remove particles, if the cleaning method of the present invention is used in the cleaning step in the photomask manufacturing, it is possible to manufacture the photomask stably in a short delivery time. Become.
【００３０】また、半導体装置の製造におけるフォト工
程に本発明の洗浄方法を用いると、欠陥の少ない半導体
装置の製造が可能となる。If the cleaning method of the present invention is used in the photo process in the manufacture of semiconductor devices, it is possible to manufacture semiconductor devices with few defects.
【００３１】[0031]
【発明の効果】以上に説明したように、本発明のフォト
マスクの洗浄装置は、超音波発振器と振動板を用いて、
超音波振動を与えた水流をブラシに流すという簡単な構
造により、フォトマスクへのパーティクルの再付着を防
止するという効果がある。As described above, the photomask cleaning device of the present invention uses the ultrasonic oscillator and the diaphragm.
The simple structure of flowing a water stream to which ultrasonic vibration is applied to the brush has an effect of preventing reattachment of particles to the photomask.
【００３２】また、本発明のフォトマスクの洗浄装置は
洗浄効率が高く、フォトマスクを繰り返し洗浄する必要
がなくなるため、洗浄およびそれに伴う検査にかかる時
間と工数を大幅に削減できるという効果がある。Further, the photomask cleaning apparatus of the present invention has a high cleaning efficiency and does not require repeated cleaning of the photomask, so that there is an effect that the time and man-hours required for cleaning and the inspection associated therewith can be greatly reduced.
【００３３】さらに、本発明のスクラブ洗浄方法は、パ
ーティクルの再付着を防止できるため、フォトマスクの
製造における洗浄工程に本発明の洗浄方法を用いること
により、短納期で安定したフォトマスクの製造ができる
という効果もある。Further, since the scrub cleaning method of the present invention can prevent re-adhesion of particles, by using the cleaning method of the present invention in the cleaning step in manufacturing the photo mask, the photo mask can be manufactured stably in a short delivery time. There is also the effect that you can.
【００３４】また、半導体装置の製造におけるフォト工
程に本発明の洗浄方法を用いることにより、欠陥の少な
い半導体装置の製造ができ、歩留りが上がるという効果
もある。Further, by using the cleaning method of the present invention in the photo process in the manufacture of semiconductor devices, semiconductor devices with few defects can be manufactured, and the yield can be increased.
【図１】本発明のフォトマスクの両面スクラブ洗浄装置
の断面図。FIG. 1 is a cross-sectional view of a double-sided scrub cleaning device for a photomask according to the present invention.
【図２】従来技術のフォトマスクの両面スクラブ洗浄装
置の断面図。FIG. 2 is a cross-sectional view of a conventional double-sided scrub cleaning device for a photomask.
１ フォトマスク ２ アーム ３ ブラシ ４ ホルダー ５ ブラシ駆動軸 ６ モーター ７ 超音波発振器 ８ 振動板 ９ ノズル １０ 超音波振動を与えられた純水 １１ 純水配管 １２ シャワーノズル １３ 純水 １４ スクラブ洗浄槽 １５ ドレイン口 １６ 洗剤ノズル １７ 洗剤 1 Photo Mask 2 Arm 3 Brush 4 Holder 5 Brush Drive Shaft 6 Motor 7 Ultrasonic Oscillator 8 Vibration Plate 9 Nozzle 10 Pure Water Subjected to Ultrasonic Vibration 11 Pure Water Pipe 12 Shower Nozzle 13 Pure Water 14 Scrub Cleaning Tank 15 Drain Mouth 16 Detergent Nozzle 17 Detergent
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｈ０１Ｌ 21/304 ３４１ Ｂ 8831−4Ｍ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical indication H01L 21/304 341 B 8831-4M
Claims (3)
ルを除去するために前記フォトマスクの表面をブラシで
こするフォトマスクの洗浄装置において、超音波発振器
と振動板を有し、超音波振動を与えた水流を前記ブラシ
に流すことを特徴とするフォトマスクの洗浄装置。1. A photomask cleaning apparatus in which the surface of the photomask is rubbed with a brush to remove particles adhering to the surface of the photomask. The photomask cleaning apparatus includes an ultrasonic oscillator and a vibration plate, and applies ultrasonic vibration. An apparatus for cleaning a photomask, characterized in that a flowing water stream is caused to flow through the brush.
求項１記載のフォトマスクの洗浄装置を用いることを特
徴とするフォトマスクの製造方法。2. A method of manufacturing a photomask, wherein the photomask cleaning apparatus according to claim 1 is used in a cleaning step of manufacturing a photomask.
求項１記載のフォトマスクの洗浄装置で洗浄したフォト
マスクを用いてパターン転写することを特徴とする半導
体装置の製造方法。3. A method of manufacturing a semiconductor device, wherein in the photo step of manufacturing a semiconductor device, pattern transfer is performed using the photomask cleaned by the photomask cleaning device according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30043591A JPH05134398A (en) | 1991-11-15 | 1991-11-15 | Photomask cleaner, production for photomask and for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30043591A JPH05134398A (en) | 1991-11-15 | 1991-11-15 | Photomask cleaner, production for photomask and for semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05134398A true JPH05134398A (en) | 1993-05-28 |
Family
ID=17884771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30043591A Pending JPH05134398A (en) | 1991-11-15 | 1991-11-15 | Photomask cleaner, production for photomask and for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05134398A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6345630B2 (en) | 1998-11-11 | 2002-02-12 | Applied Materials, Inc. | Method and apparatus for cleaning the edge of a thin disc |
| US6743723B2 (en) | 1995-09-14 | 2004-06-01 | Canon Kabushiki Kaisha | Method for fabricating semiconductor device |
| US6904637B2 (en) | 2001-10-03 | 2005-06-14 | Applied Materials, Inc. | Scrubber with sonic nozzle |
| CN1319657C (en) * | 2003-10-22 | 2007-06-06 | 株式会社海上 | Ultrasonic shower cleaning apparatus of double-side cleaning type |
| US8372210B2 (en) | 2003-10-27 | 2013-02-12 | Applied Materials, Inc. | Post CMP scrubbing of substrates |
| CN108993975A (en) * | 2018-08-22 | 2018-12-14 | 宁国宁志橡塑科技有限公司 | A kind of drum-type auto parts and components cleaning device |
| CN110977501A (en) * | 2019-11-20 | 2020-04-10 | 江苏昊雄智能装备有限公司 | Horizontal machining center overturning workbench |
-
1991
- 1991-11-15 JP JP30043591A patent/JPH05134398A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6743723B2 (en) | 1995-09-14 | 2004-06-01 | Canon Kabushiki Kaisha | Method for fabricating semiconductor device |
| US6345630B2 (en) | 1998-11-11 | 2002-02-12 | Applied Materials, Inc. | Method and apparatus for cleaning the edge of a thin disc |
| US6904637B2 (en) | 2001-10-03 | 2005-06-14 | Applied Materials, Inc. | Scrubber with sonic nozzle |
| US7063749B2 (en) | 2001-10-03 | 2006-06-20 | Applied Materials | Scrubber with sonic nozzle |
| CN1319657C (en) * | 2003-10-22 | 2007-06-06 | 株式会社海上 | Ultrasonic shower cleaning apparatus of double-side cleaning type |
| US7422024B2 (en) | 2003-10-22 | 2008-09-09 | Kaijo Corporation | Ultrasonic shower cleaning apparatus of double-side cleaning type |
| US8372210B2 (en) | 2003-10-27 | 2013-02-12 | Applied Materials, Inc. | Post CMP scrubbing of substrates |
| CN108993975A (en) * | 2018-08-22 | 2018-12-14 | 宁国宁志橡塑科技有限公司 | A kind of drum-type auto parts and components cleaning device |
| CN110977501A (en) * | 2019-11-20 | 2020-04-10 | 江苏昊雄智能装备有限公司 | Horizontal machining center overturning workbench |
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